Patents-Review.com
ClassID:

206364 ⎘

H01J2237/06 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Sources

Sub-classes:
Recent Application in this class:
#1
20190279847
2019-09-12

Method for pulsed laser deposition

 #2
20190185988
2019-06-20

Storage and delivery of antimony-containing materials to an ion implanter

 #3
20190062901
2019-02-28

Antimony-containing materials for ion implantation

 #4
20180226226
2018-08-09

Power supply system

 #5
20170287674
2017-10-05

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #6
20160155602
2016-06-02

Ion milling device and processing method using the ion milling device

 #7
20160111251
2016-04-21

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #8
20150325411
2015-11-12

Directional treatment for multi-dimensional device processing

 #9
20150097123
2015-04-09

Charged particle beam apparatus

 #10
20150000842
2015-01-01

Power supply system, plasma etching apparatus, and plasma etching method

 #11
20140158902
2014-06-12

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #12
20120104252
2012-05-03

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #13
20100258262
2010-10-14

Method and apparatus for producing large diameter superalloy ingots

 #14
20100181479
2010-07-22

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #15
20090110951
2009-04-30

Atomically sharp iridium tip

 #16
20080179033
2008-07-31

Method and apparatus for producing large diameter superalloy ingots

 #17
20080054184
2008-03-06

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #18
20060289804
2006-12-28

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements