206381 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Source emittance characteristics Density
PHOTO-ASSISTED ELECTRON BEAM EMITTER
#2Charged Particle Beam Device
#3SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUDING MULTI-RF ZONED SUBSTRATE SUPPORTS
#4Gun lens design in a charged particle microscope
#5Device for the Extraction of Electrical Charge Carriers from a Charge Carrier Generation Space and Method for Operating Such a Device
#6Methods and Systems for Independent Control of Radical Density, Ion Density, and Ion Energy in Pulsed Plasma Semiconductor Device Fabrication
#7System and method for increasing electron density levels in a plasma of a substrate processing system
#8Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication
#9Resonant structure for a plasma processing system
#10Plasma Etching Device
#11Substrate Treating Apparatus and Method
#12Charged particle beam apparatus, and method of controlling the same
#13Crossover point regulation method for electro-static focusing systems
#14ION BEAM DISTRIBUTION
#15Charged particle beam apparatus, and method of controlling the same
#16Multiple device shaping uniform distribution of current density in electro-static focusing systems
#17Multiple device shaping uniform distribution of current density in electro-static focusing systems