206379 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources Source emittance characteristics
Sub-classes:ION BEAM GENERATING DEVICE INCLUDING LIQUID METAL ION SOURCE AND METHOD OF MANUFACTURING THE SAME
#2Ultra broad band continuously tunable electron beam pulser
#3Apparatus of plural charged-particle beams
#4Electrode for use in ion implantation apparatus and ion implantation apparatus
#5Electron gun, method of controlling same, and electron beam additive manufacturing machine
#6Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
#7Electron beam apparatus
#8Inductive modulation of focusing voltage in charged beam system
#9Method of protecting a radiation detector in a charged particle instrument
#10Electron beam source and method of manufacturing the same
#11Electron gun
#12Small form factor plasma source for high density wide ribbon ion beam generation
#13ELECTRON BEAM GENERATOR HAVING ADJUSTABLE BEAM WIDTH
#14Electron gun with magnetic immersion double condenser lenses
#15Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control
#16Electron beam source and method of manufacturing the same
#17ELECTRON SOURCE
#18Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the same
#19Charged particle beam device
#20Systems and methods for a gas field ionization source
#21Electron gun and electron beam apparatus field of invention
#22Method for manufacturing an electron emitter
#23Ion implanter and method of manufacturing semiconductor device
#24Control circuit for controlling an electron-emitting device