ClassID:

206395

H01J2237/0835 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Beam forming Variable cross-section or shape

Recent Application in this class:
#1
20240212967
2024-06-27

ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELECTRON BEAM

#2
20230065475
2023-03-02

PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTICLE MICROSCOPE

#3
20190326089
2019-10-24

Ion source and ion implantation apparatus

#4
20170178859
2017-06-22

Systems for controlling a high power ion beam

#5
20160189914
2016-06-30

Device and method for optimizing diffusion section of electron beam

#6
20150371857
2015-12-24

Lower dose rate ion implantation using a wider ion beam

#7
20150060704
2015-03-05

WRITING DATA CORRECTING METHOD, WRITING METHOD, AND MANUFACTURING METHOD OF MASK OR TEMPLATE FOR LITHOGRAPHY

#8
20130299697
2013-11-14

Charged particle beam applied apparatus, and irradiation method

#9
20130042809
2013-02-21

Ion implanter

#10
20120181444
2012-07-19

High-vacuum variable aperture mechanism and method of using same

#11
20120080308
2012-04-05

PLUME STEERING

#12
20110204225
2011-08-25

ION Beam System and Machining Method

#13
20110199027
2011-08-18

ELECTRON BEAM GENERATOR HAVING ADJUSTABLE BEAM WIDTH

#14
20110186749
2011-08-04

Ion source

#15
20100320395
2010-12-23

External cathode ion source

#16
20100148089
2010-06-17

Ion implantation ion source, system and method

#17
20100001203
2010-01-07

Method of acquiring offset deflection amount for shaped beam and lithography apparatus

#18
20090314962
2009-12-24

Method and apparatus for controlling beam current uniformity in an ion implanter

#19
20090266997
2009-10-29

Ion source with adjustable aperture

#20
20090152462
2009-06-18

Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method

#21
20090121149
2009-05-14

TECHNIQUES FOR SHAPING AN ION BEAM

#22
20090057558
2009-03-05

SCANNING ELECTRON MICROSCOPE

#23
20090014667
2009-01-15

External cathode ion source

#24
20080135779
2008-06-12

Ion beam system and machining method

#25
20080099693
2008-05-01

Charged-particle exposure apparatus

#26
20080054196
2008-03-06

Variable shaped electron beam lithography system and method for manufacturing substrate

#27
20070262262
2007-11-15

Ion implantation ion source, system and method

#28
20070132358
2007-06-14

Ion source and polishing system using the same

#29
20070108394
2007-05-17

Dual mode ion source for ion implantation

#30
20070107841
2007-05-17

Ion implantation ion source, system and method

#31
20060113493
2006-06-01

Irradiation system ion beam and method to enhance accuracy of irradiation

#32
20060113466
2006-06-01

Irradiation system with ion beam

#33
20060113465
2006-06-01

Method to increase low-energy beam current in irradiation system with ion beam

#34
20060065854
2006-03-30

Ion beam system and machining method

#35
20050269520
2005-12-08

Ion implantation ion source, system and method

#36
20050051096
2005-03-10

Ion implantation ion source, system and method