Patents-Review.com
ClassID:

206400 ⎘

H01J2237/1202 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Lenses electrostatic Associated circuits

Recent Application in this class:
#1
20250343025
2025-11-06

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED MULTI-BEAM GENERATOR FOR FIELD CURVATURE CORRECTION AND MULTI-BEAM GENERATOR

 #2
20250232944
2025-07-17

MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE

 #3
20250014855
2025-01-09

CHARGED PARTICLE APPARATUS AND METHOD

 #4
20220223386
2022-07-14

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS DEVICE

 #5
20210210303
2021-07-08

Particle beam system for adjusting the current of individual particle beams

 #6
20210005421
2021-01-07

Conductive beam optic containing internal heating element

 #7
20200402760
2020-12-24

Scanning electron microscope

 #8
20200357600
2020-11-12

Multi-beam charged particle system

 #9
20200251301
2020-08-06

Multi-beam charged particle system

 #10
20200161098
2020-05-21

Circuits for edge ring control in shaped DC pulsed plasma process device

 #11
20200118784
2020-04-16

Deflection array apparatus for multi-electron beam system

 #12
20190295805
2019-09-26

Electron beam device

 #13
20190088440
2019-03-21

Particle beam system

 #14
20190035602
2019-01-31

Planarization, densification, and exfoliation of porous materials by high-energy ion beams

 #15
20170133194
2017-05-11

Particle beam system

 #16
20170076910
2017-03-16

System for imaging a secondary charged particle beam with adaptive secondary charged particle optics

 #17
20170003235
2017-01-05

System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics

 #18
20120001086
2012-01-05

Charged particle beam apparatus and sample processing method

 #19
20090302233
2009-12-10

CHARGED PARTICLE BEAM APPARATUS

 #20
20060151696
2006-07-13

Electron microscope and a method of imaging objects