Patents-Review.com
ClassID:

206511 ⎘

H01J2237/24571 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterised by the variable being measured Measurements of non-electric or non-magnetic variables

Sub-classes:
Recent Application in this class:
#1
20250266281
2025-08-21

ELECTROSTATIC WAFER CLAMPING AND SENSING SYSTEM

 #2
20250176925
2025-06-05

NON-INVASIVE MEASURING/DIAGNOSIS/TREATMENT APPARATUS AND METHOD

 #3
20240115222
2024-04-11

Ultra-precision timing clock method

 #4
20240079222
2024-03-07

SURFACE MODIFYING APPARATUS AND BONDING STRENGTH DETERMINATION METHOD

 #5
20210183625
2021-06-17

Control method and plasma processing apparatus

 #6
20210027983
2021-01-28

Scanning electron microscopy system and pattern depth measurement method

 #7
20200411281
2020-12-31

Pattern measurement device and non-transitory computer readable medium having stored therein program for executing measurement

 #8
20200397391
2020-12-24

Non-contact angle measuring apparatus

 #9
20200111648
2020-04-09

Plasma processing apparatus and method for measuring thickness of ring member

 #10
20190088442
2019-03-21

Electron-Beam Inspection Systems with optimized throughput

 #11
20170301509
2017-10-19

Multi-Stage/Multi-Chamber Electron-Beam Inspection System

 #12
20170301508
2017-10-19

Multi-stage/multi-chamber electron-beam inspection system

 #13
20170281102
2017-10-05

NON-CONTACT ANGLE MEASURING APPARATUS, MISSION CRITICAL INSPECTION APPARATUS, NON-INVASIVE DIAGNOSIS/TREATMENT APPARATUS, METHOD FOR FILTERING MATTER WAVE FROM A COMPOSITE PARTICLE BEAM, NON-INVASIVE MEASURING APPARATUS, APPARATUS FOR GENERATING A VIRTUAL SPACE-TIME LATTICE, AND FINE ATOMIC CLOCK

 #14
20170040142
2017-02-09

Range-based real-time scanning electron microscope non-visual binner

 #15
20150300941
2015-10-22

METHOD FOR CHARACTERISING PARTICLES BY IMAGE ANALYSIS

 #16
20150109431
2015-04-23

Systems and Methods for Material Texture Analysis

 #17
20150014529
2015-01-15

Charged particle beam device

 #18
20140346351
2014-11-27

Orientation imaging using wide angle convergent beam diffraction in transmission electron microscopy

 #19
20140027632
2014-01-30

SYSTEM AND METHOD FOR MEASURING ANGULAR LUMINESCENCE IN A CHARGED PARTICLE MICROSCOPE

 #20
20120298865
2012-11-29

Scanning electron microscope

 #21
20120068068
2012-03-22

Charged particle detectors

 #22
20120053892
2012-03-01

Pattern measurement apparatus

 #23
20120025073
2012-02-02

Orientation imaging using wide angle convergent beam diffraction in transmission electron microscopy

 #24
20100288926
2010-11-18

ATOM PROBE DATA AND ASSOCIATED SYSTEMS AND METHODS

 #25
20100204927
2010-08-12

ATOM PROBE DATA PROCESSES AND ASSOCIATED SYSTEMS

 #26
20090039274
2009-02-12

Surface contamination analyzer for semiconductor wafers

 #27
20080061250
2008-03-13

Ion beam monitoring in an ion implanter using an imaging device

 #28
20080017797
2008-01-24

PATTERN INSPECTION AND MEASUREMENT APPARATUS

 #29
20070210249
2007-09-13

Electron Spectroscope With Emission Induced By A Monochromatic Electron Beam

 #30
20070145269
2007-06-28

Electron anti-fogging baffle used as a detector

 #31
20050230622
2005-10-20

Surface contamination analyzer for semiconductor wafers, method used therein and process for fabricating semiconductor device

 #32
17164803
2022-07-05

Method for focusing an electron beam on a wafer having a transparent substrate