206512 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterised by the variable being measured; Measurements of non-electric or non-magnetic variables Spatial variables, e.g. position, distance
Scanning Electron Microscope and Gradient Map Generation Method
#2MEASUREMENT DEVICE
#3AUTO-CALIBRATION TO A STATION OF A PROCESS MODULE THAT SPINS A WAFER
#4CHUCKING OF HIGH-WARP SUBSTRATES USING MULTIZONAL CHUCKS
#5HEIGHT MEASUREMENTS USING FOCUS LINE
#6SUBSTRATE PROCESSING EQUIPMENT
#7MID-RING EROSION COMPENSATION IN SUBSTRATE PROCESSING SYSTEMS
#8SUBSTRATE PROCESSING APPARATUS AND METHOD OF ADJUSTING HEIGHT OF RING MEMBER
#9PLASMA PROCESSING SYSTEM AND METHOD FOR ESTIMATING HEIGHT OF ANNULAR MEMBER
#10DETECTING AND ADJUSTING LAMELLA DEFORMATION
#11CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
#12METHOD OF VIRTUAL SECTIONING OF STEM SAMPLE USING COMBINATION OF SE
#13BACKGROUND WAVEFORM ACQUISITION METHOD, MARK POSITION DETECTION METHOD, ELECTRON BEAM WRITING METHOD, AND ELECTRON BEAM WRITING APPARATUS
#14METHODS OF CROSS-SECTION IMAGING OF AN INSPECTION VOLUME IN A WAFER
#15SEMICONDUCTOR PROCESSING APPARATUS
#16SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#17Controlling the Relative Position of a Moveable Target and Charged-Particle Beams in a Multi-Column Exposure Apparatus
#18DRIFT COMPENSATION FOR RADIATION-SENSITIVE SPECIMENS
#19ILLUMINATION LENS ADJUSTMENT METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM
#20ENHANCED EDGE DETECTION USING DETECTOR INCIDENCE LOCATIONS
#21WIRELESS CHAMBER SENSOR
#22WIRELESS CHAMBER INTERIOR SENSOR
#23Detection of Space Charge Effect During Ion Implantation
#24ALIGNER STATION WITH LIFTING MECHANISM
#25CONTROLLING ETCH EDGE EFFECTS
#26POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS, AND MARK POSITION MEASUREMENT METHOD
#27METHOD AND SYSTEM OF OVERLAY MEASUREMENT USING CHARGED-PARTICLE INSPECTION APPARATUS
#28CHARGED PARTICLE BEAM DISTORTION CORRECTION METHOD
#29Plasma Processing Apparatus and Plasma Processing Method
#30PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
#31PROGRAMMABLE PRECISION ETCHING
#32NON-INVASIVE MEASURING/DIAGNOSIS/TREATMENT APPARATUS AND METHOD
#33MONITORING METHOD AND PLASMA PROCESSING APPARATUS
#34CHARGED PARTICLE BEAM DEVICE ADJUSTMENT METHOD AND CHARGED PARTICLE BEAM DEVICE
#35ION ANGLE SENSOR
#36ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF
#37IMPROVED OPTICAL ACCESS FOR SPECTROSCOPIC MONITORING OF SEMICONDUCTOR PROCESSES
#38SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
#39SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR PROCESS
#40ION BEAM PROFILING USING OPTICAL TOMOGRAPHY
#41BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD
#42METHOD OF DETERMINING A BEAM CONVERGENCE OF A CHARGED PARTICLE BEAM, AND CHARGED PARTICLE BEAM SYSTEM
#43BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
#44SENSOR SUBSTRATE, APPARATUS, AND METHOD
#45METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGED PARTICLE INSPECTION SYSTEM, METHOD OF PROCESSING A SAMPLE, ASSESSMENT METHOD
#46CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
#47METHOD FOR OPERATING A MULTI-BEAM PARTICLE BEAM MICROSCOPE
#48Plasma process monitoring apparatus using terahertz waves and monitoring method thereof
#49MACHINE LEARNING BASED YIELD PREDICTION
#50MEASUREMENT METHOD AND MEASUREMENT SYSTEM
#51SUBSTRATE POSITION MONITORING DEVICES
#52METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS, COMPUTER PROGRAM PRODUCT AND BEAM APPARATUS FOR CARRYING OUT THE METHOD
#53METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRODUCT
#54XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER
#55Method for Alignment Free Ion Column
#56WAFER STATE DETECTION
#57Collision Judgment Apparatus, Recording Medium Recording Program, and Collision Judgment Method
#58MONITORING SYSTEM, APPARATUS, AND METHOD FOR DETERMINING MAINTENANCE CYCLE OF PROCESSING CHAMBER
#59CALCULATE WAFERS THICKNESS OUT OF WAFER MAPPING PROCESS
#60USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT AND CONTROL WORKING DISTANCE SEM TO TARGET
#61SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
#62ION BEAM IMPLANTATION METHOD AND SEMICONDUCTOR DEVICE
#63COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COMPONENT REPLACEMENT SYSTEM
#64Ultra-precision timing clock method
#65SUBSTRATE ANALYSIS SYSTEM
#66TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
#67CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING METHOD, AND PHASE DIFFERENCE PLATE ADJUSTMENT METHOD
#68APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
#69SAMPLE PIECE RELOCATING DEVICE
#70MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSCOPE USING SETTINGS ADJUSTED TO AN INSPECTION SITE
#71Auto-focus sensor implementation for multi-column microscopes
#72INSPECTION DEVICE AND INSPECTION METHOD
#73MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELECTRIC CRYSTAL ONTO WHICH A THIN FILM OF MATERIAL IS DEPOSITED AS WELL AS THIN-FILM DEPOSITION SYSTEMS WITH SUCH A DEVICE AND A METHOD FOR CONTROLLING SUCH SYSTEMS
#74PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD
#75METHOD, APPARATUS AND SYSTEM FOR PROCESSING SEMICONDUCTOR STRUCTURE
#76System for Deriving Electrical Characteristics and Non-Transitory Computer-Readable Medium
#77SENSOR MODULE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME
#78Charged Particle Beam Apparatus
#79MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTICLE BEAM WRITING METHOD, INSPECTION METHOD FOR APERTURE ARRAY SUBSTRATE FOR MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#80AUTO-CALIBRATION TO A STATION OF A PROCESS MODULE THAT SPINS A WAFER
#81Analysis System
#82HIGH PRECISION EDGE RING CENTERING FOR SUBSTRATE PROCESSING SYSTEMS
#83STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE
#84METHOD AND DEVICE FOR THE OUTER-WALL AND/OR INNER-WALL COATING OF HOLLOW BODIES
#85Charged Particle Beam System
#86Charged Particle Beam Apparatus
#87TRANSMISSION CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF ALIGNING SUCH A TRANSMISSION CHARGED PARTICLE BEAM APPARATUS
#88SUBSTRATE PROCESSING APPARATUS
#89OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM APPARATUS AND COMPUTER READABLE RECORDING MEDIUM
#90SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC
#91OBSERVATION SYSTEM, OBSERVATION METHOD, AND PROGRAM
#92INTERMITTENT STAGNANT FLOW
#93CONTROL OF MASK CD
#94SAMPLE IMAGE OBSERVATION DEVICE AND METHOD FOR SAME
#95PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#96Method for operating a multi-beam particle beam microscope
#97STAGE DEVICE, AND CHARGED PARTICLE BEAM DEVICE
#98LIFT PIN ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS HAVING SAME
#99Apparatus and Method for Milling Sample
#100System using pixelated faraday sensor
#101MID-RING EROSION COMPENSATION IN SUBSTRATE PROCESSING SYSTEMS
#102Method Of Imaging And Milling A Sample
#103CHARGED PARTICLE BEAM DEVICE
#104PLASMA PROCESSING CHAMBERS CONFIGURED FOR TUNABLE SUBSTRATE AND EDGE SHEATH CONTROL
#105Plasma processing chambers configured for tunable substrate and edge sheath control
#106IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING APPARATUS
#107SYSTEM AND METHOD FOR HIGH THROUGHPUT DEFECT INSPECTION IN A CHARGED PARTICLE SYSTEM
#108Methods of determining aberrations of a charged particle beam, and charged particle beam system
#109CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
#110LEVELING SENSOR IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
#111CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR CALCULATING ROUGHNESS INDEX
#112Charged Particle Beam Drawing Apparatus and Control Method for Charged Particle Beam Drawing Apparatus
#113SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
#114Semiconductor Analysis System
#115Analyzing a sidewall of hole milled in a sample to determine thickness of a buried layer
#116Electron microscope and image generation method
#117Plasma processing apparatus, and method and program for controlling elevation of focus ring
#118Wafer de-chucking detection and arcing prevention
#119Plasma processing apparatus and plasma processing method
#120Method and system for processing wafer
#121METHODS OF CROSS-SECTION IMAGING OF AN INSPECTION VOLUME IN A WAFER
#122Pattern height metrology using an e-beam system
#123Specimen Machining Device and Specimen Machining Method
#124Charged particle beam apparatus and image acquiring method
#125Scanning electron microscope and image generation method using scanning electron microscope
#126Method and apparatus for charged particle detection
#127SUBSTRATE PROCESSING SYSTEM AND METHOD OF ESTIMATING HEIGHT OF ANNULAR MEMBER
#128Charged particle beam device
#129Apparatus and method for determining a position of an element on a photolithographic mask
#130SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
#131Overlay Measurement System and Overlay Measurement Device
#132Ion beam device
#133Method for measuring CD using scanning electron microscope
#134E-BEAM POSITION TRACKER
#135Numerically compensating SEM-induced charging using diffusion-based model
#136Inspection tool and method of determining a distortion of an inspection tool
#137Substrate processing apparatus and interlock method thereof
#138Plasma processing apparatus and methods of manufacturing semiconductor device using the same
#139Diagnosis apparatus, plasma processing apparatus and diagnosis method
#140DETECTION DEVICE, PROCESSING SYSTEM, AND TRANSFER METHOD
#141Auto-calibration to a station of a process module that spins a wafer
#142Particle beam focusing
#143APPARATUS FOR TREATING SUBSTRATE, METHOD FOR MEASURING HEIGHT DIFFERENCE BETWEEN LIFT PINS, AND COMPUTER READABLE RECORDING MEDIUM HAVING PROCESSING PROGRAM STORED THEREIN
#144Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures
#145Measuring method and plasma processing apparatus
#146In situ angle measurement using channeling
#147Charged particle beam apparatus, sample alignment method of charged particle beam apparatus
#148Method for operating a multi-beam particle beam microscope
#149Ion beam implantation method and semiconductor device
#150Ion milling device
#151Temperature measurement system, temperature measurement method, and substrate processing apparatus
#152Multi charged particle beam evaluation method and multi charged particle beam writing device
#153Charged particle beam device
#154ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS
#155LIFT PIN ALIGNMENT METHOD AND ALIGNMENT APPARATUS AND SUBSTRATE PROCESSING APPARATUS
#156Method for determining irradiation conditions for charged particle beam device and charged particle beam device
#157System for deriving electrical characteristics and non-transitory computer-readable medium
#158Sample inspection method and system
#159Non-contact angle measuring apparatus
#160Charged particle scanners
#161Defect candidate generation for inspection
#162Inspection tool and method of determining a distortion of an inspection tool
#163Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
#164Multiple electron beam inspection apparatus and multiple electron beam inspection method
#165Optical height detection system
#166Auto-calibration to a station of a process module that spins a wafer
#167System and method for spatially resolved optical metrology of an ion beam
#168Electron beam irradiation apparatus and electron beam alignment method
#169Charged particle beam system and method of measuring sample using scanning electron microscope
#170Interferometric stage positioning apparatus
#171Apparatus and method for determining a position of an element on a photolithographic mask
#172ION IMPLANTER AND MEASURING DEVICE
#173Wafer de-chucking detection and arcing prevention
#174System and method for spatially resolved optical metrology of an ion beam
#175Pattern evaluation device
#176Long range capacitive gap measurement in a wafer form sensor system
#177Substrate processing apparatus and substrate processing control method
#178Method and apparatus for charged particle detection
#179Ranging apparatus and method using the ranging apparatus
#180System and method with fiducials having offset layouts
#181Measuring a height profile of a hole formed in non-conductive region
#182PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#183Search device, search method and plasma processing apparatus
#184Ion implantation apparatus and measurement device
#185Charged particle beam axial alignment device, charged particle beam irradiation device and charged particle beam axial alignment method
#186Charged particle beam axial alignment device, charged particle beam irradiation device and charged particle beam axial alignment method
#187System and method for performing failure analysis using virtual three-dimensional imaging
#188Ion implantation apparatus and ion implantation method
#189Plasma processing method and plasma processing apparatus
#190ELECTRON SOURCE AND ELECTRON BEAM IRRADIATION DEVICE
#191Auto-calibration to a station of a process module that spins a wafer
#192Endpointing for focused ion beam processing
#193System and method for measuring patterns
#194Pattern measuring method, pattern measuring apparatus, and computer program storage device
#195Electron microscope and specimen tilt angle adjustment method
#196PLASMA PROCESSING APPARATUS, AND METHOD AND PROGRAM FOR CONTROLLING ELEVATION OF FOCUS RING
#197Pattern measuring method and pattern measuring apparatus
#198Sputtering gap measurement apparatus and magnetron sputtering device
#199Electron microscope
#200Method and system of measuring semiconductor device and method of fabricating semiconductor device using the same
#201Sputtering apparatus, film deposition method, and control device
#202Cross sectional depth composition generation utilizing scanning electron microscopy
#203Method of image acquisition and electron microscope
#204Cross sectional depth composition generation utilizing scanning electron microscopy
#205Multi charged particle beam writing apparatus and multi charged particle beam writing method
#206Defect inspection method and defect inspection apparatus
#207Fine alignment system for electron beam exposure system
#208Mobile and free-form x-ray imaging systems and methods
#209Compressive scanning spectroscopy
#210Scanning electron microscope
#211Method for measuring the mass thickness of a target sample for electron microscopy
#212METHOD FOR EVALUATING SHAPING APERTURE ARRAY
#213Method of adjusting the primary side of an X-ray diffractometer
#214Detector apparatus and charged particle beam system
#215Calibration method and charged particle beam system
#216At least partially balancing out thickness variations of a substrate
#217Exposure apparatus and method of manufacturing semiconductor device
#218Electron microscope and measurement method
#219Charged particle beam apparatus
#220Determining multi-patterning step overlay error
#221Method of performing electron diffraction pattern analysis upon a sample
#222Pattern measurement device and computer program
#223DETECTING THICKNESS VARIATION AND QUANTITATIVE DEPTH UTILIZING SCANNING ELECTRON MICROSCOPY WITH A SURFACE PROFILER
#224Pattern matching using a lamella of known shape for automated S/TEM acquisition and metrology
#225COPPER SUBSTRATE FOR DEPOSITION OF GRAPHENE
#226Charged particle beam device
#227Endpointing for focused ion beam processing
#228Sputtering apparatus, film deposition method, and control device
#229LEED for SEM
#230Sputtering apparatus
#231Ion implanter, ion implantation method, and beam measurement apparatus
#232Pattern shape evaluation method, semiconductor device manufacturing method, and pattern shape evaluation device
#233System for electron beam detection
#234Characterization method for a reservoir micro pore structure and a system thereof
#235Image evaluation apparatus and pattern shape evaluation apparatus
#236Sample micromotion mechanism, method of using the same, and charged particle device
#237Method and system of measuring semiconductor device and method of fabricating semiconductor device using the same
#238Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
#239Overlay error measuring device and computer program
#240Three-dimensional semiconductor image reconstruction apparatus and method
#241Pattern dimension measuring device, charged particle beam apparatus, and computer program
#242Pattern sensing device and semiconductor sensing system
#243Semiconductor measurement apparatus and computer program
#244Multiple image metrology
#245Defect inspection apparatus and method using a plurality of detectors to generate a subtracted image that may be used to form a subtraction profile
#246Scanning particle microscope having an energy selective detector system
#247Scanning electron microscope
#248Measuring method, data processing apparatus and electron microscope using same
#249Backscatter reduction in thin electron detectors
#250System, method and computed readable medium for evaluating a parameter of a feature having nano-metric dimensions
#251Pattern dimension measurement method and charged particle beam apparatus
#252SYSTEM AND METHOD FOR MEASURING ANGULAR LUMINESCENCE IN A CHARGED PARTICLE MICROSCOPE
#253Charged particle beam device, and image analysis device
#254Image processing apparatus
#255Pattern determination device and computer program
#256Charged particle beam apparatus
#257Method and apparatus for measuring displacement between patterns and scanning electron microscope installing unit for measuring displacement between patterns
#258Pattern inspection apparatus and method
#259Pattern measuring apparatus, and pattern measuring method and program
#260Pattern measuring method, pattern measuring apparatus, and program using same
#261Positioning system and method for precise stage and pattern used therof
#262Drawing apparatus, and method of manufacturing article
#263Pattern dimension measurement method using electron microscope, pattern dimension measurement system, and method for monitoring changes in electron microscope equipment over time
#264Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof
#265Image forming device and computer program
#266Pattern dimension measurement method, pattern dimension measurement device, program for causing computer to execute pattern dimension measurement method, and recording medium having same recorded thereon
#267Pattern measurement apparatus and pattern measurement method
#268Charged particle beam drawing apparatus and charged particle beam drawing method
#269Pattern evaluation method, device therefor, and electron beam device
#270IMAGE GENERATING METHOD AND DEVICE USING SCANNING CHARGED PARTICLE MICROSCOPE, SAMPLE OBSERVATION METHOD, AND OBSERVING DEVICE
#271Charged particle beam microscope
#272Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
#273Electron beam drift detection device and method for detecting electron beam drift
#274Microtome utilizing a movable knife in a retardation field scanning electron microscope and a retardation field scanning electron microscope including the same
#275Pattern-height measuring apparatus and pattern-height measuring method
#276Charged particle radiation apparatus, and method for displaying three-dimensional information in charged particle radiation apparatus
#277Charged particle beam apparatus and film thickness measurement method
#278Drawing apparatus and method of manufacturing article
#279Signal Processing Method for Charged Particle Beam Device, and Signal Processing Device
#280Charged particle beam device
#281Semiconductor inspection device and semiconductor inspection method using the same
#282Scanning electron microscope
#283Backscatter reduction in thin electron detectors
#284Pattern measuring apparatus and pattern measuring method
#285Physical properties measuring method and apparatus
#286Charged particle radiation device and image capturing condition determining method using charged particle radiation device
#287Pattern measurement apparatus and pattern measurement method
#288Pattern measurement apparatus and pattern measurement method
#289CHARGED CORPUSCULAR BEAM APPARATUS
#290Method and device for synthesizing panorama image using scanning charged-particle microscope
#291METHOD FOR IDENTIFYING INDIVIDUAL VIRUSES IN A SAMPLE
#292DIAGNOSIS DEVICE OF RECIPE USED FOR SCANNING ELECTRON MICROSCOPE
#293Electron beam measurement apparatus
#294Pattern measuring apparatus and pattern measuring method
#295DIFFRACTION PATTERN CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE
#296System and method for material analysis of a microscopic element
#297Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus
#298Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
#299METHOD OF DETERMINING ANGLE MISALIGNMENT IN BEAM LINE ION IMPLANTERS
#300Charged particle beam profile measurement