206514 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterised by the variable being measured Inspection and quality control of devices
Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method
#302Method of measuring a critical dimension of a semiconductor device and a related apparatus
#303Defect analyzer
#304Defect inspection and charged particle beam apparatus
#305Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern
#306Method for defect detection and process monitoring based on SEM images
#307Subsurface imaging using an electron beam
#308Sample electrification measurement method and charged particle beam apparatus
#309Technique for CD measurement on the basis of area fraction determination
#310Charged particle beam device probe operation
#311Detector optics for multiple electron beam test system
#312Method and apparatus for inspecting patterns
#313Method and an apparatus of an inspection system using an electron beam
#314Method and apparatus for specifying working position on a sample and method of working the sample
#315Scanning electron microscope
#316Scanning electron microscope and system for inspecting semiconductor device
#317Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method
#318Method for inspecting defect and system therefor
#319Inspection method and inspection apparatus using electron beam
#320Charged particle beam apparatus and dimension measuring method
#321Method and system for inspecting specimen
#322Charged particle beam column and method of its operation
#323Scanning electron microscope
#324Electric charged particle beam microscopy, electric charged particle beam microscope, critical dimension measurement and critical dimension measurement system
#325Patterned wafer inspection method and apparatus therefor
#326Charged particle beam apparatus
#327Electron beam apparatus and a device manufacturing method using the same apparatus
#328Microstructured pattern inspection method
#329Defect inspection and charged particle beam apparatus
#330Apparatus and method for inspecting pattern on object
#331Surface contamination analyzer for semiconductor wafers, method used therein and process for fabricating semiconductor device
#332Method and an apparatus of an inspection system using an electron beam
#333Detection of defects in patterned substrates
#334Sample surface inspection method and inspection system
#335Probe current imaging
#336Probe tip processing
#337Sample electrification measurement method and charged particle beam apparatus
#338Patterned wafer inspection method and apparatus therefor
#339Scanning electron microscope
#340Inspection method and inspection apparatus using electron beam
#341Systems and methods for characterizing a three-dimensional sample
#342Resonant frequency shift as etch stop of gate oxide of MOSFET transistor
#343Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
#344Method for detecting voids in interconnects and an inspection system
#345Utilization of voltage contrast during sample preparation for transmission electron microscopy
#346Precision substrate material removal using miniature-column charged particle beam arrays
#347Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems