206514 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterised by the variable being measured Inspection and quality control of devices
SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS
#2PHOTO-ELECTRICAL EVOLUTION DEFECT INSPECTION
#3CONTAMINATION DETECTION SYSTEM AND METHOD
#4CO-JET NOZZLE ASSEMBLY AND ANOMALY DETECTION
#5METHOD, APPARATUS, AND SYSTEM FOR DYNAMICALLY CONTROLLING AN ELECTROSTATIC CHUCK DURING AN INSPECTION OF WAFER
#6DETECTING AND ADJUSTING LAMELLA DEFORMATION
#7ENHANCED EDGE DETECTION USING DETECTOR INCIDENCE LOCATIONS
#8HIGH-PERFORMANCE ADAPTABLE SAMPLING SYSTEM
#9METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
#10METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
#11MEASUREMENT DEVICE AND SCANNING IMAGE ACQUISITION METHOD
#12CHARGED-PARTICLE BEAM APPARATUS WITH LARGE FIELD-OF-VIEW AND METHODS THEREOF
#13Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET Transistor
#14DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PARTICLE BEAM INSPECTION
#15SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
#16INSPECTION FLOW DETERMINATION DEVICE, CHARGED PARTICLE BEAM DEVICE, AND PROGRAM
#17PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#18PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND ASSISTANCE PROGRAM
#19MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE
#20SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS
#21DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
#22METHOD AND SYSTEM FOR MONITORING RADICAL SPECIES FLUX OF PLASMA
#233D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGHPUT AND ACCURACY
#24CALIBRATION APPARATUS FOR SENSOR DEVICE AND SYSTEM INCLUDING THE SAME
#25Program, Information Processing Method, Information Processing Device and Model Generation Method
#26METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGED PARTICLE INSPECTION SYSTEM, METHOD OF PROCESSING A SAMPLE, ASSESSMENT METHOD
#27DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPARATUS, AND METHOD
#28CHARGED-PARTICLE OPTICAL DEVICE
#29METHOD OF OPERATING AN ION BEAM SOURCE, ION BEAM SOURCE AND COMPUTER PROGRAM
#30SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#31LOW POWER PLASMA SYSTEM MONITOR METHOD
#32DETECTOR FOR PROCESS KIT RING WEAR
#33SUBSTRATE PROCESSING APPARATUS INCLUDING COATING FILM AND INSPECTION METHOD OF COATING FILM FOR SUBSTRATE PROCESSING
#34SYSTEM AND METHOD FOR INSPECTION BY DEFLECTOR CONTROL IN A CHARGED PARTICLE SYSTEM
#35MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING FOR IMPROVED IMAGE CONTRAST
#36Sample Inspection Apparatus, Inspection System, Thin Piece Sample Fabrication Apparatus, and Method for Inspecting Sample
#37Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics
#38DATA PROCESSING DEVICE AND METHOD, CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
#39MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSCOPE USING SETTINGS ADJUSTED TO AN INSPECTION SITE
#40Mesh Integrity Check
#41METHOD FOR PROCESSING SUBSTRATE
#42INSPECTION DEVICE AND INSPECTION METHOD
#43Apparatus using charged particle beams
#44MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTICLE BEAM WRITING METHOD, INSPECTION METHOD FOR APERTURE ARRAY SUBSTRATE FOR MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#45CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MONITORING
#46Processing System and Charged Particle Beam Apparatus
#47INSPECTION METHOD AND INSPECTION TOOL
#48System and method for scanning a sample using multi-beam inspection apparatus
#49SEMICONDUCTOR INSPECTION APPARATUS AND SEMICONDUCTOR INSPECTION METHOD USING THE SAME
#50METHOD, APPARATUS, AND SYSTEM FOR DYNAMICALLY CONTROLLING AN ELECTROSTATIC CHUCK DURING AN INSPECTION OF WAFER
#51CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MONITORING
#52MODEL-BASED CHARACTERIZATION OF PLASMAS IN SEMICONDUCTOR PROCESSING SYSTEMS
#53BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
#54Measurement system, measurement method, and plasma processing device
#55Method, apparatus, and program for determining condition related to captured image of charged particle beam apparatus
#56Apparatus and method for inspecting electrostatic chuck
#57STACK ALIGNMENT TECHNIQUES
#58METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
#59Method and apparatus for charged particle detection
#60Systems and methods for voltage contrast defect detection
#61SUBSTRATE PROCESSING SYSTEM AND METHOD OF ESTIMATING HEIGHT OF ANNULAR MEMBER
#62SELF-REFERENCING HEALTH MONITORING SYSTEM FOR MULTI-BEAM SEM TOOLS
#63Multiple charged-particle beam apparatus with low crosstalk
#64TEM-based metrology method and system
#65Inspection apparatus
#66Conduction inspection method for multipole aberration corrector, and conduction inspection apparatus for multipole aberration corrector
#67PHOTO-ELECTRICAL EVOLUTION DEFECT INSPECTION
#68Inspection tool and method of determining a distortion of an inspection tool
#69Multi-beam inspection apparatus
#70System and method for bare wafer inspection
#71Apparatus for multiple charged-particle beams
#72Stage apparatus suitable for a particle beam apparatus
#73SUBSTRATE STATE DETECTION FOR PLASMA PROCESSING TOOLS
#74Charged particle beam device
#75System and method for detecting rare stochastic defects
#76Capacitive sensing data integration for plasma chamber condition monitoring
#77Measurement method and measurement system
#78ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD
#79Detecting method and detecting device of gas components and processing apparatus using detecting device of gas components
#80System and method for scanning a sample using multi-beam inspection apparatus
#81TEM-based metrology method and system
#82Apparatus of plural charged-particle beams
#83JIG, PROCESSING SYSTEM AND PROCESSING METHOD
#84Evaluation method of metal contamination
#85RF power generator with analogue and digital detectors
#86Pixel shape and section shape selection for large active area high speed detector
#87BEAMLINE ARCHITECTURE WITH INTEGRATED PLASMA PROCESSING
#88Detector for process kit ring wear
#89Method and a device for automatically determining adjustment values for operating parameters of a deposition line
#90System and method of power generation with phase linked solid-state generator modules
#91System and method of power generation with phase linked solid-state generator modules
#92Pattern evaluation system and pattern evaluation method
#93Apparatus and method for high dynamic range counting by pixelated detectors
#94System, apparatus, and method for determining elemental composition using 4D STEM
#95Inspection tool and method of determining a distortion of an inspection tool
#96CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS
#97Apparatus using charged particle beams
#98DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PARTICLE BEAM INSPECTION
#99Multi-beam inspection apparatus
#100Nano vacuum tube
#101Photocathode designs and methods of generating an electron beam using a photocathode
#102Methods for stability monitoring and improvements to plasma sources for plasma processing
#103Wafer quality inspection method and apparatus, and semiconductor device manufacturing method including the wafer quality inspection method
#104Electron optical system and multi-beam image acquiring apparatus
#105Maintenance mode power supply system
#106Method and apparatus for charged particle detection
#107System and method for bare wafer inspection
#108Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets
#1093D defect characterization of crystalline samples in a scanning type electron microscope
#110TEM-based metrology method and system
#111Measuring a height profile of a hole formed in non-conductive region
#112Electron microscope device and inclined hole measurement method using same
#113Laser-assisted electron-beam inspection for semiconductor devices
#114Resonant process monitor
#115Laser processing system and laser processing method
#116System and method for performing failure analysis using virtual three-dimensional imaging
#117Signal separator for a multi-beam charged particle inspection apparatus
#118Film formation time setting method
#119Apparatus of plural charged-particle beams
#120Cross section processing observation method and charged particle beam apparatus
#121Electron beam generation and measurement
#122Photocathode designs and methods of generating an electron beam using a photocathode
#123Silicon electron emitter designs
#124Inspection method for wafer or DUT
#125Charged particle beam writing apparatus and method for diagnosing failure of blanking circuit
#126Substrate treating apparatus and inspection method
#127Method for detecting voids and an inspection system
#128Nano vacuum tube
#129Calibration of elementary small patterns in variable-shaped-beam electron-beam lithography
#130Guided scanning electron microscopy metrology based on wafer topography
#131Dynamic response analysis prober device
#132FILM FORMATION APPARATUS AND FILM FORMATION METHOD
#133Care areas for improved electron beam defect detection
#134Method and system of measuring semiconductor device and method of fabricating semiconductor device using the same
#135Microwave generators and manufacture of synthetic diamond material
#136Detecting method and detecting equipment therefor
#137Multi charged particle beam writing apparatus and multi charged particle beam writing method
#138Multi charged particle beam writing apparatus and multi charged particle beam writing method
#139Multi charged particle beam writing apparatus and multi charged particle beam writing method
#140Chamber component part wear indicator and a system for detecting part wear
#141Charged particle beam device
#142Scanning electron microscope and methods of inspecting and reviewing samples
#143Multi electron beam inspection apparatus
#144Test structure for electron beam inspection and method for defect determination using electron beam inspection
#145CD-SEM technique for wafers fabrication control
#146Apparatus of plural charged-particle beams
#147Wafer Defect Discovery
#148Charged particle beam device and detection method using said device
#149Determining a position of a defect in an electron beam image
#150Range-based real-time scanning electron microscope non-visual binner
#151Charge dynamics effect for detection of voltage contrast defect and determination of shorting location
#152Defect image classification apparatus
#153METHOD FOR ESTIMATING LIFETIME OF CATHODE IN ELECTRON BEAM LITHOGRAPHY APPARATUS
#154Electron microscope and method of measuring aberrations
#155Charged particle beam inclination correction method and charged particle beam device
#156Inspection equipment
#157Charged particle beam device
#158Method and system for adaptively scanning a sample during electron beam inspection
#159Charged particle beam apparatus and inspection method using the same
#160Method and device for line pattern shape evaluation
#161E-beam inspection apparatus and method of using the same on various integrated circuit chips
#162Pattern analysis method of a semiconductor device
#163Scanning electron microscope and methods of inspecting and reviewing samples
#164Pattern shape evaluation method, semiconductor device manufacturing method, and pattern shape evaluation device
#165Device and method for computing amount of drift and charged particle beam system
#166Charged particle radiation apparatus
#167Apparatus and method for processing sample, and charged particle radiation apparatus
#168Defect sampling for electron beam review based on defect attributes from optical inspection and optical review
#169Method of inspecting a semiconductor substrate
#170Method for detecting an electrical defect of contact/via plugs
#171Image evaluation apparatus and pattern shape evaluation apparatus
#172Control unit for generating timing signal for imaging unit in inspection system and method for sending out timing signal to imaging unit
#173Charged-particle radiation apparatus
#174APPARATUS FOR IMAGING PLASMA PARTICLES AND METHOD FOR DETECTING ETCHING END POINT USING SAME
#175Pattern inspecting and measuring device and program
#176Defect observation system and defect observation method
#177Method and system of measuring semiconductor device and method of fabricating semiconductor device using the same
#178Charged particle beam apparatus
#179Radiographic image capturing device, method for detecting radiation doses, and computer readable storage medium
#180Overlay error measuring device and computer program
#181Measurement method, image processing device, and charged particle beam apparatus
#182Charged particle multi-beam inspection system and method of operating the same
#183Enhanced defect detection in electron beam inspection and review
#184Charged particle beam apparatus
#185Specimen observation method and device using secondary emission electron and mirror electron detection
#186Detecting arcing using processing chamber data
#187Circuit probe for charged particle beam system
#188Plasma processing method and apparatus
#189Electron beam apparatus
#190Method and system for adaptively scanning a sample during electron beam inspection
#191Defect inspection apparatus and method using a plurality of detectors to generate a subtracted image that may be used to form a subtraction profile
#192Defect pattern evaluation method, defect pattern evaluation apparatus, and recording media
#193Inspection system using scanning electron microscope
#194Image processing apparatus
#195Charged particle beam device and method for correcting detected signal thereof
#196Multi channel detector, optics therefor and method of operating thereof
#197Switchable multi perspective detector, optics therefor and method of operating thereof
#198Pattern determination device and computer program
#199Charged particle beam apparatus
#200Pattern measuring apparatus, and pattern measuring method and program
#201Pattern measuring method, pattern measuring apparatus, and program using same
#202Method and apparatus for monitoring cross-sectional shape of a pattern formed on a semiconductor device
#203Electron beam irradiation method and scanning electronic microscope
#204Charged particle detection system and multi-beamlet inspection system
#205Scanning electron microscope optical condition setting method and scanning electron microscope
#206PATTERN MEASUREMENT APPARATUS AND PATTERN MEASUREMENT METHOD
#207Method of extracting contour lines of image data obtained by means of charged particle beam device, and contour line extraction device
#208Method for detecting information of an electronic potential on a sample and charged particle beam apparatus
#209METHOD FOR DEFECT INSPECTION AND APPARATUS FOR DEFECT INSPECTION
#210Method and an apparatus of an inspection system using an electron beam
#211Charged particle beam device
#212Scanning electron microscope device, evaluation point generating method, and program
#213Semiconductor inspection device and semiconductor inspection method using the same
#214CHARGED-PARTICLE MICROSCOPE DEVICE, AND METHOD OF CONTROLLING CHARGED-PARTICLE BEAMS
#215Structure and method for determining a defect in integrated circuit manufacturing process
#216Pattern defect inspection using data based on secondary electron from pattern
#217Scanning electron microscope
#218Sample observing method and scanning electron microscope
#219METHOD AND APPARATUS FOR INSPECTING SEMICONDUCTOR USING ABSORBED CURRENT IMAGE
#220Semiconductor inspection method and device that consider the effects of electron beams
#221Pattern matching method and image processing device
#222Defect analyzer
#223Charged particle beam device
#224Twin beam charged particle column and method of operating thereof
#225Charged particle beam apparatus
#226CHARGED CORPUSCULAR BEAM APPARATUS
#227Method and device for synthesizing panorama image using scanning charged-particle microscope
#228Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus
#229Specimen observation method and device using secondary emission electron and mirror electron detection
#230APPARATUS AND SYSTEMS FOR INTEGRATED CIRCUIT DIAGNOSIS
#231Method and apparatus for probe contacting
#232Sample inspection methods, systems and components
#233Measuring Apparatus, Measuring Coordinate Setting Method and Measuring Coordinate Number Calculation Method
#234Pattern measuring apparatus and pattern measuring method
#235Microstructured pattern inspection method
#236Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus
#237Sample electrification measurement method and charged particle beam apparatus
#238ATOM PROBE DATA AND ASSOCIATED SYSTEMS AND METHODS
#239Pattern inspection method and apparatus
#240INSPECTION METHOD AND INSPECTION APPARATUS FOR SEMICONDUCTOR SUBSTRATE
#241ATOM PROBE DATA PROCESSES AND ASSOCIATED SYSTEMS
#242Pattern measurement apparatus
#243Defect inspection and charged particle beam apparatus
#244Methods of operating a nanoprober to electrically probe a device structure of an integrated circuit
#245Electron beam apparatus
#246Electron beam apparatus
#247Structure and method for determining a defect in integrated circuit manufacturing process
#248Fast wafer inspection system
#249Charged particle beam apparatus and dimension measuring method
#250Method for detecting information of an electric potential on a sample and charged particle beam apparatus
#251Graphical user interface for use with electron beam wafer inspection
#252Sample inspection apparatus
#253Defect analyzer
#254Scanning electron microscope
#255Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus
#256Apparatus and method for inspection and measurement
#257Hole inspection apparatus and hole inspection method using the same
#258Defect recognizing method, defect observing method, and charged particle beam apparatus
#259Inspection method for semiconductor wafer and apparatus for reviewing defects
#260Apparatus and method for enhancing voltage contrast of a wafer
#261Method and apparatus of an inspection system using an electron beam
#262Inspection method for semiconductor wafer and apparatus for reviewing defects
#263Surface contamination analyzer for semiconductor wafers
#264Pattern measurement apparatus
#265Scanning electron microscope for determining quality of a semiconductor pattern
#266Microstructured pattern inspection method
#267Method and its system for calibrating measured data between different measuring tools
#268Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
#269Device and method for automatic detection of incorrect measurements by means of quality factors
#270Sample electrification measurement method and charged particle beam apparatus
#271Methods for monitoring ion implant process in bond and cleave, silicon-on-insulator (SOI) wafer manufacturing
#272Charged particle beam device probe operation
#273Defect inspection and charged particle beam apparatus
#274Charged-Particle Beam System
#275Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same
#276Charged particle beam apparatus and dimension measuring method
#277Inspection system and inspection method
#278Standard component for calibration and calibration method using it and electro beam system
#279Electron-beam size measuring apparatus and size measuring method with electron beams
#280Semiconductor wafer inspection tool and semiconductor wafer inspection method
#281Electron beam apparatus and an aberration correction optical apparatus
#282CHARGED PARTICLE BEAM APPARATUS
#283Pattern inspection method and apparatus
#284Method for inspecting defect and system therefor
#285Pattern inspection method and apparatus
#286Electron induced chemical etching for device level diagnosis
#287Microstructured pattern inspection method
#288Method and apparatus for pattern inspection
#289Pattern inspection method and apparatus
#290METHOD AND APPARATUS FOR SETTING OF APPLIANCE-SPECIFIC EVALUATION PARAMETERS
#291Charged particle beam apparatus
#292Pattern matching method and pattern matching program
#293Scanning electron microscope
#294Method and an apparatus of an inspection system using an electron beam
#295Wafer-level testing of light-emitting resonant structures
#296Method and apparatus for monitoring cross-sectional shape of a pattern formed on a semiconductor device
#297Pattern inspection method, pattern inspection apparatus, semiconductor device manufacturing method, and program
#298Method and apparatus for displaying detected defects
#299Scanning electron microscope and apparatus for detecting defect
#300Electron microscope and electron bean inspection system.