H01J2237/3045 - CPC Classification Index

#1

20240304407

2024-09-12

Device and Method for Calibrating a Charged-Particle Beam

#2

20240297012

2024-09-05

Charged particle beam device and inspection device

#3

20230029715

2023-02-02

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS

#4

20220359156

2022-11-10

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

#5

20220122804

2022-04-21

Charged particle beam device

#6

20210225611

2021-07-22

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

#7

20200312615

2020-10-01

Charged particle beam device

#8

20200051780

2020-02-13

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

#9

20190195815

2019-06-27

Multiple beam image acquisition apparatus and multiple beam image acquisition method

#10

20190180979

2019-06-13

Charged particle beam device

#11

20190035603

2019-01-31

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#12

20180138013

2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#13

20180090299

2018-03-29

Charged particle beam apparatus and positional displacement correcting method of charged particle beam

#14

20170294288

2017-10-12

Method and device for characterizing an electron beam

#15

20170278671

2017-09-28

Charged particle beam device

#16

20160365223

2016-12-15

Method for evaluating charged particle beam drawing apparatus

#17

20160211116

2016-07-21

Method and device for characterizing an electron beam

#18

20160093466

2016-03-31

Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus

#19

20160086764

2016-03-24

Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus

#20

20160004161

2016-01-07

Patterning method using electron beam and exposure system configured to perform the same

#21

20150221473

2015-08-06

Charged particle beam apparatus

#22

20150109601

2015-04-23

Charged particle lithography system with alignment sensor and beam measurement sensor

#23

20130137044

2013-05-30

Scanning apparatus, drawing apparatus, and method of manufacturing article

#24

20110174975

2011-07-21

Charged particle beam scanning method and charged particle beam apparatus

#25

20110049382

2011-03-03

Pattern modification schemes for improved FIB patterning

#26

20100288939

2010-11-18

Method of determining main deflection settling time for charged particle beam writing, method of writing with charged particle beam, and apparatus for writing with charged particle beam

#27

20100102254

2010-04-29

ELECTRON BEAM APPARATUS

#28

20100090131

2010-04-15

METHOD OF DETERMINING ANGLE MISALIGNMENT IN BEAM LINE ION IMPLANTERS

#29

20090314950

2009-12-24

Lithography apparatus and focusing method for charged particle beam

#30

20090272911

2009-11-05

Method for inspecting settling time of deflection amplifier, and method for judging failure of deflection amplifier

#31

20090204983

2009-08-13

Master disk exposing apparatus and the adjusting method therefor

#32

20090194711

2009-08-06

Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium

#33

20090189062

2009-07-30

Method of calibrating beam position in charged-particle beam system

#34

20090084955

2009-04-02

Charged particle beam equipment and charged particle microscopy

#35

20090026389

2009-01-29

Multi-beam source

#36

20090008568

2009-01-08

Charged particle beam writing apparatus and method thereof

#37

20080315112

2008-12-25

Charged particle beam deflection method with separate stage tracking and stage positional error signals

#38

20080265174

2008-10-30

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD

#39

20080174779

2008-07-24

Wafer alignment method for dual beam system

#40

20080096359

2008-04-24

Method of determining angle misalignment in beam line ion implanters

#41

20080093551

2008-04-24

Electric charged particle beam microscopy and electric charged particle beam microscope

#42

20080078954

2008-04-03

Beam line architecture for ion implanter

#43

20080078952

2008-04-03

Technique for improving ion implantation based on ion beam angle-related information

#44

20080078947

2008-04-03

Beam shot position correction coefficient computation/updating technique for ultrafine pattern fabrication using variable shaped beam lithography

#45

20080073579

2008-03-27

Ion beam measuring method and ion implanting apparatus

#46

20080073528

2008-03-27

Charged particle beam scanning method and charged particle beam apparatus

#47

20080067444

2008-03-20

Ion beam scanning control methods and systems for ion implantation uniformity

#48

20080067435

2008-03-20

Beam tuning with automatic magnet pole rotation for ion implanters

#49

20080067403

2008-03-20

Charged particle beam exposure apparatus

#50

20080067402

2008-03-20

Charged particle beam exposure apparatus

#51

20080067338

2008-03-20

Charged particle beam lithography system and method for evaluating the same

#52

20070177132

2007-08-02

Reticle for use in rapid determination of average intrafield scanning distortion having transmissivity of a complementary alignment attribute being different than the transmissivity of at least one alignment attribute

#53

20060208202

2006-09-21

Technique for ion beam angle spread control

#54

20060197453

2006-09-07

Electron beam writing system and electron beam writing method

#55

20060192143

2006-08-31

Charged particle beam lithography apparatus and method

#56

20060151697

2006-07-13

Charged particle beam equipment and charged particle microscopy

#57

20060091321

2006-05-04

Wafer alignment method for dual beam system

#58

20060007431

2006-01-12

Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion

#59

20050232114

2005-10-20

Electron beam recorder, electron beam irradiation position detecting method and electron beam irradiation position controlling method

#60

20050219516

2005-10-06

Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion

#61

20050211921

2005-09-29

Electron beam exposure system

#62

20050133739

2005-06-23

Charged beam writing method and writing tool

#63

20050040343

2005-02-24

Electron beam writing equipment and electron beam writing method