ClassID:

206581

H01J2237/30433 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes System calibration

Sub-classes:
Recent Application in this class:
#1
20250323013
2025-10-16

Detection of Space Charge Effect During Ion Implantation

#2
20240186104
2024-06-06

METHOD AND APPARATUS FOR AN IMAGING SYSTEM

#3
20220402036
2022-12-22

Devices, systems, and methods for using an imaging device to calibrate and operate a plurality of electron beam guns in an additive manufacturing system

#4
20220260509
2022-08-18

Verification plates with automated evaluation of melt performance

#5
20200406389
2020-12-31

X-ray calibration standard object

#6
20200203122
2020-06-25

Optical alignment correction using convolutional neural network evaluation of a beam image

#7
20200083020
2020-03-12

Method of pattern data preparation and method of forming pattern in layer

#8
20190355628
2019-11-21

Process window analysis

#9
20190027367
2019-01-24

Workpiece processing technique

#10
20180374677
2018-12-27

Calibration of elementary small patterns in variable-shaped-beam electron-beam lithography

#11
20180364564
2018-12-20

On-axis illumination and alignment for charge control during charged particle beam inspection

#12
20180330920
2018-11-15

Ion implantation apparatus

#13
20170294288
2017-10-12

Method and device for characterizing an electron beam

#14
20170169993
2017-06-15

Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image

#15
20170115167
2017-04-27

Temperature measuring mask and temperature measuring method

#16
20170087661
2017-03-30

X-ray calibration standard object

#17
20160307731
2016-10-20

Method for verifying characteristics of an electron beam

#18
20160211116
2016-07-21

Method and device for characterizing an electron beam

#19
20160181062
2016-06-23

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

#20
20160111252
2016-04-21

Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method

#21
20160090645
2016-03-31

Method for structuring an object with the aid of a particle beam apparatus

#22
20160035534
2016-02-04

Method for analyzing and/or processing an object as well as a particle beam device for carrying out the method

#23
20150102236
2015-04-16

Electron beam exposure apparatus and method of detecting error using the same

#24
20130323937
2013-12-05

Combined laser processing system and focused ion beam system

#25
20130253688
2013-09-26

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#26
20130057874
2013-03-07

Method for operating a laser scanner and processing system with laser scanner

#27
20130037724
2013-02-14

Charged particle beam drawing apparatus and charged particle beam drawing method

#28
20130020502
2013-01-24

Charged particle beam drawing apparatus and method of manufacturing article

#29
20120293810
2012-11-22

Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus

#30
20120085936
2012-04-12

Method for monitoring ion implantation

#31
20110095182
2011-04-28

Electron microscope with electron spectrometer

#32
20110029117
2011-02-03

Ion implanter, ion implantation method and program

#33
20100237231
2010-09-23

Apparatus and method for ion beam implantation using scanning and spot beams

#34
20100084583
2010-04-08

REDUCED IMPLANT VOLTAGE DURING ION IMPLANTATION

#35
20100072392
2010-03-25

Charged particle beam profile measurement

#36
20100038553
2010-02-18

System and method of beam energy identification for single wafer ion implantation

#37
20090246655
2009-10-01

Electron beam writing apparatus and method

#38
20090236312
2009-09-24

Method and apparatus for film thickness adjustment

#39
20090045340
2009-02-19

Electron microscope with electron spectrometer

#40
20090001282
2009-01-01

Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces

#41
20080302955
2008-12-11

Techniques for ion beam current measurement using a scanning beam current transformer

#42
20080296515
2008-12-04

Charged particle beam writing apparatus and method

#43
20080245957
2008-10-09

TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE

#44
20080157074
2008-07-03

Method to measure ion beam angle

#45
20080121791
2008-05-29

Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same

#46
20080087844
2008-04-17

Technique for matching performance of ion implantation devices using an in-situ mask

#47
20070257210
2007-11-08

Preventing dosage drift with duplicate dose integrators

#48
20070152169
2007-07-05

Move mechanism for moving target object and charged particle beam writing apparatus

#49
20070100567
2007-05-03

Faraday system integrity determination

#50
20070057204
2007-03-15

Lithography system, sensor and measuring method

#51
20070023688
2007-02-01

Apparatus for measuring a position of an ion beam profiler and a method for its use

#52
20060284117
2006-12-21

Charged beam dump and particle attractor

#53
20060284116
2006-12-21

Particulate prevention in ion implantation

#54
20060284071
2006-12-21

Beam stop and beam tuning methods

#55
20060169927
2006-08-03

Aberration adjusting method, device fabrication method, and charged particle beam lithography machine

#56
20060169898
2006-08-03

Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus

#57
20060151721
2006-07-13

Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program

#58
20060022147
2006-02-02

Method and device of monitoring and controlling ion beam energy distribution

#59
20060007418
2006-01-12

Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system

#60
20050285047
2005-12-29

Electron beam diagnostic for profiling high power beams

#61
20050242299
2005-11-03

Diagnostic system for profiling micro-beams

#62
20050236567
2005-10-27

Lithography tool image quality evaluating and correcting

#63
20050184257
2005-08-25

Characterizing an electron beam treatment apparatus

#64
20050173650
2005-08-11

Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device

#65
20050127307
2005-06-16

Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus

#66
20050017202
2005-01-27

Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams

#67
18076429
2023-05-23

Ion beam cutting calibration system and method