206581 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes System calibration
Sub-classes:Detection of Space Charge Effect During Ion Implantation
#2METHOD AND APPARATUS FOR AN IMAGING SYSTEM
#3Devices, systems, and methods for using an imaging device to calibrate and operate a plurality of electron beam guns in an additive manufacturing system
#4Verification plates with automated evaluation of melt performance
#5X-ray calibration standard object
#6Optical alignment correction using convolutional neural network evaluation of a beam image
#7Method of pattern data preparation and method of forming pattern in layer
#8Process window analysis
#9Workpiece processing technique
#10Calibration of elementary small patterns in variable-shaped-beam electron-beam lithography
#11On-axis illumination and alignment for charge control during charged particle beam inspection
#12Ion implantation apparatus
#13Method and device for characterizing an electron beam
#14Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image
#15Temperature measuring mask and temperature measuring method
#16X-ray calibration standard object
#17Method for verifying characteristics of an electron beam
#18Method and device for characterizing an electron beam
#19Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#20Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method
#21Method for structuring an object with the aid of a particle beam apparatus
#22Method for analyzing and/or processing an object as well as a particle beam device for carrying out the method
#23Electron beam exposure apparatus and method of detecting error using the same
#24Combined laser processing system and focused ion beam system
#25Multi charged particle beam writing apparatus and multi charged particle beam writing method
#26Method for operating a laser scanner and processing system with laser scanner
#27Charged particle beam drawing apparatus and charged particle beam drawing method
#28Charged particle beam drawing apparatus and method of manufacturing article
#29Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
#30Method for monitoring ion implantation
#31Electron microscope with electron spectrometer
#32Ion implanter, ion implantation method and program
#33Apparatus and method for ion beam implantation using scanning and spot beams
#34REDUCED IMPLANT VOLTAGE DURING ION IMPLANTATION
#35Charged particle beam profile measurement
#36System and method of beam energy identification for single wafer ion implantation
#37Electron beam writing apparatus and method
#38Method and apparatus for film thickness adjustment
#39Electron microscope with electron spectrometer
#40Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces
#41Techniques for ion beam current measurement using a scanning beam current transformer
#42Charged particle beam writing apparatus and method
#43TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE
#44Method to measure ion beam angle
#45Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
#46Technique for matching performance of ion implantation devices using an in-situ mask
#47Preventing dosage drift with duplicate dose integrators
#48Move mechanism for moving target object and charged particle beam writing apparatus
#49Faraday system integrity determination
#50Lithography system, sensor and measuring method
#51Apparatus for measuring a position of an ion beam profiler and a method for its use
#52Charged beam dump and particle attractor
#53Particulate prevention in ion implantation
#54Beam stop and beam tuning methods
#55Aberration adjusting method, device fabrication method, and charged particle beam lithography machine
#56Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus
#57Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
#58Method and device of monitoring and controlling ion beam energy distribution
#59Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
#60Electron beam diagnostic for profiling high power beams
#61Diagnostic system for profiling micro-beams
#62Lithography tool image quality evaluating and correcting
#63Characterizing an electron beam treatment apparatus
#64Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device
#65Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus
#66Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams
#67Ion beam cutting calibration system and method