206585 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes Correction during exposure
Sub-classes:MULTIPLE CHARGED-PARTICLE BEAM IRRADIATION APPARATUS, MULTIPLE CHARGED-PARTICLE BEAM IRRADIATION METHOD, CORRECTION MAP GENERATION APPARATUS, AND CORRECTION MAP GENERATION METHOD
#2CHARGED PARTICLE BEAM WRITING APPARATUS, SHOT DATA CORRECTION METHOD AND CHARGED PARTICLE BEAM WRITING METHOD
#3Ion Milling Device, and Inspection System
#4METHOD FOR HANDLING A PARTICLE BEAM SYSTEM, PARTICLE BEAM SYSTEM, COMPUTER AND COMPUTATIONAL SYSTEM
#5ELECTRON BEAM WRITING METHOD, ELECTRON BEAM WRITING APPARATUS, AND NON-TRANSITORY MATERIAL COMPUTER-READABLE STORAGE MEDIUM WITH PROGRAMS STORED THEREIN
#6Charged particle beam writing apparatus, charged particle beam writing method and recording medium
#7Charged-particle beam writing apparatus and charged-particle beam writing method
#8Method for sample orientation for TEM lamella preparation
#9Charged particle beam writing apparatus and charged particle beam writing method
#10Charged particle beam writing apparatus and charged particle beam writing method
#11Multi charged particle beam writing apparatus and multi charged particle beam writing method
#12Charged particle beam writing apparatus and charged particle beam writing method
#13Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
#14Method for determining the changing location of the point of incidence of an energetic beam on a delimited surface
#15Evaluation method, correction method, recording medium and electron beam lithography system
#16Control method and control program for focused ion beam device
#17Ion implantation apparatus and ion implantation method
#18In situ beam current monitoring and control in scanned ion implantation systems
#19Multi charged particle beam writing apparatus and multi charged particle beam writing method
#20Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus
#21Evaluation method, correction method, recording medium and electron beam lithography system
#22Exposure apparatus and exposure method
#23Charged particle beam writing apparatus and charged particle beam writing method
#24Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method
#25Program for correcting charged particle radiation location, device for calculating degree of correction of charged particle radiation location, charged particle radiation system, and method for correcting charged particle radiation location
#26Beam irradiation apparatus and beam irradiation method
#27Lithography apparatus, and method of manufacturing an article
#28Method for correcting drift of charged particle beam, and charged particle beam writing apparatus
#29Apparatus and methods for implementing predicted systematic error correction in location specific processing
#30Method for monitoring ion implantation
#31Method and apparatus for electron beam lithography
#32System and method for controlling ion implanter
#33System and method for real-time overlay error reduction
#34Electron beam exposure apparatus and method of detecting error using the same
#35Implant-induced damage control in ion implantation
#36Apparatus for monitoring ion implantation
#37Multi charged particle beam writing apparatus and multi charged particle beam writing method
#38Sample preparation method and apparatus
#39Charged-particle beam drawing method, computer-readable recording media, and charged-particle beam drawing apparatus
#40Apparatus for monitoring ion implantation
#41Ion implanter
#42Charged particle beam drawing apparatus and charged particle beam drawing method
#43Method of processing of an object
#44Versatile beam glitch detection system
#45Throughput Enhancement for Scanned Beam Ion Implanters
#46Method for improving implant uniformity during photoresist outgassing
#47Electron beam apparatus
#48Ion beam monitoring arrangement
#49System and method for material analysis of a microscopic element
#50Closed-loop process control for electron beam freeform fabrication and deposition processes
#51Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus
#52ELECTRON BEAM APPARATUS
#53REDUCED IMPLANT VOLTAGE DURING ION IMPLANTATION
#54Method and device for producing an image
#55System and method of performing uniform dose implantation under adverse conditions
#56Techniques for improved uniformity tuning in an ion implanter system
#57Extraction electrode system for high current ion implanter
#58Method of suppressing beam position drift, method of suppressing beam dimension drift, and charged particle beam lithography system
#59Recording apparatus, recording control signal generating apparatus, method of manufacturing imprint mold, imprint mold, and magnetic disc
#60Predicting dose repeatability in an ion implantation
#61Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture
#62UNIFORMITY CONTROL FOR ION BEAM ASSISTED ETCHING
#63Charged-particle beam writing method
#64Charged particle beam writing method
#65Charged particle beam deflection method with separate stage tracking and stage positional error signals
#66Ion implantation apparatus
#67Ion implantation apparatus and ion implantation method
#68Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
#69Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
#70System and method for two-dimensional beam scan across a workpiece of an ion implanter
#71Method and device for ion beam processing of surfaces
#72Methods for rapidly switching off an ion beam
#73Technique for improving ion implantation throughput and dose uniformity
#74Ion beam irradiating apparatus and method of adjusting uniformity of a beam
#75Ion beam scanning control methods and systems for ion implantation uniformity
#76Beam tuning with automatic magnet pole rotation for ion implanters
#77System and method of ion beam control in response to a beam glitch
#78Charged particle beam exposure apparatus
#79Charged particle beam exposure apparatus
#80Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus
#81Manufacturing equipment using ION beam or electron beam
#82Preventing dosage drift with duplicate dose integrators
#83Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system
#84Pattern writing and forming method
#85Ion implantation apparatus and ion implanting method
#86Particle-optical projection system
#87Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unit
#88Beam current stabilization utilizing gas feed control loop
#89Ion implanter and ion implantation control method thereof
#90Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control
#91Technique for ion beam angle process control
#92Technique for ion beam angle spread control
#93Parameter control in a lithographic apparatus using polarization
#94Scanning systems and methods for providing ions from an ion beam to a workpiece
#95Multiple gas injection system for charged particle beam instruments
#96Field emission gun and electron beam instruments
#97Ion implantation apparatus and ion implanting method
#98Particle-optical projection system
#99Ion beam monitoring arrangement
#100Modulating ion beam current
#101Ion implantation
#102Method of manufacturing electronic device capable of controlling threshold voltage and ion implanter controller and system that perform the method
#103Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device
#104Charged beam writing apparatus and writing method
#105Method of measuring pattern dimension and method of controlling semiconductor device process
#106Utilization of an ion gauge in the process chamber of a semiconductor ion implanter