H01J2237/30461 - CPC Classification Index

#1

20250246402

2025-07-31

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING PROGRAM THEREIN

#2

20230296989

2023-09-21

Correction of Thermal Expansion in a Lithographic Device

#3

20230029715

2023-02-02

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS

#4

20210027987

2021-01-28

Multi-beam writing method and multi-beam writing apparatus

#5

20210027986

2021-01-28

Multi-beam writing method and multi-beam writing apparatus

#6

20200341380

2020-10-29

Bias correction for lithography

#7

20200328060

2020-10-15

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#8

20200251306

2020-08-06

Exposure apparatus and exposure method, lithography method, and device manufacturing method

#9

20200012195

2020-01-09

Bias correction for lithography

#10

20190355628

2019-11-21

Process window analysis

#11

20190333734

2019-10-31

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

#12

20190115185

2019-04-18

Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

#13

20190074161

2019-03-07

Exposure apparatus and exposure method, lithography method, and device manufacturing method

#14

20190066977

2019-02-28

Ion implantation method, ion implantation apparatus and semiconductor device

#15

20190066975

2019-02-28

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#16

20180342371

2018-11-29

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

#17

20180204707

2018-07-19

Method of performing dose modulation, in particular for electron beam lithography

#18

20180090299

2018-03-29

Charged particle beam apparatus and positional displacement correcting method of charged particle beam

#19

20180076002

2018-03-15

Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

#20

20170371246

2017-12-28

Bias correction for lithography

#21

20170221677

2017-08-03

Ion milling device and ion milling method

#22

20160254122

2016-09-01

Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method

#23

20160093466

2016-03-31

Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus

#24

20160071687

2016-03-10

Charged particle radiation device and specimen preparation method using said device

#25

20160071682

2016-03-10

Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

#26

20140239200

2014-08-28

Cathode operating temperature adjusting method, and writing apparatus

#27

20140203185

2014-07-24

Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

#28

20130134329

2013-05-30

Charged particle beam writing apparatus and charged particle beam writing method

#29

20130068162

2013-03-21

System and method of dosage profile control

#30

20130032707

2013-02-07

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF

#31

20120256106

2012-10-11

Electron beam exposure apparatus and electron beam exposure method

#32

20120104253

2012-05-03

CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME

#33

20120068089

2012-03-22

Charged particle beam writing apparatus and charged particle beam writing method

#34

20120009692

2012-01-12

System and method of dosage profile control

#35

20120007002

2012-01-12

Charged particle beam pattern forming apparatus and charged particle beam pattern forming method

#36

20110278454

2011-11-17

Scanning electron microscope

#37

20110253911

2011-10-20

Charged particle beam writing apparatus and charged particle beam writing method

#38

20110204224

2011-08-25

Multi-column electron beam lithography apparatus and electron beam trajectory adjustment method for the same

#39

20110121208

2011-05-26

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF

#40

20110049382

2011-03-03

Pattern modification schemes for improved FIB patterning

#41

20090289196

2009-11-26

Deflection signal compensation for charged particle beam

#42

20090242787

2009-10-01

Charged-particle beam writing method and charged-particle beam writing apparatus

#43

20090114853

2009-05-07

Manufacturing system for semiconductor device capable of controlling variation in electrical property of element in wafer surface and method for manufacturing the semiconductor device

#44

20090084759

2009-04-02

Method and system for multi-pass correction of substrate defects

#45

20090057574

2009-03-05

Methods for modifying features of a workpiece using a gas cluster ion beam

#46

20090039264

2009-02-12

Scanning electron microscope

#47

20090037868

2009-02-05

AREA BASED OPTICAL PROXIMITY CORRECTION IN RASTER SCAN PRINTING

#48

20090014663

2009-01-15

Charged-particle beam writing method

#49

20090008568

2009-01-08

Charged particle beam writing apparatus and method thereof

#50

20080265174

2008-10-30

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD

#51

20080067441

2008-03-20

Charged-particle beam lithography with grid matching for correction of beam shot position deviation

#52

20080067434

2008-03-20

Non-uniform ion implantation

#53

20080054188

2008-03-06

Electron beam lithography apparatus and method for compensating for electron beam misalignment

#54

20070114462

2007-05-24

Charged particle beam irradiation method and charged particle beam apparatus

#55

20060255284

2006-11-16

Deflection signal compensation for charged particle beam

#56

20060124869

2006-06-15

Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object

#57

20060076510

2006-04-13

Ion beam implant current, spot width and position tuning

#58

20060007418

2006-01-12

Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system

#59

20060001688

2006-01-05

Area based optical proximity correction in raster scan printing

#60

20050161599

2005-07-28

Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object

#61

20050116180

2005-06-02

Charged-particle beam lithographic system

#62

20050014076

2005-01-20

Method of generating mask distortion data, exposure method and method of producing semiconductor device