ClassID:

206604

H01J2237/3151 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a macro-scale Etching

Recent Application in this class:
#1
20260142123
2026-05-21

GRID STRUCTURES OF ION BEAM ETCHING (IBE) SYSTEMS

#2
20260051455
2026-02-19

METHOD TO FABRICATE BLAZED GRATING USING SPACER AND ION BEAM ETCHING

#3
20250191917
2025-06-12

WAFER TOTAL THICKNESS VARIATION USING MASKLESS IMPLANT

#4
20250125124
2025-04-17

ELECTRON BEAM-INDUCED AND REMOTE PLASMA-ASSISTED SIMULTANEOUS MATERIAL-SELECTIVE ETCHING AND GROWTH

#5
20250014861
2025-01-09

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY

#6
20240222071
2024-07-04

Grid Structures Of Ion Beam Etching (IBE) Systems

#7
20240203708
2024-06-20

CLEANING METHOD OF FILM LAYER IN THE PLASMA PROCESSING APPARATUS

#8
20230369013
2023-11-16

Angle control for neutral reactive species generated in a plasma

#9
20230187167
2023-06-15

MEMS PLATFORM FOR THIN FILM NANOMECHANICS CHARACTERIZATION

#10
20230162996
2023-05-25

ETCHING APPARATUS

#11
20230135735
2023-05-04

TECHNIQUES AND APPARATUS FOR SELECTIVE SHAPING OF MASK FEATURES USING ANGLED BEAMS

#12
20220351939
2022-11-03

Grid structures of ion beam etching (IBE) systems

#13
20220262598
2022-08-18

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#14
20220246397
2022-08-04

Temperature controlled/electrically biased wafer surround

#15
20220115215
2022-04-14

Substrate processing apparatus

#16
20220044905
2022-02-10

Material recovery systems for optical components

#17
20210333450
2021-10-28

Controlling etch angles by substrate rotation in angled etch tools

#18
20210189566
2021-06-24

Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic deposition of thin films

#19
20210125835
2021-04-29

Method for real time monitoring semiconductor fabrication process

#20
20210125821
2021-04-29

Method and device for the surface treatment of substrates

#21
20210104377
2021-04-08

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#22
20210082656
2021-03-18

Etching apparatus and etching method

#23
20200279753
2020-09-03

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

#24
20200176261
2020-06-04

Method of determining plasma abnormality, method of manufacturing semiconductor device, and substrate processing apparatus

#25
20200006036
2020-01-02

Methods and apparatus for electron beam etching process

#26
20190393053
2019-12-26

ETCHING APPARATUS

#27
20190295848
2019-09-26

Vertical transistor with trench gate insulator having varying thickness

#28
20190244784
2019-08-08

METHOD OF PROCESSING A SURFACE BY MEANS OF A PARTICLE BEAM

#29
20190108973
2019-04-11

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#30
20190035602
2019-01-31

Planarization, densification, and exfoliation of porous materials by high-energy ion beams

#31
20190027367
2019-01-24

Workpiece processing technique

#32
20180330913
2018-11-15

Sample holder unit and sample observation apparatus

#33
20180218878
2018-08-02

Enhanced FIB-SEM systems for large-volume 3D imaging

#34
20180215660
2018-08-02

Method for the Fabrication of a Reduced Reflectance Metal Mesh

#35
20180204717
2018-07-19

Method and device for the surface treatment of substrates

#36
20180053631
2018-02-22

Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching

#37
20170309454
2017-10-26

Negative ribbon ion beams from pulsed plasmas

#38
20170221677
2017-08-03

Ion milling device and ion milling method

#39
20170178870
2017-06-22

Method of extracting and accelerating ions

#40
20170125217
2017-05-04

Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching

#41
20170069483
2017-03-09

Method and device for the surface treatment of substrates

#42
20170062181
2017-03-02

Use of ion beam etching to generate gate-all-around structure

#43
20170047198
2017-02-16

Ion milling apparatus and sample processing method

#44
20170044661
2017-02-16

DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSITION AND ION-BEAM EROSION

#45
20170011885
2017-01-12

Method for preparing cross-sections by ion beam milling

#46
20160196951
2016-07-07

Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam

#47
20160148779
2016-05-26

Specimen preparation device

#48
20160111249
2016-04-21

Methods and apparatus for determining, using, and indicating ion beam working properties

#49
20160093468
2016-03-31

Method of reducing the thickness of a target sample

#50
20160087195
2016-03-24

Etching apparatus and etching method

#51
20160056016
2016-02-25

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#52
20160024645
2016-01-28

Ion beam sample preparation and coating apparatus and methods

#53
20150307986
2015-10-29

Wafer stage for symmetric wafer processing

#54
20150294885
2015-10-15

Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam

#55
20140357088
2014-12-04

Precursor for planar deprocessing of semiconductor devices using a focused ion beam

#56
20140353151
2014-12-04

Charged particle beam irradiation apparatus

#57
20130213933
2013-08-22

Methods and apparatus for employing an accelerated neutral beam for improved surface analysis

#58
20120206795
2012-08-16

Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements

#59
20120104274
2012-05-03

ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

#60
20120091363
2012-04-19

Processing system

#61
20120080406
2012-04-05

METHOD AND SYSTEM FOR PREPARING A LAMELA

#62
20120080307
2012-04-05

ION BEAM DISTRIBUTION

#63
20120006786
2012-01-12

METHOD AND SYSTEM FOR PREPARING A SAMPLE

#64
20110272593
2011-11-10

Gas cluster ion beam system with cleaning apparatus

#65
20110220487
2011-09-15

Protective enclosure for an ion gun, device for depositing materials through vacuum evaporation comprising such a protective enclosure and method for depositing materials

#66
20110198033
2011-08-18

SHUTTER DEVICE AND VACUUM PROCESSING APPARATUS

#67
20110174770
2011-07-21

Method for modifying an etch rate of a material layer using energetic charged particles

#68
20110147200
2011-06-23

Ion beam generator, and substrate processing apparatus and production method of electronic device using the ion beam generator

#69
20100319545
2010-12-23

CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDMENT APPARATUS

#70
20100230616
2010-09-16

Method of smoothing solid surface with gas cluster ion beam and solid surface smoothing apparatus

#71
20100101940
2010-04-29

METHOD FOR REMOVING FOREIGN MATTER FROM GLASS SUBSTRATE SURFACE AND METHOD FOR PROCESSING GLASS SUBSTRATE SURFACE

#72
20100096263
2010-04-22

Solid surface smoothing apparatus

#73
20100051828
2010-03-04

Processing system

#74
20100044579
2010-02-25

APPARATUS

#75
20100018858
2010-01-28

Frequency adjusting apparatus

#76
20090288603
2009-11-26

PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD

#77
20090236312
2009-09-24

Method and apparatus for film thickness adjustment

#78
20090224180
2009-09-10

Apparatus and method for processing a wafer

#79
20090098186
2009-04-16

Method and system for coating a surface of a medical device with a therapeutic agent and drug eluting medical devices made thereby

#80
20090084757
2009-04-02

UNIFORMITY CONTROL FOR ION BEAM ASSISTED ETCHING

#81
20090037015
2009-02-05

Method and system for increasing throughput during location specific processing of a plurality of substrates

#82
20080315128
2008-12-25

Method and apparatus for flattening solid surface

#83
20080290298
2008-11-27

Method and system for treating an interior surface of a workpiece using a charged particle beam

#84
20080149858
2008-06-26

Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements

#85
20080078745
2008-04-03

RF Coil Plasma Generation

#86
20080073557
2008-03-27

Methods and apparatuses for directing an ion beam source

#87
20080067421
2008-03-20

Electron Beam Etching Apparatus and Method for the same

#88
20080048132
2008-02-28

Apparatus and method for reducing particulate contamination in gas cluster ion beam processing equipment

#89
20080048127
2008-02-28

Ion source including magnet and magnet yoke assembly

#90
20080038933
2008-02-14

Plasma and electron beam etching device and method

#91
20070181820
2007-08-09

Apparatus and method for controlling ion beam

#92
20070132358
2007-06-14

Ion source and polishing system using the same

#93
20060284105
2006-12-21

Ion source

#94
20060278611
2006-12-14

Method for smoothing a solid surface

#95
20060192132
2006-08-31

Charged particle beam extraction and formation apparatus

#96
20060169923
2006-08-03

Sample holder and ion-beam processing system

#97
20060102854
2006-05-18

Apparatus and method for polishing gemstones and the like

#98
20060060795
2006-03-23

Iron beam irradiation device and insulating spacer for the device

#99
20050211926
2005-09-29

Ion beam irradiation apparatus and insulating spacer for the same

#100
20050205802
2005-09-22

Method and apparatus for improved processing with a gas-cluster ion beam

#101
20050205801
2005-09-22

Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system