206593 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects Processing objects on a macro-scale
Sub-classes:UPGRADING PROCESS STREAMS
#2PROCESSING MATERIALS
#3ENCLOSURES FOR TREATING MATERIALS
#4RECONFIGURABLE PROCESSING ENCLOSURES
#5CONTROLLING PROCESS GASES
#6Processing materials
#7Workpiece processing technique
#8Array for processing materials
#9Processing materials
#10Processing materials
#11Reconfigurable processing enclosures
#12Array for processing materials
#13Charged particle system and methods for irradiating a planning target volume
#14Hollow cathode ion source
#15Controlling process gases
#16Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system
#17Array for processing materials
#18Processing materials
#19Reconfigurable processing enclosures
#20Method for preparing cross-sections by ion beam milling
#21Array for processing materials
#22Multi-source plasma focused ion beam system
#23Plasma source apparatus and methods for generating charged particle beams
#24Electron-beam-supported production of electrical components
#25Plasma whirl reactor apparatus and methods of use
#26Upgrading process streams
#27Multi-source plasma focused ion beam system
#28Processing materials
#29Array for processing materials
#30Reconfigureable processing enclosures
#31Enclosures for treating materials
#32Controlling process gases
#33Apparatus for the sterilization of plastics material containers by means of medium-controlled electron beams
#34Apparatus and method of sterilizing containers with a charge carrier source introduced into the containers
#35Surface processing method
#36SYSTEM AND METHOD FOR GENERATING A BEAM OF PARTICLES
#37CLUSTER BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, CLUSTER BEAM GENERATING METHOD, AND SUBSTRATE PROCESSING METHOD
#38Method to minimize chain scission and monomer generation in processing of poly(L-lactide) stent
#39Multi-source plasma focused ion beam system
#40Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support
#41Hall-current ion source with improved ion beam energy distribution
#42Gas-cluster-jet generator and gas-cluster ion-beam apparatus utilizing an improved gas-cluster-jet generator
#43Surface processing method
#44Closed drift ion source
#45Apparatus for producing a charged particle beam
#46Multi-source plasma focused ion beam system
#47Apparatus and method for clean, rapidly solidified alloys
#48Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams
#49Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support
#50SOLID SAMPLE, SOLID SAMPLE FABRICATING METHOD, AND SOLID SAMPLE FABRICATING APPARATUS
#51Ion source with upstream inner magnetic pole piece
#52Adaptive controller for ion source
#53Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams
#54Irradiating device and method for controlling the same
#55Method and system for continuous large-area scanning implantation process
#56Ion source with recess in electrode
#57Apparatus and method for clean, rapidly solidified alloys
#58Subsurface imaging using an electron beam
#59Multiple gas injection system for charged particle beam instruments
#60Electron beam diagnostic for profiling high power beams
#61Floating mode ion source