206627 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale Depositing thin layers on selected microareas
Sub-classes:METHOD FOR DEPOSITING A COATING IN PROCESS CHAMBERS
#2Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate
#3Depositive shielding for fiducial protection from redeposition
#4Method for preparing a TEM sample
#5Apparatus and method for repairing a photolithographic mask
#6Nanofabrication using a new class of electron beam induced surface processing techniques
#7Methods and systems for plasma deposition and treatment
#8Coating arrangement and method
#9Charged particle device and wiring method
#10Composite charged particle beam apparatus and control method thereof
#11Attachment of nano-objects to beam-deposited structures
#12Negative ribbon ion beams from pulsed plasmas
#13Method for structuring an object and associated particle beam system
#14CAD-assisted TEM prep recipe creation
#15Adaptive beam current for high throughput patterning
#16Deposition method and focused ion beam system
#17Process gas enhancement for beam treatment of a substrate
#18Electron beam-induced etching
#19Method and System of Creating a Symmetrical FIB Deposition
#20METHODS OF FORMING LAYERS
#21Charged particle device and wiring method
#22Bulk deposition for tilted mill protection
#23Electron beam-induced etching
#24Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
#25Low energy ion milling or deposition
#26Method and system for ion-assisted processing
#27Method and apparatus for generating electron beams
#28Methods and apparatuses of using metal needle arrays for specimen lift-out and circuit edit
#29Beam-induced deposition of low-resistivity material
#30Apparatus and method for controlled particle beam manufacturing
#31Processing system
#32Method and apparatus for specimen fabrication
#33Gas field ion microscopes having multiple operation modes
#34Particle-Beam Induced Processing Using Liquid Reactants
#35Method for modifying a material layer using gas cluster ion beam processing
#36Methods for performing circuit edit operations with low landing energy electron beams
#37Laser processing system, object mount and laser processing method
#38Apparatus and method for surface modification using charged particle beams
#39Method and apparatus for specimen fabrication
#40Method for treating non-planar structures using gas cluster ion beam processing
#41GAS CLUSTER ION BEAM PROCESSING METHOD FOR PREPARING AN ISOLATION LAYER IN NON-PLANAR GATE STRUCTURES
#42High pressure charged particle beam system
#43Electron induced chemical etching and deposition for local circuit repair
#44METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES
#45Method for forming microscopic 3D structures
#46Method for modifying a material layer using gas cluster ion beam processing
#47Cross section processing method and method of manufacturing cross section observation sample
#48ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS
#49Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
#50APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
#51Processing system
#52Method to direct pattern metals on a substrate
#53METHOD FOR FORMING TRENCH ISOLATION
#54PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD
#55Nanotube processing employing solid-condensed-gas-layers
#56Material processing system and method
#57Installation and method of nanofabrication
#58Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
#59Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
#60Charged particle beam apparatus
#61APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM
#62METHODS AND APPARATUS FOR IN SITU SUBSTRATE TEMPERATURE MONITORING BY ELECTROMAGNETIC RADIATION EMISSION
#63Method and apparatus for specimen fabrication
#64Working method by focused ion beam and focused ion beam working apparatus
#65Apparatus and method for surface modification using charged particle beams
#66METHOD AND APPARATUS FOR SPECIMEN FABRICATION
#67Method and apparatus for specimen fabrication
#68Method and system for treating an interior surface of a workpiece using a charged particle beam
#69Method of manufacturing sample for atom probe analysis by FIB and focused ion beam apparatus implementing the same
#70Method and apparatus for in-situ sample preparation
#71Charged particle-beam processing using a cluster source
#72Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
#73Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
#74Charged beam processing apparatus
#75Plasma and electron beam etching device and method
#76Electron induced chemical etching and deposition for local circuit repair
#77Apparatus and method for controlled particle beam manufacturing
#78Apparatus and method for controlled particle beam manufacturing
#79Apparatus and method for controlled particle beam manufacturing
#80Apparatus and method for controlled particle beam manufacturing
#81Apparatus and method for controlled particle beam manufacturing
#82Apparatus and method for controlled particle beam manufacturing
#83Apparatus and method for controlled particle beam manufacturing
#84Use of ion implantation in chemical etching
#85Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
#86Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
#87Method and apparatus for specimen fabrication
#88Method and apparatus for specimen fabrication
#89Method and apparatus for specimen fabrication
#90Focused ion beam apparatus for specimen fabrication
#91Charged particle beam apparatus
#92Apparatus and method for controlled particle beam manufacturing
#93Ion beam apparatus and analysis method
#94Material processing system and method
#95TEM sample preparation from a circuit layer structure
#96Method and apparatus for specimen fabrication
#97Method and apparatus for specimen fabrication
#98Method of processing semiconductor apparatus
#99APPARATUS AND METHOD FOR MANIPULATING SAMPLE TEMPERATURE FOR FOCUSED ION BEAM PROCESSING
#100Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
#101Ion source with particular grid assembly
#102Method for the removal of a microscopic sample from a substrate
#103Minute three dimensional structure producing apparatus and method
#104Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system
#105Method to locally protect extreme ultraviolet multilayer blanks used for lithography
#106Material processing system and method
#107Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
#108Method and apparatus for specimen fabrication
#109Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
#110Plasma micronozzle adapter
#111Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
#112Precision deposition using miniature-column charged particle beam arrays
#113Precision deposition using miniature-column charged particle beam arrays