ClassID:

206627

H01J2237/31732 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale Depositing thin layers on selected microareas

Sub-classes:
Recent Application in this class:
#1
20260058094
2026-02-26

METHOD FOR DEPOSITING A COATING IN PROCESS CHAMBERS

#2
20230023396
2023-01-26

Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate

#3
20220102284
2022-03-31

Depositive shielding for fiducial protection from redeposition

#4
20220068600
2022-03-03

Method for preparing a TEM sample

#5
20200249564
2020-08-06

Apparatus and method for repairing a photolithographic mask

#6
20200190669
2020-06-18

Nanofabrication using a new class of electron beam induced surface processing techniques

#7
20200058463
2020-02-20

Methods and systems for plasma deposition and treatment

#8
20200017953
2020-01-16

Coating arrangement and method

#9
20180216223
2018-08-02

Charged particle device and wiring method

#10
20170330722
2017-11-16

Composite charged particle beam apparatus and control method thereof

#11
20170327951
2017-11-16

Attachment of nano-objects to beam-deposited structures

#12
20170309454
2017-10-26

Negative ribbon ion beams from pulsed plasmas

#13
20170263416
2017-09-14

Method for structuring an object and associated particle beam system

#14
20170062178
2017-03-02

CAD-assisted TEM prep recipe creation

#15
20170002455
2017-01-05

Adaptive beam current for high throughput patterning

#16
20160163507
2016-06-09

Deposition method and focused ion beam system

#17
20160071734
2016-03-10

Process gas enhancement for beam treatment of a substrate

#18
20160020068
2016-01-21

Electron beam-induced etching

#19
20150369710
2015-12-24

Method and System of Creating a Symmetrical FIB Deposition

#20
20150348753
2015-12-03

METHODS OF FORMING LAYERS

#21
20150299842
2015-10-22

Charged particle device and wiring method

#22
20150243477
2015-08-27

Bulk deposition for tilted mill protection

#23
20140363978
2014-12-11

Electron beam-induced etching

#24
20140360977
2014-12-11

Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission

#25
20140302252
2014-10-09

Low energy ion milling or deposition

#26
20140038393
2014-02-06

Method and system for ion-assisted processing

#27
20130300286
2013-11-14

Method and apparatus for generating electron beams

#28
20130199034
2013-08-08

Methods and apparatuses of using metal needle arrays for specimen lift-out and circuit edit

#29
20120308740
2012-12-06

Beam-induced deposition of low-resistivity material

#30
20120112323
2012-05-10

Apparatus and method for controlled particle beam manufacturing

#31
20120091363
2012-04-19

Processing system

#32
20120085924
2012-04-12

Method and apparatus for specimen fabrication

#33
20120068067
2012-03-22

Gas field ion microscopes having multiple operation modes

#34
20110293847
2011-12-01

Particle-Beam Induced Processing Using Liquid Reactants

#35
20110266466
2011-11-03

Method for modifying a material layer using gas cluster ion beam processing

#36
20110204263
2011-08-25

Methods for performing circuit edit operations with low landing energy electron beams

#37
20110198326
2011-08-18

Laser processing system, object mount and laser processing method

#38
20110186719
2011-08-04

Apparatus and method for surface modification using charged particle beams

#39
20110140006
2011-06-16

Method and apparatus for specimen fabrication

#40
20110084216
2011-04-14

Method for treating non-planar structures using gas cluster ion beam processing

#41
20110084214
2011-04-14

GAS CLUSTER ION BEAM PROCESSING METHOD FOR PREPARING AN ISOLATION LAYER IN NON-PLANAR GATE STRUCTURES

#42
20110031394
2011-02-10

High pressure charged particle beam system

#43
20110017401
2011-01-27

Electron induced chemical etching and deposition for local circuit repair

#44
20100297362
2010-11-25

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

#45
20100255213
2010-10-07

Method for forming microscopic 3D structures

#46
20100243919
2010-09-30

Method for modifying a material layer using gas cluster ion beam processing

#47
20100189917
2010-07-29

Cross section processing method and method of manufacturing cross section observation sample

#48
20100136255
2010-06-03

ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS

#49
20100119698
2010-05-13

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#50
20100098922
2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

#51
20100051828
2010-03-04

Processing system

#52
20100032302
2010-02-11

Method to direct pattern metals on a substrate

#53
20090314963
2009-12-24

METHOD FOR FORMING TRENCH ISOLATION

#54
20090288603
2009-11-26

PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD

#55
20090179005
2009-07-16

Nanotube processing employing solid-condensed-gas-layers

#56
20090121132
2009-05-14

Material processing system and method

#57
20090095923
2009-04-16

Installation and method of nanofabrication

#58
20090071605
2009-03-19

Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor

#59
20090041949
2009-02-12

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers

#60
20090039260
2009-02-12

Charged particle beam apparatus

#61
20090032725
2009-02-05

APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM

#62
20090025876
2009-01-29

METHODS AND APPARATUS FOR IN SITU SUBSTRATE TEMPERATURE MONITORING BY ELECTROMAGNETIC RADIATION EMISSION

#63
20090008578
2009-01-08

Method and apparatus for specimen fabrication

#64
20080302979
2008-12-11

Working method by focused ion beam and focused ion beam working apparatus

#65
20080302954
2008-12-11

Apparatus and method for surface modification using charged particle beams

#66
20080296516
2008-12-04

METHOD AND APPARATUS FOR SPECIMEN FABRICATION

#67
20080296497
2008-12-04

Method and apparatus for specimen fabrication

#68
20080290298
2008-11-27

Method and system for treating an interior surface of a workpiece using a charged particle beam

#69
20080289954
2008-11-27

Method of manufacturing sample for atom probe analysis by FIB and focused ion beam apparatus implementing the same

#70
20080185517
2008-08-07

Method and apparatus for in-situ sample preparation

#71
20080142735
2008-06-19

Charged particle-beam processing using a cluster source

#72
20080121791
2008-05-29

Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same

#73
20080099674
2008-05-01

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#74
20080067437
2008-03-20

Charged beam processing apparatus

#75
20080038933
2008-02-14

Plasma and electron beam etching device and method

#76
20080006603
2008-01-10

Electron induced chemical etching and deposition for local circuit repair

#77
20070284695
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#78
20070284538
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#79
20070284537
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#80
20070284527
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#81
20070278428
2007-12-06

Apparatus and method for controlled particle beam manufacturing

#82
20070278419
2007-12-06

Apparatus and method for controlled particle beam manufacturing

#83
20070278418
2007-12-06

Apparatus and method for controlled particle beam manufacturing

#84
20070264831
2007-11-15

Use of ion implantation in chemical etching

#85
20070262050
2007-11-15

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers

#86
20070252092
2007-11-01

Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor

#87
20070145302
2007-06-28

Method and apparatus for specimen fabrication

#88
20070145301
2007-06-28

Method and apparatus for specimen fabrication

#89
20070145300
2007-06-28

Method and apparatus for specimen fabrication

#90
20070145299
2007-06-28

Focused ion beam apparatus for specimen fabrication

#91
20070069158
2007-03-29

Charged particle beam apparatus

#92
20070045534
2007-03-01

Apparatus and method for controlled particle beam manufacturing

#93
20060284115
2006-12-21

Ion beam apparatus and analysis method

#94
20060284090
2006-12-21

Material processing system and method

#95
20060243919
2006-11-02

TEM sample preparation from a circuit layer structure

#96
20060231776
2006-10-19

Method and apparatus for specimen fabrication

#97
20060192099
2006-08-31

Method and apparatus for specimen fabrication

#98
20060071182
2006-04-06

Method of processing semiconductor apparatus

#99
20060065853
2006-03-30

APPARATUS AND METHOD FOR MANIPULATING SAMPLE TEMPERATURE FOR FOCUSED ION BEAM PROCESSING

#100
20060038137
2006-02-23

Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same

#101
20060017011
2006-01-26

Ion source with particular grid assembly

#102
20060000973
2006-01-05

Method for the removal of a microscopic sample from a substrate

#103
20050211922
2005-09-29

Minute three dimensional structure producing apparatus and method

#104
20050205801
2005-09-22

Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system

#105
20050109278
2005-05-26

Method to locally protect extreme ultraviolet multilayer blanks used for lithography

#106
20050103272
2005-05-19

Material processing system and method

#107
20050066899
2005-03-31

Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor

#108
20050054029
2005-03-10

Method and apparatus for specimen fabrication

#109
20050037617
2005-02-17

Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission

#110
17152942
2024-05-28

Plasma micronozzle adapter

#111
16015772
2020-03-31

Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays

#112
14809985
2017-01-31

Precision deposition using miniature-column charged particle beam arrays

#113
14745463
2016-09-27

Precision deposition using miniature-column charged particle beam arrays