H01J2237/317 - CPC Classification Index

ClassID:

206608 ⎘

H01J2237/317 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects Processing objects on a microscale

Sub-classes:

H01J2237/31701 » Ion implantation 302
H01J2237/31715 » Particle-beam lithography, e.g. electron beam lithography 20
H01J2237/31732 » Depositing thin layers on selected microareas 108
H01J2237/31735 » Direct-write microstructures 23
H01J2237/3174 » Etching microareas 200
H01J2237/31749 » Focused ion beam 491
H01J2237/3175 » Lithography 129

Recent Application in this class:

20240170250

2024-05-23

Charged Particle Beam Device and Sample Analysis Method

20240029996

2024-01-25

METHOD OF PROCESSING A SAMPLE, PARTICLE BEAM SYSTEM, AND COMPUTER PROGRAM PRODUCT

20220348361

2022-11-03

Ion propulsion device

20220028657

2022-01-27

MEMBER FOR SEMICONDUCTOR MANUFACTURING DEVICE

20210040600

2021-02-11

Methods for directed irradiation synthesis with ion and thermal beams

20200266021

2020-08-20

Ion beam generator with nanowires

20200012091

2020-01-09

Method for changing a surface via particle irradiation

20190355543

2019-11-21

Method and apparatus for a porous electrospray emitter

20190292652

2019-09-26

Methods for directed irradiation synthesis with ion and thermal beams

#10

20190157036

2019-05-23

Method and apparatus for a porous electrospray emitter

#11

20180209032

2018-07-26

Methods for directed irradiation synthesis with ion and thermal beams

#12

20180157067

2018-06-07

Detecting method and detecting equipment therefor

#13

20180114671

2018-04-26

Cryogenic specimen processing in a charged particle microscope

#14

20180076003

2018-03-15

Method and apparatus for a porous electrospray emitter

#15

20180033611

2018-02-01

Cluster tool and manufacuturing method of semiconductor structure using the same

#16

20170125207

2017-05-04

Method for optimizing charged particle beams formed by shaped apertures

#17

20170110288

2017-04-20

Supporting case and multi charged particle beam drawing apparatus

#18

20170110284

2017-04-20

Method and apparatus for a porous electrospray emitter

#19

20160293380

2016-10-06

Charged particle beam processing using process gas and cooled surface

#20

20160240354

2016-08-18

Plasma ion source and charged particle beam apparatus

#21

20160181058

2016-06-23

Method for processing and/or for observing an object, and particle beam device for carrying out the method

#22

20160155607

2016-06-02

Multiple gas injection system

#23

20160126057

2016-05-05

Ion milling device

#24

20160093467

2016-03-31

Charged particle beam apparatus

#25

20150292077

2015-10-15

Methods for directed irradiation synthesis with ion and thermal beams

#26

20150243476

2015-08-27

Apparatus and methods for implementing predicted systematic error correction in location specific processing

#27

20150228488

2015-08-13

Semiconductor device manufacturing method and semiconductor manufacturing apparatus

#28

20150206708

2015-07-23

Charged particle beam apparatus and processing method

#29

20150200072

2015-07-16

Method and apparatus for an imaging system

#30

20150170878

2015-06-18

DRAWING APPARATUS, DRAWING METHOD AND MANUFACTURING METHOD OF ARTICLE

#31

20150144786

2015-05-28

Molecular beam enhanced GCIB treatment

#32

20150008121

2015-01-08

Ion milling device

#33

20140014742

2014-01-16

Gas injection system for energetic-beam instruments

#34

20130248490

2013-09-26

Multiple gas injection system

#35

20120211677

2012-08-23

Multiple beam charged particle optical system

#36

20120025093

2012-02-02

Particle beam system

#37

20110309263

2011-12-22

Dual beam system

#38

20110168910

2011-07-14

Multiple beam charged particle optical system

#39

20110163244

2011-07-07

Multiple beam charged particle optical system

#40

20100187970

2010-07-29

Apparatus for producing a charged particle beam

#41

20100096566

2010-04-22

Reducing Line Edge Roughness by Particle Beam Exposure

#42

20100051802

2010-03-04

Single-channel optical processing system for energetic-beam microscopes

#43

20100025578

2010-02-04

Dual beam system

#44

20090200484

2009-08-13

Dual mode gas field ion source

#45

20090152461

2009-06-18

Hole inspection apparatus and hole inspection method using the same

#46

20090134127

2009-05-28

Electron beam heating system having carbon nanotubes

#47

20090045339

2009-02-19

Charged particle beam equipment

#48

20080237492

2008-10-02

Methods and processing systems for using a gas cluster ion beam to offset systematic non-uniformities in workpieces processed in a process tool

#49

20080237491

2008-10-02

Apparatus and methods for systematic non-uniformity correction using a gas cluster ion beam

#50

20080142733

2008-06-19

Substrate processing apparatus and method

#51

20080035860

2008-02-14

Dual beam system

#52

20080023643

2008-01-31

Multiple beam charged particle optical system

#53

20080022925

2008-01-31

Method for marking a crystalline material using cathodoluminescence

#54

20070216767

2007-09-20

Electron beam displacement measuring method, electron beam displacement measuring device, and electron beam recording apparatus

#55

20070184596

2007-08-09

Ion beam irradiation apparatus and ion beam irradiation method

#56

20060228287

2006-10-12

Precision shape modification of nanodevices with a low-energy electron beam

#57

20060118733

2006-06-08

Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method

#58

20050242299

2005-11-03

Diagnostic system for profiling micro-beams

#59

20050035291

2005-02-17

Dual beam system