H01J2237/3326 - CPC Classification Index

ClassID:

206675 ⎘

H01J2237/3326 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Coating; Problems associated with coating high speed

Recent Application in this class:

20260031312

2026-01-29

Beam Plasma Source Enhanced Magnetron Sputtering

20230253194

2023-08-10

ATMOSPHERIC PLASMA PROCESSING METHOD AND ATMOSPHERIC PLASMA PROCESSING APPARATUS

20170352562

2017-12-07

DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME

20160284518

2016-09-29

Ways to generate plasma in continuous power mode for low pressure plasma processes

20160276140

2016-09-22

GROUND STATE HYDROGEN RADICAL SOURCES FOR CHEMICAL VAPOR DEPOSITION OF SILICON-CARBON-CONTAINING FILMS

20160211122

2016-07-21

Plasma-chemical coating apparatus

20160181068

2016-06-23

Radical generator and molecular beam epitaxy apparatus

20160071702

2016-03-10

ARC-PLASMA FILM FORMATION DEVICE

20150136735

2015-05-21

Plasma processing device and plasma processing method

#10

20140335288

2014-11-13

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

#11

20130037755

2013-02-14

Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies

#12

20120040513

2012-02-16

Plasma deposition of amorphous semiconductors at microwave frequencies

#13

20100040802

2010-02-18

METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE

#14

20090311866

2009-12-17

METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE

#15

20090233442

2009-09-17

Method and apparatus for production of metal film or the like

#16

20050230830

2005-10-20

Interconnection structure

#17

20050217579

2005-10-06

Method and apparatus for production of metal film or the like