Patents-Review.com
ClassID:

206672 ⎘

H01J2237/3322 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Coating Problems associated with coating

Sub-classes:
Recent Application in this class:
#1
20260150600
2026-05-28

METHOD FOR LATERAL ETCH WITH BOTTOM PROTECTION

 #2
20250379031
2025-12-11

TUNING DEPOSITION SELECTIVITY

 #3
20230260785
2023-08-17

Method for manufacturing sputtering target, method for forming oxide film, and transistor

 #4
20230230802
2023-07-20

Ultra High Purity Conditions for Atomic Scale Processing

 #5
20230212736
2023-07-06

METHOD OF OPERATING A PVD APPARATUS

 #6
20230141067
2023-05-11

Method and system for plasma processing arc suppression

 #7
20230104096
2023-04-06

Plasma generation systems with multi-dimensional impedance matching networks

 #8
20220020586
2022-01-20

Method for manufacturing sputtering target, method for forming oxide film, and transistor

 #9
20210391148
2021-12-16

Arc suppression device for plasma processing equipment

 #10
20210313145
2021-10-07

Ultra high purity conditions for atomic scale processing

 #11
20210180185
2021-06-17

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

 #12
20200411290
2020-12-31

Arc suppression device for plasma processing equipment

 #13
20200194243
2020-06-18

Process kit having tall deposition ring for PVD chamber

 #14
20200144059
2020-05-07

Method for manufacturing sputtering target, method for forming oxide film, and transistor

 #15
20200066494
2020-02-27

FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM

 #16
20190157055
2019-05-23

Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same

 #17
20190055651
2019-02-21

SHOWER HEAD AND VACUUM PROCESSING APPARATUS

 #18
20180269045
2018-09-20

PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS

 #19
20180269044
2018-09-20

PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS

 #20
20180261438
2018-09-13

Tungsten Sintered Compact Sputtering Target and Tungsten Film Formed Using Said Target

 #21
20180247797
2018-08-30

Reactors for plasma-assisted processes and associated methods

 #22
20180005814
2018-01-04

Selective atomic layer deposition with post-dose treatment

 #23
20170372914
2017-12-28

Apparatus and method for processing gas, and storage medium

 #24
20170330737
2017-11-16

Treating arcs in a plasma process

 #25
20170191161
2017-07-06

Cooled gas feed block with baffle and nozzle for HDP-CVD

 #26
20170178904
2017-06-22

Method for manufacturing sputtering target, method for forming oxide film, and transistor

 #27
20170140907
2017-05-18

Sputtering apparatus and processing apparatus

 #28
20170110301
2017-04-20

Sputtering apparatuses and methods of manufacturing a magnetic memory device using the same

 #29
20170062189
2017-03-02

Apparatus for coating a film in a container and method for coating the film

 #30
20170040150
2017-02-09

Roll-to-roll hybrid plasma modular coating system

 #31
20160362812
2016-12-15

OFF-AXIS SPUTTERING DEPOSITION FOR GROWTH OF SINGLE CRYSTALLINE FILMS OF A BROAD RANGE OF COMPLEX MATERIALS

 #32
20160358767
2016-12-08

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

 #33
20160336155
2016-11-17

Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same

 #34
20160336151
2016-11-17

AC power connector, sputtering apparatus and method therefor

 #35
20160333461
2016-11-17

Methods for surface preparation of sputtering target

 #36
20160172166
2016-06-16

Target, adapted to an indirect cooling device, having a cooling plate

 #37
20160172165
2016-06-16

Carrier ring structure and chamber systems including the same

 #38
20160160342
2016-06-09

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXIDE FILM, AND TRANSISTOR

 #39
20160155619
2016-06-02

FORMING MEMORY USING HIGH POWER IMPULSE MAGNETRON SPUTTERING

 #40
20160141157
2016-05-19

TARGET FOR THE REACTIVE SPUTTER DEPOSITION OF ELECTRICALLY INSULATING LAYERS

 #41
20160118230
2016-04-28

Apparatus for the plasma treatment of surfaces and a method for treating surfaces with plasma

 #42
20160013035
2016-01-14

SYSTEM AND APPARATUS TO FACILITATE PHYSICAL VAPOR DEPOSITION TO MODIFY NON-METAL FILMS ON SEMICONDUCTOR SUBSTRATES

 #43
20150368788
2015-12-24

(Ga) Zn Sn oxide sputtering target

 #44
20150357171
2015-12-10

Methods and apparatus for improved metal ion filtering

 #45
20150303040
2015-10-22

Tungsten Sintered Compact Sputtering Target and Tungsten Film Formed Using Said Target

 #46
20150279673
2015-10-01

Thin film transistor array panel having an oxide semiconductor including silicon

 #47
20150243535
2015-08-27

CLUSTER TYPE SEMICONDUCTOR PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #48
20150235819
2015-08-20

Oxide sintered body and sputtering target

 #49
20150235751
2015-08-20

Magnet unit and magnetron sputtering apparatus

 #50
20150232980
2015-08-20

Cu-Ga Alloy Sputtering Target, and Method for Producing Same

 #51
20150221486
2015-08-06

Methods for reducing material overhang in a feature of a substrate

 #52
20150187546
2015-07-02

Vacuum-processing apparatus, vacuum-processing method, and storage medium

 #53
20150184280
2015-07-02

ITO ceramic sputtering targets with reduced InOcontents and method of producing it

 #54
20150179413
2015-06-25

Process tools and methods of forming devices using process tools

 #55
20140322063
2014-10-30

Process for producing FePt-based sputtering target

 #56
20140322062
2014-10-30

Process for producing FePt-based sputtering target

 #57
20140318955
2014-10-30

FePt-based sputtering target

 #58
20140318954
2014-10-30

FePt-based sputtering target

 #59
20120160673
2012-06-28

Magnet unit and magnetron sputtering apparatus

 #60
20110315543
2011-12-29

Forming memory using high power impulse magnetron sputtering

 #61
20110048934
2011-03-03

System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates

 #62
20060060300
2006-03-23

Plasma treatment method

 #63
20060035035
2006-02-16

Film forming method and film forming apparatus

 #64
20050074977
2005-04-07

Method and apparatus for dry etching

 #65
15680159
2020-06-09

Reactors and methods for making diamond coatings