206677 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Coating; Problems associated with coating adhesion, stress, lift-off of deposited films
PLASMA-ASSISTED FILM REMOVAL FOR WAFER FABRICATION
#2SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
#3Common substrate and shadow ring lift apparatus
#4Member for plasma processing device and plasma processing device provided with same
#5BEVEL PEELING AND DEFECTIVITY SOLUTION FOR SUBSTRATE PROCESSING
#6DUAL FREQUENCY SILANE-BASED SILICON DIOXIDE DEPOSITION TO MINIMIZE FILM INSTABILITY
#7Substrate mounting table
#8Thermal spraying method of component for plasma processing apparatus and component for plasma processing apparatus
#9Roll to roll fabrication apparatus for preventing thermal impact
#10METHOD FOR METALLIZING DIELECTRIC SUBSTRATE SURFACE, AND DIELECTRIC SUBSTRATE PROVIDED WITH METAL FILM
#11Processing apparatus having a first shield and a second shield arranged to sandwich a substrate
#12Reactive sputtering apparatus
#13VACUUM FILM DEPOSITION DEVICE AND VACUUM FILM DEPOSITION METHOD
#14Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
#15Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
#16Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
#17Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
#18Reactive sputtering apparatus
#19Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
#20Film forming method and film forming apparatus