206680 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Etching Resist stripping
PLASMA MULTI-WAFER ASHING SYSTEM
#2Plasma Strip Tool With Movable Insert
#3ETCHING METHOD
#4REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS
#5TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
#6ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#7SUBSTRATE PROCESS APPARATUS AND SUBSTRATE PROCESS METHOD USING THE SAME
#8PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#9Gas distribution plate with UV blocker
#10RING CARRIER AND SUBSTRATE TREATING SYSTEM
#11Etching method
#12METAL ETCHING WITH IN SITU PLASMA ASHING
#13Apparatus for processing substrate
#14Gas supply ring and substrate processing apparatus
#15ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#16Plasma strip tool with movable insert
#17Tin oxide thin film spacers in semiconductor device manufacturing
#18Tin oxide thin film spacers in semiconductor device manufacturing
#19Plasma Spreading Apparatus And System
#20Method of processing target object
#21Tin oxide thin film spacers in semiconductor device manufacturing
#22Metal etching with in situ plasma ashing
#23PLASMA ASHING OF COATED SUBSTRATES
#24Substrate processing apparatuses and substrate processing methods
#25Plasma Processing Apparatus and Methods
#26Method of processing target object
#27Plasma spreading apparatus and method of spreading plasma in process ovens
#28Method of processing target object
#29Tin oxide thin film spacers in semiconductor device manufacturing
#30Implanted photoresist stripping process
#31Substrate support with thermal zones for semiconductor processing
#32Method for producing contact areas on a semiconductor substrate
#33High dose implantation strip (HDIS) in Hbase chemistry
#34Heating plate with heating zones for substrate processing and method of use thereof
#35Bare aluminum baffles for resist stripping chambers
#36High dose implantation strip (HDIS) in H2 base chemistry
#37PLASMA MEDIATED ASHING PROCESSES
#38Heating plate with planar heating zones for semiconductor processing
#39Bare aluminum baffles for resist stripping chambers
#40Plasma ashing apparatus and endpoint detection process
#41Plasma Doping Method and Apparatus
#42Asher, Ashing Method and Impurity Doping Apparatus
#43Enhanced stripping of low-K films using downstream gas mixing
#44High dose implantation strip (HDIS) in Hbase chemistry
#45Manufacturing method for wiring
#46Advanced processing technique and system for preserving tungsten in a device structure
#47BATCH PHOTORESIST DRY STRIP AND ASH SYSTEM AND PROCESS
#48Bare aluminum baffles for resist stripping chambers
#49Removal of organic-containing layers from large surface areas
#50Method and apparatus for providing mask in semiconductor processing
#51Photoresist stripping chamber and methods of etching photoresist on substrates
#52Manufacturing method for wiring
#53Plasma processing device and ashing method
#54Batch photoresist dry strip and ash system and process
#55Method of removing a photoresist and method of manufacturing a semiconductor device using the same
#56Methods and apparatus for stripping
#57Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
#58Methods of removing resist from substrates in resist stripping chambers
#59Low-pressure removal of photoresist and etch residue
#60Focus rings, apparatus in chamber, contact hole and method of forming contact hole
#61Dry stripping equipment comprising plasma distribution shower head
#62Apparatus and method for removing photoresist in a semiconductor device
#63Process for removing a residue from a metal structure on a semiconductor substrate
#64Wafer bevel polymer removal
#65Atmospheric pressure plasma processing reactor
#66Apparatus and plasma ashing process for increasing photoresist removal rate
#67Bare aluminum baffles for resist stripping chambers
#68Manufacturing method of semiconductor device
#69Plasma processing method and apparatus
#70Resist removal method and semiconductor device manufactured by using the same
#71Gas distribution plate assembly for plasma reactors
#72Plasma ashing method
#73Method for improving ash rate uniformity in photoresist ashing process equipment
#74Manufacturing method for wiring
#75Tin oxide thin film spacers in semiconductor device manufacturing