206689 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing Changing physical properties of treated surfaces
Sub-classes:METHOD OF MANUFACTURING PACKAGING SUBSTRATE
#2SUBSTRATE PROCESSING APPARATUS
#3Electrical Discharge Machining Processing for Semiconductor Workpiece
#4Atmospheric Plasma Activation for Hybrid Bonding
#5Electrical Discharge Machining Processing for Semiconductor Workpiece
#6DENSIFICATION OF CARBON GAPFILL USING LOW FREQUENCY RADIO FREQUENCY (LFRF) TREATMENT
#7SYSTEMS, METHODS, AND APPARATUSES FOR ATMOSPHERIC PRESSURE PLASMA JET NOZZLES
#8SUBSTRATE-TREATMENT METHOD AND SUBSTRATE-TREATMENT SYSTEM
#9SCRUBBER, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME
#10SELECTIVE SELF-ASSEMBLED MONOLAYER (SAM) REMOVAL
#11COMPRESSIVE FILMS FOR LARGE AREA GAPFILL
#12DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
#13HIGHER PRESSURE PURGE FOR IMPURITY REDUCTION IN RADICAL TREATMENT CHAMBER
#14Substrate holding method and substrate processing apparatus
#15ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABILITY FOR INTEGRATED CIRCUITS
#16VHF Broadband Coaxial Adapter
#17PLASMA ETCHING METHOD AND PLASMA ETCHING DEVICE
#18SURFACE MODIFYING APPARATUS AND BONDING STRENGTH DETERMINATION METHOD
#19SURFACE MODIFYING METHOD AND SURFACE MODIFYING APPARATUS
#20SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#21SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#22NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
#23METHOD, APPARATUS AND SYSTEM FOR PROCESSING SEMICONDUCTOR STRUCTURE
#24SURFACE PREPARATION
#25INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRIDE DEPOSITION
#26INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRIDE DEPOSITION
#27RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHODRESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AN LAMINATE BODY MANUFACTURING METHOD
#28MULTICELL OR MULTIARRAY PLASMA AND METHOD FOR SURFACE TREATMENT USING THE SAME
#29DEEP SMOOTH ETCHING TO REALIZE SCALABLE DEVICES HAVING PIEZOELECTRIC CRYSTALS
#30Method for Etching of Metal
#31Device For Generating A Dielectric Barrier Discharge And Method For Treating An Object To Be Activated
#32RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHOD
#33Method and apparatus for poling polymer thin films
#34OXYGEN RADICAL ASSISTED DIELECTRIC FILM DENSIFICATION
#35Method and apparatus for poling polymer thin films
#36Apparatus for sterilising an instrument channel of a surgical scoping device
#37System and method for precision formation of a lattice on a substrate
#38System and method for precision formation of a lattice on a substrate
#39Apparatus for sterilizing an instrument channel of a surgical scoping device
#40Drop-on-demand identification document printing with surface pre-treatment
#41Display device and method of manufacturing display device
#42Gas delivery system
#43Selective area coating sintering
#44Treatment-target modification device, treatment-target modification system, image forming system, and image forming method
#45Flame-Assisted Flash Sintering
#46ARTICLE INCLUDING POLYMER HAVING SURFACE WITH LOW COEFFICIENT OF FRICTION AND MANUFACTURING METHOD OF SUCH
#47Heated air plasma treatment
#48Plasma processing apparatus and plasma processing method
#49METHOD AND SYSTEM FOR MODIFYING A SUBSTRATE USING A PLASMA
#50Apparatus for the plasma treatment of surfaces and a method for treating surfaces with plasma
#51Workpiece Processing Method And Apparatus
#52Plasma treatment method, plasma treatment apparatus, and plasma-treated long object
#53SYSTEMS AND METHODS FOR TREATING MATERIAL SURFACES
#54Plasma processing device, printing apparatus, printing system, computer program product, and method for manufacturing printed material
#55FUME REMOVAL DEVICE AND SUBSTRATE TREATMENT DEVICE
#56METHOD FOR FORMING CONDUCTIVE FILM
#57Low k porous SiCOH dielectric and integration with post film formation treatment
#58Deposition of Material to Form a Coating
#59LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT
#60Techniques for temperature-controlled ion implantation
#61Techniques for temperature-controlled ion implantation
#62Plasma generation and processing with multiple radiation sources
#63Plasma catalyst
#64Preparation of coatings through plasma polymerization
#65Device for treating surfaces of containers with plasma
#66Plasma-assisted joining
#67Electrical discharge machining processing for semiconductor workpiece