H01J27/14 - CPC Classification Index

ClassID:

204959 ⎘

H01J27/14 - CPC Classification

Classification description:

Ion beam tubes; Ion sources; Ion guns using arc discharge Other arc discharge ion sources using an applied magnetic field

Sub-classes:

H01J27/143 » {Hall-effect ion sources with closed electron drift} 25
H01J27/146 » {End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder} 21

Recent Application in this class:

20260004987

2026-01-01

ION SOURCE WITH MULTIPLE INTEGRATED ARC CHAMBERS

20220406554

2022-12-22

Crucible design for liquid metal in an ion source

20220319796

2022-10-06

Ion source repeller

20220165614

2022-05-26

Systems And Methods For Workpiece Processing Using Neutral Atom Beams

20210375584

2021-12-02

Ion source and method

20200043775

2020-02-06

Systems and methods for workpiece processing using neutral atom beams

20180012722

2018-01-11

End-hall ion source with enhanced radiation cooling

20170110282

2017-04-20

Ribbon beam ion source of arbitrary length

20160148775

2016-05-26

Linear anode layer slit ion source

#10

20160111250

2016-04-21

Beam extraction slit structure and ion source

#11

20140319369

2014-10-30

Ion source and a method for in-situ cleaning thereof

#12

20130214684

2013-08-22

Method and device for transporting vacuum arc plasma

#13

20120229012

2012-09-13

Bucket-type ion source for fanning cusped magnetic fields inside a plasma generation chamber

#14

20110018423

2011-01-27

INDIRECT HEATED CATHODE OF ION IMPLANTER

#15

20100051825

2010-03-04

Ion source

#16

20100024841

2010-02-04

Ion source and a method for in-situ cleaning thereof

#17

20090078890

2009-03-26

Ion source, ion implantation apparatus, and ion implantation method

#18

20090008570

2009-01-08

Arc chamber for an ion implantation system

#19

20090001290

2009-01-01

Ion source and method for operating same

#20

20080277593

2008-11-13

Ion source

#21

20080067411

2008-03-20

Ion source

#22

20070273288

2007-11-29

Thermal control plate for ion source

#23

20060284104

2006-12-21

Ion source

#24

20060113928

2006-06-01

Electromagnetic induced accelerator based on coil-turn modulation

#25

20050057137

2005-03-17

Ion source, ion implanting device, and manufacturing method of semiconductor devices