205195 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details; Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
INTENSITY MODULATED ELECTRON BEAM AND APPLICATION TO ELECTRON BEAM BLANKER
#302Apparatus and method for inspecting sample surface
#303Apparatus for ion beam fabrication
#304Pattern definition device having distinct counter-electrode array plate
#305Ion implantation apparatus
#306Ion implantation apparatus and ion implantation method
#307Scanning electron microscope with length measurement function and dimension length measurement method
#308Multi-beam deflector array device for maskless particle-beam processing
#309OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM
#310OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM
#311Method of reducing particle contamination for ion implanters
#312Partial ion implantation apparatus and method using bundled beam
#313Charged-particle exposure apparatus
#314Lithography system
#315Apparatus for blanking a charged particle beam
#316High brightness—multiple beamlets source for patterned X-ray production
#317Apparatus and method for controlled particle beam manufacturing
#318Apparatus and method for controlled particle beam manufacturing
#319Apparatus and method for controlled particle beam manufacturing
#320Apparatus and method for controlled particle beam manufacturing
#321Apparatus and method for controlled particle beam manufacturing
#322Apparatus and method for controlled particle beam manufacturing
#323Apparatus and method for controlled particle beam manufacturing
#324Optical switching in a lithography system
#325Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method
#326Charged particle beam writing method and apparatus
#327Electrostatic deflection system with impedance matching for high positioning accuracy
#328Combined aperture holder, beam blanker and vacuum feed through for electron beam, ion beam charged particle devices
#329Beam blanker driver system and method
#330Method for reducing particles during ion implantation
#331Apparatus and method for controlled particle beam manufacturing
#332Electron beam apparatus, and inspection instrument and inspection process thereof
#333Charged beam dump and particle attractor
#334Particulate prevention in ion implantation
#335Beam stop and beam tuning methods
#336Electron beam apparatus, and inspection instrument and inspection process thereof
#337Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method
#338Optical switching in lithography system
#339Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
#340Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation
#341Advanced pattern definition for particle-beam exposure
#342Advanced pattern definition for particle-beam processing
#343Charged particle beamlet exposure system
#344Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
#345System, apparatus and method for bunched ribbon ion beam
#346Extraction apparatus and system for high throughput ion beam processing
#347Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device