205195 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details; Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
ULTRA FAST PULSER FOR LOW ENERGY ELECTRON BEAMS
#2MULTI-CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND MULTI-CHARGED PARTICLE BEAM IRRADIATION METHOD
#3DARK CORRECTION FOR LONG TERM ACQUISITION
#4MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS
#5METHODS OF OPERATING A CHARGED PARTICLE MICROSCOPE SYSTEM INCLUDING A BEAM DEFLECTOR AND ASSOCIATED SYSTEMS
#6APERTURE CORRECTION AMOUNT CALCULATION METHOD FOR APERTURE ARRAY SUBSTRATE, APERTURE ARRAY SUBSTRATE, BLANKING APERTURE ARRAY SUBSTRATE, MULTIPLE CHARGED-PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHARGED-PARTICLE BEAM WRITING METHOD
#7MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#8CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION METHOD
#9BEAM ALIGNMENT AND SYNCHRONIZATION IN MICROSCOPY
#10BEAM SYNCHRONIZATION IN MICROSCOPY
#11BEAM ALIGNMENT AND SYNCHRONIZATION IN MICROSCOPY
#12ILLUMINATION LENS ADJUSTMENT METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM
#13MULTIPLE CHARGED-PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED-PARTICLE BEAM WRITING APPARATUS
#14PATTERN SHAPING OF METAL RESIST LAYER USING REACTIVE ANGLED BEAM PROCESSING
#15POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS, AND MARK POSITION MEASUREMENT METHOD
#16IMAGE GENERATION WITH IMPROVED SCANNING LINES FOR SMART CHARGE DISTRIBUTION
#17ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM
#18SHUTTER SYSTEM FOR GAP-FREE SHIELDING OF A COATING SOURCE, AND ASSOCIATED METHOD
#19MINIMIZATION OF ENERGY SPREAD IN FOCUSED ION BEAM (FIB) SYSTEMS
#20MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD
#21BLANKER-ENHANCED MOIRE IMAGING
#22ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS
#23ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS
#24TECHNIQUES FOR IMAGING LOW DUTY CYCLE SIGNALS USING A SCANNING ELECTRON MICROSCOPE
#25TECHNIQUES FOR WAVEFORM DETECTION OF PERIODIC SIGNALS USING VOLTAGE CONTRAST
#26BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM
#27BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS
#28SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
#29IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATION REDEPOSITS
#30Optimizing Image Distortion in a Multi Beam Charged Particle Processing Apparatus
#31CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
#32Ion Milling Apparatus
#33MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#34MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#35MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#36MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#37METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE MICROSCOPE, ASSOCIATED COMPUTER PROGRAM PRODUCT AND MULTI-BEAM PARTICLE MICROSCOPE
#38BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#39CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE IN A CHARGED PARTICLE ASSESSMENT SYSTEM
#40CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#41BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#42MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS
#43MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTICLE BEAM WRITING METHOD, INSPECTION METHOD FOR APERTURE ARRAY SUBSTRATE FOR MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#44COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD, COVERAGE CALCULATING DEVICE, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM
#45Multi-Beam Pattern Definition Device
#46CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SUCH AN ELEMENT, AND METHOD FOR USING SUCH AN EXPOSURE APPARATUS
#47Charged Particle Beam Device
#48Charged Particle Beam Apparatus
#49ION IMPLANTER AND ION IMPLANTATION METHOD
#50PARTICLE BEAM IRRADIATION SYSTEM, CONTROL METHOD FOR PARTICLE BEAM IRRADIATION SYSTEM, AND CONTROL DEVICE FOR PARTICLE BEAM IRRADIATION SYSTEM
#51MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#52Charged particle beam system and control method therefor
#53CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS
#54Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing method
#55Multi-charged-particle-beam writing method, multi-charged-particle-beam writing apparatus, and computer-readable recording medium
#56Charged Particle Beam Device and Image Generation Method
#57MEMORY DEVICE WITH PREDETERMINED START-UP VALUE
#58System and method for reducing the charging effect in a transmission electron microscope system
#59Multi-modal operations for multi-beam inspection system
#60CHARGED PARTICLE BEAM DEVICE
#61Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatus
#62Time-gated detection, dual-layer SPAD-based electron detection
#63APERTURE BODY, FLOOD COLUMN AND CHARGED PARTICLE TOOL
#64Multi charged particle beam writing apparatus
#65Blanking aperture array unit
#66Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen
#67Charged particle beam writing apparatus and charged particle beam writing method
#68PARTICLE BEAM SYSTEM INCLUDING A MULTI-BEAM DEFLECTION DEVICE AND A BEAM STOP, METHOD FOR OPERATING THE PARTICLE BEAM SYSTEM AND ASSOCIATED COMPUTER PROGRAM PRODUCT
#69Semiconductor device, multi-charged-particle beam writing apparatus, and multi-charged-particle beam exposure apparatus
#70MULTIPLE LANDING ENERGY SCANNING ELECTRON MICROSCOPY SYSTEMS AND METHODS
#71Transmission electron microscope and inspection method using transmission electron microscope
#72Electron beam irradiation apparatus and electron beam irradiation method
#73Drawing apparatus and deflector
#74Multiple-charged particle-beam irradiation apparatus and multiple-charged particle-beam irradiation method
#75Method for scanning a sample by a charged particle beam system
#76Charged particle beam device
#77Multiple electron beam writing apparatus and multiple electron beam writing method
#78Time-resolved cathodoluminescence sample probing
#79Tunable extraction assembly for wide angle ion beam
#80Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus
#81Fill pattern to enhance ebeam process margin
#82Multi-beam blanking device and multi-charged-particle-beam writing apparatus
#83Charged particle beam deflection device
#84Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#85ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD
#86Beam blanking device for a multi-beamlet charged particle beam apparatus
#87Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#88Electron beam inspection apparatus and electron beam inspection method
#89Multibeamlet charged particle device and method
#90Pulsed CFE electron source with fast blanker for ultrafast TEM applications
#91Multi charged particle beam evaluation method and multi charged particle beam writing device
#92Multi-beam particle beam system
#93Coating on dielectric insert of a resonant RF cavity
#94Multi charged particle beam writing apparatus
#95Multi charged particle beam writing apparatus and multi charged particle beam writing method
#96Set of aperture substrates for multiple beams and multi charged particle beam apparatus
#97Multi-charged-particle beam writing apparatus and multi-charged-particle beam writing method
#98Method for scanning a sample by a charged particle beam system
#99Memory device with predetermined start-up value
#100OPTICAL SYSTEM ADJUSTMENT METHOD OF IMAGE ACQUISITION APPARATUS
#101Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus
#102Systems and methods for charged particle beam modulation
#103Multi charged particle beam writing apparatus and multi charged particle beam writing method
#104Extraction apparatus and system for high throughput ion beam processing
#105Writing data generation method, computer-readable recording medium on which program is recorded, and multi-charged particle beam writing apparatus
#106Multiple charged particle beam writing apparatus and multiple charged particle beam writing method
#107Electron optical system and multi-beam image acquiring apparatus
#108Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
#109Multi-beam charged particle imaging apparatus
#110Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus
#111Deflector for multiple electron beams and multiple beam image acquiring apparatus
#112Scanning electron microscope and sample observation method using scanning electron microscope
#113Measurement and inspection device
#114Studying dynamic specimens in a transmission charged particle microscope
#115Laser processing system and laser processing method
#116Multi-beam particle beam system
#117Aperture array alignment method and multi charged particle beam writing apparatus
#118Multiple charged particle beam writing method and apparatus using beams for straddling regions
#119Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method
#120Aperture set for multi-beam
#121Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
#122Fill pattern to enhance e-beam process margin
#123Ebeam universal cutter
#124Multi-charged-particle beam writing apparatus
#125Cross scan proximity correction with ebeam universal cutter
#126Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#127DEVICE AND METHOD FOR GENERATING CHARGED PARTICLE BEAM PULSES
#128Charged particle beam writing apparatus and method for diagnosing failure of blanking circuit
#129MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#130Optical system adjustment method of image acquisition apparatus
#131Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#132Multi charged particle beam writing apparatus and multi charged particle beam writing method
#133Sample holding mechanism, manufacturing method for same, and charged particle beam device
#134Aperture size modulation to enhance ebeam patterning resolution
#135Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
#136Multi charged particle beam drawing apparatus and multi charged particle beam drawing method
#137Reduced Coulomb interactions in a multi-beam column
#138Charged particle beam apparatus
#139Charged particle beam writing method and charged particle beam writing apparatus
#140Microstructure manufacturing method and microstructure manufacturing apparatus
#141MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#142Multi charged particle beam writing apparatus and adjusting method for multi charged particle beam writing apparatus
#143Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line
#144Beam blanker and method for blanking a charged particle beam
#145Time-resolved charged particle microscopy
#146Multi charged particle beam writing apparatus and multi charged particle beam writing method
#147Ebeam three beam aperture array
#148Multi charged particle beam writing apparatus and multi charged particle beam writing method
#149Multi charged particle beam writing apparatus and multi charged particle beam writing method
#150Electron microscope and image acquisition method
#151Multi-column electron beam lithography including field emitters on a silicon substrate with boron layer
#152Charged particle beam device with transient signal correction during beam blanking
#153Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#154Multi charged particle beam writing apparatus and method of adjusting the same
#155Fine alignment system for electron beam exposure system
#156APPARATUS AND METHOD FOR PROCESSING OR IMAGING A SAMPLE
#157Blanking aperture array, method for manufacturing blanking aperture array, and multi-charged particle beam writing apparatus
#158Multi charged particle beam writing apparatus and multi charged particle beam writing method
#159Exposure apparatus and exposure method
#160Multi charged-particle beam writing apparatus and adjustment method for the same
#161Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus
#162Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus
#163Stage mechanism
#164Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method
#165Multi charged particle beam exposure method, and multi charged particle beam blanking apparatus
#166Multi charged particle beam blanking apparatus, multi charged particle beam blanking method, and multi charged particle beam writing apparatus
#167Corner rounding correction for electron beam (Ebeam) direct write system
#168Cross scan proximity correction with ebeam universal cutter
#169Studying dynamic specimen behavior in a charged-particle microscope
#170Multi charged particle beam writing apparatus and multi charged particle beam writing method
#171Multi-piece electrode aperture
#172Multi charged particle beam writing method and multi charged particle beam writing apparatus
#173Heat-spreading blanking system for high throughput electron beam apparatus
#174Control system and method for lithography apparatus
#175Multiple charged particle beam apparatus
#176Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image
#177Ultra broad band continuously tunable electron beam pulser
#178Systems including a beam projection device providing variable exposure duration resolution
#179Pattern inspection apparatus and pattern inspection method
#180Multi charged particle beam writing method and multi charged particle beam writing apparatus
#181Exposure apparatus and exposure method
#182Backscattered electrons (BSE) imaging using multi-beam tools
#183Unidirectional metal on layer with ebeam
#184Ebeam staggered beam aperture array
#185Ebeam three beam aperture array
#186DATA COMPRESSION FOR EBEAM THROUGHPUT
#187Method for evaluating charged particle beam drawing apparatus
#188Apparatus for charged particle lithography system
#189Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#190Device, manufacturing method, and exposure apparatus
#191Charged particle inspection method and charged particle system
#192Exposure apparatus and exposure method
#193Multi charged particle beam writing apparatus and multi charged particle beam writing method
#194Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#195Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams
#196Dynamic pattern generator and method of toggling mirror cells of the dynamic pattern generator
#197Blanking system for multi charged particle beams, and multi charged particle beam writing apparatus
#198Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method
#199Blanking device for multi charged particle beams, and multi charged particle beam writing apparatus
#200Chicane blanker assemblies for charged particle beam systems and methods of using the same
#201Ozone supplying apparatus, ozone supplying method, and charged particle beam drawing system
#202Data generating apparatus, energy beam writing apparatus, and energy beam writing method
#203Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#204Blanking device for multi-beam of charged particle writing apparatus using multi-beam of charged particle and defective beam blocking method for multi-beam of charged particle
#205Blanking device for multi charged particle beams, and multi charged particle beam writing apparatus
#206Inspection method for blanking device for blanking multi charged particle beams
#207Apparatus for charged particle lithography system
#208Multi charged particle beam writing method and multi charged particle beam writing apparatus
#209Charged particle beam writing apparatus and charged particle beam writing method
#210Compensation of imaging deviations in a particle-beam writer using a convolution kernel
#211Charged Particle Beam System
#212Customizing a particle-beam writer using a convolution kernel
#213LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#214Apparatus and method for calculating drawing speeds of a charged particle beam
#215Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#216TARGET DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
#217LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE
#218Multi-beam tool for cutting patterns
#219Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#220Ion beam processing method and ion beam processing apparatus
#221Electron beam writing apparatus, and method for adjusting convergence half angle of electron beam
#222LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE
#223Multi charged particle beam writing apparatus
#224Compensation of defective beamlets in a charged-particle multi-beam exposure tool
#225Proximity effect correction in a charged particle lithography system
#226Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#227DRAWING APPARATUS, DRAWING METHOD, AND METHOD FOR MANUFACTURING ARTICLE
#228PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING THE SAME
#229Modulation device and power supply arrangement
#230Blanking device for multi charged particle beam, and multi charged particle beam writing method
#231DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#232CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE
#233Pattern definition device having multiple blanking arrays
#234Charged particle inspection method and charged particle system
#235Drawing apparatus, and method of manufacturing article
#236Blanking apparatus, drawing apparatus, and method of manufacturing article
#237Charged particle beam system and method of operating thereof
#238Electron microscope
#239Drawing apparatus, and method of manufacturing article
#240Charged particle lithography system
#241Method for exposing a wafer
#242Deflection scan speed adjustment during charged particle exposure
#243Particle beam system and method for operating the same
#244Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#245Multi charged particle beam writing method and multi charged particle beam writing apparatus
#246Drawing apparatus, and method of manufacturing article
#247Beam pulsing device for use in charged-particle microscopy
#248Techniques for improving the performance and extending the lifetime of an ion source
#249Measuring/inspecting apparatus and measuring/inspecting method enabling blanking control of electron beam
#250Devices and methods for improved reflective electron beam lithography
#251Charged particle beam applied apparatus, and irradiation method
#252Automated ion beam idle
#253Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers
#254Methods, devices, and systems for manipulating charged particle streams
#255Charged particle beam writing apparatus and charged particle beam writing method
#256Charged particle optical system and scribing apparatus
#257Particle beam system and method for operating the same
#258CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION METHOD, DRAWING DATA GENERATION PROGRAM STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD
#259ELECTROLYTIC PLATING METHOD AND ELECTROSTATIC DEFLECTING DEVICE
#260Charged particle lithography system with aperture array cooling
#261Charged particle beam modulator
#262Dual pass scanning
#263Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
#264Modulation device and charged particle multi-beamlet lithography system using the same
#265Beam blanker for interrupting a beam of charged particles
#266Charged particle beam drawing apparatus and article manufacturing method using same
#267DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE
#268Bladed Ion Slicer
#269Ion slicer with accelleration and decelleration optics
#270Lithography system, modulation device and method of manufacturing a fiber fixation substrate
#271Drawing apparatus, method of manufacturing article, method of manufacturing deflecting apparatus, and method of manufacturing drawing apparatus
#272DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD
#273Apparatus and method for controlled particle beam manufacturing
#274Beamlet blanker arrangement
#275OPTICAL SWITCHING IN A LITHOGRAPHY SYSTEM
#276Particle beam system
#277Drawing apparatus and method of manufacturing article
#278Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof
#279Modulation device and charged particle multi-beamlet lithography system using the same
#280Charged particle multi-beamlet lithography system with modulation device
#281Pattern definition device with multiple multibeam array
#282SHUTTER DEVICE AND VACUUM PROCESSING APPARATUS
#283WEAK-LENS COUPLING OF HIGH CURRENT ELECTRON SOURCES TO ELECTRON MICROSCOPE COLUMNS
#284Multi-beam deflector array means with bonded electrodes
#285Device for deflecting or guiding in a particle beam
#286Charged particle beam writing apparatus
#287Charged particle beam processing
#288Method for producing a multi-beam deflector array device having electrodes
#289Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
#290Apparatus and method for generating femtosecond electron beam
#291APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
#292Pattern forming apparatus and pattern forming method
#293Lithography system
#294INSPECTION APPARATUS AND INSPECTION METHOD
#295Charged Particle Inspection Method and Charged Particle System
#296Charged particle beam exposure system
#297Variable-ratio double-deflection beam blanker
#298Particle-beam exposure apparatus with overall-modulation of a patterned beam
#299Charged particle-optical systems, methods and components
#300Charged-particle beam writing apparatus and charged-particle beam writing method