Patents-Review.com
ClassID:

205202 ⎘

H01J37/07 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details; Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement; Electron sources; Electron guns Eliminating deleterious effects due to thermal effects or electric or magnetic fields

Recent Application in this class:
#1
20260031298
2026-01-29

ELECTRON BEAM ADJUSTMENT METHOD, ELECTRON BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM

 #2
20250316437
2025-10-09

ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY

 #3
20250273423
2025-08-28

ELECTRON GUN AND ELECTRON BEAM WRITING APPARATUS

 #4
20250079112
2025-03-06

Charged particle beam apparatus

 #5
20240242918
2024-07-18

Structure for Particle Acceleration And Charged Particle Beam Apparatus

 #6
20230178325
2023-06-08

Charged Particle Gun and Charged Particle Beam System

 #7
20210257178
2021-08-19

Charged particle beam generator and charged particle beam apparatus

 #8
20210050175
2021-02-18

Electron source and electron gun

 #9
20210020408
2021-01-21

SUBSTRATE SUPPORT ASSEMBLY, SUBSTRATE PROCESSING APPARATUS, AND EDGE RING

 #10
20200273594
2020-08-27

ELECTRON BEAM IRRADIATION DEVICE AND METHOD FOR MANUFACTURING SAME

 #11
20200126751
2020-04-23

Charged particle beam device, field curvature corrector, and methods of operating a charged particle beam device

 #12
20190080879
2019-03-14

Charged-particle beam apparatus, charged-particle beam writing apparatus, and charged-particle beam controlling method

 #13
20170056539
2017-03-02

Sterilization device and an electron beam emitter

 #14
20170049914
2017-02-23

Sterilization machine and method for sterilizing packaging containers

 #15
20170040140
2017-02-09

MAGNET ARRAY FOR PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

 #16
20150325403
2015-11-12

Focused ion beam low kV enhancement

 #17
20140239200
2014-08-28

Cathode operating temperature adjusting method, and writing apparatus

 #18
20140055025
2014-02-27

Electron gun and electron beam device

 #19
20140000104
2014-01-02

Enclosure and method for handling electron gun or ion gun

 #20
20110266418
2011-11-03

Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof

 #21
20110261340
2011-10-27

Modulation device and charged particle multi-beamlet lithography system using the same

 #22
20110260040
2011-10-27

Charged particle multi-beamlet lithography system with modulation device

 #23
20100026161
2010-02-04

Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor

 #24
20090289186
2009-11-26

Small electron gun

 #25
20070236143
2007-10-11

Small electron gun

 #26
20070210691
2007-09-13

Electron beam gun

 #27
20060226753
2006-10-12

Stabilized emitter and method for stabilizing same

 #28
20050052103
2005-03-10

Small electron gun

 #29
20050012049
2005-01-20

Magnetic lens

 #30
13490214
2016-05-17

Methods for characterizing carbon overcoat