205218 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details; Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement; Arrangements for directing or deflecting the discharge along a desired path Deflecting along given lines
Sub-classes:DISTRIBUTIVE IMAGING ALLOWING SAMPLE RELAXATION
#2MEASUREMENT DEVICE
#3ELECTRONIC COMPONENT
#4CHARGED PARTICLE BEAM DEVICE AND CONTROL METHOD THEREOF
#5SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR IN A SINGLE-BEAM OR MULTI-BEAM APPARATUS
#6CREATION OF ELECTRON BEAMS USING A MICRO-DEFLECTOR ARRAY
#7APPARATUS FOR APPLYING ACCELERATED ELECTRONS TO BULK MATERIAL
#8METHOD FOR OPERATING A PARTICLE BEAM APPARATUS, COMPUTER PROGRAM PRODUCT AND PARTICLE BEAM APPARATUS FOR CARRYING OUT THE METHOD
#9CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION METHOD
#10CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
#11ABERRATION CORRECTOR FOR SCANNING ELECTRON MICROSCOPE WITH MULTIPLE ELECTRON BEAMS
#12ELECTRON BEAM METROLOGY HAVING A SOURCE ENERGY SPREAD WITH FILTERED TAILS
#13METHOD FOR DESIGNING A MULTI-BEAM PARTICLE BEAM SYSTEM HAVING MONOLITHIC PATH TRAJECTORY CORRECTION PLATES, COMPUTER PROGRAM PRODUCT AND MULTI-BEAM PARTICLE BEAM SYSTEM
#14ELECTRON MICROSCOPE AND IMAGE CAPTURING METHOD THEREOF
#15MODULAR ASSEMBLY
#16Microscope System
#17Aberration Correction Device and Aberration Correction Method
#18GRID-LESS ION ENERGY DETECTOR
#19MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE
#20TECHNIQUES FOR GUIDE STAR ALIGNMENT OF AN ION IMPLANTER
#21Natural Frequency Adjuster For Extraction Electrodes
#22SIGNAL ELECTRON BEAM DEFLECTOR FOR AN ELECTRON BEAM APPARATUS, ELECTRON BEAM APPARATUS AND METHOD OF DEFLECTING A SIGNAL ELECTRON BEAM
#23HIGH BANDWIDTH VARIABLE DOSE ION IMPLANTATION SYSTEM AND METHOD
#24METHOD OF CHARACTERIZING A DETECTION PATH OF A CHARGED PARTICLE BEAM AND A CHARGED PARTICLE MIRROR
#25APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
#26CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
#27ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS
#28MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU CONSTRUCTION OF THREE-DIMENSIONAL STRUCTURES
#29Charged Particle Beam Device, and Beam Deflection Method in Charged Particle Beam Device
#30ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN THE PRODUCTION OF WAFERS
#31ELECTRON BEAM POSITION DETECTION AND REPOSITIONING
#32MULTIPLE ELECTRON BEAM OPTICS
#33CHARGED PARTICLE IMAGING SYSTEM AND USE THEREOF
#34BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM APPARATUS
#35HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
#36APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
#37SEMICONDUCTOR DEVICE
#38METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELECTRON BEAM, AND MULTIPOLE DEVICE
#39METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRODUCT
#40CHARGED PARTICLE OPTICAL SYSTEM AND CHARGED PARTICLE APPARATUS
#41CHARGED PARTICLE BEAM SYSTEM, CORRECTOR FOR ABERRATION CORRECTION OF A CHARGED PARTICLE BEAM, AND METHOD THEREOF
#42DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY
#43SUBSTRATE INSPECTION APPARATUS AND A METHOD OF INSPECTING A SUBSTRATE USING THE SAME
#44Objective lens system for fast scanning large FOV
#45Beam bending snout for mobile electron accelerators
#46SUBSTRATE ANALYSIS SYSTEM
#47ELECTRON OPTICAL COLUMN AND METHOD FOR DIRECTING A BEAM OF PRIMARY ELECTRONS ONTO A SAMPLE
#48Energy filter element for ion implantation systems for the use in the production of wafers
#49Charged particle optics components and their fabrication
#50Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#51Apparatus using charged particle beams
#52Creating multiple electron beams with a photocathode film
#53ANTI-SCANNING OPERATION MODE OF SECONDARY-ELECTRON PROJECTION IMAGING SYSTEM FOR APPARATUS WITH PLURALITY OF BEAMLETS
#54Multi-Beam Pattern Definition Device
#55CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
#56Charged Particle Beam System
#57CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#58MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION, METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION AND ASSOCIATED COMPUTER PROGRAM PRODUCT
#59ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM
#60Ion implanter and ion implantation method
#61SYSTEM AND METHOD FOR HIGH THROUGHPUT DEFECT INSPECTION IN A CHARGED PARTICLE SYSTEM
#62SYSTEMS AND METHODS FOR SIGNAL ELECTRON DETECTION
#63CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
#64Multi-charged-particle-beam writing method, multi-charged-particle-beam writing apparatus, and computer-readable recording medium
#65PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTICLE MICROSCOPE
#66MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#67Beam pattern device having beam absorber structure
#68Particle beam gun control systems and methods
#69CERTAIN IMPROVEMENTS OF MULTI-BEAM GENERATING AND MULTI-BEAM DEFLECTING UNITS
#70Apparatus and method for generating particle wave carrying electric charge
#71Blanking aperture array unit
#72Charged particle beam writing apparatus, charged particle beam writing method and recording medium
#73Particle beam device having a deflection unit
#74MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#75Charged particle beam device
#76Multi-beam inspection apparatus with improved detection performance of signal electrons
#77Methods and systems for acquiring three-dimensional electron diffraction data
#78SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR IN A SINGLE-BEAM OR MULTI-BEAM APPARATUS
#79Stroboscopic illumination synchronized electron detection and imaging
#80Primary charged particle beam current measurement
#81Apparatus of plural charged-particle beams
#82Charged particle beam device
#83METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACCELERATED NEUTRAL ATOM BEAM AND THEREBY PROTECT A BEAM TARGET
#84Charged particle beam apparatus and control method
#85Charged particle beam system
#86IN-LENS WAFER PE-CHARGING AND INSPECTION WITH MULTIPLE BEAMS
#87ION IMPLANTER AND ION SELECTION METHOD
#88Energy filter element for ion implantation systems for the use in the production of wafers
#89Charged particle beam apparatus
#90Infrastructure-scale additive manufacturing using mobile electron accelerators
#91Particle beam apparatus and composite beam apparatus
#92Method and device for implanting ions in wafers
#93Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#94Multi-beam writing method and multi-beam writing apparatus
#95Charged particle beam writing apparatus, charged particle beam writing method, and a non-transitory computer-readable storage medium
#96Sampling assembly and testing instrument
#97Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#98Charged particle beam apparatus
#99Multi-beam inspection apparatus with improved detection performance of signal electrons
#100Multi-beam inspection apparatus
#101ELECTROSTATIC FILTER WITH SHAPED ELECTRODES
#102MULTI-COLUMN SCANNING ELECTRON MICROSCOPY SYSTEM
#103Methods of optical device fabrication using an electron beam apparatus
#104Charged particle beam device
#105Multi-pole deflector for charged particle beam and charged particle beam imaging apparatus
#106Ion milling device and ion source adjusting method for ion milling device
#107Energy filter element for ion implantation systems for the use in the production of wafers
#108Charged particle beam system
#109Apparatus of plural charged-particle beams
#110Laser-based phase plate image contrast manipulation
#111Particle beam gun control systems and methods
#112Method and system for in situ cross-linking of materials to produce three-dimensional features via electron beams from mobile accelerators
#113Ion implanter
#114Ion implanter and ion implantation method
#115Apparatus using charged particle beams
#116Charged Particle Beam Apparatus
#117Apparatus, system and techniques for mass analyzed ion beam
#118Pattern measurement device and pattern measurement method
#119Apparatus and method for repairing a photolithographic mask
#120Deflector and charged particle beam system
#121Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#122In-lens wafer pre-charging and inspection with multiple beams
#123Methods of optical device fabrication using an electron beam apparatus
#124Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces
#125Methods of optical device fabrication using an ion beam source
#126Electron beam apparatus for optical device fabrication
#127Method of ion implantation and an apparatus for the same
#128Method and system for in situ cross-linking of materials to produce three-dimensional features via electron beams from mobile accelerators
#129Semiconductor device
#130Multi-electron-beam imaging apparatus with improved performance
#131Method and apparatus to eliminate contaminant particles from an accelerated neutral atom beam and thereby protect a beam target
#132Coil-integrated-type yoke and manufacturing method of the same
#133Charged particle beam image acquisition apparatus
#134Electron beam inspection apparatus and electron beam inspection method
#135Charged particle beam device
#136Charged particle beam system
#137Multi-beam inspection apparatus
#138Ion source and ion implantation apparatus
#139Interference optical system unit, charged particle beam interference apparatus, and method for observing charged particle beam interference image
#140Multi-beam inspection apparatus with improved detection performance of signal electrons
#141Two-axis variable width mass resolving aperture with fast acting shutter motion
#142Method and device for implanting ions in wafers
#143Charged particle beam apparatus and sample processing observation method
#144Apparatus of plural charged-particle beams
#145Charged particle beam steering arrangement
#146Charged particle beam writing method and charged particle beam writing apparatus
#147Ion beam apparatus including slit structure for extracting ion beam
#148Aberration correcting device for an electron microscope and an electron microscope comprising such a device
#149Method of eliminating thermally induced beam drift in an electron beam separator
#150Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
#151Charged particle beam writing apparatus and charged particle beam writing method
#152Energy filter element for ion implantation systems for the use in the production of wafers
#153Objective lens system for fast scanning large FOV
#154Charged particle beam system and method of operating the same
#155Apparatus of plural charged-particle beams
#156Systems and methods for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus
#157Particle beam gun control systems and methods
#158Ion implanter and ion implantation method
#159Generation and acceleration of charged particles using compact devices and systems
#160Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
#161Particle source for producing a particle beam and particle-optical apparatus
#162Energy filter and charged particle beam system
#163Aberration measurement in a charged particle microscope
#164Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#165Wide field atmospheric scanning electron microscope
#166Multi-column scanning electron microscopy system
#167Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line
#168Ion beam apparatus including slit structure for extracting ion beam, etching method using the same, and method for manufacturing magnetic memory device using the ion beam apparatus
#169Charged particle beam writing apparatus, and charged particle beam writing method
#170Electron beam apparatus and positional displacement correcting method of electron beam
#171Apparatus of plural charged-particle beams
#172Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method
#173Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#174Multi charged particle beam exposure method, and multi charged particle beam blanking apparatus
#175Charged particle beam device
#176Scanning electron microscope and electron trajectory adjustment method therefor
#177Charged particle beam writing apparatus and charged particle beam writing method
#178Apparatus of plural charged-particle beams
#179Light bath for particle suppression
#180Electron beam splitter
#181Particle beam treatment system with solenoid magnets
#182Charged particle beam drawing apparatus and charged particle beam drawing method
#183Charged particle beam device
#184Charged particle beam writing apparatus and charged particle beam writing method
#185Apparatus for GHz rate high duty cycle pulsing and manipulation of low and medium energy DC electron beams
#186Apparatus of plural charged-particle beams
#187Charged particle beam system and method of operating the same
#188MICRO-ELECTRON COLUMN HAVING NANO STRUCTURE TIP WITH EASILY ALIGNING
#189Signal charged particle deflection device, signal charged particle detection system, charged particle beam device and method of detection of a signal charged particle beam
#190Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#191X-ray generation device having multiple metal target members
#192Objective lens system for fast scanning large FOV
#193Charged particle beam device
#194Electron microscope
#195Combined electrostatic lens system for ion implantation
#196High resolution charged particle beam device and method of operating the same
#197Generation and acceleration of charged particles using compact devices and systems
#198Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#199Method and apparatus for electron beam lithography
#200Electron beam writing apparatus and output control method
#201Mass analyzing electromagnet and ion beam irradiation apparatus
#202DEVICE FOR MEASURING AND CLOSED-LOOP CONTROL OF A MAGNETIC FIELD GENERATED BY AN ELECTROMAGNET
#203Electron detection system
#204Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus
#205Annular cooling fluid passage for magnets
#206Charged particle beam writing apparatus and charged particle beam writing method
#207High-speed multiframe dynamic transmission electron microscope image acquisition system with arbitrary timing
#208Single bend energy filter for controlling deflection of charged particle beam
#209Charged particle beam application device
#210Charged particle beam device and method for analyzing defect therein
#211Charged particle beam apparatus
#212Charged-particle beam device
#213Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#214Low-dose radiographic imaging system
#215Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same
#216Imaging a Sample with Multiple Beams and Multiple Detectors
#217Charged particle beam treatment apparatus and method of adjusting path length of charged particle beam
#218ELECTRON BEAM DRAWING METHOD, ELECTRON BEAM DRAWING APPARATUS AND DATA GENERATING METHOD
#219High-speed multiframe dynamic transmission electron microscope image acquisition system with arbitrary timing
#220High-energy ion implanter, beam collimator, and beam collimation method
#221Method and apparatus for electron beam lithography
#222Circular accelerator and particle beam therapy apparatus
#223PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING THE SAME
#224Asymmetric electrostatic quadrupole deflector for improved field uniformity
#225High energy ion implanter, beam current adjuster, and beam current adjustment method
#226Deceleration apparatus for ribbon and spot beams
#227Method for transmitting a broadband ion beam and ion implanter
#228CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE
#229Particle optical system
#230Charged particle beam writing apparatus, and charged particle beam writing method
#231HYBRID ELECTROSTATIC LENS WITH INCREASED NATURAL FREQUENCY
#232Spherical aberration corrector, method of spherical aberration correction, and charged particle beam instrument
#233METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY
#234Scanning electron microscope
#235Hybrid electrostatic lens with increased natural frequency
#236Particle beam system and method for operating the same
#237Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
#238SYSTEM AND METHOD FOR PRODUCING A MASS ANALYZED ION BEAM FOR HIGH THROUGHPUT OPERATION
#239Deflecting device for electron beams, magnetic deflecting unit for such a deflecting device, and device for vapor coating a planar substrate using such a deflecting device
#240Electrostatic lenses and systems including the same
#241Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#242Ion implantation method and ion implantation apparatus
#243CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE
#244Deceleration apparatus for ribbon and spot beams
#245Generalized Focusing And Deflection Utilizing Deformed Conducting Electrodes
#246Throughput Enhancement for Scanned Beam Ion Implanters
#247Ion implantation method and ion implantation apparatus
#248Method for improving implant uniformity during photoresist outgassing
#249EVAPORATION SYSTEM
#250Achromatic beam deflector, achromatic beam separator, charged particle device, method of operating an achromatic beam deflector, and method of operating an achromatic beam separator
#251Pattern modification schemes for improved FIB patterning
#252Use of beam scanning to improve uniformity and productivity of a 2D mechanical scan implantation system
#253Off-axis ion milling device for manufacture of magnetic recording media and method for using the same
#254Ion deflector for two-dimensional control of ion beam cross sectional spread
#255Implant uniformity control
#256Charged particle beam apparatus
#257PLASMA GENERATING APPARATUS AND FILM FORMING APPARATUS USING PLASMA GENERATING APPARATUS
#258Method of acquiring offset deflection amount for shaped beam and lithography apparatus
#259Apparatus and method for processing a wafer
#260Apparatus and methods for ion beam implantation using ribbon and spot beams
#261Charged particle beam deflection method with separate stage tracking and stage positional error signals
#262Broad energy-range ribbon ion beam collimation using a variable-gradient dipole
#263Pattern definition device having distinct counter-electrode array plate
#264Pattern measuring method and electron microscope
#265Apparatus for blanking a charged particle beam
#266Systems and methods for beam angle adjustment in ion implanters
#267Variable shaped electron beam lithography system and method for manufacturing substrate
#268Electron beam lithography apparatus and method for compensating for electron beam misalignment
#269Method of aberration correction and electron beam system
#270Charged particle beam device and method for inspecting specimen
#271Apparatus and method for ion beam implantation using ribbon and spot beams
#272Electromagnet with active field containment
#273Controlling the characteristics of implanter ion-beams
#274Controlling the characteristics of implanter ion-beams
#275Broad energy-range ribbon ion beam collimation using a variable-gradient dipole
#276Controlling the characteristics of implanter ion-beams
#277Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
#278Controlling the characteristics of implanter ion-beams
#279Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus
#280Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams
#281Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams
#282Positioning samples for microscopy, inspection, or analysis
#283Beam current density distribution adjustment device and ion implanter
#284Scanning UV light source utilizing semiconductor heterostructures
#285Emitter for an electron beam, electron beam device and method for producing and operating an electron emitter
#286Beam separator device, charged particle beam device and methods of operating thereof
#287Dual mode ion implanter