ClassID:

205223

H01J37/15 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details; Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement; Arrangements for directing or deflecting the discharge along a desired path External mechanical adjustment of electron or ion optical components

Recent Application in this class:
#1
20260148925
2026-05-28

ION IMPLANTER

#2
20250349498
2025-11-13

SPLIT-COLUMN ACCELERATION TUBE FOR SCANNING ELECTRON MICROSCOPE

#3
20250259817
2025-08-14

SUBSTRATE PROCESSING APPARATUS

#4
20250029809
2025-01-23

FIB AND SEM RESOLUTION ENHANCEMENT USING ASYMMETRIC PROBE DECONVOLUTION

#5
20240186107
2024-06-06

METHOD AND APPARATUS FOR INSPECTION

#6
20240029992
2024-01-25

Mechanism for adjusting angle of incidence on charged particle beam aperture, and charged particle beam device

#7
20230377829
2023-11-23

Charged particle beam device and axis adjustment method thereof

#8
20230207252
2023-06-29

ACTUATOR ARRANGEMENT AND ELECTRON-OPTICAL COLUMN

#9
20230154724
2023-05-18

POLE PIECE FOR A TRANSMISSION ELECTRON MICROSCOPE

#10
20210391139
2021-12-16

Replaceable module for a charged particle apparatus

#11
20210375581
2021-12-02

Method and apparatus for inspection

#12
20210366684
2021-11-25

Axial alignment assembly, and charged particle microscope comprising such an alignment assembly

#13
20210151279
2021-05-20

Charged particle beam device and axis adjustment method thereof

#14
20200219707
2020-07-09

Plasma processing system

#15
20200203115
2020-06-25

Plasma processing system

#16
20190237292
2019-08-01

Ion beam apparatus including slit structure for extracting ion beam

#17
20190006147
2019-01-03

Method and apparatus for inspection

#18
20180261423
2018-09-13

Control method and control program for focused ion beam device

#19
20180226220
2018-08-09

CONTINUOUSLY VARIABLE APERTURE

#20
20180158643
2018-06-07

Ion beam apparatus including slit structure for extracting ion beam, etching method using the same, and method for manufacturing magnetic memory device using the ion beam apparatus

#21
20170309436
2017-10-26

Electron-beam spot optimization

#22
20160181055
2016-06-23

Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system

#23
20150228454
2015-08-13

High-energy ion implanter, beam collimator, and beam collimation method

#24
20150144800
2015-05-28

Device for producing an electron beam

#25
20140197327
2014-07-17

High-voltage insulation device for charged-particle optical apparatus

#26
20130270450
2013-10-17

Double ended electrode manipulator

#27
20130188249
2013-07-25

Optical module for X-ray microscope

#28
20120319003
2012-12-20

Ion beam device

#29
20120292497
2012-11-22

Method and structure for controlling magnetic field distributions in an ExB Wien filter

#30
20120168637
2012-07-05

Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam

#31
20110266465
2011-11-03

Ion beam device

#32
20110192975
2011-08-11

Selectable coulomb aperture in E-beam system

#33
20110139981
2011-06-16

Method for controlling charging of sample and scanning electron microscope

#34
20110049361
2011-03-03

Particle beam apparatus having an aperture unit and method for setting a beam current in a particle beam apparatus

#35
20100072402
2010-03-25

Extraction electrode manipulator

#36
20090321634
2009-12-31

Multi-beam ion/electron spectra-microscope

#37
20090242757
2009-10-01

Charged particle beam apparatus and method adjusting axis of aperture

#38
20090078569
2009-03-26

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

#39
20080230694
2008-09-25

Beam optical component having a charged particle lens

#40
20080061246
2008-03-13

Apparatus for blanking a charged particle beam

#41
20070125957
2007-06-07

Techniques for reducing effects of photoresist outgassing

#42
20070125955
2007-06-07

Techniques for preventing parasitic beamlets from affecting ion implantation

#43
20070045557
2007-03-01

Technique for implementing a variable aperture lens in an ion implanter

#44
20060113493
2006-06-01

Irradiation system ion beam and method to enhance accuracy of irradiation

#45
20060113466
2006-06-01

Irradiation system with ion beam

#46
20060113465
2006-06-01

Method to increase low-energy beam current in irradiation system with ion beam

#47
20060071175
2006-04-06

Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof

#48
20050087701
2005-04-28

Pattern-definition device for maskless particle-beam exposure apparatus