205269 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
METHOD AND APPARATUS FOR CHARGE COMPENSATION DURING 3D TOMOGRAPHY
#2HEIGHT MEASUREMENTS USING FOCUS LINE
#3METHOD FOR LOCALIZING A REGION OF INTEREST IN A SAMPLE AND MICROMACHINING THE SAMPLE USING A CHARGED PARTICLE BEAM
#4METHOD TO FABRICATE BLAZED GRATING USING SPACER AND ION BEAM ETCHING
#5Ion Milling Device and Processing Method Using Same
#6STANDARD SAMPLE FOR USE IN TRANSMISSION ELECTRON MICROSCOPE, METHOD OF PREPARING THE SAME, METHOD OF ADJUSTING TRANSMISSION ELECTRON MICROSCOPE, AND METHOD OF ANALYZING OBSERVATION IMAGE OBTAINED WITH TRANSMISSION ELECTRON MICROSCOPE
#7METHOD FOR CREATING A SAMPLE FOR USE IN A CHARGED PARTICLE MICROSCOPE
#8LAMELLA PREPARATION FROM THICK HPF SAMPLES
#9DETECTING AND ADJUSTING LAMELLA DEFORMATION
#10BROAD ION BEAM (BIB) SYSTEMS FOR MORE EFFICIENT PROCESSING OF MULTIPLE SAMPLES
#11SAMPLE PREPARATION WITH NON-UNIFORM DOSE
#12Air Bearing Shaft With Wide Operating Temperature Range
#13EDITING OF DEEP, MULTI-LAYERED STRUCTURES
#14ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME
#153D METROLOGY FROM 3D DATACUBE CREATED FROM STACK OF REGISTERED IMAGES OBTAINED DURING DELAYERING OF THE SAMPLE
#16MICROSCOPY IMAGING METHOD AND SYSTEM
#17ION MILLING DEVICE
#18BEAM ANGLE ROTATION AND SAMPLE ROTATION
#19DELAYERING APPARATUS AND METHODS
#20ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#21ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#223D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGHPUT AND ACCURACY
#23METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INVESTIGATION DEVICE TO PERFORM SUCH METHOD
#24Method for Reducing Line-End Space in Integrated Circuit Patterning
#25FOCUSED ION BEAM DEVICE
#26Integrated Circuit with FIB-Ready Structures
#27Systems and methods for performing sample lift-out for highly reactive materials
#28FILLING EMPTY STRUCTURES BY DEPOSITION UNDER SEM - BALANCING PARAMETERS BY GAS FLOW CONTROL
#29IN-LINE DEPTH MEASUREMENTS BY AFM
#30METHOD FOR MICROMACHINING A BIOLOGICAL SAMPLE FOR CREATING A LAMELLA FOR ANALYSIS IN A CRYO-CHARGED PARTICLE MICROSCOPE
#31Fiducial guided cross-sectioning and lamella preparation with tomographic data collection
#32TEXTURED SURFACES FOR BREAST IMPLANTS
#33METHOD FOR PREPARING A MICROSCOPIC SAMPLE FOR FIB/SEM TOMOGRAPHY
#34Ion Milling Device
#35ALTERING OPERATIONAL CHARACTERISTICS OF A SEMICONDUCTOR DEVICE USING ACCELERATED IONS
#36DEVICE FOR IMAGING AND PROCESSING A SAMPLE USING A FOCUSED PARTICLE BEAM
#37Charged Particle Beam Device
#38METHOD OF PROCESSING A SAMPLE, PARTICLE BEAM SYSTEM, AND COMPUTER PROGRAM PRODUCT
#39COMBINED LASER AND BROAD ION BEAM (BIB) SYSTEMS FOR MORE EFFICIENT PROCESSING OF MULTIPLE SAMPLES
#40Method of making cell regions of integrated circuits
#41Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a Broad Ion Beam (BIB) system
#42Broad ion beam (BIB) systems for more efficient processing of multiple samples
#43Ion Milling Device and Ion Milling Method
#44DUAL-WALL MULTI-STRUCTURE QUARTZ CYLINDER DEVICE
#45Reduced charging by low negative voltage in FIB systems
#46Temperature-tuned ultrafast X-ray shutter using optics-on-a-chip
#47END POINT DETERMINATION BY MEANS OF CONTRAST GAS
#483D metrology from 3D datacube created from stack of registered images obtained during delayering of the sample
#49PROCESSING APPARATUS AND METHOD OF MANUFACTURE
#50Method and system for analyzing three-dimensional features
#51ENDPOINTING WITH DETERMINATION OF REMAINING DISTANCE
#52METHOD AND APPARATUS FOR MICROMACHINING A SAMPLE USING A FOCUSED ION BEAM
#53Modulation of rolling k vectors of angled gratings
#54Method for reducing line-end space in integrated circuit patterning
#55Systems and methods for performing sample lift-out for highly reactive materials
#56EMITTER FOR EMITTING CHARGED PARTICLES
#57FIB delayering endpoint detection by monitoring sputtered materials using RGA
#58Processing an object using a material processing device
#59Analysis device, analysis method, and storage medium
#60Microscopy imaging method for 3D tomography with predictive drift tracking for multiple charged particle beams
#613D metrology from 3D datacube created from stack of registered images obtained during delayering of the sample
#62Method for manufacturing semiconductor structure
#63Ion milling device
#64Gratings with variable depths formed using planarization for waveguide displays
#65Ion beam irradiation apparatus and program therefor
#66Ion milling device and milling processing method using same
#67CONTROLLING ETCH ANGLES BY SUBSTRATE ROTATION IN ANGLED ETCH TOOLS
#68SHADOW MASK APPARATUS AND METHODS FOR VARIABLE ETCH DEPTHS
#69Perimeter trench formation and delineation etch delayering
#70Method for preparing a TEM sample
#71Method of preparing and analyzing thin films
#72Method for reducing line-end space in integrated circuit patterning
#73Imaging method and imaging system
#74Textured surfaces for breast implants
#75Controlling etch angles by substrate rotation in angled etch tools
#76Method for changing the spatial orientation of a micro-sample in a microscope system, and computer program product
#77Substrate processing system, switching timing creation support device,switching timing creation support method, and substrate processing apparatus
#78Shadow mask apparatus and methods for variable etch depths
#79Etch improvement
#80Method and device for a carrier proximity mask
#81Method and system for iteratively cross-sectioning a sample to correlatively targeted sites
#82Method of material deposition
#83System and method of preparing integrated circuits for backside probing using charged particle beams
#84Method and device for a carrier proximity mask
#85Modulation of rolling k vectors of angled gratings
#86Perimeter trench formation and delineation etch delayering
#87Method for manufacturing semiconductor structure
#88Milling a multi-layered object
#89Gratings with variable depths formed using planarization for waveguide displays
#90Diagonal compound mill
#91System and method to increase surface friction across a hydrophobic, anti-fouling, and oleophobic coated substrate
#92Modulation of ion beam angle
#93Modulation of rolling K vectors of angled gratings
#94Textured surfaces for breast implants
#95Method and system for cross-sectioning a sample with a preset thickness or to a target site
#96Textured surfaces for breast implants
#97Ion beam etching system
#98Dose-based end-pointing for low-kV FIB milling in TEM sample preparation
#99Automatic processing device
#100Bragg-like gratings on high refractive index material
#101Method for operating a plurality of FIB-SEM systems
#102Tomography-assisted TEM prep with requested intervention automation workflow
#103Method and apparatus for the planarization of surfaces
#104Fabricating non-uniform diffraction gratings
#105Methods for acquiring planar view STEM images of device structures
#106Gratings with variable depths formed using planarization for waveguide displays
#107Method for producing a TEM sample
#108Sensor characteristic evaluation method and charged particle beam device
#109Apparatus, method, and program for processing and observing cross section, and method of measuring shape
#110Multi-beam particle beam system
#111METHOD OF PROCESSING A SURFACE BY MEANS OF A PARTICLE BEAM
#112Ion milling device, ion source, and ion milling method
#113Charged-particle source and method for cleaning a charged-particle source using back-sputtering
#114Scanning electron microscope and measurement method for obtaining images of a specimen using an ion beam and an electron beam
#115Etching methods
#116Phase-transforming optical element formed by partial etching or by partial etching with reflow
#117CHARGED PARTICLE BEAM SYSTEM AND METHODS
#118Composite beam apparatus
#119Lathe Head for Nano/Micro Machining of Materials
#120Endpointing for focused ion beam processing
#121Charged particle beam apparatus
#122Electronic beam machining system
#123Specimen preparation and inspection in a dual-beam charged particle microscope
#124Depth-controllable ion milling
#125Method for removal of matter
#126Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus
#127Method of analyzing surface modification of a specimen in a charged-particle microscope
#128Optical sensor, manufacturing method thereof, and fluid analysis method using the same
#129Method for the in situ preparation of microscopic specimens
#130Device processing method and device processing apparatus
#131Ion milling apparatus and sample holder
#132METHOD FOR THE STRUCTURING OF A SUBSTRATE SURFACE
#133Fiducial design for tilted or glancing mill operations with a charged particle beam
#134Method of material deposition
#135SENSING SYSTEM, SENSING WAFER, AND PLASMA PROCESSING APPARATUS
#136Control method and control program for focused ion beam device
#137Scanning electron microscope
#138Microstructure manufacturing method and ION beam apparatus
#139Ion beam processing device
#140SYSTEMS AND METHODS OF PHASE GRATING NANOMANUFACTURING
#141Charged particle beam apparatus
#142Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
#143Semiconductor manufacturing apparatus and method thereof
#144Enhanced charged particle beam processes for carbon removal
#145Tomography sample preparation systems and methods with improved speed, automation, and reliability
#146Phase-transforming optical reflector formed by partial etching or by partial etching with reflow
#147Fabricating non-uniform diffraction gratings
#148Gas flow process control system and method using crystal microbalance(s)
#149Composite beam apparatus
#150Microscopy imaging method and system
#151Blanking aperture array, method for manufacturing blanking aperture array, and multi-charged particle beam writing apparatus
#152Electronic beam machining system
#153Black phosphorus gas sensor
#154Method of stem-based drilling of ultrathin silicon nitride nanopores and nanopore arrays
#155Focused ion beam apparatus
#156High throughput TEM preparation processes and hardware for backside thinning of cross-sectional view lamella
#157Charged particle beam-induced etching
#158Slide part and surface processing method of the same
#159Microscopy imaging method and system
#160Method of material deposition
#161METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SAME
#162CHUCK ASSEMBLY WITH TILTABLE CHUCK AND SEMICONDUCTOR FABRICATION SYSTEM INCLUDING THE SAME
#163Gas injection system for ion beam device
#164Use of ion beam etching to generate gate-all-around structure
#165Textured surfaces for breast implants
#166Method for preparing cross-sections by ion beam milling
#167SURFACE PROCESSING IN ADDITIVE MANUFACTURING WITH LASER AND GAS FLOW
#168Method of analyzing surface modification of a specimen in a charged-particle microscope
#169Method of performing electron diffraction pattern analysis upon a sample
#170Cross-section processing-and-observation method and cross-section processing-and-observation apparatus
#171Two-dimensional materials and uses thereof
#172Methods of generation of pores in sheets of hexagonal boron nitride and applications thereof
#173Gold ion beam drilled nanopores modified with thiolated DNA origamis
#174System for manufacturing semiconductor device
#175Charged particle beam processing using process gas and cooled surface
#176Lathe head for nano/micro machining of materials
#177Reconstruction Of Scanning Probe Microscopy Cantilever Tip
#178Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#179Differential imaging with pattern recognition for process automation of cross sectioning applications
#180Charged particle beam system and methods
#181RAPID TEM SAMPLE PREPARATION METHOD WITH BACKSIDE FIB MILLING
#182Method for processing and/or for observing an object, and particle beam device for carrying out the method
#183Sample holder and focused-ion-beam machining device provided therewith
#184Source for selectively providing positively or negatively charged particles for a focusing column
#185Method for S/TEM sample analysis
#186Endpointing for focused ion beam processing
#187Method for coincident alignment of a laser beam and a charged particle beam
#188Use of ion beam etching to generate gate-all-around structure
#189Methods and apparatus for determining, using, and indicating ion beam working properties
#190Focused ion beam systems and methods of operation
#191Method for structuring an object with the aid of a particle beam apparatus
#192Sample stack structure and method for preparing the same
#193Process gas enhancement for beam treatment of a substrate
#194Charged particle radiation device and specimen preparation method using said device
#195Apparatus for preparing a sample for microscopy
#196TEM sample preparation
#197Process for producing magnetoresistive effect element and device producing method
#198Surface processing apparatus
#199Method and System of Creating a Symmetrical FIB Deposition
#200Apparatus and method for mass analyzed ion beam
#201Fiducial design for tilted or glancing mill operations with a charged particle beam
#202Ion implantation to alter etch rate
#203Method and apparatus for slice and view sample imaging
#204Directional treatment for multi-dimensional device processing
#205Focused ion beam low kV enhancement
#206Method for creating S/TEM sample and sample structure
#207Multi-source plasma focused ion beam system
#208Ion beam processing method and ion beam processing apparatus
#209Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam
#210Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
#211GRAPHENE MACHINING METHOD
#212High aspect ratio structure analysis
#213Bulk deposition for tilted mill protection
#214Scanning electron microscope
#215Endpoint detection for photolithography mask repair
#216Ion sources, systems and methods
#217Method for S/TEM sample analysis
#218Charged particle beam apparatus and sample observation method
#219Method for manufacturing semiconductor device and semiconductor device
#220Focused ion beam apparatus with precious metal emitter surface
#221Differential imaging with pattern recognition for process automation of cross sectioning applications
#222Method for fabrication of high aspect ratio trenches and formation of nanoscale features therefrom
#223Cross section processing method and cross section processing apparatus
#224Semiconductor manufacturing apparatus and method thereof
#225Method for preparing thin samples for TEM imaging
#226Ion beam processing method and ion beam processing apparatus
#227Detaching probe from TEM sample during sample preparation
#228Cross-section processing-and-observation method and cross-section processing-and-observation apparatus
#229Method for coincident alignment of a laser beam and a charged particle beam
#230TEM sample preparation
#231Method for processing and/or for observing an object, and particle beam device for carrying out the method
#232Automated slice milling for viewing a feature
#233Charged particle beam device
#234Ion milling device
#235Precursor for planar deprocessing of semiconductor devices using a focused ion beam
#236Method of reconstructing electrical probes
#237Ion beam sample preparation apparatus and methods
#238Gas field ionization ion source and ion beam device
#239Source for selectively providing positively or negatively charged particles for a focusing column
#240Nanopore fabrication and applications thereof
#241Multi-source plasma focused ion beam system
#242Ion sources, systems and methods
#243Focused ion beam apparatus and method of working sample using the same
#244System for protecting light optical components during laser ablation
#245Focused ion beam system, sample processing method using the same, and sample processing program using focused ion beam
#246Endpoint detection for photolithography mask repair
#247Ion beam etching method of magnetic film and ion beam etching apparatus
#248Method for fabricating emitter
#249Microscopy imaging method and system
#250Method of depositing protective structures
#251Method for preparing samples for imaging
#252Method of processing a material-specimen
#253Dual laser beam system used with an electron microscope and FIB
#254SAMPLE PREPARATION APPARATUS, SAMPLE PREPARATION METHOD, AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME
#255Method for creating S/TEM sample and sample structure
#256Slide part and surface processing method of the same
#257Particle beam system and method of processing a TEM-sample
#258System and method for ex situ analysis of a substrate
#259Charged particle beam device and sample production method
#260Specimen holder for holding a semiconductor device during a sample preparation procedure carried out using first and second sample preparation apparatuses
#261Dose-based end-pointing for low-kV FIB milling TEM sample preparation
#262Method and system for ion-assisted processing
#263Ion beam sample preparation apparatus and methods
#264Method for S/TEM sample analysis
#265Laser processing system having a laser shield and a transmission window
#266Lamella creation method and device using fixed-angle beam and rotating sample stage
#267Method and apparatus for scanning a surface of an object using a particle beam
#268Lathe head for nano/micro machining of materials
#269Ion sources, systems and methods
#270Sample preparation method
#271Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical Spectrometer
#272Ion beam apparatus
#273High throughput TEM preparation processes and hardware for backside thinning of cross-sectional view lamella
#274Particle beam system including a supply of process gas to a processing location
#275DIRECTED MULTI-DEFLECTED ION BEAM MILLING OF A WORK PIECE AND DETERMINING AND CONTROLLING EXTENT THEREOF
#276Methods for preparing thin samples for TEM imaging
#277Inductively coupled plasma source as an electron beam source for spectroscopic analysis
#278Charged particle energy filter
#279Charged particle beam device and sample production method
#280Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa
#281Processing system
#282Composite charged particle beam apparatus
#283Apparatus and method for probe shape processing by ion beam
#284Composite charged-particle-beam apparatus
#285Method of stack patterning using a ion etching
#286REDEPOSITION TECHNIQUE FOR MEMBRANE ATTACHMENT
#287Charged particle beam apparatus, and sample processing and observation method
#288Particle beam device and method for use in a particle beam device
#289Ion Milling Device, Sample Processing Method, Processing Device, and Sample Drive Mechanism
#290Method and apparatus for processing a micro sample
#291Method and apparatus for processing a substrate with a focused particle beam
#292Processing system
#293Focused ion beam device and focused ion beam processing method
#294Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#295Charged particle beam device, position specification method used for charged particle beam device, and program
#296Particle beam device and method for processing and/or analyzing a sample
#297Gas field ionization ion source and ion beam device
#298SEM repair for sub-optimal features
#299TEM-lamella, process for its manufacture, and apparatus for executing the process
#300SEM repair for sub-optimal features