Patents-Review.com
ClassID:

205282 ⎘

H01J37/32027 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources; Glow discharge DC powered

Recent Application in this class:
#1
20260120995
2026-04-30

DC BIAS IN PLASMA PROCESS

 #2
20250357090
2025-11-20

PLASMA PROCESSING APPARATUS AND METHOD

 #3
20250349516
2025-11-13

PLASMA CONTROL APPARATUS

 #4
20250191877
2025-06-12

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #5
20250115991
2025-04-10

PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD

 #6
20240395508
2024-11-28

PLASMA PROCESSING APPARATUS AND METHOD

 #7
20240347323
2024-10-17

COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING

 #8
20240321561
2024-09-26

Electron bias control signals for electron enhanced material processing

 #9
20240282552
2024-08-22

PULSING POWER SUPPLY WITH POWERED CROWBAR

 #10
20240249919
2024-07-25

DC PULSE PLASMA SUBSTRATE TREATMENT APPARATUS

 #11
20240249913
2024-07-25

Atomic layer etching by electron wavefront

 #12
20240162007
2024-05-16

Reducing aspect ratio dependent etch with direct current bias pulsing

 #13
20240154594
2024-05-09

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

 #14
20240128060
2024-04-18

Electron bias control signals for electron enhanced material processing

 #15
20240071722
2024-02-29

DC bias in plasma process

 #16
20240006152
2024-01-04

ETCHING METHOD AND ETCHING APPARATUS

 #17
20230260765
2023-08-17

Electron bias control signals for electron enhanced material processing

 #18
20230162946
2023-05-25

Plasma processing apparatus and control method

 #19
20230144264
2023-05-11

DC plasma control for electron enhanced material processing

 #20
20230143453
2023-05-11

DC plasma control for electron enhanced material processing

 #21
20230140979
2023-05-11

DC plasma control for electron enhanced material processing

 #22
20230122956
2023-04-20

Methods and apparatus for processing a substrate

 #23
20230051432
2023-02-16

Film forming apparatus

 #24
20230005719
2023-01-05

Variable inductor for plasma generator

 #25
20220384147
2022-12-01

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM

 #26
20220359158
2022-11-10

DC bias in plasma process

 #27
20220341025
2022-10-27

Apparatus for reducing tungsten resistivity

 #28
20220193719
2022-06-23

Organic polymer film and manufacturing method thereof

 #29
20220157561
2022-05-19

Apparatus and methods for controlling ion energy distribution

 #30
20220122813
2022-04-21

SUBSTRATE PROCESSING SYSTEM, CONTROL METHOD, AND CONTROL PROGRAM

 #31
20220081756
2022-03-17

Methods and apparatus for reducing tungsten resistivity

 #32
20210343448
2021-11-04

Power cable with an overmolded probe for power transfer to a non-thermal plasma generator and a method for constructing the overmolded probe

 #33
20210267042
2021-08-26

Plasma processing apparatus and plasma processing method

 #34
20210172060
2021-06-10

Process and device for diamond synthesis by CVD

 #35
20210134561
2021-05-06

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

 #36
20210050181
2021-02-18

Method of low-temperature plasma generation, method of an electrically conductive or ferromagnetic tube coating using pulsed plasma and corresponding devices

 #37
20200357658
2020-11-12

Etching apparatus and etching method

 #38
20200335306
2020-10-22

Matching method and plasma processing apparatus

 #39
20200328063
2020-10-15

Electrostatic chucking process

 #40
20200294767
2020-09-17

Substrate processing method and apparatus

 #41
20200273670
2020-08-27

Plasma processing apparatus and control method

 #42
20200251314
2020-08-06

Wafer chuck and processing arrangement

 #43
20200243303
2020-07-30

High voltage filter assembly

 #44
20200144920
2020-05-07

Power supply device and method for controlling power supply device

 #45
20200144028
2020-05-07

Plasma processing apparatus and plasma processing method

 #46
20200140988
2020-05-07

Plasma nitriding with PECVD coatings using hollow cathode ion immersion technology

 #47
20200123645
2020-04-23

Plasma Process and Reactor for the Thermochemical Treatment of the Surface of Metallic Pieces

 #48
20200118794
2020-04-16

Plasma processing apparatus and control method

 #49
20200118793
2020-04-16

Systems and methods for coating surfaces

 #50
20200107429
2020-04-02

Plasma processing apparatus and plasma processing method

 #51
20200090910
2020-03-19

Power cable with an overmolded probe for power transfer to a non-thermal plasma generator and a method for constructing the overmolded probe

 #52
20200090833
2020-03-19

Power cable with an overmolded probe for power transfer to a non-thermal plasma generator and a method for constructing the overmolded probe

 #53
20200066498
2020-02-27

Controlling multiple plasma processes

 #54
20190385815
2019-12-19

FILM FORMING APPARATUS

 #55
20190348258
2019-11-14

System for tunable workpiece biasing in a plasma reactor

 #56
20190333739
2019-10-31

Etching apparatus and etching method

 #57
20190273004
2019-09-05

VACUUM PROCESSING APPARATUS AND EXHAUST CONTROL METHOD

 #58
20190267211
2019-08-29

DC bias in plasma process

 #59
20190237305
2019-08-01

METHOD FOR APPLYING DC VOLTAGE AND PLASMA PROCESSING APPARATUS

 #60
20190233936
2019-08-01

Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations

 #61
20190115192
2019-04-18

Plasma etching apparatus and method

 #62
20190096633
2019-03-28

System and method for plasma ignition

 #63
20190059148
2019-02-21

Ion generator apparatus

 #64
20190011400
2019-01-10

Polarization dielectric discharge source for IMS instrument

 #65
20180374679
2018-12-27

Power feed member and substrate processing apparatus

 #66
20180350568
2018-12-06

Method of operating electrostatic chuck of plasma processing apparatus

 #67
20180333968
2018-11-22

Hydrophilic and hydrophobic modification of a printing surface

 #68
20180294147
2018-10-11

Plasma processing apparatus

 #69
20180261428
2018-09-13

ION SOURCE SPUTTERING

 #70
20180226226
2018-08-09

Power supply system

 #71
20180226225
2018-08-09

System for tunable workpiece biasing in a plasma reactor

 #72
20180211821
2018-07-26

Wafer chuck and processing arrangement

 #73
20180151335
2018-05-31

Method for controlling exposure region in bevel etching process for semiconductor fabrication

 #74
20180061681
2018-03-01

Plasma processing apparatus

 #75
20180025895
2018-01-25

Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control

 #76
20180023185
2018-01-25

Plasma Process and Reactor for the Thermochemical Treatment of the Surface of Metallic Pieces

 #77
20170287678
2017-10-05

High temperature electrolysis glow discharge device

 #78
20170271133
2017-09-21

Method for balancing consumption of targets in pulsed dual magnetron sputtering (DMS) processes

 #79
20170268122
2017-09-21

Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms

 #80
20170178879
2017-06-22

Sputtering system and method including an arc detection

 #81
20170133048
2017-05-11

Plasma CVD device and method of manufacturing magnetic recording medium

 #82
20170073836
2017-03-16

DIAMOND PRODUCING METHOD AND DC PLASMA ENHANCED CVD APPARATUS

 #83
20170062188
2017-03-02

Mono-energetic neutral beam activated chemical processing system and method of using

 #84
20170018410
2017-01-19

Apparatus and methods for generating reactive gas with glow discharges

 #85
20160307733
2016-10-20

High temperature electrolysis glow discharge method

 #86
20160276199
2016-09-22

DECOMPRESSION PROCESSING APPARATUS

 #87
20160230267
2016-08-11

Apparatus and a method for plating an Nd—Fe—B magnet

 #88
20160172212
2016-06-16

Plasma processing method

 #89
20160115048
2016-04-28

Water/wastewater recycle and reuse with plasma, activated carbon and energy system

 #90
20160071697
2016-03-10

Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages

 #91
20150294842
2015-10-15

Electrical transformer

 #92
20150255305
2015-09-10

Plasma etching method and plasma etching apparatus

 #93
20150243524
2015-08-27

Method of processing target object and plasma processing apparatus

 #94
20150179411
2015-06-25

Apparatus for generating reactive gas with glow discharges and methods of use

 #95
20150162223
2015-06-11

Substrate processing apparatus and substrate processing method

 #96
20150144266
2015-05-28

SUBSTRATE PROCESSING APPARATUS

 #97
20150085545
2015-03-26

Current generator and method for generating current pulses

 #98
20150027635
2015-01-29

Plasma processing apparatus

 #99
20150021167
2015-01-22

System and method for balancing consumption of targets in pulsed dual magnetron sputtering (DMS) processes

 #100
20150000843
2015-01-01

Plasma etching apparatus and method

 #101
20150000842
2015-01-01

Power supply system, plasma etching apparatus, and plasma etching method

 #102
20140329030
2014-11-06

Plasma generation for thin film deposition on flexible substrates

 #103
20140251956
2014-09-11

Etching apparatus and etching method

 #104
20140232266
2014-08-21

Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages

 #105
20140212116
2014-07-31

High temperature electrolysis glow discharge device

 #106
20140117861
2014-05-01

Differing boost voltages applied to two or more anodeless electrodes for plasma processing

 #107
20140007813
2014-01-09

Ion control for a plasma source

 #108
20130061872
2013-03-14

Ion bombardment treatment apparatus and method for cleaning of surface of base material using the same

 #109
20120313596
2012-12-13

High-frequency supply of a load without impedance matching

 #110
20120025726
2012-02-02

Reversed-polarity pulse generating circuit for direct current plasma and direct current plasma power supply unit

 #111
20110303643
2011-12-15

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

 #112
20110198315
2011-08-18

PLASMA PROCESSING METHOD

 #113
20110147206
2011-06-23

Sputter device

 #114
20110070665
2011-03-24

DC and RF hybrid processing system

 #115
20110005454
2011-01-13

Plasma Reactor, and Method for the Production of Monocrystalline Diamond Layers

 #116
20100224587
2010-09-09

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READABLE STORAGE MEDIUM

 #117
20100220081
2010-09-02

PLASMA PROCESSING APPARATUS

 #118
20100213162
2010-08-26

Plasma etching method, plasma etching apparatus and storage medium

 #119
20100210114
2010-08-19

Plasma processing method

 #120
20100072172
2010-03-25

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #121
20100033194
2010-02-11

Plasma system and measurement method

 #122
20100032289
2010-02-11

Method for ultra-uniform sputter deposition using simultaneous RF and DC power on target

 #123
20100012482
2010-01-21

Sputtering system and method including an arc detection

 #124
20090275207
2009-11-05

Plasma processing method and computer readable storage medium

 #125
20090246943
2009-10-01

Apparatus for mass-producing silicon-based thin film and method for mass-producing silicon-based thin film

 #126
20090246942
2009-10-01

Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film

 #127
20090246407
2009-10-01

Method for forming amorphous carbon film

 #128
20090242516
2009-10-01

Plasma etching method and computer readable storage medium

 #129
20090242515
2009-10-01

Plasma processing apparatus and plasma etching method

 #130
20090236314
2009-09-24

Mono-energetic neutral beam activated chemical processing system and method of using

 #131
20090206058
2009-08-20

Plasma processing apparatus and method, and storage medium

 #132
20090194508
2009-08-06

Substrate plasma processing apparatus and plasma processing method

 #133
20090111216
2009-04-30

Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging

 #134
20090101283
2009-04-23

Plasma processing apparatus

 #135
20090065056
2009-03-12

HYBRID PHOTOVOLTAICALLY ACTIVE LAYER AND METHOD FOR FORMING SUCH A LAYER

 #136
20080317965
2008-12-25

Plasma processing apparatus and method

 #137
20080226838
2008-09-18

Plasma CVD apparatus and film deposition method

 #138
20080202924
2008-08-28

Power Source Arrangement For Multiple-Target Sputtering System

 #139
20080197015
2008-08-21

MULTIPLE-MAGNETRON SPUTTERING SOURCE WITH PLASMA CONFINEMENT

 #140
20080122368
2008-05-29

Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding

 #141
20080110859
2008-05-15

Plasma etching apparatus and method

 #142
20080053817
2008-03-06

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #143
20080045031
2008-02-21

Plasma etching method and computer readable storage medium

 #144
20080038926
2008-02-14

Method of treating a mask layer prior to performing an etching process

 #145
20080032507
2008-02-07

Method of treating a mask layer prior to performing an etching process

 #146
20070218681
2007-09-20

PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM

 #147
20070023398
2007-02-01

Plasma processing apparatus

 #148
20060278524
2006-12-14

System and method for modulating power signals to control sputtering

 #149
20060118043
2006-06-08

Method for producing coated workpieces, uses and installation for the method

 #150
20060054601
2006-03-16

DC-DC converter with over-voltage protection circuit

 #151
20060037700
2006-02-23

Method and apparatus for removing material from a substrate surface

 #152
20060012308
2006-01-19

DC power supply utilizing real time estimation of dynamic impedance

 #153
20060008594
2006-01-12

Plasma enhanced chemical vapor deposition system for forming carbon nanotubes

 #154
20050269292
2005-12-08

Plasma processing apparatus and method, and electrode plate for plasma processing apparatus

 #155
20050126486
2005-06-16

Apparatus and method for applying diamond-like carbon coatings

 #156
20050098430
2005-05-12

Vacuum plasma generator

 #157
18474114
2024-03-26

Atomic layer etching by electron wavefront

 #158
18149893
2024-01-09

Atomic layer etching by electron wavefront

 #159
17668301
2023-06-27

Electron bias control signals for electron enhanced material processing