Patents-Review.com
ClassID:

205280 ⎘

H01J37/32009 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Sub-classes:
Recent Application in this class:
#1
20260081107
2026-03-19

APPARATUS TO PRODUCE A WAVEFORM

 #2
20250316449
2025-10-09

PLASMA SOURCE AND METHOD FOR REMOVING MATERIALS FROM SUBSTRATES UTILIZING PRESSURE WAVES

 #3
20250253127
2025-08-07

PLASMA PROCESSING SYSTEM WITH DIRECT CURRENT SUPERPOSITION

 #4
20250166975
2025-05-22

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #5
20250154662
2025-05-15

THERMAL ATOMIC LAYER ETCHING PROCESSES

 #6
20250095949
2025-03-20

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

 #7
20250037970
2025-01-30

ATOMIC LAYER ETCHING PROCESSES

 #8
20250007296
2025-01-02

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

 #9
20240371609
2024-11-07

PLASMA PROCESSING APPARATUS

 #10
20240369918
2024-11-07

METHOD OF MANUFACTURING EUV PHOTO MASKS

 #11
20240312815
2024-09-19

FACEPLATE LOADING PLATFORM

 #12
20240258075
2024-08-01

SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL

 #13
20240242941
2024-07-18

LIGHT EMITTING SEALED BODY, LIGHT EMITTING UNIT, AND LIGHT SOURCE DEVICE

 #14
20240222074
2024-07-04

HIGH-FREQUENCY POWER SUPPLY DEVICE

 #15
20240154404
2024-05-09

Simplified voltage-boosting snubber network

 #16
20240128121
2024-04-18

MULTI-STEP PROCESS FOR FLOWABLE GAP-FILL FILM

 #17
20240112918
2024-04-04

PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING METHOD

 #18
20240096593
2024-03-21

PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

 #19
20240071721
2024-02-29

SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS

 #20
20240055266
2024-02-15

PLASMA ETCHING APPARATUS COMPONENT FOR MANUFACTURING SEMICONDUCTOR COMPRISING COMPOSITE SINTERED BODY AND MANUFACTURING METHOD THEREFOR

 #21
20240055225
2024-02-15

Apparatus to control ion energy

 #22
20240055224
2024-02-15

PLASMA SOURCE AND METHOD FOR REMOVING MATERIALS FROM SUBSTRATES UTILIZING PRESSURE WAVES

 #23
20240030073
2024-01-25

ETCH MONITORING AND PERFORMING

 #24
20240026548
2024-01-25

Thermal atomic layer etching processes

 #25
20230420218
2023-12-28

APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF TERMINAL TO ADJACENT NON-RF TERMINAL

 #26
20230395399
2023-12-07

Substrate treating method and substrate treating apparatus

 #27
20230377840
2023-11-23

Apparatus with switches to produce a waveform

 #28
20230377839
2023-11-23

APPARATUS TO PRODUCE A WAVEFORM

 #29
20230374671
2023-11-23

Thermal atomic layer etching processes

 #30
20230369016
2023-11-16

Apparatus to control a waveform

 #31
20230367193
2023-11-16

Method of manufacturing EUV photo masks

 #32
20230360970
2023-11-09

DEPOSITION TOOL AND METHOD FOR FILLING DEEP TRENCHES

 #33
20230343647
2023-10-26

METHOD AND APPARATUS FOR PLASMA DICING A SEMI-CONDUCTOR WAFER

 #34
20230307211
2023-09-28

Process Chamber And Process Kits For Advanced Packaging

 #35
20230282462
2023-09-07

Adaptive predictive control system

 #36
20230268187
2023-08-24

Atomic layer etching

 #37
20230253188
2023-08-10

Substrate support with real time force and film stress control

 #38
20230253182
2023-08-10

Atomic layer etching processes

 #39
20230215711
2023-07-06

Method of detecting radicals using mass spectrometry

 #40
20230207309
2023-06-29

METHOD AND APPARATUS FOR FILLING A GAP

 #41
20230203652
2023-06-29

Methods to reduce material surface roughness

 #42
20230197418
2023-06-22

SELECTIVE DEPOSITION ENABLED BY VAPOR PHASE INHIBITOR

 #43
20230170184
2023-06-01

Pulsing assembly and power supply arrangement

 #44
20230162972
2023-05-25

Plasma etching method using perfluoroisopropyl vinyl ether

 #45
20230087979
2023-03-23

Plasma processing apparatus, temperature control method, and temperature control program

 #46
20230064671
2023-03-02

Simplified voltage-boosting snubber network

 #47
20230062426
2023-03-02

Etch monitoring and performing

 #48
20230045456
2023-02-09

METHODS AND APPARATUS FOR REDIRECTING IONS GENERATED FROM ATMOSPHERIC PRESSURE LOW TEMPERATURE PLASMA

 #49
20230040728
2023-02-09

SUBSTRATE PROCESSING METHOD AND APPARATUS

 #50
20230038597
2023-02-09

PLASMA PROCESSING DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE BY USING THE SAME

 #51
20230023621
2023-01-26

Control circuit, pulsed power supply system, and semiconductor processing equipment

 #52
20230020438
2023-01-19

METHOD AND APPARATUS FOR PLASMA DICING A SEMI-CONDUCTOR WAFER

 #53
20220415661
2022-12-29

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #54
20220415660
2022-12-29

PROCESSING APPARATUS

 #55
20220380896
2022-12-01

SEMICONDUCTOR PROCESS SURFACE MONITORING

 #56
20220375777
2022-11-24

STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUS

 #57
20220351987
2022-11-03

Bonding method for cleaning non-bonding surface of substrate

 #58
20220336189
2022-10-20

Atomic-scale processing method by combining extreme ultraviolet light and plasma

 #59
20220285164
2022-09-08

Plasma Etching Apparatus Component for Manufacturing Semiconductor Comprising Composite Sintered Body and Manufacturing Method Therefor

 #60
20220285163
2022-09-08

Atomic layer etching of metal oxides

 #61
20220275501
2022-09-01

SURFACE TREATMENT FOR SELECTIVE DEPOSITION

 #62
20220230854
2022-07-21

Apparatus for indirect atmospheric pressure plasma processing

 #63
20220199372
2022-06-23

Light emitting sealed body, light emitting unit, and light source device

 #64
20220199363
2022-06-23

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #65
20220189743
2022-06-16

Multi-layer protective coating

 #66
20220186373
2022-06-16

SUBSTRATE PROCESSING DEVICE

 #67
20220157567
2022-05-19

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #68
20220139670
2022-05-05

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

 #69
20220119962
2022-04-21

Thermal atomic layer etching processes

 #70
20220119961
2022-04-21

Thermal atomic layer etching processes

 #71
20220102130
2022-03-31

Discharge chambers and ionization devices, methods and systems using them

 #72
20220082733
2022-03-17

SEMICONDUCTOR LENS OPTIMIZATION OF FABRICATION

 #73
20220076929
2022-03-10

SUBSTRATE TREATING APPARATUS AND COVER RING THEREOF

 #74
20220076921
2022-03-10

Plasma processing apparatus and control method

 #75
20220057706
2022-02-24

Method of manufacturing EUV photo masks

 #76
20220051872
2022-02-17

Atomic layer etching processes

 #77
20220028687
2022-01-27

Method of depositing thin film and method of manufacturing semiconductor device using the same

 #78
20220028657
2022-01-27

MEMBER FOR SEMICONDUCTOR MANUFACTURING DEVICE

 #79
20220018769
2022-01-20

SURFACE PLASMON DETECTION APPARATUSES AND METHODS

 #80
20220013387
2022-01-13

Substrate processing system and temperature control method

 #81
20220007489
2022-01-06

NOZZLE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

 #82
20210392899
2021-12-23

Continuous Methods for Treating Liquids and Manufacturing Certain Constituents (e.g., Nanoparticles) in Liquids, Apparatuses and Nanoparticles and Nanoparticle/Liquid Solution(s) Resulting Therefrom

 #83
20210375648
2021-12-02

Power feeding mechanism and method for controlling temperature of a stage

 #84
20210363635
2021-11-25

Heated ceramic faceplate

 #85
20210358714
2021-11-18

MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTING

 #86
20210335625
2021-10-28

DRY ETCHING APPARATUS AND DRY ETCHING METHOD

 #87
20210327679
2021-10-21

SYSTEM, METHOD, AND APPARATUS FOR ION CURRENT COMPENSATION

 #88
20210319986
2021-10-14

Plasma processing apparatus and plasma processing method

 #89
20210313167
2021-10-07

Method and apparatus for filling a gap

 #90
20210296135
2021-09-23

Heat shield for chamber door and devices manufactured using same

 #91
20210257252
2021-08-19

Multi-step process for flowable gap-fill film

 #92
20210233794
2021-07-29

Plasma processing apparatus and plasma processing method

 #93
20210183617
2021-06-17

Plasma source and method for removing materials from substrates utilizing pressure waves

 #94
20210175088
2021-06-10

Atomic layer etching

 #95
20210170400
2021-06-10

Imprinted substrates

 #96
20210159055
2021-05-27

Plasma processing device

 #97
20210140045
2021-05-13

Methods to reduce material surface roughness

 #98
20210134587
2021-05-06

Multi-function equipment implementing fabrication of high-k dielectric layer

 #99
20210125821
2021-04-29

Method and device for the surface treatment of substrates

 #100
20210110997
2021-04-15

Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same

 #101
20210104412
2021-04-08

Substrate processing method, substrate processing apparatus and substrate processing system

 #102
20210087680
2021-03-25

Susceptor having cooling device

 #103
20210067044
2021-03-04

Flying capacitor multilevel converters for anode supplies in hall effect thrusters

 #104
20210066056
2021-03-04

Method, device and system for the treatment of biological cryogenic samples by plasma focused ion beams

 #105
20210066048
2021-03-04

Plasma processing apparatus

 #106
20210066038
2021-03-04

Substrate support with real time force and film stress control

 #107
20210057213
2021-02-25

Non-plasma etch of titanium-containing material layers with tunable selectivity to alternate metals and dielectrics

 #108
20210057193
2021-02-25

Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathode

 #109
20210013013
2021-01-14

Plasma Spreading Apparatus And System

 #110
20200411287
2020-12-31

Plasma processing apparatus and method of operating the same

 #111
20200402809
2020-12-24

Plasma processing apparatus and plasma processing method

 #112
20200388466
2020-12-10

Adaptive plasma ignition

 #113
20200365372
2020-11-19

Plasma processing apparatuses having a dielectric injector

 #114
20200350146
2020-11-05

Apparatus and methods for removing contaminant particles in a plasma process

 #115
20200350143
2020-11-05

Batch type substrate processing apparatus

 #116
20200335303
2020-10-22

Modular print head assembly for plasma jet printing

 #117
20200313628
2020-10-01

High frequency power supply device and high frequency power supply method

 #118
20200312703
2020-10-01

Wafer positioning pedestal for semiconductor processing

 #119
20200312620
2020-10-01

Atomic layer etching processes

 #120
20200308710
2020-10-01

Thermal atomic layer etching processes

 #121
20200308709
2020-10-01

Thermal atomic layer etching processes

 #122
20200294824
2020-09-17

Bonding system with cleaning apparatus for cleaning non-bonding surface of substrate

 #123
20200279758
2020-09-03

Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber

 #124
20200273713
2020-08-27

Method of atomic layer etching of oxide

 #125
20200273669
2020-08-27

Power supply device for plasma, plasma device, and method for controlling power supply device for plasma

 #126
20200266081
2020-08-20

Placing table and plasma treatment apparatus

 #127
20200266034
2020-08-20

Plasma processing apparatus

 #128
20200258717
2020-08-13

MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTING

 #129
20200251307
2020-08-06

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

 #130
20200234982
2020-07-23

Loadlock integrated bevel etcher system

 #131
20200211823
2020-07-02

Plasma processing apparatus and control method

 #132
20200185250
2020-06-11

STRUCTURE OF MOUNTING TABLE AND SEMICONDUCTOR PROCESSING APPARATUS

 #133
20200161139
2020-05-21

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH)

 #134
20200152452
2020-05-14

Methods of encapsulation

 #135
20200152422
2020-05-14

Member for plasma processing devices

 #136
20200140294
2020-05-07

Non-thermal multiple plasma gate devices

 #137
20200132943
2020-04-30

METHODS FOR PROCESSING FERRULES AND/OR OPTICAL FIBERS

 #138
20200126758
2020-04-23

Flow through line charge volume

 #139
20200123651
2020-04-23

Deposition apparatus and deposition method using the same

 #140
20200118811
2020-04-16

Method for etching a carbon-containing feature

 #141
20200118798
2020-04-16

Adjustable extended electrode for edge uniformity control

 #142
20200107430
2020-04-02

Plasma generation apparatus

 #143
20200103742
2020-04-02

Method of manufacturing EUV photo masks

 #144
20200090948
2020-03-19

Three or more states for achieving high aspect ratio dielectric etch

 #145
20200083028
2020-03-12

Multi-functional protective coating

 #146
20200083024
2020-03-12

Multi-layer protective coating

 #147
20200035464
2020-01-30

COOLING STRUCTURE AND PARALLEL PLATE ETCHING APPARATUS

 #148
20200027747
2020-01-23

Pattern transfer technique and method of manufacturing the same

 #149
20200027700
2020-01-23

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

 #150
20190385823
2019-12-19

Chemical control features in wafer process equipment

 #151
20190371630
2019-12-05

Loadlock integrated bevel etcher system

 #152
20190357341
2019-11-21

Resonant network for plasma power supply and power supply device for plasma generator

 #153
20190355565
2019-11-21

Discharge chambers and ionization devices, methods and systems using them

 #154
20190348296
2019-11-14

Method of atomic layer etching of oxide

 #155
20190348259
2019-11-14

Physical vapor deposition in-chamber electro-magnet

 #156
20190346838
2019-11-14

Common Terminal Heater for Ceramic Pedestals Used in Semiconductor for Fabrication

 #157
20190341292
2019-11-07

Wafer positioning pedestal for semiconductor processing

 #158
20190279848
2019-09-12

Measuring device and operation method of system for inspecting focus ring

 #159
20190261500
2019-08-22

Plasma treatment apparatus

 #160
20190259611
2019-08-22

Substrate processing method and apparatus

 #161
20190259585
2019-08-22

Apparatus and methods for removing contaminant particles in a plasma process

 #162
20190252237
2019-08-15

System and method for performing spin dry etching

 #163
20190249312
2019-08-15

Thermal atomic layer etching processes

 #164
20190244859
2019-08-08

Method and apparatus for plasma dicing a semi-conductor wafer

 #165
20190244786
2019-08-08

Atomic layer etching processes

 #166
20190242019
2019-08-08

Thermal atomic layer etching processes

 #167
20190237298
2019-08-01

Ion beam etch without need for wafer tilt or rotation

 #168
20190198345
2019-06-27

Atomic layer etching using a combination of plasma and vapor treatments

 #169
20190180982
2019-06-13

System, method, and apparatus for controlling ion energy distribution in plasma processing systems

 #170
20190180981
2019-06-13

Gas splitting by time average injection into different zones by fast gas valves

 #171
20190157078
2019-05-23

Methods of encapsulation

 #172
20190148131
2019-05-16

APPARATUS AND METHOD FOR SELECTIVE DEPOSITION

 #173
20190148120
2019-05-16

Plasma processing apparatus, temperature control method, and temperature control program

 #174
20190143321
2019-05-16

Fabrication of microfluidic chips having electrodes level with microchannel walls

 #175
20190139778
2019-05-09

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

 #176
20190139770
2019-05-09

Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity

 #177
20190131137
2019-05-02

Maintenance method of plasma processing apparatus

 #178
20190122871
2019-04-25

PURGE AND PUMPING STRUCTURES ARRANGED BENEATH SUBSTRATE PLANE TO REDUCE DEFECTS

 #179
20190122867
2019-04-25

HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFACTURING A SEMICONDUCTOR DEVICE, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A HOLLOW CATHODE

 #180
20190108984
2019-04-11

Plasma electrode and plasma processing device

 #181
20190096708
2019-03-28

Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber

 #182
20190096691
2019-03-28

Heat shield for chamber door and devices manufactured using same

 #183
20190094143
2019-03-28

SURFACE PLASMON DETECTION APPARATUSES AND METHODS

 #184
20190088523
2019-03-21

Plasma processing apparatus and plasma processing method

 #185
20190088522
2019-03-21

System for coupling a voltage to spatially segmented portions of the wafer with variable voltage

 #186
20190088467
2019-03-21

High-k dielectric layer, fabricating method thereof and multi-function equipment implementing such fabricating method

 #187
20190084315
2019-03-21

Printing systems

 #188
20190065634
2019-02-28

Care area generation by detection optimized methodology

 #189
20190043766
2019-02-07

Hybrid corrective processing system and method

 #190
20190035601
2019-01-31

Methods and devices for examining an electrically charged specimen surface

 #191
20190027375
2019-01-24

Chamber Cleaning and Semiconductor Etching Gases

 #192
20180374709
2018-12-27

Etching method using remote plasma source, and method of fabricating semiconductor device including the etching method

 #193
20180372605
2018-12-27

Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber

 #194
20180366351
2018-12-20

OXYGEN COMPATIBLE PLASMA SOURCE

 #195
20180366339
2018-12-20

Chamber Cleaning and Semiconductor Etching Gases

 #196
20180366298
2018-12-20

Plasma enhancement member, and plasma supplying apparatus and medical instrument including the same

 #197
20180323098
2018-11-08

Wafer positioning pedestal for semiconductor processing

 #198
20180323037
2018-11-08

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

 #199
20180314148
2018-11-01

Layout pattern proximity correction through edge placement error prediction

 #200
20180312973
2018-11-01

Atomic layer clean for removal of photoresist patterning scum

 #201
20180308668
2018-10-25

Plasma spreading apparatus and method of spreading plasma in process ovens

 #202
20180304643
2018-10-25

System for providing multiple surface treatments to three-dimensional objects prior to printing

 #203
20180286634
2018-10-04

Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP

 #204
20180277377
2018-09-27

Plasma processing apparatus and plasma processing method

 #205
20180240678
2018-08-23

Element chip and manufacturing process thereof

 #206
20180240664
2018-08-23

REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON CARBIDE FILM

 #207
20180233327
2018-08-16

Apparatus with concentric pumping for multiple pressure regimes

 #208
20180226235
2018-08-09

Methods for removing particles from etching chamber

 #209
20180218933
2018-08-02

Adjustable extended electrode for edge uniformity control

 #210
20180204717
2018-07-19

Method and device for the surface treatment of substrates

 #211
20180197796
2018-07-12

Critical dimensions variance compensation

 #212
20180197720
2018-07-12

Plasma processing method and plasma processing apparatus

 #213
20180195179
2018-07-12

Methods of etching films with reduced surface roughness

 #214
20180190542
2018-07-05

Method and apparatus for plasma dicing a semi-conductor wafer

 #215
20180182656
2018-06-28

Measurement method, method of removing static electricity, and plasma processing apparatus

 #216
20180182599
2018-06-28

Plasma reactor with non-power-absorbing dielectric gas shower plate assembly

 #217
20180182597
2018-06-28

Atomic layer etching processes

 #218
20180174883
2018-06-21

Plasma distribution control

 #219
20180174858
2018-06-21

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

 #220
20180174843
2018-06-21

Sputter etch material selectivity

 #221
20180174800
2018-06-21

Plasma device

 #222
20180172885
2018-06-21

Semiconductor lens optimization of fabrication

 #223
20180166255
2018-06-14

Thermal atomic layer etching processes

 #224
20180163312
2018-06-14

Thermal atomic layer etching processes

 #225
20180158725
2018-06-07

Method and system for fabrication semiconductor device

 #226
20180151385
2018-05-31

Heat shield for chamber door and devices manufactured using same

 #227
20180147405
2018-05-31

A SURGICAL IMPLANT CONDUCTOR WITH INCREASED RADIO FREQUENCY ALTERNATING CURRENT RESISTANCE

 #228
20180138055
2018-05-17

Removal methods for high aspect ratio structures

 #229
20180130696
2018-05-10

Wafer positioning pedestal for semiconductor processing

 #230
20180130681
2018-05-10

PROCESSING SYSTEM

 #231
20180130679
2018-05-10

PLASMA PROCESSING DEVICE

 #232
20180127878
2018-05-10

COATING DEVICE OF COMPONENT FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND COATING METHOD THEREOF

 #233
20180124923
2018-05-03

Method for manufacturing an ultra-thin metal layer printed circuit board

 #234
20180114674
2018-04-26

Methods of forming features

 #235
20180108549
2018-04-19

SUBSTRATE PROCESSING APPARATUS

 #236
20180102235
2018-04-12

Method and apparatus for plasma etching

 #237
20180096865
2018-04-05

Oxygen compatible plasma source

 #238
20180096842
2018-04-05

Remote plasma based deposition of graded or multi-layered silicon carbide film

 #239
20180096834
2018-04-05

Chemical modification of hardmask films for enhanced etching and selective removal

 #240
20180095936
2018-04-05

OPTIMIZING A MANUFACTURING OR FABRICATION PROCESS USING AN INTEGRATED BAYESIAN STATISTICS AND CONTINUUM MODEL APPROACH

 #241
20180085752
2018-03-29

Imprinted substrates

 #242
20180082825
2018-03-22

Plasma processing method

 #243
20180068832
2018-03-08

Film deposition apparatus and method for cleaning film deposition apparatus

 #244
20180068831
2018-03-08

Endpoint detection algorithm for atomic layer etching (ALE)

 #245
20180061659
2018-03-01

Silicon-based deposition for semiconductor processing

 #246
20180061619
2018-03-01

Plasma processing apparatus

 #247
20180047545
2018-02-15

Substrate processing apparatus and substrate processing method

 #248
20180044780
2018-02-15

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

 #249
20180040458
2018-02-08

Systems and methods of treating a substrate

 #250
20180033635
2018-02-01

Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch)

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20180033618
2018-02-01

Substrate processing apparatus and substrate processing method

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20180025928
2018-01-25

Hold checking method and unhold checking method for wafer

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20180025889
2018-01-25

NONTHERMAL PLASMA SYNTHESIS

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20180019105
2018-01-18

Plasma equipment for treating powder

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20180019100
2018-01-18

System, method, and apparatus for controlling ion energy distribution in plasma processing systems

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20180005851
2018-01-04

CHAMBER FILLER KIT FOR DIELECTRIC ETCH CHAMBER

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20180004318
2018-01-04

FLEXIBLE SENSOR

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SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD

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2017-12-28

Pattern transfer technique and method of manufacturing the same

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2017-12-21

Gas distribution plate assembly for high power plasma etch processes

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2017-12-14

Plasma dicing of silicon carbide

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20170352558
2017-12-07

Rotary plasma electrical feedthrough

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2017-12-07

Apparatus and method for selective deposition

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2017-11-30

System and method for performing spin dry etching

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2017-11-30

Method and apparatus for reproducing component of semiconductor manufacturing apparatus, and reproduced component

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Systems and methods for improved semiconductor etching and component protection

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2017-11-09

Methods of encapsulation

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2017-11-09

METHOD TO DEPOSIT CONFORMAL AND LOW WET ETCH RATE ENCAPSULATION LAYER USING PECVD

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2017-11-09

APPARATUS FOR PLASMA TREATING AND PROCESS FOR PRODUCING MODIFIED PROTEIN STRUCTURE

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METHOD OF ETCHING ATOMIC LAYER

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2017-11-02

Transformer, plasma processing apparatus, and plasma processing method

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2017-11-02

Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity

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2017-11-02

Plasma processing method and plasma processing apparatus

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2017-10-26

Apparatus and techniques to treat substrates using directional plasma and reactive gas

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2017-10-26

Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP

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2017-10-26

Etching method

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20170309456
2017-10-26

Toroidal plasma channel with varying cross-section areas along the channel

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2017-10-26

Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device

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2017-10-19

Semiconductor lens optimization of fabrication

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2017-10-19

Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle

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2017-10-12

Vacuum chuck pressure control system

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2017-10-05

Cleaning process that precipitates yttrium oxy-flouride

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2017-09-28

Plasma densification method

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2017-09-28

LOCAL DRY ETCHING APPARATUS

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2017-09-14

Substrate processing apparatus and control method of substrate processing apparatus

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2017-09-07

Atomic layer etching of ALOusing a combination of plasma and vapor treatments

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2017-08-31

Methods of forming optical system components and optical coatings

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2017-08-24

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

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2017-08-24

PLASMA PROCESSING APPARATUS

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2017-08-24

Flow through line charge volume

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2017-08-17

Common terminal heater for ceramic pedestals used in semiconductor fabrication

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20170236691
2017-08-17

Chemical control features in wafer process equipment

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2017-08-17

Thin film self assembly of topcoat-free silicon-containing diblock copolymers

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20170229314
2017-08-10

Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces

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20170229309
2017-08-10

Flow distribution plate for surface fluorine reduction

 #296
20170229287
2017-08-10

Oxide etch selectivity systems and methods

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20170229275
2017-08-10

Particle charger

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20170221680
2017-08-03

Nanostructured material and method of making the same

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20170213707
2017-07-27

Substrate processing apparatus

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20170213699
2017-07-27

Gas splitting by time average injection into different zones by fast gas valves