205284 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources; Glow discharge Circuits specially adapted for controlling the glow discharge
COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING
#2Atomic layer etching by electron wavefront
#3DC plasma control for electron enhanced material processing
#4DC plasma control for electron enhanced material processing
#5Variable inductor for plasma generator
#6Fast neutral generation for plasma processing
#7High frequency power source allowing arbitrary setting of temporal change pattern for high frequency output power
#8Glow plasma gas measurement signal processing
#9SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
#10Multi-electrode/multi-modal atmospheric pressure glow discharge plasma ionization device
#11Method of low-temperature plasma generation, method of an electrically conductive or ferromagnetic tube coating using pulsed plasma and corresponding devices
#12Control method and plasma processing apparatus
#13Plasma processing apparatus and plasma processing method
#14GLOW PLASMA STABILIZATION
#15Substrate processing method and apparatus
#16Container, apparatus and method for handling an implant
#17System for tunable workpiece biasing in a plasma reactor
#18Method and apparatus for the thermal treatment of a substrate
#19System and method for plasma ignition
#20ION SOURCE SPUTTERING
#21Atomic layer etching with pulsed plasmas
#22Power supply system
#23System for tunable workpiece biasing in a plasma reactor
#24Redundant Power Supply System for a plasma process
#25Electric discharge generator and power supply device of electric discharge generator
#26Plasma generation device
#27Container, apparatus and method for handling an implant
#28Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
#29APPARATUS AND METHOD FOR TREATMENT OF ORGANIC HUMAN TISSUE WITH A LOW PRESSURE PLASMA
#30Power supply device for plasma processing
#31Plasma etching method and plasma etching apparatus
#32Method of processing target object and plasma processing apparatus
#33Method of Treating a Porous Substrate and Manufacture of a Membrane
#34System and method for controlling plasma density
#35Substrate processing apparatus and substrate processing method
#36Current generator and method for generating current pulses
#37Plasma processing apparatus and plasma processing method
#38Power supply system, plasma etching apparatus, and plasma etching method
#39PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
#40Power supply device for plasma processing
#41Plasma source
#42Power supply device for plasma processing
#43Power supply device for plasma processing
#44Ignition circuit for igniting a plasma fed with alternating power
#45Over-voltage protection during arc recovery for plasma-chamber power supplies
#46Arc extinction arrangement and method for extinguishing arcs
#47High-frequency supply of a load without impedance matching
#48Generating plasmas in pulsed power systems
#49Reversed-polarity pulse generating circuit for direct current plasma and direct current plasma power supply unit
#50ATOMIC LAYER ETCHING WITH PULSED PLASMAS
#51Method and apparatus for controlling ion energy distribution
#52Power supply device for plasma processing
#53Plasma supply device
#54Driving switches of a plasma load power supply
#55Protecting high-frequency amplifers
#56Determining high frequency operating parameters in a plasma system
#57Arc recovery with over-voltage protection for plasma-chamber power supplies
#58Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge
#59Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
#60ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES
#61PLASMA SOURCE FOR CHAMBER CLEANING AND PROCESS
#62SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#63Power supply ignition system and method
#64Vacuum Treatment Apparatus, A Bias Power Supply And A Method Of Operating A Vacuum Treatment Apparatus
#65Apparatus for mass-producing silicon-based thin film and method for mass-producing silicon-based thin film
#66Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film
#67Method for forming amorphous carbon film
#68ELECTRICAL CONTROL OF PLASMA UNIFORMITY USING EXTERNAL CIRCUIT
#69Substrate plasma processing apparatus and plasma processing method
#70REMOTE CONTROL POWER DISTRIBUTION APPARATUS, POWER DISTRIBUTION SYSTEM AND METHOD OF REMOTELY CONTROLLING TYPES OF POWER
#71Distributed power arrangements for localizing power delivery
#72Isolating a control signal source in a high frequency power supply
#73RF power supply
#74Plasma supply device
#75High frequency power supply
#76Radio frequency power supply
#77Arc suppression
#78PLASMA POWER SUPPLY CONTROL SYSTEM AND METHOD
#79RF substrate bias with high power impulse magnetron sputtering (HIPIMS)
#80Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
#81Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge
#82Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge
#83Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
#84Methods and apparatus for plasma implantation with improved dopant profile
#85Method and arrangement for controlling a glow discharge plasma under atmospheric conditions
#86Vacuum plasma generator
#87Atomic layer etching by electron wavefront
#88Atomic layer etching by electron wavefront