ClassID:

205286

H01J37/32064 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources; Arc discharge Circuits specially adapted for controlling the arc discharge

Recent Application in this class:
#1
20260011534
2026-01-08

COATING SYSTEM, ELECTRIC GENERATOR, POWER SUPPLY AND USAGE THEREOF

#2
20250166979
2025-05-22

APPARATUS, SYSTEM AND METHOD TO REDUCE CRAZING

#3
20240379321
2024-11-14

ION IMPLANTATION SYSTEM

#4
20240212994
2024-06-27

Methods and systems for increasing energy output in Z-pinch plasma confinement system

#5
20240117493
2024-04-11

ARC-BEAM POSITION MONITORING AND POSITION CONTROL IN PICVD COATING SYSTEMS

#6
20240052477
2024-02-15

DEPOSITION APPARATUS

#7
20230377762
2023-11-23

Methods and systems for increasing energy output in Z-pinch plasma confinement system

#8
20230369009
2023-11-16

Ion implantation system

#9
20230369008
2023-11-16

Hybrid ion source for aluminum ion generation using a target holder and a solid target

#10
20230197425
2023-06-22

Multi racetrack cathodic arc

#11
20220285129
2022-09-08

Pulsed DC power for deposition of film

#12
20220157571
2022-05-19

Base conducting layer beneath graphite layer of ceramic cathode for use with cathodic arc deposition

#13
20220102129
2022-03-31

Apparatus and method for ionizing an analyte, and apparatus and method for analyzing an ionized analyte

#14
20210317567
2021-10-14

Cathodic arc ignition device

#15
20210296078
2021-09-23

Ion generation device and ion generation method

#16
20210242063
2021-08-05

Helical plug for reduction or prevention of arcing in a substrate support

#17
20210151309
2021-05-20

Apparatus and method for ionizing an analyte, and apparatus and method for analysing an ionized analyte

#18
20210090862
2021-03-25

Base conducting layer beneath graphite layer of ceramic cathode for use with cathodic arc deposition

#19
20200303160
2020-09-24

Ion plasma disintegrator

#20
20200255933
2020-08-13

Deposition apparatus

#21
20200220203
2020-07-09

Apparatus of reactive cathodic arc evaporator for plating lithium-compound thin film and method thereof

#22
20190341235
2019-11-07

Apparatus, system and method to reduce crazing

#23
20190287763
2019-09-19

DIFFUSIVE PLASMA AIR TREATMENT AND MATERIAL PROCESSING

#24
20190246482
2019-08-08

Cyclotronic plasma actuator with arc-magnet for active flow control

#25
20190096633
2019-03-28

System and method for plasma ignition

#26
20190024228
2019-01-24

Arc evaporation device

#27
20180366299
2018-12-20

Simple and environment-friendly production equipment for carbon nanomaterials

#28
20180301323
2018-10-18

Extinguishing arcs in a plasma chamber

#29
20180286635
2018-10-04

Cyclotronic plasma actuator with arc-magnet for active flow control

#30
20180066353
2018-03-08

Vacuum arc deposition apparatus and deposition method

#31
20170125215
2017-05-04

Methods for thin film material deposition using reactive plasma-free physical vapor deposition

#32
20170076918
2017-03-16

Method to filter macro particles in a cathodic arc physical vapor deposition (PVD), in vacuum

#33
20170004966
2017-01-05

Substrate processing apparatus and method of manufacturing semiconductor device

#34
20170001918
2017-01-05

Selective area coating sintering

#35
20160358752
2016-12-08

Plasma generation device

#36
20160348247
2016-12-01

Flame-Assisted Flash Sintering

#37
20160343546
2016-11-24

PLASMA POWER SUPPLY UTILIZING IGNITION CIRCUIT WITH BYPASS SWITCH WITH REACTIVE IMPEDANCE

#38
20160336148
2016-11-17

Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages

#39
20160326630
2016-11-10

Deposition apparatus

#40
20160237554
2016-08-18

Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)

#41
20160141155
2016-05-19

Current threshold response mode for arc management

#42
20160071697
2016-03-10

Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages

#43
20160060750
2016-03-03

Deposition apparatus

#44
20150361561
2015-12-17

Flame-assisted flash sintering

#45
20150287576
2015-10-08

Extinguishing arcs in a plasma chamber

#46
20150191827
2015-07-09

Flame-assisted flash sintering

#47
20150080877
2015-03-19

Spark ablation device

#48
20140354149
2014-12-04

Apparatus for generating a hollow cathode arc discharge plasma

#49
20140320015
2014-10-30

Reducing stored electrical energy in a lead inductance

#50
20140224768
2014-08-14

Method for removing hard carbon layers

#51
20140217892
2014-08-07

Plasma source

#52
20140061034
2014-03-06

Method for pretreating substrates for PVD methods

#53
20140054165
2014-02-27

Carbon spark evaporation

#54
20140034612
2014-02-06

Method of differential counter electrode tuning in an RF plasma reactor

#55
20130134890
2013-05-30

Arc extinction arrangement and method for extinguishing arcs

#56
20120285620
2012-11-15

Current threshold response mode for arc management

#57
20110278157
2011-11-17

METHOD FOR PRETREATING SUBSTRATES FOR PVD METHODS

#58
20100213903
2010-08-26

Reducing stored electrical energy in a lead inductance

#59
20100141221
2010-06-10

Delivered energy compensation during plasma processing

#60
20090246407
2009-10-01

Method for forming amorphous carbon film

#61
20090065350
2009-03-12

FILTERED CATHODIC ARC DEPOSITION WITH ION-SPECIES-SELECTIVE BIAS

#62
20080309402
2008-12-18

EXTINCTION OF PLASMA ARCS

#63
20080286496
2008-11-20

Method for depositing electrically insulating layers

#64
20080135401
2008-06-12

RF substrate bias with high power impulse magnetron sputtering (HIPIMS)

#65
20080135400
2008-06-12

Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)

#66
20080095952
2008-04-24

Apparatus and method for nano plasma deposition

#67
20080061794
2008-03-13

System and method for managing power supplied to a plasma chamber

#68
20070144901
2007-06-28

Pulsed cathodic arc plasma

#69
20050121321
2005-06-09

Ignition device

#70
14014053
2016-05-17

Electrical arc trigger systems, methods, and apparatuses

#71
14013933
2016-12-06

Controlled-energy electrical arc systems, methods, and apparatuses