205315 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources; Discharge generated by other radiation using charged particles
PLASMA TREATMENT DEVICE
#2VIRTUAL SHUTTER IN ION BEAM SYSTEM
#3Plasma treatment device
#4Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
#5Charged particle emission device, system, method, and program
#6Charged particle emission device, system, method, and program
#7Method of manufacturing semiconductor device and ion beam irradiation apparatus
#8Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
#9Apparatuses and methods for plasma processing
#10Charged particle beam apparatus
#11Charged particle beam treatment apparatus
#12Confocal imaging technique in a charged particle microscope
#13Ion-ion plasma atomic layer etch process
#14Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
#15Plasma processing system, electron beam generator, and method of fabricating semiconductor device
#16DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
#17X-ray spectroscopy in a charged-particle microscope
#18Substrate processing method and substrate processing apparatus
#19Ion source for enhanced ionization
#20Beam intensity converting film, and method of manufacturing beam intensity converting film
#21COATER
#22Ion implanter and ion implantation method
#23Deposition or treatment of diamond-like carbon in a plasma reactor
#24Self-sustained non-ambipolar direct current (DC) plasma at low power
#25ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR
#26Plasma spray coating for sealing a defect area in a workpiece
#27Substrate bonding apparatus and substrate bonding method
#28Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
#29Diamond like carbon layer formed by an electron beam plasma process
#30Coil filament for plasma enhanced chemical vapor deposition source
#31APPARATUS AND METHOD FOR PROGRAMMABLE SPATIALLY SELECTIVE NANOSCALE SURFACE FUNCTIONALIZATION
#32Apparatus and method for programmable spatially selective nanoscale surface functionalization
#33Stand alone microfluidic analytical chip device
#34Virtual cathode deposition (VCD) for thin film manufacturing
#35Coaxial Hollow Cathode Plasma Assisted Directed Vapor Deposition and Related Method Thereof
#36Substrate bonding apparatus and substrate bonding method
#37APPLICATION OF ELECTRON-BEAM INDUCED PLASMA PROBES TO INSPECTION, TEST, DEBUG AND SURFACE MODIFICATIONS
#38Ion-ion plasma atomic layer etch process and reactor
#39Filament holder for hot cathode PECVD source
#40ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM COOLING AND LIQUID COOLED PEDESTAL FOR UNIFORM PLASMA GENERATION
#41Plasma source
#42Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam
#43Thermal plasma treatment method
#44CARBON FILM FORMING APPARATUS, CARBON FILM FORMING METHOD, AND MAGNETIC RECORDING MEDIUM MANFACTURING METHOD
#45Interface treatment of semiconductor surfaces with high density low energy plasma
#46Self-sustained non-ambipolar direct current (DC) plasma at low power
#47Photoresist treatment method by low bombardment plasma
#48Electron beam plasma source with remote radical source
#49Electron beam plasma source with reduced metal contamination
#50Electron beam plasma source with segmented suppression electrode for uniform plasma generation
#51Machine for implanting ions in plasma immersion mode for a low-pressure method
#52Plasma reactor with electron beam plasma source having a uniform magnetic field
#53Electron beam plasma source with profiled magnet shield for uniform plasma generation
#54Electron beam plasma source with segmented beam dump for uniform plasma generation
#55SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION
#56ELECTRON BEAM PLASMA SOURCE WITH PROFILED CONDUCTIVE FINS FOR UNIFORM PLASMA GENERATION
#57ELECTRON BEAM PLASMA SOURCE WITH PROFILED CHAMBER WALL FOR UNIFORM PLASMA GENERATION
#58E-BEAM PLASMA SOURCE WITH PROFILED E-BEAM EXTRACTION GRID FOR UNIFORM PLASMA GENERATION
#59Electron beam plasma source with arrayed plasma sources for uniform plasma generation
#60Coating and ion beam mixing apparatus and method to enhance the corrosion resistance of the materials at the elevated temperature using the same
#61Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof
#62Electron Beam Enhanced Nitriding System (EBENS)
#63Apparatus and method for improving photoresist properties using a quasi-neutral beam
#64COATING AND ION BEAM MIXING APPARATUS AND METHOD TO ENHANCE THE CORROSION RESISTANCE OF THE MATERIALS AT THE ELEVATED TEMPERATURE USING THE SAME
#65PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD
#66PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, AND DEPOSITION METHOD
#67PLASMA TREATMENT APPARATUS
#68Thin-film deposition system
#69Methods for treating surfaces, and methods for removing one or more materials from surfaces
#70ELECTRON BEAM ENHANCED NITRIDING SYSTEM
#71METHOD AND APPARATUS FOR MAKING DIAMOND-LIKE CARBON FILMS
#72Method and apparatus for making diamond-like carbon films
#73Surface treatment apparatus
#74ETCHING APPARATUS USING NEUTRAL BEAM AND METHOD THEREOF
#75Method and system for uniformity control in ballistic electron beam enhanced plasma processing system
#76System and method for generating ions and radicals
#77Apparatus and Method for Materials Processing with Ion-Ion Plasma
#78Methods for beam current modulation by ion source parameter modulation
#79Electron beam enhanced surface wave plasma source
#80Plasma and electron beam etching device and method
#81Method of treating a mask layer prior to performing an etching process
#82Method and system for controlling the uniformity of a ballistic electron beam by RF modulation
#83Microwave plasma generator
#84Apparatus and method for generating activated hydrogen for plasma stripping
#85Method and apparatus for deposition of low-k dielectric materials
#86APPARATUS FOR REACTIVE SPUTTERING
#87Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma
#88Device for improving plasma activity PVD-reactors
#89Direct ion beam deposition method and system
#90Method and system for discretely controllable plasma processing
#91Ion sources and ion implanters and methods including the same
#92Time continuous ion-ion plasma
#93Electron beam enhanced nitriding system (EBENS)
#94Method and apparatus for producing an ion-ion plasma continuous in time
#95Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
#96System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal
#97Ion source for enhanced ionization