205316 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources; Discharge generated by other radiation using electromagnetic radiation
SYSTEM AND METHOD FOR SEMICONDUCTOR STRUCTURE
#2METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TARGET LAYER
#3LASER-SUSTAINED PLASMA GENERATION IN SUPERSONIC GAS JETS
#4System and Method for Semiconductor Structure
#5ADDITION OF EXTERNAL ULTRAVIOLET LIGHT FOR IMPROVED PLASMA STRIKE CONSISTENCY
#6PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
#7Vacuum deposition into trenches and vias and etch of trenches and via
#8PHOTOELECTRON ASSISTED PLASMA IGNITION
#9Ion extraction assembly having variable electrode thickness for beam uniformity control
#10METHOD OF IGNITING PLASMA AND PLASMA GENERATING SYSTEM
#11PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#12Vacuum processing apparatus
#13Rotating lamp for laser-sustained plasma illumination source
#14Light source apparatus
#15LOW-TEMPERATURE IONIZATION OF METASTABLE ATOMS EMITTED BY AN INDUCTIVELY COUPLED PLASMA ION SOURCE
#16Device for pulsed laser deposition and a substrate with a substrate surface for reduction of particles on the substrate
#17Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
#18Method for pulsed laser deposition
#19PLASMA SIMULATION WITH NON-LINEAR OPTICS
#20Plasma processing apparatus
#21Vacuum processing apparatus
#22Methods for forming a metal silicide interconnection nanowire structure
#23Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
#24System and method for temperature control in plasma processing system
#25Substrate treating apparatus, substrate treating method, and plasma generating unit
#26Extreme ultraviolet light generating apparatus
#27TOROIDAL PLASMA ABATEMENT APPARATUS AND METHOD
#28Method for manufacturing semiconductor device, ion beam etching device, and control device
#29Plasma processing device, plasma processing method and manufacturing method of electronic device
#30System and method for temperature control in plasma processing system
#31Coaxial Hollow Cathode Plasma Assisted Directed Vapor Deposition and Related Method Thereof
#32Vacuum processing apparatus
#33APPARATUS FOR FABRICATING TWO-DIMENSIONAL LAYERED CHALCOGENIDE FILM
#34Toroidal plasma abatement apparatus and method
#35Methods for reducing copper overhang in a feature of a substrate
#36Apparatus for and method of active cleaning of EUV optic with RF plasma field
#37Plasma generation apparatus for generating toroidal plasma
#38MAGNETIZED EDGE RING FOR EXTREME EDGE CONTROL
#39Method for activating an inner surface of a substrate tube for the manufacturing of an optical-fiber preform
#40Laser induced plasma micromachining (LIPMM)
#41Open plasma lamp for forming a light-sustained plasma
#42Method of producing an anti-wear layer and anti-wear layer produced by means of said method
#43Methods for forming a metal silicide interconnection nanowire structure
#44PLASMA PROCESSING APPARATUS
#45Method of forming thin film of semiconductor device
#46Plasma processing apparatus
#47Method for manufacturing semiconductor device, ion beam etching device, and control device
#48Laser induced plasma micromachining (LIPMM)
#49Open plasma lamp for forming a light-sustained plasma
#50Apparatus for and method of active cleaning of EUV optic with RF plasma field
#51METHOD AND EQUIPMENT FOR REMOVING PHOTORESIST RESIDUE AFER DRY ETCH
#52Surface treatment apparatus and surface treatment method
#53METHOD AND DEVICE FOR PERMANENT BONDING OF WAFERS
#54Radiation source
#55Toroidal plasma abatement apparatus and method
#56Laser-induced gas plasma machining
#57PLASMA PROCESS APPARATUS AND PLASMA GENERATING DEVICE
#58Systems for and methods of laser-enhanced plasma processing of semiconductor materials
#59PLASMA GENERATING APPARATUS AND PROCESS FOR SIMULTANEOUS EXPOSURE OF A WORKPIECE TO ELECTROMAGNETIC RADIATION AND PLASMA
#60Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof
#61Plasma Reactor, and Method for the Production of Monocrystalline Diamond Layers
#62Arrangement
#63ANODE FOR PRODUCING A PLASMA BY WAY OF ELECTRIC ARC DISCHARGES
#64Arrangement for Producing Coatings on Substrates in Vacuo
#65Apparatus and method for enhancing plasma etch
#66Plasma etching method and apparatus therefor
#67Conformal Doping Using High Neutral Density Plasma Implant
#68SYSTEM AND METHOD FOR CONTROL OF ELECTROMAGNETIC RADIATION IN PECVD DISCHARGE PROCESSES
#69Tunable uniformity in a plasma processing system
#70Method for producing solid element plasma and its plasma source
#71Semiconductor processing system and method
#72System and method for semiconductor processing
#73Plasma etching method and apparatus therefor
#74Plasma-assisted doping
#75Laser ablation apparatus and method of preparing nanoparticles using the same
#76System, apparatus, and method for increasing particle density and energy by creating a controlled plasma environment into a gaseous media
#77Photo-assisted method for semiconductor fabrication
#78Method of processing wafers with resonant heating