ClassID:

205320

H01J37/32376 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources; Localised processing Scanning across large workpieces

Recent Application in this class:
#1
20240213089
2024-06-27

INTEGRATED ATMOSPHERIC PLASMA TREATMENT STATION IN PROCESSING TOOL

#2
20200164672
2020-05-28

Drop-on-demand identification document printing with surface pre-treatment

#3
20200027707
2020-01-23

Techniques, system and apparatus for selective deposition of a layer using angled ions

#4
20180257416
2018-09-13

Drop-on-demand identification document printing with surface pre-treatment

#5
20180144906
2018-05-24

Methods for processing substrates using small plasma chambers

#6
20160118228
2016-04-28

THERMAL SPRAYING METHOD AND DEVICE THEREFOR

#7
20150069017
2015-03-12

Dynamic electrode plasma system

#8
20140151333
2014-06-05

Small plasma chamber systems and methods

#9
20130105460
2013-05-02

Plasma processing apparatus

#10
20130098556
2013-04-25

Plasma processing apparatus

#11
20120325777
2012-12-27

Plasma processing apparatus and plasma processing method

#12
20120258606
2012-10-11

E-beam enhanced decoupled source for semiconductor processing

#13
20120228515
2012-09-13

Apparatus and method for maskless patterned implantation

#14
20120125258
2012-05-24

Extended Reactor Assembly with Multiple Sections for Performing Atomic Layer Deposition on Large Substrate

#15
20120094502
2012-04-19

Methods for depositing bevel protective film

#16
20110209829
2011-09-01

SURFACE TREATMENT APPARATUS

#17
20110180403
2011-07-28

Insulator interposed type plasma processing apparatus

#18
20110174333
2011-07-21

Process and installation for surface preparation by dielectric barrier discharge

#19
20110132874
2011-06-09

Small plasma chamber systems and methods

#20
20100155225
2010-06-24

Method of forming thin film and apparatus for forming thin film

#21
20090242520
2009-10-01

Plasma processing apparatus and plasma processing method

#22
20090229972
2009-09-17

METHOD AND APPARATUS FOR PRODUCING A FEATURE HAVING A SURFACE ROUGHNESS IN A SUBSTRATE

#23
20090133714
2009-05-28

METHOD FOR SURFACE TREATING SUBSTRATE AND PLASMA TREATMENT APPARATUS

#24
20080160205
2008-07-03

Apparatus and method for plasma arc coating

#25
20080127892
2008-06-05

Plasma Processing Apparatus with Scanning Injector and Plasma Processing Method

#26
20080099441
2008-05-01

Apparatus and method for reactive atom plasma processing for material deposition

#27
20070228008
2007-10-04

Medium pressure plasma system for removal of surface layers without substrate loss

#28
20060231031
2006-10-19

Method and apparatus for treating a substrate

#29
20050279458
2005-12-22

Plasma processing method and apparatus

#30
20050271951
2005-12-08

Plasma etching apparatus and method of fabricating photomask using the same