ClassID:

205319

H01J37/32366 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources Localised processing

Sub-classes:
Recent Application in this class:
#1
20250166972
2025-05-22

METHOD AND SYSTEM FOR PLASMA PROCESS

#2
20250046577
2025-02-06

METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TARGET LAYER

#3
20240249920
2024-07-25

REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS

#4
20230365769
2023-11-16

RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHODRESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AN LAMINATE BODY MANUFACTURING METHOD

#5
20230360888
2023-11-09

MULTICELL OR MULTIARRAY PLASMA AND METHOD FOR SURFACE TREATMENT USING THE SAME

#6
20230360887
2023-11-09

MAINTENANCE FOR REMOTE PLASMA SOURCES

#7
20230290612
2023-09-14

Programmable plasma ignition profiles

#8
20230067917
2023-03-02

Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources

#9
20220416021
2022-12-29

WIDE-GAP SEMICONDUCTOR SUBSTRATE, APPARATUS FOR MANUFACTURING WIDE-GAP SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING WIDE-GAP SEMICONDUCTOR SUBSTRATE

#10
20220315721
2022-10-06

RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHOD

#11
20220262646
2022-08-18

Plasma etching method and plasma etching apparatus

#12
20220246403
2022-08-04

Digital control of plasma processing

#13
20220102119
2022-03-31

PLASMA PROCESSING APPARATUS

#14
20210391147
2021-12-16

Radio frequency ground system and method

#15
20210388498
2021-12-16

ATOMIC LAYER DEPOSITION AND VAPOR DEPOSITION REACTOR WITH IN-CHAMBER MICROPLASMA SOURCE

#16
20210343505
2021-11-04

Programmable ignition profiles for enhanced plasma ignition

#17
20210319981
2021-10-14

Faceplate with localized flow control

#18
20210265133
2021-08-26

Visible image unit identification code structure

#19
20210247336
2021-08-12

Device and method for analyzing a defect of a photolithographic mask or of a wafer

#20
20210213297
2021-07-15

METHOD AND SYSTEM OF SENSITIZING CANCER CELLS TO CHEMICAL TREATMENT BY PLASMA BASED ACTIVATION

#21
20200312681
2020-10-01

SUBSTRATE PROCESSING APPARATUS

#22
20200294812
2020-09-17

Plasma etching method and plasma etching apparatus

#23
20200266037
2020-08-20

MAINTENANCE FOR REMOTE PLASMA SOURCES

#24
20200234982
2020-07-23

Loadlock integrated bevel etcher system

#25
20200227238
2020-07-16

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

#26
20200194241
2020-06-18

Support unit, apparatus and method for treating a substrate

#27
20200155266
2020-05-21

Apparatus for sterilising an instrument channel of a surgical scoping device

#28
20200123656
2020-04-23

Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate

#29
20190374327
2019-12-12

Container, apparatus and method for handling an implant

#30
20190371630
2019-12-05

Loadlock integrated bevel etcher system

#31
20190279849
2019-09-12

Plasma-activated saline solutions and method of making plasma activated saline solutions

#32
20190279846
2019-09-12

Plasma processing system, electron beam generator, and method of fabricating semiconductor device

#33
20190179056
2019-06-13

Optical element

#34
20190122860
2019-04-25

Plasma processing system, electron beam generator, and method of fabricating semiconductor device

#35
20190088497
2019-03-21

Plasma etching method and plasma etching apparatus

#36
20190057839
2019-02-21

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

#37
20180342375
2018-11-29

Method for controlling a plasma process

#38
20180318459
2018-11-08

Apparatus for sterilizing an instrument channel of a surgical scoping device

#39
20180294145
2018-10-11

Processing method

#40
20180261463
2018-09-13

Techniques for manipulating patterned features using ions

#41
20180261434
2018-09-13

Insulating structure

#42
20180254170
2018-09-06

PLASMA GENERATING APPARATUS AND METHOD OF MANUFACTURING PATTERNED DEVICES USING SPATIALLY RESOLVED PLASMA PROCESSING

#43
20180237912
2018-08-23

Film deposition method and film deposition apparatus

#44
20180226231
2018-08-09

Plasma treatment of an elastomeric material for adhesion

#45
20180158651
2018-06-07

Device for treating an object with plasma

#46
20180151333
2018-05-31

Plasma etching method

#47
20180144906
2018-05-24

Methods for processing substrates using small plasma chambers

#48
20180138019
2018-05-17

Plasma irradiation apparatus and plasma irradiation method

#49
20180135165
2018-05-17

A METHOD AND A DEVICE FOR COATING AN ENDOPROSTHESIS HAVING A BASE BODY

#50
20180082822
2018-03-22

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

#51
20180051375
2018-02-22

Substrate processing apparatus

#52
20170372911
2017-12-28

Ion beam etching utilizing cryogenic wafer temperatures

#53
20170345625
2017-11-30

Support unit, apparatus and method for treating a substrate

#54
20170342561
2017-11-30

Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate

#55
20170338124
2017-11-23

Method for plasma etching a workpiece

#56
20170338079
2017-11-23

Apparatus and method for programmable spatially selective nanoscale surface functionalization

#57
20170333894
2017-11-23

Stand alone microfluidic analytical chip device

#58
20170292923
2017-10-12

Device and method for analysing a defect of a photolithographic mask or of a wafer

#59
20170287677
2017-10-05

Plasma processing apparatus and plasma processing method

#60
20170182514
2017-06-29

Method for forming a protective film

#61
20170137939
2017-05-18

Plasma source and surface treatment method

#62
20170117195
2017-04-27

Nano deposition and ablation for the repair and fabrication of integrated circuits

#63
20170110296
2017-04-20

Connection control method

#64
20170092511
2017-03-30

Loadlock integrated bevel etcher system

#65
20170076957
2017-03-16

Systems and methods for performing in-situ deposition of sidewall image transfer spacers

#66
20170076945
2017-03-16

Mask shrink layer for high aspect ratio dielectric etch

#67
20170002468
2017-01-05

Plasma enhanced chemical vapor deposition apparatus that includes conductive mask supports

#68
20160372715
2016-12-22

Plasma-enhanced chemical vapor deposition device and method of manufacturing display apparatus using the same

#69
20160358760
2016-12-08

System and method for plasma treatment using directional dielectric barrier discharge energy system

#70
20160351407
2016-12-01

Etching method

#71
20160302906
2016-10-20

Container, apparatus and method for handling an implant

#72
20160281207
2016-09-29

Plasma nitriding apparatus

#73
20160233061
2016-08-11

Heated air plasma treatment

#74
20160189941
2016-06-30

Methods and apparatus for nodule control in a titanium-tungsten target

#75
20160148713
2016-05-26

Material modification by neutral beam source with selected collision angle

#76
20160141202
2016-05-19

Air gap formation in interconnection structure by implantation process

#77
20160122579
2016-05-05

Silicon containing block copolymers for direct self-assembly application

#78
20160086852
2016-03-24

Proximity contact cover ring for plasma dicing

#79
20160086817
2016-03-24

Plasma etching method and plasma etching apparatus

#80
20160064196
2016-03-03

Plasma processing apparatus and plasma processing method

#81
20160064195
2016-03-03

Plasma treatment of an elastomeric material for adhesion

#82
20160064188
2016-03-03

Plasma processing apparatus and plasma processing method

#83
20160042922
2016-02-11

Techniques and apparatus for anisotropic metal etching

#84
20160032441
2016-02-04

Apparatus for manufacturing display device and method of manufacturing display device

#85
20150325411
2015-11-12

Directional treatment for multi-dimensional device processing

#86
20150309214
2015-10-29

Method for producing an antireflection layer on a silicone surface and optical element

#87
20150283563
2015-10-08

Device for positioning nanoparticles

#88
20150228548
2015-08-13

Nano deposition and ablation for the repair and fabrication of integrated circuits

#89
20150200076
2015-07-16

System and methods for plasma application

#90
20150118867
2015-04-30

Plasma processing device, plasma processing method and method of manufacturing electronic devices

#91
20150048049
2015-02-19

Method and apparatus for forming a periodic pattern using a self-assembled block copolymer

#92
20150013906
2015-01-15

Hybrid feature etching and bevel etching systems

#93
20150001175
2015-01-01

Method for production of optical waveguides and coupling and devices made from the same

#94
20140363587
2014-12-11

Substrate processing apparatus and substrate processing method

#95
20140329390
2014-11-06

Plasma treatment method and plasma treatment device

#96
20140303037
2014-10-09

PATTERNING METHOD

#97
20140252135
2014-09-11

Device for controlling placement of nanoparticles

#98
20140202633
2014-07-24

METHOD AND SYSTEM FOR ION-ASSISTED PROCESSING

#99
20140174661
2014-06-26

Plasma processing chamber for bevel edge processing

#100
20140151333
2014-06-05

Small plasma chamber systems and methods

#101
20140147603
2014-05-29

Plasma based surface augmentation method

#102
20140131311
2014-05-15

Thin film forming apparatus and thin film forming method using the same

#103
20140073138
2014-03-13

METHOD FOR PLASMA ETCHING AND PLASMA ETCHING APPARATUS THEREOF

#104
20140038393
2014-02-06

Method and system for ion-assisted processing

#105
20130334171
2013-12-19

Integrated steerability array arrangement for minimizing non-uniformity and methods thereof

#106
20130160708
2013-06-27

Combinatorial high power coaxial switching matrix

#107
20130118895
2013-05-16

Apparatus and method for reactive ion etching

#108
20130098556
2013-04-25

Plasma processing apparatus

#109
20130042811
2013-02-21

Combinatorial plasma enhanced deposition techniques

#110
20130012029
2013-01-10

Method and device for layer deposition

#111
20120301616
2012-11-29

Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead

#112
20120255492
2012-10-11

Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus

#113
20120247677
2012-10-04

SUBSTRATE PROCESSING METHOD

#114
20120231616
2012-09-13

Semiconductor structure made using improved multiple ion implantation process

#115
20120211164
2012-08-23

SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING

#116
20120174864
2012-07-12

Plasma CVD apparatus

#117
20120132367
2012-05-31

PROCESSING APPARATUS

#118
20120129324
2012-05-24

Semiconductor structure made using improved multiple ion implantation process

#119
20120100724
2012-04-26

Combinatorial plasma enhanced deposition techniques

#120
20120100723
2012-04-26

Combinatorial plasma enhanced deposition techniques

#121
20120097647
2012-04-26

Methods and apparatus for igniting and sustaining plasma

#122
20120094503
2012-04-19

Combinatorial plasma enhanced deposition techniques

#123
20120094502
2012-04-19

Methods for depositing bevel protective film

#124
20120094034
2012-04-19

Combinatorial plasma enhanced deposition techniques

#125
20120077338
2012-03-29

Combinatorial plasma enhanced deposition techniques

#126
20120045863
2012-02-23

Microplasma generator and methods therefor

#127
20120045590
2012-02-23

Apparatus and method for plasma treatment of containers

#128
20110275219
2011-11-10

High pressure bevel etch process

#129
20110214687
2011-09-08

Configurable bevel etcher

#130
20110180212
2011-07-28

Plasma processing chamber for bevel edge processing

#131
20110174440
2011-07-21

Plasma processing apparatus

#132
20110151610
2011-06-23

Workpiece patterning with plasma sheath modulation

#133
20110147345
2011-06-23

Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp

#134
20110132874
2011-06-09

Small plasma chamber systems and methods

#135
20110117748
2011-05-19

Localized plasma processing

#136
20110101862
2011-05-05

System and methods for plasma application

#137
20110089142
2011-04-21

Method and apparatus for plasma surface treatment of moving substrate

#138
20110068004
2011-03-24

Plasma generating apparatus and plasma processing apparatus

#139
20110042007
2011-02-24

Etching apparatus and etching method for substrate bevel

#140
20100301012
2010-12-02

DEVICE AND METHOD FOR PRODUCING MICROWAVE PLASMA WITH A HIGH PLASMA DENSITY

#141
20100270147
2010-10-28

Transportable, miniature, chamberless, low power, micro metallizer

#142
20100194278
2010-08-05

Flow manipulation with micro plasma

#143
20100175622
2010-07-15

SUBSTRATE PROCESSING APPARATUS

#144
20100151686
2010-06-17

High pressure bevel etch process

#145
20100147464
2010-06-17

PLASMA TREATMENT APPARATUS

#146
20100116790
2010-05-13

Device and method for locally producing microwave plasma

#147
20100080928
2010-04-01

Confining Magnets In Sputtering Chamber

#148
20100078312
2010-04-01

Sputtering Chamber Having ICP Coil and Targets on Top Wall

#149
20100072391
2010-03-25

Nano-particle trap using a microplasma

#150
20100071621
2010-03-25

Device for forming a film by deposition from a plasma

#151
20100034985
2010-02-11

Apparatus and method for the plasma treatment of hollow bodies

#152
20100032285
2010-02-11

METHOD OF PLASMA TREATMENT OF A SURFACE

#153
20090308312
2009-12-17

Devices for positioning carbon nanoparticles, and systems for controlling placement of nanoparticles

#154
20090280276
2009-11-12

Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body

#155
20090275210
2009-11-05

Combinatorial plasma enhanced deposition techniques

#156
20090229521
2009-09-17

METHOD AND DEVICE FOR MICROWAVE PLASMA DEPOSITION OF A COATING ON A THERMOPLASTIC CONTAINER SURFACE

#157
20090188525
2009-07-30

Apparatus, carrier and method for the plasma treatment of molds

#158
20090186167
2009-07-23

Atmospheric pressure plasma, generating method, plasma processing method and component mounting method using same, and device using these methods

#159
20090170334
2009-07-02

Copper Discoloration Prevention Following Bevel Etch Process

#160
20090126871
2009-05-21

PLASMA PROCESSING APPARATUS

#161
20090078677
2009-03-26

Integrated steerability array arrangement for minimizing non-uniformity

#162
20090014127
2009-01-15

Systems for plasma enhanced chemical vapor deposition and bevel edge etching

#163
20080311758
2008-12-18

Methods of and apparatus for protecting a region of process exclusion adjacent to a region of process performance in a process chamber

#164
20080185017
2008-08-07

Film removal method and apparatus

#165
20080182412
2008-07-31

Configurable bevel etcher

#166
20080179297
2008-07-31

Bevel etcher with gap control

#167
20080179290
2008-07-31

TEMPERATURE-SWITCHED PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL AND FRONT SIDE PHOTORESIST STRIP

#168
20080179289
2008-07-31

PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A PLASMA STREAM

#169
20080179009
2008-07-31

Process for wafer backside polymer removal with a ring of plasma under the wafer

#170
20080179008
2008-07-31

REACTOR FOR WAFER BACKSIDE POLYMER REMOVAL USING AN ETCH PLASMA FEEDING A LOWER PROCESS ZONE AND A SCAVENGER PLASMA FEEDING AN UPPER PROCESS ZONE

#171
20080179007
2008-07-31

REACTOR FOR WAFER BACKSIDE POLYMER REMOVAL USING PLASMA PRODUCTS IN A LOWER PROCESS ZONE AND PURGE GASES IN AN UPPER PROCESS ZONE

#172
20080178913
2008-07-31

PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A RING OF PLASMA UNDER THE WAFER

#173
20080169189
2008-07-17

Apparatus and method for RF plasma enhanced magnetron sputter deposition

#174
20080146040
2008-06-19

LOCAL PLASMA PROCESSING

#175
20080128086
2008-06-05

Backside unlayering of MOSFET devices for electrical and physical characterization

#176
20080111490
2008-05-15

System and method for generating ions and radicals

#177
20080066679
2008-03-20

PROCESSING SYSTEM AND PLASMA GENERATION DEVICE

#178
20080017316
2008-01-24

Clean ignition system for wafer substrate processing

#179
20080011332
2008-01-17

Method and apparatus for cleaning a wafer substrate

#180
20080010845
2008-01-17

Apparatus for cleaning a wafer substrate

#181
20070262052
2007-11-15

Film removal method and apparatus

#182
20070251919
2007-11-01

Etching apparatus and etching method for substrate bevel

#183
20070170371
2007-07-26

Microplasma-based sample ionizing device and methods of use thereof

#184
20070164680
2007-07-19

Plasma generation and processing with multiple radiation sources

#185
20070090092
2007-04-26

Method and device for removing layers in some areas of glass plates

#186
20060284118
2006-12-21

Process and apparatus for modifying a surface in a work region

#187
20060275549
2006-12-07

Methods for positioning carbon nanotubes

#188
20060269672
2006-11-30

Local plasma processing

#189
20060249367
2006-11-09

Plasma catalyst

#190
20060234512
2006-10-19

Plasma processing apparatus and plasma processing method

#191
20060231590
2006-10-19

Glow discharge drilling apparatus and glow discharge drilling method

#192
20060208649
2006-09-21

Method and system for discretely controllable plasma processing

#193
20060062931
2006-03-23

Method and device for microwave plasma deposition of a coating on a thermoplastic container surface

#194
20060045987
2006-03-02

Localized plasma processing

#195
20060030160
2006-02-09

Backside unlayering of MOSFET devices for electrical and physical characterization

#196
20050281959
2005-12-22

Plasma generating apparatus and method of forming alignment film of liquid crystal display using the same

#197
20050205518
2005-09-22

Method for shaping thin films in the near-edge regions of in-process semiconductor substrates

#198
20050148157
2005-07-07

Method of processing backside unlayering of MOSFET devices for electrical and physical characterization including a collimated ion plasma

#199
20050061446
2005-03-24

Plasma-assisted joining

#200
20050008550
2005-01-13

Low-power atmospheric pressure mini-plasma and array for surface and material treatment

#201
17665486
2026-05-05

Atmospheric pressure plasma reduction of copper oxide to copper metal

#202
17016951
2022-12-06

Low temperature atmospheric pressure plasma for cleaning and activating metals

#203
16042905
2020-10-13

Low temperature atmospheric pressure plasma for cleaning and activating metals

#204
15190082
2017-12-26

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

#205
14842733
2017-01-10

Mask shrink layer for high aspect ratio dielectric etch

#206
14704082
2016-08-30

Method for making guiding lines with oxidized sidewalls for use in directed self-assembly (DSA) of block copolymers