205319 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources Localised processing
Sub-classes:METHOD AND SYSTEM FOR PLASMA PROCESS
#2METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TARGET LAYER
#3REMOVABLE MASK LAYER TO REDUCE OVERHANG DURING RE-SPUTTER PROCESS IN PVD CHAMBERS
#4RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHODRESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AN LAMINATE BODY MANUFACTURING METHOD
#5MULTICELL OR MULTIARRAY PLASMA AND METHOD FOR SURFACE TREATMENT USING THE SAME
#6MAINTENANCE FOR REMOTE PLASMA SOURCES
#7Programmable plasma ignition profiles
#8Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources
#9WIDE-GAP SEMICONDUCTOR SUBSTRATE, APPARATUS FOR MANUFACTURING WIDE-GAP SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING WIDE-GAP SEMICONDUCTOR SUBSTRATE
#10RESIN SURFACE HYDROPHILIZATION METHOD, PLASMA PROCESSING DEVICE, LAMINATE BODY, AND LAMINATE BODY MANUFACTURING METHOD
#11Plasma etching method and plasma etching apparatus
#12Digital control of plasma processing
#13PLASMA PROCESSING APPARATUS
#14Radio frequency ground system and method
#15ATOMIC LAYER DEPOSITION AND VAPOR DEPOSITION REACTOR WITH IN-CHAMBER MICROPLASMA SOURCE
#16Programmable ignition profiles for enhanced plasma ignition
#17Faceplate with localized flow control
#18Visible image unit identification code structure
#19Device and method for analyzing a defect of a photolithographic mask or of a wafer
#20METHOD AND SYSTEM OF SENSITIZING CANCER CELLS TO CHEMICAL TREATMENT BY PLASMA BASED ACTIVATION
#21SUBSTRATE PROCESSING APPARATUS
#22Plasma etching method and plasma etching apparatus
#23MAINTENANCE FOR REMOTE PLASMA SOURCES
#24Loadlock integrated bevel etcher system
#25Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#26Support unit, apparatus and method for treating a substrate
#27Apparatus for sterilising an instrument channel of a surgical scoping device
#28Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate
#29Container, apparatus and method for handling an implant
#30Loadlock integrated bevel etcher system
#31Plasma-activated saline solutions and method of making plasma activated saline solutions
#32Plasma processing system, electron beam generator, and method of fabricating semiconductor device
#33Optical element
#34Plasma processing system, electron beam generator, and method of fabricating semiconductor device
#35Plasma etching method and plasma etching apparatus
#36Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#37Method for controlling a plasma process
#38Apparatus for sterilizing an instrument channel of a surgical scoping device
#39Processing method
#40Techniques for manipulating patterned features using ions
#41Insulating structure
#42PLASMA GENERATING APPARATUS AND METHOD OF MANUFACTURING PATTERNED DEVICES USING SPATIALLY RESOLVED PLASMA PROCESSING
#43Film deposition method and film deposition apparatus
#44Plasma treatment of an elastomeric material for adhesion
#45Device for treating an object with plasma
#46Plasma etching method
#47Methods for processing substrates using small plasma chambers
#48Plasma irradiation apparatus and plasma irradiation method
#49A METHOD AND A DEVICE FOR COATING AN ENDOPROSTHESIS HAVING A BASE BODY
#50Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#51Substrate processing apparatus
#52Ion beam etching utilizing cryogenic wafer temperatures
#53Support unit, apparatus and method for treating a substrate
#54Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate
#55Method for plasma etching a workpiece
#56Apparatus and method for programmable spatially selective nanoscale surface functionalization
#57Stand alone microfluidic analytical chip device
#58Device and method for analysing a defect of a photolithographic mask or of a wafer
#59Plasma processing apparatus and plasma processing method
#60Method for forming a protective film
#61Plasma source and surface treatment method
#62Nano deposition and ablation for the repair and fabrication of integrated circuits
#63Connection control method
#64Loadlock integrated bevel etcher system
#65Systems and methods for performing in-situ deposition of sidewall image transfer spacers
#66Mask shrink layer for high aspect ratio dielectric etch
#67Plasma enhanced chemical vapor deposition apparatus that includes conductive mask supports
#68Plasma-enhanced chemical vapor deposition device and method of manufacturing display apparatus using the same
#69System and method for plasma treatment using directional dielectric barrier discharge energy system
#70Etching method
#71Container, apparatus and method for handling an implant
#72Plasma nitriding apparatus
#73Heated air plasma treatment
#74Methods and apparatus for nodule control in a titanium-tungsten target
#75Material modification by neutral beam source with selected collision angle
#76Air gap formation in interconnection structure by implantation process
#77Silicon containing block copolymers for direct self-assembly application
#78Proximity contact cover ring for plasma dicing
#79Plasma etching method and plasma etching apparatus
#80Plasma processing apparatus and plasma processing method
#81Plasma treatment of an elastomeric material for adhesion
#82Plasma processing apparatus and plasma processing method
#83Techniques and apparatus for anisotropic metal etching
#84Apparatus for manufacturing display device and method of manufacturing display device
#85Directional treatment for multi-dimensional device processing
#86Method for producing an antireflection layer on a silicone surface and optical element
#87Device for positioning nanoparticles
#88Nano deposition and ablation for the repair and fabrication of integrated circuits
#89System and methods for plasma application
#90Plasma processing device, plasma processing method and method of manufacturing electronic devices
#91Method and apparatus for forming a periodic pattern using a self-assembled block copolymer
#92Hybrid feature etching and bevel etching systems
#93Method for production of optical waveguides and coupling and devices made from the same
#94Substrate processing apparatus and substrate processing method
#95Plasma treatment method and plasma treatment device
#96PATTERNING METHOD
#97Device for controlling placement of nanoparticles
#98METHOD AND SYSTEM FOR ION-ASSISTED PROCESSING
#99Plasma processing chamber for bevel edge processing
#100Small plasma chamber systems and methods
#101Plasma based surface augmentation method
#102Thin film forming apparatus and thin film forming method using the same
#103METHOD FOR PLASMA ETCHING AND PLASMA ETCHING APPARATUS THEREOF
#104Method and system for ion-assisted processing
#105Integrated steerability array arrangement for minimizing non-uniformity and methods thereof
#106Combinatorial high power coaxial switching matrix
#107Apparatus and method for reactive ion etching
#108Plasma processing apparatus
#109Combinatorial plasma enhanced deposition techniques
#110Method and device for layer deposition
#111Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead
#112Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus
#113SUBSTRATE PROCESSING METHOD
#114Semiconductor structure made using improved multiple ion implantation process
#115SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING
#116Plasma CVD apparatus
#117PROCESSING APPARATUS
#118Semiconductor structure made using improved multiple ion implantation process
#119Combinatorial plasma enhanced deposition techniques
#120Combinatorial plasma enhanced deposition techniques
#121Methods and apparatus for igniting and sustaining plasma
#122Combinatorial plasma enhanced deposition techniques
#123Methods for depositing bevel protective film
#124Combinatorial plasma enhanced deposition techniques
#125Combinatorial plasma enhanced deposition techniques
#126Microplasma generator and methods therefor
#127Apparatus and method for plasma treatment of containers
#128High pressure bevel etch process
#129Configurable bevel etcher
#130Plasma processing chamber for bevel edge processing
#131Plasma processing apparatus
#132Workpiece patterning with plasma sheath modulation
#133Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp
#134Small plasma chamber systems and methods
#135Localized plasma processing
#136System and methods for plasma application
#137Method and apparatus for plasma surface treatment of moving substrate
#138Plasma generating apparatus and plasma processing apparatus
#139Etching apparatus and etching method for substrate bevel
#140DEVICE AND METHOD FOR PRODUCING MICROWAVE PLASMA WITH A HIGH PLASMA DENSITY
#141Transportable, miniature, chamberless, low power, micro metallizer
#142Flow manipulation with micro plasma
#143SUBSTRATE PROCESSING APPARATUS
#144High pressure bevel etch process
#145PLASMA TREATMENT APPARATUS
#146Device and method for locally producing microwave plasma
#147Confining Magnets In Sputtering Chamber
#148Sputtering Chamber Having ICP Coil and Targets on Top Wall
#149Nano-particle trap using a microplasma
#150Device for forming a film by deposition from a plasma
#151Apparatus and method for the plasma treatment of hollow bodies
#152METHOD OF PLASMA TREATMENT OF A SURFACE
#153Devices for positioning carbon nanoparticles, and systems for controlling placement of nanoparticles
#154Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body
#155Combinatorial plasma enhanced deposition techniques
#156METHOD AND DEVICE FOR MICROWAVE PLASMA DEPOSITION OF A COATING ON A THERMOPLASTIC CONTAINER SURFACE
#157Apparatus, carrier and method for the plasma treatment of molds
#158Atmospheric pressure plasma, generating method, plasma processing method and component mounting method using same, and device using these methods
#159Copper Discoloration Prevention Following Bevel Etch Process
#160PLASMA PROCESSING APPARATUS
#161Integrated steerability array arrangement for minimizing non-uniformity
#162Systems for plasma enhanced chemical vapor deposition and bevel edge etching
#163Methods of and apparatus for protecting a region of process exclusion adjacent to a region of process performance in a process chamber
#164Film removal method and apparatus
#165Configurable bevel etcher
#166Bevel etcher with gap control
#167TEMPERATURE-SWITCHED PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL AND FRONT SIDE PHOTORESIST STRIP
#168PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A PLASMA STREAM
#169Process for wafer backside polymer removal with a ring of plasma under the wafer
#170REACTOR FOR WAFER BACKSIDE POLYMER REMOVAL USING AN ETCH PLASMA FEEDING A LOWER PROCESS ZONE AND A SCAVENGER PLASMA FEEDING AN UPPER PROCESS ZONE
#171REACTOR FOR WAFER BACKSIDE POLYMER REMOVAL USING PLASMA PRODUCTS IN A LOWER PROCESS ZONE AND PURGE GASES IN AN UPPER PROCESS ZONE
#172PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A RING OF PLASMA UNDER THE WAFER
#173Apparatus and method for RF plasma enhanced magnetron sputter deposition
#174LOCAL PLASMA PROCESSING
#175Backside unlayering of MOSFET devices for electrical and physical characterization
#176System and method for generating ions and radicals
#177PROCESSING SYSTEM AND PLASMA GENERATION DEVICE
#178Clean ignition system for wafer substrate processing
#179Method and apparatus for cleaning a wafer substrate
#180Apparatus for cleaning a wafer substrate
#181Film removal method and apparatus
#182Etching apparatus and etching method for substrate bevel
#183Microplasma-based sample ionizing device and methods of use thereof
#184Plasma generation and processing with multiple radiation sources
#185Method and device for removing layers in some areas of glass plates
#186Process and apparatus for modifying a surface in a work region
#187Methods for positioning carbon nanotubes
#188Local plasma processing
#189Plasma catalyst
#190Plasma processing apparatus and plasma processing method
#191Glow discharge drilling apparatus and glow discharge drilling method
#192Method and system for discretely controllable plasma processing
#193Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
#194Localized plasma processing
#195Backside unlayering of MOSFET devices for electrical and physical characterization
#196Plasma generating apparatus and method of forming alignment film of liquid crystal display using the same
#197Method for shaping thin films in the near-edge regions of in-process semiconductor substrates
#198Method of processing backside unlayering of MOSFET devices for electrical and physical characterization including a collimated ion plasma
#199Plasma-assisted joining
#200Low-power atmospheric pressure mini-plasma and array for surface and material treatment
#201Atmospheric pressure plasma reduction of copper oxide to copper metal
#202Low temperature atmospheric pressure plasma for cleaning and activating metals
#203Low temperature atmospheric pressure plasma for cleaning and activating metals
#204Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring
#205Mask shrink layer for high aspect ratio dielectric etch
#206Method for making guiding lines with oxidized sidewalls for use in directed self-assembly (DSA) of block copolymers