205324 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources Plasma immersion ion implantation
Ion implantation system and method of monitoring implant energy of an ion implantation device
#302Plasma ion implantation system with axial electrostatic confinement
#303Plasma implantation using halogenated dopant species to limit deposition of surface layers
#304RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor
#305Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage
#306Plasma-assisted doping
#307Technique for boron implantation
#308Method and apparatus for plasma source ion implantation in metals and non-metals
#309Biased pulse DC reactive sputtering of oxide films
#310Biased pulse DC reactive sputtering of oxide films
#311Biased pulse DC reactive sputtering of oxide films
#312In situ surface contaminant removal for ion implanting
#313Method for the surface activation on the metalization of electronic devices
#314Plasma immersion ion implantation reactor having an ion shower grid
#315Plasma immersion ion implantation reactor having multiple ion shower grids
#316Apparatus and method for focused electric field enhanced plasma-based ion implantation
#317Apparatus and method for doping
#318Etch and deposition control for plasma implantation
#319Methods for stable and repeatable ion implantation
#320In-situ process chamber preparation methods for plasma ion implantation systems
#321RF Plasma Source With Conductive Top Section
#322Plasma immersion ion implantion apparatus and method
#323Ion implantation of high-k materials in semiconductor devices
#324Plasma ion implantation system
#325Plasma processing method and apparatus
#326Method of cleaning a reaction chamber
#327Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement
#328Apparatus and method for metal plasma immersion ion implantation and metal plasma immersion ion deposition
#329Plasma immersion ion implantation system including an inductively coupled plasma source having low dissociation and low minimum plasma voltage
#330Biased pulse DC reactive sputtering of oxide films
#331Ion angle detector
#332RF ion source with dynamic volume control
#333Self-aligned process