Patents-Review.com
ClassID:

205324 ⎘

H01J37/32412 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources Plasma immersion ion implantation

Recent Application in this class:
#1
20260051459
2026-02-19

SHIELDED GAS INLET FOR AN ION SOURCE

 #2
20260024725
2026-01-22

GAS SUPPLY APPARATUS AND SUBSTRATE PROCESSING APPARATUS

 #3
20250391633
2025-12-25

ION EXTRACTION OPTICS WITH DYNAMIC EXTRACTION ANGLE CONTROL

 #4
20250273437
2025-08-28

VAPORIZER AND ION SOURCE

 #5
20250166970
2025-05-22

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

 #6
20240371608
2024-11-07

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRIC OR ASYMMETRIC APPLICATION OF FORCE

 #7
20240153774
2024-05-09

MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING

 #8
20240153740
2024-05-09

FILAMENT ALIGNMENT DEVICE

 #9
20240145217
2024-05-02

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

 #10
20240096601
2024-03-21

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

 #11
20240038499
2024-02-01

ION SOURCE AND OPERATING METHOD THEREOF

 #12
20240006158
2024-01-04

CO-DOPING TO CONTROL WET ETCH RATE OF FCVD OXIDE LAYERS

 #13
20230395354
2023-12-07

Control of plasma sheath with bias supplies

 #14
20230343558
2023-10-26

Hydraulic feed system for an ion source

 #15
20230282451
2023-09-07

Cover ring to mitigate carbon contamination in plasma doping chamber

 #16
20230245859
2023-08-03

Hydraulic feed system for an ion source

 #17
20230135525
2023-05-04

SHIELDED GAS INLET FOR AN ION SOURCE

 #18
20230124509
2023-04-20

Compact low angle ion beam extraction assembly and processing apparatus

 #19
20230116058
2023-04-13

Spatial control of plasma processing environments

 #20
20220367197
2022-11-17

Method for manufacturing semiconductor structure

 #21
20220359163
2022-11-10

Plasma ion processing of substrates

 #22
20220285170
2022-09-08

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING STACKED WIRING STRUCTURE, AND ION BEAM IRRADIATION APPARATUS

 #23
20220285131
2022-09-08

Spatial monitoring and control of plasma processing environments

 #24
20220223365
2022-07-14

METHOD OF PERMANENTLY PHASE-TRANSITING SEMIMETAL USING ION IMPLANTATION AND SEMIMETAL PHASE-TRANSITED THEREBY

 #25
20220216040
2022-07-07

Method and apparatus for reducing vacuum loss in an ion implantation system

 #26
20220154328
2022-05-19

Insulating structure, method for manufacturing insulating structure, ion generation device, and ion implanter

 #27
20220130636
2022-04-28

Ion implanter, ion implantation method, and semiconductor device manufacturing method

 #28
20210375590
2021-12-02

Plasma processing apparatus and techniques

 #29
20210313144
2021-10-07

Ion implanter toxic gas delivery system

 #30
20210241996
2021-08-05

Spatial monitoring and control of plasma processing environments

 #31
20210090860
2021-03-25

Plasma immersion methods for ion implantation

 #32
20210005428
2021-01-07

Spatial monitoring and control of plasma processing environments

 #33
20200408959
2020-12-31

APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF MANUFACTURING AND USE THEREOF

 #34
20200402806
2020-12-24

Method for manufacturing semiconductor structure

 #35
20200357611
2020-11-12

Plasma processing apparatus and techniques

 #36
20200350139
2020-11-05

High power wafer cooling

 #37
20200279720
2020-09-03

Ion source and cleaning method thereof

 #38
20200126774
2020-04-23

Method and apparatus for reducing vacuum loss in an ion implantation system

 #39
20200083021
2020-03-12

Foam in ion implantation system

 #40
20200058463
2020-02-20

Methods and systems for plasma deposition and treatment

 #41
20200049788
2020-02-13

Device, system, and method for controlling the focus of a laser to induce plasmas that emit signals with high directivity

 #42
20190272979
2019-09-05

METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FOR PERFORMING THE SAME

 #43
20190256973
2019-08-22

Method and Apparatus for Depositing Diamond-Like Carbon Coatings

 #44
20190185988
2019-06-20

Storage and delivery of antimony-containing materials to an ion implanter

 #45
20190157043
2019-05-23

Spatial and temporal control of ion bias voltage for plasma processing

 #46
20190144471
2019-05-16

Tin-containing dopant compositions, systems and methods for use in ion implantation systems

 #47
20190139770
2019-05-09

Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity

 #48
20190136069
2019-05-09

Hydrogenated isotopically enriched boront trifluoride dopant source gas composition

 #49
20190074189
2019-03-07

Methods for manufacturing semiconductor devices having three-dimensionally arranged memory cells

 #50
20190062901
2019-02-28

Antimony-containing materials for ion implantation

 #51
20180374681
2018-12-27

Ionization chamber, ion-implantation apparatus and ion-implantation method

 #52
20180358207
2018-12-13

Method of controlling an implanter operating in plasma immersion

 #53
20180286637
2018-10-04

Ion implanter and ion implantation method

 #54
20180209035
2018-07-26

Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment

 #55
20180204755
2018-07-19

Radiant heating presoak

 #56
20180197719
2018-07-12

Method of processing a substrate using an ion beam and apparatus for performing the same

 #57
20180174807
2018-06-21

Plasma generation for ion implanter

 #58
20180166291
2018-06-14

Semiconductor manufacturing apparatus and method thereof

 #59
20180154556
2018-06-07

Mold and method for manufacturing the same

 #60
20180138020
2018-05-17

RF ion source with dynamic volume control

 #61
20180135165
2018-05-17

A METHOD AND A DEVICE FOR COATING AN ENDOPROSTHESIS HAVING A BASE BODY

 #62
20180108516
2018-04-19

Ion beam irradiation apparatus and substrate processing apparatus

 #63
20180059289
2018-03-01

APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF MANUFACTURING AND USE THEREOF

 #64
20170345964
2017-11-30

Ion implant system having grid assembly

 #65
20170309453
2017-10-26

Radio frequency extraction system for charge neutralized ion beam

 #66
20170178943
2017-06-22

Electrostatic heating substrate holder which is polarised at high voltage

 #67
20170178866
2017-06-22

APPARATUS AND TECHNIQUES FOR TIME MODULATED EXTRACTION OF AN ION BEAM

 #68
20170140898
2017-05-18

Ion generator and method of controlling ion generator

 #69
20170107344
2017-04-20

Elongated gas barrier laminate and method for producing same

 #70
20160379844
2016-12-29

TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING

 #71
20160351398
2016-12-01

SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

 #72
20160326636
2016-11-10

Methods Of Affecting Material Properties And Applications Therefor

 #73
20160284520
2016-09-29

Multi-aperture extraction system for angled ion beam

 #74
20160247664
2016-08-25

Bipolar wafer charge monitor system and ion implantation system comprising same

 #75
20160233100
2016-08-11

Selective deposition utilizing masks and directional plasma treatment

 #76
20160211137
2016-07-21

Silicon implantation in substrates and provision of silicon precursor compositions therefor

 #77
20160204295
2016-07-14

Grid for plasma ion implant

 #78
20160189935
2016-06-30

In situ control of ion angular distribution in a processing apparatus

 #79
20160181465
2016-06-23

Ion implant system having grid assembly

 #80
20160181070
2016-06-23

DEVICE FOR ION IMPLANTATION

 #81
20160141202
2016-05-19

Air gap formation in interconnection structure by implantation process

 #82
20160111254
2016-04-21

Workpiece Processing Method And Apparatus

 #83
20160071731
2016-03-10

FINFET doping method with curvilnear trajectory implantation beam path

 #84
20160071695
2016-03-10

Ion implantation machine presenting increased productivity

 #85
20160042922
2016-02-11

Techniques and apparatus for anisotropic metal etching

 #86
20150357167
2015-12-10

Apparatus and method for mass analyzed ion beam

 #87
20150325412
2015-11-12

Ion implanter provided with a plurality of plasma source bodies

 #88
20150325411
2015-11-12

Directional treatment for multi-dimensional device processing

 #89
20150318220
2015-11-05

Plasma processing apparatus and measurement method

 #90
20150255242
2015-09-10

Plasma-based material modification using a plasma source with magnetic confinement

 #91
20150206719
2015-07-23

Plasma activated conformal dielectric film deposition

 #92
20150206710
2015-07-23

Ion implantation device

 #93
20150206700
2015-07-23

Ion implantation device

 #94
20150187582
2015-07-02

Doping method, doping apparatus and method of manufacturing semiconductor device

 #95
20150179409
2015-06-25

In situ control of ion angular distribution in a processing apparatus

 #96
20150132929
2015-05-14

METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLASMA DOPING APPARATUS

 #97
20150118825
2015-04-30

Method for manufacturing bonded wafer

 #98
20150115796
2015-04-30

Pinched plasma bridge flood gun for substrate charge neutralization

 #99
20150108894
2015-04-23

Wide metal-free plasma flood gun

 #100
20150072461
2015-03-12

Ion implant system having grid assembly

 #101
20140356547
2014-12-04

System and method of improving implant quality in a plasma-based implant system

 #102
20140353525
2014-12-04

Control module for an ion implanter

 #103
20140327358
2014-11-06

Method of controlling an ion implanter in plasma immersion mode

 #104
20140302666
2014-10-09

Pulsed gas plasma doping method and apparatus

 #105
20140272182
2014-09-18

Method for implementing low dose implant in a plasma system

 #106
20140265849
2014-09-18

Hardware plasma interlock system

 #107
20140248472
2014-09-04

Sapphire property modification through ion implantation

 #108
20140234554
2014-08-21

Method and system for plasma-assisted ion beam processing

 #109
20140197416
2014-07-17

Memories and methods of forming thin-film transistors using hydrogen plasma doping

 #110
20140170795
2014-06-19

Grid for plasma ion implant

 #111
20140165908
2014-06-19

Transfer chamber and method of using a transfer chamber

 #112
20140150723
2014-06-05

Ion implantation apparatus

 #113
20140144379
2014-05-29

Systems and methods for plasma doping microfeature workpieces

 #114
20140124363
2014-05-08

Ion beam generator and ion beam plasma processing apparatus

 #115
20140102370
2014-04-17

Machine for implanting ions in plasma immersion mode for a low-pressure method

 #116
20140099430
2014-04-10

Reducing glitching in an ion implanter

 #117
20140072798
2014-03-13

Gas barrier laminated body, method for producing same, member for electronic device, and electronic device

 #118
20140034611
2014-02-06

Enhanced etch and deposition profile control using plasma sheath engineering

 #119
20130313443
2013-11-28

Excited gas injection for ion implant control

 #120
20130305988
2013-11-21

Inline Capacitive Ignition of Inductively Coupled Plasma Ion Source

 #121
20130287963
2013-10-31

Plasma Potential Modulated ION Implantation Apparatus

 #122
20130247824
2013-09-26

Method and system for modifying photoresist using electromagnetic radiation and ion implantation

 #123
20130153779
2013-06-20

Dose measurement device for plasma-immersion ion implantation

 #124
20130146790
2013-06-13

Apparatus and method for charge neutralization during processing of a workpiece

 #125
20130095643
2013-04-18

METHODS FOR IMPLANTING DOPANT SPECIES IN A SUBSTRATE

 #126
20130092529
2013-04-18

Plasma processing with enhanced charge neutralization and process control

 #127
20130064989
2013-03-14

Plasma processing of workpieces to form a coating

 #128
20130052811
2013-02-28

Plasma uniformity control using biased array

 #129
20130046368
2013-02-21

Flexible conductive single wire

 #130
20130037052
2013-02-14

PLATEN CLEANING METHOD

 #131
20130022759
2013-01-24

Plasma processing method and apparatus

 #132
20130001440
2013-01-03

System and method for ion implantation with dual purpose mask

 #133
20120328771
2012-12-27

Closed loop process control of plasma processed materials

 #134
20120309114
2012-12-06

Methods for repairing low-k dielectrics using carbon plasma immersion

 #135
20120302048
2012-11-29

PRE OR POST-IMPLANT PLASMA TREATMENT FOR PLASMA IMMERSED ION IMPLANTATION PROCESS

 #136
20120289036
2012-11-15

SURFACE DOSE RETENTION OF DOPANTS BY PRE-AMORPHIZATION AND POST IMPLANT PASSIVATION TREATMENTS

 #137
20120288637
2012-11-15

Methods of affecting material properties and applications therefor

 #138
20120285818
2012-11-15

Plasma doping method with gate shutter

 #139
20120279449
2012-11-08

APPARATUS AND METHOD FOR FOCUSED ELECTRIC FIELD ENHANCED PLASMA-BASED ION IMPLANTATION

 #140
20120252195
2012-10-04

Ion implantation system and method

 #141
20120238074
2012-09-20

Methods and apparatus for conformal doping

 #142
20120231616
2012-09-13

Semiconductor structure made using improved multiple ion implantation process

 #143
20120228515
2012-09-13

Apparatus and method for maskless patterned implantation

 #144
20120199071
2012-08-09

PLASMA IMMERSION CHAMBER

 #145
20120186519
2012-07-26

PLASMA DOPING METHOD AND APPARATUS

 #146
20120181252
2012-07-19

Plasma processing method and plasma processing apparatus

 #147
20120171855
2012-07-05

Methods to adjust threshold voltage in semiconductor devices

 #148
20120161037
2012-06-28

Dose Measurement Method using Calorimeter

 #149
20120145918
2012-06-14

Method of ionization

 #150
20120129325
2012-05-24

Method for ion implant using grid assembly

 #151
20120129324
2012-05-24

Semiconductor structure made using improved multiple ion implantation process

 #152
20120125259
2012-05-24

Ion implant system having grid assembly

 #153
20120115317
2012-05-10

Plasma doping method and apparatus thereof

 #154
20120082942
2012-04-05

Method and system for modifying photoresist using electromagnetic radiation and ion implantation

 #155
20120043712
2012-02-23

MECHANISM AND METHOD FOR ALIGNING A WORKPIECE TO A SHADOW MASK

 #156
20120028454
2012-02-02

Plasma activated conformal dielectric film deposition

 #157
20120021592
2012-01-26

Apparatus and method for doping

 #158
20120021136
2012-01-26

SYSTEM AND METHOD FOR CONTROLLING PLASMA DEPOSITION UNIFORMITY

 #159
20120015507
2012-01-19

PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD

 #160
20120003760
2012-01-05

Glitch control during implantation

 #161
20120000606
2012-01-05

PLASMA UNIFORMITY SYSTEM AND METHOD

 #162
20120000421
2012-01-05

CONTROL APPARATUS FOR PLASMA IMMERSION ION IMPLANTATION OF A DIELECTRIC SUBSTRATE

 #163
20110309049
2011-12-22

Techniques for plasma processing a substrate

 #164
20110303146
2011-12-15

PLASMA DOPING APPARATUS

 #165
20110281440
2011-11-17

METHODS FOR NITRIDATION AND OXIDATION

 #166
20110265821
2011-11-03

TECHNIQUES FOR MAINTAINING A SUBSTRATE PROCESSING SYSTEM

 #167
20110248323
2011-10-13

ION IMPLANTATION APPARATUS, ION IMPLANTATION METHOD, AND SEMICONDUCTOR DEVICE

 #168
20110240876
2011-10-06

Apparatus for controlling the temperature of an RF ion source window

 #169
20110231174
2011-09-22

PROCESS SIMULATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND PROCESS SIMULATOR

 #170
20110226739
2011-09-22

PROCESS CHAMBER LINER WITH APERTURES FOR PARTICLE CONTAINMENT

 #171
20110217830
2011-09-08

PLASMA DOPING METHOD AND APPARATUS

 #172
20110207307
2011-08-25

Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces

 #173
20110204264
2011-08-25

Ion implantation through laser fields

 #174
20110189860
2011-08-04

METHODS FOR NITRIDATION AND OXIDATION

 #175
20110175140
2011-07-21

Methods for forming NMOS EPI layers

 #176
20110174770
2011-07-21

Method for modifying an etch rate of a material layer using energetic charged particles

 #177
20110151652
2011-06-23

Method for fabricating semiconductor device and plasma doping system

 #178
20110104393
2011-05-05

PLASMA ION IMPLANTATION PROCESS FOR PATTERNED DISC MEDIA APPLICATIONS

 #179
20110101247
2011-05-05

Temperature control of a substrate during a plasma ion implantation process for patterned disc media applications

 #180
20110081787
2011-04-07

Plasma processing method and apparatus

 #181
20110079241
2011-04-07

Method for ion source component cleaning

 #182
20110070722
2011-03-24

Manufacturing method of semiconductor device

 #183
20110065267
2011-03-17

Plasma doping method and plasma doping apparatus

 #184
20110065266
2011-03-17

Method for manufacturing semiconductor device

 #185
20110036990
2011-02-17

PLATEN TO CONTROL CHARGE ACCUMULATION

 #186
20110000896
2011-01-06

System and method for selectively controlling ion composition of ion sources

 #187
20100323508
2010-12-23

Plasma grid implant system for use in solar cell fabrications

 #188
20100308236
2010-12-09

Masking apparatus for an ion implanter

 #189
20100297836
2010-11-25

Plasma doping apparatus and method, and method for manufacturing semiconductor device

 #190
20100267224
2010-10-21

Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls

 #191
20100252531
2010-10-07

Enhanced etch and deposition profile control using plasma sheath engineering

 #192
20100197126
2010-08-05

Use of chained implants in solar cell

 #193
20100178757
2010-07-15

Process simulation method, semiconductor device manufacturing method, and process simulator

 #194
20100167507
2010-07-01

PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD

 #195
20100154835
2010-06-24

Cleaning of semiconductor processing systems

 #196
20100140077
2010-06-10

Excited gas injection for ion implant control

 #197
20100112794
2010-05-06

Doping profile modification in P3I process

 #198
20100112793
2010-05-06

Conformal doping in P3I chamber

 #199
20100098837
2010-04-22

Plasma doping method and apparatus

 #200
20100084980
2010-04-08

Plasma uniformity control using biased array

 #201
20100084577
2010-04-08

Techniques for ion implantation of molecular ions

 #202
20100083980
2010-04-08

Platen cleaning method

 #203
20100075490
2010-03-25

Defect-free junction formation using laser melt annealing of octadecaborane self-amorphizing implants

 #204
20100057179
2010-03-04

Conductive metal thin coatings for implantable medical sensing devices

 #205
20100025821
2010-02-04

Ion implanting apparatus and ion implanting method

 #206
20100022076
2010-01-28

Ion implantation with heavy halogenide compounds

 #207
20100009469
2010-01-14

PLASMA DOPING METHOD AND APPARATUS

 #208
20090317963
2009-12-24

Plasma doping processing device and method thereof

 #209
20090286012
2009-11-19

Method and apparatus for high rate, uniform plasma processing of three-dimensional objects

 #210
20090280628
2009-11-12

Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking

 #211
20090266298
2009-10-29

PLASMA DOPING APPARATUS

 #212
20090233385
2009-09-17

Plasma doping method and plasma doping apparatus

 #213
20090233383
2009-09-17

Plasma Doping Method and Apparatus

 #214
20090227094
2009-09-10

Use of chained implants in solar cells

 #215
20090215251
2009-08-27

Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking

 #216
20090206281
2009-08-20

VAPOR DELIVERY SYSTEM USEFUL WITH ION SOURCES AND VAPORIZERS FOR USE IN SUCH SYSTEM

 #217
20090200494
2009-08-13

TECHNIQUES FOR COLD IMPLANTATION OF CARBON-CONTAINING SPECIES

 #218
20090200461
2009-08-13

Closed loop control and process optimization in plasma doping processes using a time of flight ion detector

 #219
20090197401
2009-08-06

Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces

 #220
20090197010
2009-08-06

Plasma immersion ion implantation using an electrode with edge-effect suppression by a downwardly curving edge

 #221
20090195777
2009-08-06

DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER IN CONJUNCTION WITH ION CURRENT

 #222
20090186469
2009-07-23

Apparatus and method for doping

 #223
20090186426
2009-07-23

Plasma doping method and apparatus employed in the same

 #224
20090181526
2009-07-16

Plasma Doping Method and Apparatus

 #225
20090179157
2009-07-16

Vapor delivery to devices under vacuum

 #226
20090176355
2009-07-09

Plasma doping device with gate shutter

 #227
20090140174
2009-06-04

Impurity Introducing Apparatus and Impurity Introducing Method

 #228
20090120367
2009-05-14

Plasma immersion ion implantation reactor with extended cathode process ring

 #229
20090104783
2009-04-23

Asher, Ashing Method and Impurity Doping Apparatus

 #230
20090104761
2009-04-23

Plasma Doping System With Charge Control

 #231
20090068823
2009-03-12

Plasma Ion Doping Method and Apparatus

 #232
20090068769
2009-03-12

Method and apparatus for plasma processing

 #233
20090061605
2009-03-05

Profile adjustment in plasma ion implanter

 #234
20090042321
2009-02-12

APPARATUS AND METHOD FOR PLASMA DOPING

 #235
20090035878
2009-02-05

Plasma Doping Method and Apparatus

 #236
20090008577
2009-01-08

Conformal Doping Using High Neutral Density Plasma Implant

 #237
20090004836
2009-01-01

PLASMA DOPING WITH ENHANCED CHARGE NEUTRALIZATION

 #238
20090001890
2009-01-01

Apparatus for Plasma Processing a Substrate and a Method Thereof

 #239
20090000946
2009-01-01

PLASMA PROCESSING WITH ENHANCED CHARGE NEUTRALIZATION AND PROCESS CONTROL

 #240
20080318399
2008-12-25

PLASMA DOPING METHOD

 #241
20080318345
2008-12-25

PLASMA ION IMPLANTATION PROCESS CONTROL USING REFLECTOMETRY

 #242
20080317968
2008-12-25

TILTED PLASMA DOPING

 #243
20080315127
2008-12-25

Ion Implanter Operating in Pulsed Plasma Mode

 #244
20080296510
2008-12-04

Ion Implantation System and Ion Implantation System

 #245
20080296484
2008-12-04

Ion implantation system and method of monitoring implant energy of an ion implantation device

 #246
20080289576
2008-11-27

Plasma based ion implantation system

 #247
20080286982
2008-11-20

Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor

 #248
20080233723
2008-09-25

PLASMA DOPING METHOD AND APPARATUS

 #249
20080226835
2008-09-18

Production Method of Material Film and Production Apparatus of Material Film

 #250
20080210167
2008-09-04

Impurity introducing apparatus and impurity introducing method

 #251
20080200015
2008-08-21

Multi-step plasma doping with improved dose control

 #252
20080194086
2008-08-14

Method of Introducing Impurity

 #253
20080193666
2008-08-14

Apparatus and method for focused electric field enhanced plasma-based ion implantation

 #254
20080188013
2008-08-07

In-situ dose monitoring using optical emission spectroscopy

 #255
20080185537
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