205325 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources Arrangement for selecting ions or species in the plasma
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#2INHIBITOR-FREE GAPFILL PROCESS METHOD AND HARDWARE
#3PLASMA PROCESSING DEVICE AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#4PLASMA PROCESSING APPARATUS
#5Single Process Chamber for Dielectric Material Etching Using a Capacitively Coupled Plasma and Radical-Based Highly Selective Etching
#6System and Method for Atomic Layer Etching and Radical-Based Highly Selective Etching in a Single Process Chamber
#7Atomic Layer Process Chamber for Optimal Etching and Deposition with Controlled Ion and Radical Exposure
#8Chamber with Grounded Ion Filter for Enhanced Atomic Layer Etching Processes
#9APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING PLASMA
#10Filter Circuit and Plasma Processing Apparatus
#11PLASMA SUPPLY APPARATUS AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME
#12INERT RADICAL ASSISTED CVD LOW K FILM DEPOSITION
#13GAS DISTRIBUTION MODULE, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS
#14SEMICONDUCTOR MANUFACTURING EQUIPMENT
#15Device for Performing Plasma Treatment, and Method for Performing Plasma Treatment
#16PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#17PLASMA-ASSISTED ETCHING OF METAL OXIDES
#18RADICAL-ACTIVATED ETCHING OF METAL OXIDES
#19ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
#20METHOD AND DEVICE FOR THIN FILM PROCESS INCLUDING ACTIVATED PROTON ASSIST PLASMA ETCHING
#21SELECTIVE DEPOSITION USING DIFFERENTIAL SURFACE CHARGING
#22PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME
#23SEMICONDUCTOR PROCESSING APPARATUS
#24APPARATUS AND METHOD FOR MODULATING IONS AND RADICAL SPECIES IN PLASMAS
#25SHOWERHEAD STRUCTURE AND APPARATUS FOR TREATING SUBSTRATE
#26APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
#27Plasma Strip Tool With Movable Insert
#28Oxidation-Reduction Adjustable Plasma
#29GRID FOR SEMICONDUCTOR PROCESS
#30RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
#31REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
#32Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
#33APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES
#34ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME, AND METHOD FOR TREATING SUBSTRATE USING THE SAME
#35METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TARGET LAYER
#36ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER
#37APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
#38Wafer Bonding Apparatus and Method
#39Ion Beam Etching Apparatus And Method
#40ION BEAM ETCH SYSTEM AND METHOD
#41Apparatus and Methods for Plasma Processing
#42INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL AND PRECURSOR GAS TO A DOWNSTREAM CHAMBER TO ENABLE REMOTE PLASMA FILM DEPOSITION
#43SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREAM PLASMA
#44PLASMA PROCESSING IMPROVEMENT
#45SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD
#46Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
#47Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
#48Processing chamber with multiple plasma units
#49MODIFYING PATTERNED FEATURES USING A DIRECTIONAL ETCH
#50SUBSTRATE PROCESSING APPARATUS
#51SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#52METHOD FOR ETCHING ATOMIC LAYER
#53PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#54PECVD COATING SYSTEM AND COATING METHOD
#55HIGH VOLTAGE PLASMA CONTROL
#56SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE BY USING THE SAME
#57APPARATUS FOR TREATING SUBSTRATE
#58System And Methods Using An Inline Surface Engineering Source
#59Substrate Bombardment with Ions having Targeted Mass using Pulsed Bias Phase Control
#60Ion beam source, substrate process apparatus including the same, and method of processing a substrate using the same
#61PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#62Substrate processing with material modification and removal
#63TREATMENT METHODS FOR SILICON NANOSHEET SURFACES
#64PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT
#65SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#66EXTRACTION GRID
#67NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH
#68METHODS AND SYSTEMS FOR DRY ETCHING
#69Plasma-Enhanced Chemical Vapor Deposition for Structurally-Complex Substrates
#70Plasma-Assisted Etching Of Metal Oxides
#71PLASMA PROCESSING APPARATUS
#72ETCHING APPARATUS AND ETCHING METHOD USING THE SAME
#73Methods and systems for transmission and detection of free radicals
#74Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
#75ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
#76RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
#77Methods To Provide Anisotropic Etching Of Metal Hard Masks Using A Radio Frequency Modulated Pulsed Plasma Scheme
#78Showerhead assembly with heated showerhead
#79Apparatus and method for processing substrate using plasma
#80SUBSTRATE PROCESSING APPARATUS AND METHOD USING THE PLASMA
#81OPTIMIZING EDGE RADICAL FLUX IN A DOWNSTREAM PLASMA CHAMBER
#82PLASMA PROCESSING APPARATUS
#83REMOTE PLASMA SOURCE SHOWERHEAD ASSEMBLY WITH ALUMINUM FLUORIDE PLASMA EXPOSED SURFACE
#84Plasma shaper to control ion flux distribution of plasma source
#85PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
#86RESIDUE-FREE REMOVAL OF STIMULUS RESPONSIVE POLYMERS FROM SUBSTRATES
#87Substrate treating apparatus and substrate treating method
#88FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS
#89Apparatus and method for processing substrate using plasma
#90Remote source pulsing with advanced pulse control
#91Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
#92Substrate treating method and substrate treating apparatus
#93APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
#94Compact low angle ion beam extraction assembly and processing apparatus
#95METHOD AND APPARATUS FOR GENERATING PLASMA WITH ION BLOCKER PLATE
#96WATER VAPOR PLASMA TO ENHANCE SURFACE HYDROPHILICITY
#97METHOD AND APPARATUS FOR TREATING SUBSTRATE
#98Ion beam etching apparatus and method
#99SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
#100APPARATUS FOR TREATING SUBSTRATE
#101Wafer bonding apparatus and method
#102SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
#103APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
#104Dry etching method using potential control of grid and substrate
#105SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
#106DUAL PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL
#107Processing chamber with multiple plasma units
#108Plasma processing method and plasma processing apparatus
#109Plasma processing method and plasma processing apparatus
#110Plasma system and filter device
#111PROCESSING TOOL CAPABLE FOR FORMING CARBON LAYERS ON SUBSTRATES
#112Plasma processing apparatus
#113Charged particle beam source, surface processing apparatus and surface processing method
#114RADICAL-ACTIVATED ETCHING OF METAL OXIDES
#115Wafer processing apparatus
#116PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING
#117Apparatus for ion energy analysis of plasma processes
#118ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
#119SUBSTRATE PROCESSING TOOL CAPABLE OF MODULATING ONE OR MORE PLASMA TEMPORALLY AND/OR SPATIALLY
#120LOW CURRENT HIGH ION ENERGY PLASMA CONTROL SYSTEM
#121Method and apparatus for chemical vapour deposition
#122Apparatus for ion energy analysis of plasma processes
#123APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING PLASMA
#124Substrate processing system including dual ion filter for downstream plasma
#125Atomic layer deposition using a substrate scanning system
#126Plasma strip tool with movable insert
#127Generation of Hydrogen Reactive Species For Processing of Workpieces
#128Plasma Strip Tool with Multiple Gas Injection
#129Methods for depositing dielectric material
#130TECHNIQUES AND APPARATUS FOR ELONGATION PATTERNING USING ANGLED ION BEAMS
#131REACTIVITY ENHANCEMENT IN ION BEAM ETCHER
#132Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
#133Systems and methods for selective ion mass segregation in pulsed plasma atomic layer etching
#134Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
#135Methods And Apparatus For Pulsed Inductively Coupled Plasma For Surface Treatment Processing
#136Plasma processing apparatus and plasma processing method
#137Plasma processing apparatus and plasma processing method
#138System and methods using an inline surface engineering source
#139APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
#140System for controlling radicals using a radical filter
#141Method and apparatus for selective nitridation process
#142Dual plasma pre-clean for selective gap fill
#143Processing Chamber With Multiple Plasma Units
#144Plasma processing method and plasma processing apparatus
#145Vacuum processing apparatus
#146Plasma immersion methods for ion implantation
#147PLASMA PROCESSING APPARATUS AND METHOD
#148Methods of optical device fabrication using an electron beam apparatus
#149PLASMA PROCESSING APPARATUS
#150Apparatus and system having extraction assembly for wide angle ion beam
#151Radical assist ignition plasma system and method
#152Plasma processing method and plasma processing apparatus
#153Methods for tuning plasma potential using variable mode plasma chamber
#154Plasma Processing Apparatus With Post Plasma Gas Injection
#155METHOD OF ETCHING POROUS FILM
#156IMPROVED GUIDANCE OF IONS FROM A PLASMA TO A SUBSTRATE TO BE COATED
#157LOW-TEMPERATURE IONIZATION OF METASTABLE ATOMS EMITTED BY AN INDUCTIVELY COUPLED PLASMA ION SOURCE
#158Method of manufacturing mold for diffraction grating light guide plate and method of manufacturing diffraction grating light guide plate
#159Substrate processing apparatus
#160Ion filter using aperture plate with plurality of zones
#161ATOMIC LAYER ETCHING METHODS AND APPARATUS
#162Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece
#163Single beam plasma source
#164REACTIVITY ENHANCEMENT IN ION BEAM ETCHER
#165APPARATUS AND METHODS FOR DEFINING A PLASMA
#166Silicon mandrel etch after native oxide punch-through
#167Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
#168Methods of optical device fabrication using an electron beam apparatus
#169Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces
#170Methods of optical device fabrication using an ion beam source
#171Electron beam apparatus for optical device fabrication
#172CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURFACE PROCESSING METHOD
#173Dynamic random access device including two-dimensional array of fin structures
#174Metal contact landing structure
#175Charged particle beam apparatus
#176Hybrid electron beam and RF plasma system for controlled content of radicals and ions
#177Substrate processing apparatus and substrate processing method
#178Plasma processing apparatus and method
#179System and method for precision formation of a lattice on a substrate
#180Methods for depositing dielectric material
#181Methods for controlling an end-to-end distance in semiconductor device
#182SELECTIVE ION FILTERING IN A MULTIPURPOSE CHAMBER
#183Ion-ion plasma atomic layer etch process
#184System and methods using an inline surface engineering source
#185Generation of hydrogen reactive species for processing of workpieces
#186Techniques and apparatus for elongation patterning using angled ion beams
#187Selective ion filtering in a multipurpose chamber
#188Method of forming a pattern
#189Plasma processing apparatus and plasma processing method
#190PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#191Processing of workpieces with reactive species generated using alkyl halide
#192Method for ion mass separation and ion energy control in process plasmas
#193Dry plasma etch method to pattern MRAM stack
#194Selective atomic layer etching of semiconductor materials
#195Plasma-activated saline solutions and method of making plasma activated saline solutions
#196Plasma processing system, electron beam generator, and method of fabricating semiconductor device
#197METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FOR PERFORMING THE SAME
#198Methods for controlling an end-to-end distance in semiconductor device
#199Method and apparatus for forming semiconductor structure
#200Vacuum processing apparatus
#201Ion beam etch without need for wafer tilt or rotation
#202Ion beam apparatus including slit structure for extracting ion beam
#203DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
#204Substrate Processing Apparatus
#205Methods for controlling an end-to-end distance in semiconductor device
#206Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation
#207Linearized energetic radio-frequency plasma ion source
#208Techniques and structure for forming dynamic random access device
#209Reactivity enhancement in ion beam etcher
#210Plasma processing apparatus and method of manufacturing semiconductor device using the same
#211Oxygen treatment for nitride etching
#212Controlling ion energy within a plasma chamber
#213Method and apparatus for selective nitridation process
#214Shower head, processing apparatus, and shower plate
#215System and method for precision formation of a lattice on a substrate
#216Methods for manufacturing semiconductor devices having three-dimensionally arranged memory cells
#217Method of forming a pattern
#218Germanium etching systems and methods
#219Ion beam etching apparatus
#220Method of Using a Barrier-Seed Tool for Forming Fine Pitched Metal Interconnects
#221Method and apparatus for plasma dicing a semi-conductor wafer
#222Tantalum-containing material removal
#223Apparatus and techniques for anisotropic substrate etching
#224Plasma strip tool with uniformity control
#225Plasma processing apparatus with post plasma gas injection
#226Method of controlling an implanter operating in plasma immersion
#227Plasma Processing Apparatus
#228Plasma Strip Tool With Multiple Gas Injection Zones
#229HIGH DEPOSITION RATE HIGH QUALITY SILICON NITRIDE ENABLED BY REMOTE NITROGEN RADICAL SOURCE
#230GAS ADDITIVES FOR SIDEWALL PASSIVATION DURING HIGH ASPECT RATIO CRYOGENIC ETCH
#231Ion implanter and ion implantation method
#232Techniques for manipulating patterned features using ions
#233ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR
#234ION SOURCE SPUTTERING
#235Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing
#236Directional deposition on patterned structures
#237PROCESSING DEVICE AND COLLIMATOR
#238Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus
#239Method of processing a substrate using an ion beam and apparatus for performing the same
#240Plasma processing apparatus and plasma processing method
#241Techniques for processing substrates using directional reactive ion etching
#242Atomic layer etching methods and apparatus
#243Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
#244Ion injector and lens system for ion beam milling
#245Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
#246Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
#247System and method for selective nitride etch
#248PLACING UNIT AND PLASMA PROCESSING APPARATUS
#249RF ion source with dynamic volume control
#250A METHOD AND A DEVICE FOR COATING AN ENDOPROSTHESIS HAVING A BASE BODY
#251Plasma doping using a solid dopant source
#252Method and system for in situ formation of gas-phase compounds
#253Techniques for processing a polycrystalline layer using an angled ion beam
#254Material deposition for high aspect ratio structures
#255LARGE AREA ENERGETIC ION SOURCE
#256Apparatus for radical-based deposition of dielectric films
#257Angle control for radicals and reactive neutral ion beams
#258Plasma processing apparatus
#259MAGNET USED WITH A PLASMA CLEANER
#260Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
#261Methods and systems for transmission and detection of free radicals
#262Dry plasma etch method to pattern MRAM stack
#263ION TO NEUTRAL CONTROL FOR WAFER PROCESSING WITH DUAL PLASMA SOURCE REACTOR
#264Macroparticle filter device and method for use in cathodic arc deposition
#265Ion beam etching utilizing cryogenic wafer temperatures
#266Diamond like carbon layer formed by an electron beam plasma process
#267Ion implant system having grid assembly
#268Method for plasma etching a workpiece
#269Two-step fluorine radical etch of hafnium oxide
#270Method for manufacturing semiconductor device, ion beam etching device, and control device
#271Negative ribbon ion beams from pulsed plasmas
#272Radio frequency extraction system for charge neutralized ion beam
#273RPS assisted RF plasma source for semiconductor processing
#274HKMG integration
#275Charged particle beam apparatus and plasma ignition method
#276Substrate processing apparatus
#277SUBSTRATE PROCESSING APPARATUS
#278Substrate processing method
#279Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces
#280Filter apparatus for arc ion evaporator used in cathodic arc plasma deposition system
#281Semiconductor processing systems having multiple plasma configurations
#282Device for anisotropically etching a substrate, and method for operating a device for anisotropically etching a substrate
#283Ion to neutral control for wafer processing with dual plasma source reactor
#284Substrate processing chamber including multiple gas injection points and dual injector
#285ION SOURCE
#286Ion beam apparatus generating ion beams of bilateral symmetry
#287Techniques for controlling ion/neutral ratio of a plasma source
#288PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO
#289Method and system for in-situ formation of intermediate reactive species
#290UNIFORM LOW ELECTRON TEMPERATURE PLASMA SOURCE WITH REDUCED WAFER CHARGING AND INDEPENDENT CONTROL OVER RADICAL COMPOSITION
#291Ion generator and method of controlling ion generator
#292RPS assisted RF plasma source for semiconductor processing
#293Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
#294Ion beam etching method and ion beam etching apparatus
#295PLASMA REACTOR FOR PROCESSING A WORKPIECE WITH AN ARRAY OF PLASMA POINT SOURCES
#296Ion beam etching devices
#297Method and system for controlling ion flux in an RF plasma
#298Systems and methods for selectively etching tungsten in a downstream reactor
#299Cyclical plasma etching
#300PLASMA-BASED PROCESSING SYSTEM AND OPERATION METHOD THEREOF