Mono-energetic neutral beam activated chemical processing system and method of using

Use of ion beam etching to generate gate-all-around structure

Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications

Negative ribbon ion beams from pulsed plasmas

Pulsed remote plasma method and system

Plasma processing apparatus and method

Controlling ion energy within a plasma chamber

Plasma processing apparatus and plasma processing method

Method of using a barrier-seed tool for forming fine pitched metal interconnects

Radical generator and molecular beam epitaxy apparatus

Plasma processing apparatus and plasma processing method

Non-planar radial-flow plasma treatment system

Methods Of Affecting Material Properties And Applications Therefor

Ion injector and lens system for ion beam milling

Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films

Semiconductor processing with DC assisted RF power for improved control

Energetic negative ion impact ionization plasma

Ion-ion plasma atomic layer etch process and reactor

Methods for etch of SiN films

Silicon selective removal

MULTI-GRID ASSEMBLY IN PLASMA SOURCE SYSTEM AND METHODS FOR IMPROVING SAME

Plasma ion source and charged particle beam apparatus

Selective deposition utilizing masks and directional plasma treatment

Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber

Oxide and metal removal

ION BEAM ETCHING SYSTEM

Grid for plasma ion implant

Internal plasma grid for semiconductor fabrication

In situ control of ion angular distribution in a processing apparatus

Ion implant system having grid assembly

Plasma processing apparatus and plasma processing method

Method of forming a pattern using ion beams of bilateral symmetry, a method of forming a magnetic memory device using the same, and an ion beam apparatus generating ion beams of bilateral symmetry

PRE-CLEANING CHAMBER AND A SEMICONDUCTOR PROCESSING APPARATUS CONTAINING THE SAME

Material modification by neutral beam source with selected collision angle

Air gap formation in interconnection structure by implantation process

Internal plasma grid for semiconductor fabrication

Method and apparatus for plasma dicing a semi-conductor wafer

Material deposition for high aspect ratio structures

Guard aperture to control ion angular distribution in plasma processing

Etching apparatus and etching method

Internal plasma grid applications for semiconductor fabrication

Ion injector and lens system for ion beam milling

Ion beam etch without need for wafer tilt or rotation

Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control

Method and system for in situ formation of gas-phase compounds

Techniques and apparatus for anisotropic metal etching

Plasma generation chamber with smooth plasma resistant coating

Techniques and apparatus for anisotropic metal etching

Helmholtz coil assisted PECVD carbon source

Method and apparatus for ESC charge control for wafer clamping

Layer-forming device and layer-forming method

Multiple point gas delivery apparatus for etching materials

Apparatus for radical-based deposition of dielectric films

Method and apparatus for plasma dicing a semi-conductor wafer

Bias voltage frequency controlled angular ion distribution in plasma processing

Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods

Dual chamber plasma etcher with ion accelerator

Dual chamber plasma etcher with ion accelerator

Non-local plasma oxide etch

Apparatus and method for mass analyzed ion beam

Directional treatment for multi-dimensional device processing

Methods for etch of metal and metal-oxide films

Method for manufacturing semiconductor device, ion beam etching device, and control device

Ion beam processing method and ion beam processing apparatus

Grid assembly and ion beam etching apparatus

Temperature ramping using gas distribution plate heat

RPS assisted RF plasma source for semiconductor processing

Methods for etch of sin films

Ion beam etching system

In situ control of ion angular distribution in a processing apparatus

Plasma processing method and plasma processing apparatus

Mask removal process strategy for vertical NAND device

Plasma cathode charged particle lithography system

Deposition device and deposition method

Ion to neutral control for wafer processing with dual plasma source reactor

Techniques for processing substrates using directional reactive ion etching

Ion implant system having grid assembly

Dynamic electrode plasma system

Dual chamber plasma etcher with ion accelerator

Biasing system for a plasma processing apparatus

Controlling ion energy within a plasma chamber

Control module for an ion implanter

Electron beam plasma source with remote radical source

Filtered cathodic arc deposition apparatus and method

Method of controlling an ion implanter in plasma immersion mode

Method and system for modifying substrate relief features using ion implantation

Internal plasma grid for semiconductor fabrication

Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing

Techniques to mitigate straggle damage to sensitive structures

Method for implementing low dose implant in a plasma system

Apparatus and techniques for energetic neutral beam processing

Scalable and uniformity controllable diffusion plasma source

Pulsed remote plasma method and system

Method and systems for in-situ formation of intermediate reactive species

Remote plasma radical treatment of silicon oxide

Semiconductor processing systems having multiple plasma configurations

Method of fabricating fin FET and method of fabricating device

Grid for plasma ion implant

Non-local plasma oxide etch

Method and apparatus for plasma dicing a semi-conductor wafer

Low profile magnetic filter

Biasing system for a plasma processing apparatus

Machine for implanting ions in plasma immersion mode for a low-pressure method

Plasma deposition on a partially formed battery through a mesh screen

Plasma processing apparatus and plasma processing method

Systems and methods for calibrating a switched mode ion energy distribution system

Plasma processing device

ANISOTROPIC SURFACE ENERGY MODULATION BY ION IMPLANTATION

DEVICE FOR THE ELIMINATION OF LIQUID DROPLETS FROM A CATHODIC ARC PLASMA SOURCE

Three dimensional metal deposition technique

Techniques for treating sidewalls of patterned structures using angled ion treatment

Excited gas injection for ion implant control

Plasma potential modulated ion implantation system

Method and system for modifying photoresist using electromagnetic radiation and ion implantation

Apparatus and method for controllably implanting workpieces

Method and apparatus for plasma dicing a semi-conductor wafer

Method and apparatus for plasma dicing a semi-conductor wafer

Apparatus for forming gas blocking layer and method thereof

Semiconductor processing system with source for decoupled ion and radical control

Dose measurement device for plasma-immersion ion implantation

Semiconductor processing system and methods using capacitively coupled plasma

Apparatus and method for charge neutralization during processing of a workpiece

Remote plasma radical treatment of silicon oxide

SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION

Transformer-coupled RF source for plasma processing tool

Semiconductor processing system and methods using capacitively coupled plasma

RADICAL PASSING DEVICE AND SUBSTRATE PROCESSING APPARATUS

Method and system for modifying resist openings using multiple angled ions

Method and apparatus for selective nitridation process

Distributed, concentric multi-zone plasma source systems, methods and apparatus

MULTI-GRID ASSEMBLY IN PLASMA SOURCE SYSTEM AND METHODS FOR IMPROVING SAME

Projected plasma source

METHODS AND APPARATUS FOR CONTROLLING PHOTORESIST LINE WIDTH ROUGHNESS WITH ENHANCED ELECTRON SPIN CONTROL

Methods of affecting material properties and applications therefor

PLASMA PROCESSING METHOD

TEMPERATURE CONTROLLING METHOD AND PLASMA PROCESSING SYSTEM

Apparatus and method for multiple slot ion implantation

Methods for etch of metal and metal-oxide films

Methods for etch of sin films

Method and apparatus for plasma dicing a semi-conductor wafer

Plasma processing apparatus

Plasma CVD device and method of manufacturing silicon thin film

SEMICONDUCTOR DEVICE, POWER SUPPLY DEVICE, AMPLIFIER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma processing method and plasma processing apparatus

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUPLED PLASMA

VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

Method of ionization

HYDROPHOBIC PROPERTY ALTERATION USING ION IMPLANTATION

Apparatus and Method For Incorporating Composition Into Substrate Using Neutral Beams

Method for ion implant using grid assembly

Ion implant system having grid assembly

Plasma treatment system

Plasma processing apparatus and method of producing amorphous silicon thin film using same

Thin-film manufacturing method and apparatus

ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

Method and system for modifying photoresist using electromagnetic radiation and ion implantation

Plasma deposition

Method for fabricating semiconductor device and plasma doping apparatus

Distributed multi-zone plasma source systems, methods and apparatus

Systems, methods and apparatus for separate plasma source control

Plasma processing device, plasma processing method and method of manufacturing element including substrate to be processed

Plasma Etching Apparatus

Plasma processing apparatus and method

Apparatus for controlling the temperature of an RF ion source window

Method and system for modifying substrate relief features using ion implantation

Plasma processing method and apparatus

Ion implantation through laser fields

ATOMIC LAYER ETCHING APPARATUS AND ETCHING METHOD USING THE SAME

Insulator interposed type plasma processing apparatus

Switchable Neutral Beam Source

Method for modifying an etch rate of a material layer using energetic charged particles

Apparatus and method for improving photoresist properties using a quasi-neutral beam

Method and apparatus for photomask plasma etching

Workpiece patterning with plasma sheath modulation

Method for depositing film

Apparatus and method for controllably implanting workpieces

DEPOSITION APPARATUS AND MANUFACTURING METHOD OF THIN FILM DEVICE

DEVICE FOR FORMING FILM

SYSTEM AND METHOD FOR PRE-IONIZATION OF SURFACE WAVE LAUNCHED PLASMA DISCHARGE SOURCES

Plasma grid implant system for use in solar cell fabrications

ETCHING LOW-K DIELECTRIC OR REMOVING RESIST WITH A FILTERED IONIZED GAS

Grounded confinement ring having large surface area

Carbon nanotube growing process, and carbon nanotube bundle formed substrate

SHOWERHEAD, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SHOWERHEAD, AND PLASMA SUPPLYING METHOD USING THE SHOWERHEAD

REMOTE PLASMA APPARATUS FOR PROCESSING SUBSTRATE WITH TWO TYPES OF GASES

Plasma treatment system

Excited gas injection for ion implant control

Plasma generating apparatus

CAPACITIVELY COUPLED REMOTE PLASMA SOURCE WITH LARGE OPERATING PRESSURE RANGE

NF3/H2 REMOTE PLASMA PROCESS WITH HIGH ETCH SELECTIVITY OF PSG/BPSG OVER THERMAL OXIDE AND LOW DENSITY SURFACE DEFECTS

Substrate processing apparatus and cleaning method of the same

Remote Plasma Apparatus for Manufacturing Solar Cells

MICROWAVE PLASMA CONTAINMENT SHIELD SHAPING

Technique for monitoring and controlling a plasma process with an ion mobility spectrometer

PLASMA PROCESSING METHOD AND APPARATUS

Vacuum processing apparatus

Substrate processing apparatus, and magnetic recording medium manufacturing method

Multi-plasma neutral beam source and method of operating

Technique for Monitoring and Controlling A PLasma Process

Ion source and plasma processing apparatus

Two-grid ion energy analyzer and methods of manufacturing and operating

Ion energy analyzer and methods of manufacturing and operating

Mono-energetic neutral beam activated chemical processing system and method of using

Method to improve mask critical dimension uniformity (CDU)

APPARATUS AND METHOD FOR INCORPORATING COMPOSITION INTO SUBSTRATE USING NEUTRAL BEAMS

Processing system for producing a negative ion plasma

Method and apparatus for spacer-optimization (S-O)

FILTERED CATHODIC ARC DEPOSITION WITH ION-SPECIES-SELECTIVE BIAS

Plasma gun

Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Surface-treating apparatus

TECHNIQUE FOR USING AN IMPROVED SHIELD RING IN PLASMA-BASED ION IMPLANTATION

Hyperthermal neutral beam source and method of operating

Plasma Doping With Electronically Controllable Implant Angle

Method and apparatus for photomask plasma etching

Method and apparatus for photomask plasma etching

ION ANALYSIS SYSTEM BASED ON ANALYZER OF ION ENERGY DISTRIBUTION USING RETARDED ELECTRIC FIELD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Technique for monitoring and controlling a plasma process

Ion sources and methods for generating an ion beam with a controllable ion current density distribution

Apparatus and Method for Manufacturing Semiconductor Device

Carbon beam deposition chamber for reduced defects

Remote plasma pre-clean with low hydrogen pressure

Apparatus and a method for cleaning a dielectric film

Remote plasma apparatus for processing substrate with two types of gases

Plasma doping method and plasma doping apparatus for performing the same

Neutral particle beam processing apparatus

Hyperthermal neutral beam source and method of operating

PROCESSING APPARATUS

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Neutral beam etching device for separating and accelerating plasma

Plasma processing apparatuses and methods

Reflector for generating a neutral beam and substrate processing apparatus including the same

Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric films

System and method for reducing metal oxides with hydrogen radicals

Plasma treatment processing apparatus

Plasma processing apparatus and method

Plasma processing apparatuses and methods

Plasma processing method and apparatus

Method and apparatus for photomask plasma etching

Plasma treatment system

Method and system of forming semiconductor wiring, method and system of fabricating semiconductor device, and wafer

Neutral beam source having electromagnet used for etching semiconductor device

Plasma processing apparatus and method of designing the same

Getter metal alloy coating and device and method for the production thereof

Processing apparatus and method

Remote plasma apparatus for processing substrate with two types of gases

Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric films

Etching method and apparatus

Silicon pretreatment for nitride removal

RF ion source with dynamic volume control

Powered anode for ion source for DLC and reactive processes