Microwave plasma spectrometer using dielectric resonator

Bevel etch profile control

Plasma processing device

RADICAL ASSISTED CURE OF DIELECTRIC FILMS

Additively manufactured gas distribution manifold

Apparatus and method of manufacturing display apparatus

Vapor phase growth apparatus, method of manufacturing epitaxial wafer, and attachment for vapor phase growth apparatus

Deposition apparatus and deposition method using the same

Method of processing substrate

Chamber with flow-through source

RF CHOKE FOR GAS DELIVERY TO AN RF DRIVEN ELECTRODE IN A PLASMA PROCESSING APPARATUS

Method of removal of sharp corners from diffuser plate

Method for processing workpiece

Geometrically selective deposition of dielectric films utilizing low frequency bias

Two channel cosine-theta coil assembly

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

Ex situ coating of chamber components for semiconductor processing

Plasma treatment apparatus

Source material container

Antenna and plasma deposition apparatus

Plasma source and semiconductor processing apparatus

Gas splitting by time average injection into different zones by fast gas valves

Mechanical suppression of parasitic plasma in substrate processing chamber

Advanced coating method and materials to prevent HDP-CVD chamber arcing

Gas injector

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

Support unit and substrate treating apparatus comprising the same

Methods of encapsulation

Multi-zone reactor, system including the reactor, and method of using the same

Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device

Gas spraying apparatus for substrate processing apparatus and substrate processing apparatus

Methods and systems for material property profiling of thin films

Electrostatic chucks and substrate processing apparatus including the same

Substrate processing method and substrate processing apparatus

Grounding cap module, gas injection device and etching apparatus

Deposition apparatus including upper shower head and lower shower head

Mechanism for creating vacuum in processing apparatus

INSULATED SEMICONDUCTOR FACEPLATE DESIGNS

Gas supply system and gas supply method

Substrate treating apparatus and method

Liner assemblies for substrate processing systems

Hydrogenated isotopically enriched boront trifluoride dopant source gas composition

SUBSTRATE PROCESSING APPARATUS

Substrate treating apparatus and substrate treating method

SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR FORMING FILMS

Plasma generator

System and method for substrate processing chambers

PURGE AND PUMPING STRUCTURES ARRANGED BENEATH SUBSTRATE PLANE TO REDUCE DEFECTS

Plasma reactor with highly symmetrical four-fold gas injection

Plasma processing system, electron beam generator, and method of fabricating semiconductor device

Horizontal heat choke faceplate design

Film deposition apparatus for fine pattern forming

Substrate processing apparatus and substrate processing method

Electrode for plasma processing chamber

Batch type plasma substrate processing apparatus

Integrated circuit fabrication system with adjustable gas injector

SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Process and related device for removing by-product on semiconductor processing chamber sidewalls

Ultra-localized and plasma uniformity control in a plasma processing system

Plasma processing apparatus

Plasma processing-apparatus processing object support platform, plasma processing apparatus, and plasma processing method

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER STORAGE MEDIUM

Heat shield for chamber door and devices manufactured using same

Film deposition apparatus for fine pattern forming

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

System for coupling a voltage to portions of a substrate

SUBSTRATE SUPPORT WITH COOLED AND CONDUCTING PINS

Plasma etching method and plasma etching apparatus

High-k dielectric layer, fabricating method thereof and multi-function equipment implementing such fabricating method

Integrated Thermal Management for Surface Treatment with Atmospheric Plasma

Apparatus for thermal control of tubing assembly and associated methods

Shower head, processing apparatus, and shower plate

Graphene structure forming method and graphene structure forming apparatus

Plasma processing apparatus having injection ports at both sides of the ground electrode for batch processing of substrates

Film forming apparatus and film forming method

Plasma polymerization coating apparatus and process

Substrate inspection apparatus and substrate processing system including the same

Plasma processing device

Plasma etching method and method of fabricating semiconductor device

Method of manufacturing semiconductor device and semiconductor manufacturing apparatus

Multi regime plasma wafer processing to increase directionality of ions

Sputtering apparatus including gas distribution system

PLASMA PROCESSING APPARATUS

Reaction chamber and semiconductor processing apparatus

INTERCHANGEABLE HOT FILAMENTS CVD REACTOR

Substrate processing apparatus

INTEGRATED EPITAXY SYSTEM HIGH TEMPERATURE CONTAMINANT REMOVAL

Apparatus and methods for fertilizer production

Distributed electrode array for plasma processing

Distributed electrode array for plasma processing

SHOWER HEAD AND VACUUM PROCESSING APPARATUS

GAS SUPPLY APPARATUS

System and method for temperature control in plasma processing system

Method for forming metal oxide layer, and plasma-enhanced chemical vapor deposition device

Method for depositing a silicon nitride film and film deposition apparatus

Multi-plate faceplate for a processing chamber

Distributed electrode array for plasma processing

Hybrid corrective processing system and method

Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method

Germanium etching systems and methods

Process window widening using coated parts in plasma etch processes

Substrate treating apparatus and inspection method

PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Ion beam etching apparatus

SOLID-STATE SOURCE OF ATOMIC SPECIE FOR ETCHING

Method of manufacturing semiconductor device, and recording medium

Chamber Cleaning and Semiconductor Etching Gases

Plasma abatement of compounds containing heavy atoms

Apparatus for purging semiconductor process chamber slit valve opening

Etching method

Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same

Method for conditioning a processing chamber for steady etching rate control

Toroidal Plasma Chamber

Apparatus and techniques to treat substrates using directional plasma and point of use chemistry

Substrate support and substrate processing apparatus

PLASMA PROCESSING APPARATUS

Processing tool with electrically switched electrode assembly

Plasma source

Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber

Edge seal configurations for a lower electrode assembly

Plasma health determination in semiconductor substrate processing reactors

OXYGEN COMPATIBLE PLASMA SOURCE

Chamber Cleaning and Semiconductor Etching Gases

Film forming method, film forming apparatus, and storage medium

PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Plasma processing apparatus with post plasma gas injection

Plasma Processing Apparatus

Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching

Plasma Strip Tool With Multiple Gas Injection Zones

Heater block having continuous concavity

SUBSTRATE SUPPORTING DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

Fault detection using showerhead voltage variation

Apparatus and method for gas delivery in semiconductor process chambers

Deposition radial and edge profile tunability through independent control of TEOS flow

Universal optical fiber coating stripper using gliding plasma

Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas

Remote plasma oxidation chamber

Etching method and etching apparatus

Monopole antenna array source with gas supply or grid filter for semiconductor process equipment

Monopole antenna array source for semiconductor process equipment

Monopole antenna array source with phase shifted zones for semiconductor process equipment

Semiconductor processing chamber for multiple precursor flow

Plasma processing apparatus and plasma processing method

Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing

Plasma source for rotating susceptor

Supporting unit and substrate treating apparatus including the same

Insulator structure for avoiding abnormal electrical discharge and plasma concentration

Bevel etch profile control

Processing method in processing apparatus using halogen-based gas

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

Plasma abatement of compounds containing heavy atoms

Apparatus for sterilizing an instrument channel of a surgical scoping device

Layout pattern proximity correction through edge placement error prediction

METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS ON INSULATOR SURFACES

Electrode assembly

Plasma spreading apparatus and method of spreading plasma in process ovens

Process chamber and wafer processing method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Method of processing target object

Etching method

Processing method

HIGH DEPOSITION RATE HIGH QUALITY SILICON NITRIDE ENABLED BY REMOTE NITROGEN RADICAL SOURCE

Seedless particles with carbon allotropes

Sub-pulsing during a state

GAS PHASE PARTICLE REDUCTION IN PECVD CHAMBER

Activated gas generation apparatus and film-formation treatment apparatus

GAS ADDITIVES FOR SIDEWALL PASSIVATION DURING HIGH ASPECT RATIO CRYOGENIC ETCH

Substrate processing apparatus and substrate processing method

Plasma generating unit and substrate treating apparatus comprising the same

Material deposition prevention on a workpiece in a process chamber

Substrate processing apparatus and method for processing substrate

Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP

SHOWER PLATE, SUBSTRATE PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

PLASMA REACTOR WITH ELECTRON BEAM OF SECONDARY ELECTRONS

Gas supply member and gas processing apparatus

Ultrahigh selective nitride etch to form FinFET devices

Liquid processing apparatus including container, first and second electrodes, insulator surrounding at least part of side face of the first electrode, gas supply device, metallic member surrounding part of side face of the first electrode, and power source

Side gas injection kit for multi-zone gas injection assembly

Detachable gas injector used for semiconductor equipment

Etching method

Etching method

Application of bottom purge to increase clean efficiency

Pulsing RF power in etch process to enhance tungsten gapfill performance

Substrate fixture and substrate fixing device

Reactors for plasma-assisted processes and associated methods

Methods and systems for determining a fault in a gas heater channel

Power supply apparatus able to control output current and power supply method using the same

Film forming apparatus

Plasma processing apparatus and plasma processing method

Element chip and manufacturing process thereof

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON CARBIDE FILM

Multi-layer plasma resistant coating by atomic layer deposition

Systems and methods for tuning to reduce reflected power in multiple states

Dry etching method

Apparatus with concentric pumping for multiple pressure regimes

Temperature controlled spacer for use in a substrate processing chamber

Shaped etch profile with oxidation

Plasma processing apparatus

Methods for removing particles from etching chamber

Systems and methods for radial and azimuthal control of plasma uniformity

Microwave chemical processing reactor

Method of controlling an adjustable nozzle and method of making a semiconductor device

Chamber with flow-through source

Extreme ultraviolet light generating device

Microwave plasma source, microwave plasma processing apparatus and plasma processing method

Method of processing target object

Multi-layer plasma resistant coating by atomic layer deposition

Method of preferential silicon nitride etching using sulfur hexafluoride

Substrate treating apparatus and substrate treating method

Gas supply device and substrate processing apparatus

Showerhead having a detachable high resistivity gas distribution plate

Plasma reactor with non-power-absorbing dielectric gas shower plate assembly

Large Sized Showerhead Assembly

Method for inspecting for leaks in gas supply system valves

Chamber conditioning for remote plasma process

Compression member for use in showerhead electrode assembly

APPARATUSES AND METHODS FOR SURFACE TREATMENT

Substrate processing apparatus

Shower plate structure for exhausting deposition inhibiting gas

METHOD FOR SUPPLYING GAS, AND PLASMA PROCESSING APPARATUS

Thermal atomic layer etching processes

Thermal atomic layer etching processes

Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition

Multi-station plasma reactor with RF balancing

Method and system for fabrication semiconductor device

Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source

Heat shield for chamber door and devices manufactured using same

Vacuum processing apparatus

Plasma generating device

System and method for selective nitride etch

PLACING UNIT AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling

Removal methods for high aspect ratio structures

Plasma light up suppression

RF ion source with dynamic volume control

Plasma irradiation apparatus and plasma irradiation method

Microwave chemical processing

Gas supply unit and substrate processing apparatus including the gas supply unit

Photoluminescent carbon nanoparticles and method of preparing the same

PROCESSING SYSTEM

PLASMA PROCESSING DEVICE

Plasma doping using a solid dopant source

Process feed management for semiconductor substrate processing

High conductance process kit

Methods and systems to modulate film stress

Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber

Method and system for in situ formation of gas-phase compounds

PLASMA PROCESSING APPARATUS

ANTI-ARC ZERO FIELD PLATE

Surface treatment apparatus using plasma

High aspect ratio etch

Integrated direct dielectric and metal deposition

Film forming apparatus, cleaning method for film forming apparatus and recording medium

Plasma process apparatus

Cobalt-containing material removal

Oxygen compatible plasma source

Remote plasma based deposition of graded or multi-layered silicon carbide film

Chemical modification of hardmask films for enhanced etching and selective removal

Atmospheric plasma processing systems and methods for manufacture of microelectronic workpieces

Dual-channel showerhead with improved profile

PLASMA SYSTEM

Dual-channel showerhead with improved profile

Plasma generation apparatus and high-frequency power source

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS

Methods and systems for advanced ion control for etching processes

Diffuser With Corner HCG

Sputtering showerhead

Plasma treating a process chamber

Plasma processing method

Methods and systems for advanced ion control for etching processes

Methods and systems for plasma deposition and treatment

Control system for plasma chamber having controllable valve and method of using the same

Substrate processing apparatus and method for manufacturing semiconductor device using the same

Plasma processing method and plasma processing apparatus

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF MANUFACTURING AND USE THEREOF

Modular microwave plasma source

Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching

Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment

Separation Grid for Plasma Chamber

Substrate processing apparatus

Differentially pumped reactive gas injector

Slip ring, support mechanism, and plasma processing apparatus

Substrate processing apparatus and substrate processing method

INDUCTIVELY COUPLED PLASMA CHAMBER HAVING A MULTI-ZONE SHOWERHEAD

Film forming apparatus and gas injection member used therefor

Systems and methods of treating a substrate

SURFACE TREATMENT FOR IMPROVEMENT OF PARTICLE PERFORMANCE

Gas cooled substrate support for stabilized high temperature deposition

Sub-pulsing during a state

SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM

Apparatus for manufacturing a second substrate on a first substrate including removal of the first substrate

DRY ETCHING METHOD

Hollow cathode plasma source

Plasma uniformity control by gas diffuser hole design

Non-thermal soft plasma cleaning

Method for RF power distribution in a multi-zone electrode array