Metal component and manufacturing method thereof and process chamber having the metal component

PLASMA PROCESSING-APPARATUS PROCESSING OBJECT SUPPORT PLATFORM, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD

Plasma processing apparatus and plasma processing method

DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

Gas supply system, substrate processing system and gas supply method

Substrate processing device

Collar, conical showerheads and/or top plates for reducing recirculation in a substrate processing system

Apparatus for depositing metal films with plasma treatment

System and method for substrate support feed-forward temperature control based on RF power

Apparatus and method for deposition and etch in gap fill

Gas supply unit and thin film deposition apparatus including the same

Etching process method

Apparatus and method for processing gas, and storage medium

Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance

Pipe holding connection structure and high frequency antenna device including the same

Plasma film-forming method and plasma film-forming apparatus

Plasma film-forming apparatus and substrate pedestal

Coil filament for plasma enhanced chemical vapor deposition source

PLASMA GENERATOR APPARATUS

Plasma processing apparatus

Gas distribution plate assembly for high power plasma etch processes

Plasma dicing of silicon carbide

Line edge roughness improvement with photon-assisted plasma process

RF power delivery regulation for processing substrates

APPARATUS AND METHOD FOR TREATING WAFER

Substrate processing method

Plasma processing apparatus and particle adhesion preventing method

Substrate processing method

Substrate processing apparatus

Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate

Systems and methods for improved semiconductor etching and component protection

Systems and methods for improved semiconductor etching and component protection

Methods and Apparatus for Variable Selectivity Atomic Layer Etching

PLASMA PROCESSING METHOD

APPARATUS AND METHOD FOR PROGRAMMABLE SPATIALLY SELECTIVE NANOSCALE SURFACE FUNCTIONALIZATION

Apparatus and method for programmable spatially selective nanoscale surface functionalization

Film deposition apparatus

Stand alone microfluidic analytical chip device

PLASMA PROCESSING APPARATUS

Adjustable side gas plenum for edge rate control in a downstream reactor

Antenna, microwave plasma source including the same, plasma processing apparatus, and method of manufacturing semiconductor device

Fluorinated compositions for ion source performance improvements in nitrogen ion implantation

Increasing the gas efficiency for an electrostatic chuck

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

Methods of encapsulation

METHOD TO DEPOSIT CONFORMAL AND LOW WET ETCH RATE ENCAPSULATION LAYER USING PECVD

APPARATUS FOR PLASMA TREATING AND PROCESS FOR PRODUCING MODIFIED PROTEIN STRUCTURE

METHOD OF ETCHING ATOMIC LAYER

Etching substrates using ale and selective deposition

VHF Z-COIL PLASMA SOURCE

APPARATUS AND METHOD FOR TREATING A SUBSTRATE

Method for manufacturing semiconductor device, ion beam etching device, and control device

PLASMA REACTOR HAVING DIVIDED ELECTRODES

Apparatus and techniques to treat substrates using directional plasma and reactive gas

Display device and apparatus and method for manufacturing the same

ELECTRONIC COMPONENT AND MANUFACTURING METHOD THEREOF

Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP

Radio frequency extraction system for charge neutralized ion beam

Plasma processing apparatus and gas introduction mechanism

Effusion cells, deposition systems including effusion cells, and related methods

Film forming method and film forming apparatus

Superhydrophobic compositions and coating process for the internal surface of tubular structures

FOCUS RING ASSEMBLY AND A METHOD OF PROCESSING A SUBSTRATE USING THE SAME

Gas supply mechanism and semiconductor manufacturing system

Gas supply mechanism and semiconductor manufacturing apparatus

Baffle plate and showerhead assemblies and corresponding manufacturing method

Vacuum chuck pressure control system

Semiconductor processing chamber

System and method for plasma discharge in liquid

Semiconductor device manufacturing method and recording medium

Aerosol deposition coating for semiconductor chamber components

Plasma gas jetting device

Plasma processing apparatus and plasma processing method

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

Showerhead, semicondcutor processing apparatus having the same and semiconductor process

Substrate Processing Apparatus

Plasma generating method including generating first plasma without supplying first gas in liquid and generating second plasma in first gas, and plasma generating apparatus

System and method for temperature control in plasma processing system

Non-ambipolar plasma enhanced DC/VHF phasor

Charged particle beam apparatus and plasma ignition method

Plasma processing method

LOCAL DRY ETCHING APPARATUS

POLYGON DEPOSITION SOURCES WITH HIGH MATERIALS UTILIZATION AND INCREASED TIME BETWEEN CHAMBER CLEANINGS

Substrate supporting plate, thin film deposition apparatus including the same, and thin film deposition method

Electrostatic chucks and substrate processing apparatus including the same

Symmetric plasma process chamber

Semiconductor manufacturing apparatus

Method of arranging treatment process

Apparatus for purging semiconductor process chamber slit valve opening

Three-dimensional plasma printer

SUBSTRATE PROCESSING APPARATUS

Plasma processing system workpiece carrier with thermally isolated heater plate blocks

PLASMA PROCESSING APPARATUS AND PRECOATING METHOD

Corrosion-resistant components and methods of making

PLASMA ETCHING METHOD

Showerhead having an extended detachable gas distribution plate

Flow through line charge volume

Variable depth edge ring for etch uniformity control

Rotatable substrate support having radio frequency applicator

Coaxial Hollow Cathode Plasma Assisted Directed Vapor Deposition and Related Method Thereof

Chemical control features in wafer process equipment

Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring

Reaction chamber for chemical vapor apparatus

Contamination removal apparatus and method

Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces

Flow distribution plate for surface fluorine reduction

Systems and methods for internal surface conditioning in plasma processing equipment

Oxide etch selectivity systems and methods

Particle charger

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

Film forming method and film forming apparatus

Methods for igniting a plasma in a substrate processing chamber

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING APPARATUS

Substrate processing apparatus

PLASMA ABATEMENT OF COMPOUNDS CONTAINING HEAVY ATOMS

Dual-feed tunable plasma source

Symmetric plasma source to generate pie shaped treatment

Plasma treatment method to meet line edge roughness and other integration objectives

Gas splitting by time average injection into different zones by fast gas valves

RPS defect reduction by cyclic clean induced RPS cooling

Etching device and etching method

Additively manufactured gas distribution manifold

Vapor deposition apparatus

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE

Substrate processing method, substrate processing apparatus and substrate processing system

Hydrogen plasma based cleaning process for etch hardware

Charged particle beam-induced etching

ATOMIC LAYER ETCHING SYSTEM WITH REMOTE PLASMA SOURCE AND DC ELECTRODE

Substrate processing chamber including multiple gas injection points and dual injector

Flow control showerhead with integrated flow restrictors for improved gas delivery to a semiconductor process

Inductive plasma source with metallic shower head using B-field concentrator

Gas flow control for millisecond anneal system

Process gas management for an inductively-coupled plasma deposition reactor

Cooled gas feed block with baffle and nozzle for HDP-CVD

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

Plasma processing apparatus

PLASMA SYSTEM, PLASMA PROCESSING METHOD, AND PLASMA ETCHING METHOD

Method for forming a protective film

Decontamination and sterilization device with flexible enclosing cover using plasma and reactive gas

Plasma processing method

Etching method

Method for cleaning substrate

Plasma processing apparatus and method therefor

Hollow cathode ion source

UPPER ELECTRODE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS HAVING THE SAME

Showerhead having a detachable gas distribution plate

Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

Film deposition method and film deposition apparatus

SUPER-HYDROPHOBIC SURFACE BY CHEMICALLY MODIFIED BLOCK COPOLYMER GENERATED NANO-STRUCTURES

Method for manufacturing insulating film laminated structure

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

Fluid permeable anodic oxide film and fluid permeable body using anodic oxide film

Showerhead assembly

Atomic layer deposition apparatus and method for processing substrates using an apparatus

PLASMA PROCESSING APPARATUS AND FILM DEPOSITION METHOD

COMPOSITE BARRIER LAYER AND MANUFACTURING METHOD THEREOF

Capacitive coupling plasma processing apparatus and method for using the same

FILM FORMING APPARATUS, RECORDING MEDIUM, AND FILM FORMING METHOD

Gas supply system, plasma processing apparatus, and operation method for plasma processing apparatus

Advanced coating method and materials to prevent HDP-CVD chamber arcing

Cold plasma treatment devices and associated methods

Method of etching

Method for etching high-K dielectric using pulsed bias power

SUBSTRATE PROCESSING METHOD AND APPARATUS THEREOF

PARTICLE CONCENTRATION MECHANISM, PARTICLE MEASURING DEVICE, AND SUBSTRATE PROCESSING APPARATUS INCLUDING PARTICLE MEASURING DEVICE

Self-aligned shielding of silicon oxide

Method for modifying epitaxial growth shape

Lateral plasma/radical source

Device For Plasma Coating And Method For Coating A Printed Circuit Board

Aluminum nitride electrostatic chuck used in high temperature and high plasma power density semiconductor manufacturing process

CORROSION-RESISTANT COMPONENTS AND METHODS OF MAKING

UNIFORM LOW ELECTRON TEMPERATURE PLASMA SOURCE WITH REDUCED WAFER CHARGING AND INDEPENDENT CONTROL OVER RADICAL COMPOSITION

Etching method for a structure pattern layer having a first material and second material

Ion generator and method of controlling ion generator

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma source and surface treatment method

COMPUTER ADDRESSABLE PLASMA DENSITY MODIFICATION FOR ETCH AND DEPOSITION PROCESSES

Counter flow mixer for process chamber

Substrate processing apparatus, substrate processing method and substrate holding member

APPARATUS FOR INDIRECT ATMOSPHERIC PRESSURE PLASMA PROCESSING

Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching

Methods for reducing copper overhang in a feature of a substrate

Substrate processing apparatus and methods

Semiconductor manufacturing system including deposition apparatus

Support unit, substrate treating apparatus including the same, and method for treating a substrate

SYSTEM AND METHOD FOR TREATING SUBSTRATE

Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance

Plasma etching method

Showerhead with reduced backside plasma ignition

Ink composition for plasma treatment detection, and plasma treatment detection indicator

Purge and pumping structures arranged beneath substrate plane to reduce defects

RF power delivery regulation for processing substrates

Loadlock integrated bevel etcher system

Plasma processing method

Temperature adjustment device and substrate processing apparatus

Plasma processing apparatus and plasma processing method

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM

Gas mixer and semiconductor device fabricating apparatuses including the same

Method and system for controlling ion flux in an RF plasma

APPARATUS FOR DETERMINING PROCESS RATE

Showerhead support structures

Atomic layer deposition method

Plasma processing method and plasma processing apparatus

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

Mask shrink layer for high aspect ratio dielectric etch

Gas Configuration for Magnetron Deposition Systems

Plasma Module With Slotted Ground Plate

Substrate support with real time force and film stress control

PLASMA PROCESSING APPARATUS

Ring member with air holes and substrate processing system including the same

Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing

Plasma excitation for spatial atomic layer deposition (ALD) reactors

Seasoning method and etching method

Apparatus for coating a film in a container and method for coating the film

Mono-energetic neutral beam activated chemical processing system and method of using

Gas injection system for ion beam device

Plasma etching systems and methods with secondary plasma injection

Embedded mask patterning process for fabricating magnetic media and other structures

Hybrid corrective processing system and method

Wear detection of consumable part in semiconductor manufacturing equipment

Pulsing RF power in etch process to enhance tungsten gapfill performance

Atomic layer etching of tungsten and other metals

Application of powered electrostatic faraday shield to recondition dielectric window in ICP plasmas

Multi-Station Chamber Having Symmetric Grounding Plate

SUSCEPTOR AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR INSTALLING A GAS DIFFUSION DEVICE

Plasma treatment system including cover plate to insulate window

MAGNETIZED EDGE RING FOR EXTREME EDGE CONTROL

Plasma Processing Apparatus

Deposition apparatus and deposition system having the same

Oxide etch selectivity systems and methods

Systems and Methods for Separately Applying Charged Plasma Constituents and Ultraviolet Light in a Mixed Mode Processing Operation

Systems Comprising Silicon Coated Gas Supply Conduits and Methods for Applying Coatings

PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

Microwave plasma reactor for manufacturing synthetic diamond material

Plasma treatment of liquid surfaces

PLASMA TREATMENT APPARATUS

Gas delivery system

INTEGRATED ANODE AND ACTIVATED REACTIVE GAS SOURCE FOR USE IN A MAGNETRON SPUTTERING DEVICE

Cold plasma annular array methods and apparatus

Time varying segmented pressure control

Method and device for generating a plasma excited by a microwave energy in the electron cyclotron resonance (ECR) domain, in order to carry out a surface treatment or produce a coating around a filiform element

Plasma processing apparatus and method

GAS DISTRIBUTION APPARATUS IN A VACUUM CHAMBER, COMPRISING A GAS CONDUCTING DEVICE

Microwave Plasma Source and Plasma Processing Apparatus

Plasma treatment apparatus and method of plasma treating a substrate using the same

Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systems

Plasma generator using dielectric resonator

SEMICONDUCTOR DEVICE PRODUCTION METHOD AND PRODUCTION APPARATUS

PLASMA PROCESSING APPARATUS

Apparatus and methods for generating reactive gas with glow discharges

Method for activating an inner surface of a substrate tube for the manufacturing of an optical-fiber preform

Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

Adjustable remote dissociation

ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS RING MATERIAL

Temperature controlled showerhead

Plasma processing apparatus and film formation method

Gas barrier film and method for producing it

Plasma processing method and plasma processing apparatus

Etching method and plasma processing apparatus

TEMPERATURE CONTROLLED SUBSTRATE PROCESSING

Plasma processing apparatus and method

Selective removal of boron doped carbon hard mask layers

ROTATIONAL ANTENNA AND SEMICONDUCTOR DEVICE INCLUDING THE SAME

Recursive inject apparatus for improved distribution of gas

Thin substrate processing device

Plasma-enhanced chemical vapor deposition device and method of manufacturing display apparatus using the same

Gas supply system, gas supply control method and gas replacement method

Plasma processing method

Method for Controlling Plasma Uniformity in Plasma Processing Systems

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

PLASMA ETCHING DEVICE WITH DOPED QUARTZ SURFACES

Temperature control method and plasma processing apparatus

INJECTOR FOR SEMICONDUCTOR EPITAXY GROWTH

Atomic layer deposition processing chamber permitting low-pressure tool replacement

APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE HAVING A GAS MIXER

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Plasma processing apparatus and method, and method of manufacturing electronic device

HIGH THERMAL CONDUCTIVITY WAFER SUPPORT PEDESTAL DEVICE

Plasma processing apparatus

Microwave plasma source and plasma processing apparatus

PLASMA PROCESSING APPARATUS

Systems, methods and apparatus for choked flow element extraction

PLASMA PROCESSING APPARATUS AND METHOD

ARC DISCHARGE APPARATUS AND PLASMA PROCESSING SYSTEM INCLUDING THE SAME

PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

Plasma Processing Apparatus and Coil Used Therein

Radical generator and molecular beam epitaxy apparatus

Processing chamber, combination of processing chamber and loadlock, and system for processing substrates

Plasma generator and thermal electron emitter

Methods of forming coating layers

Plasma processing detection indicator

Method and system for controlling plasma in semiconductor fabrication

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

Chamber cleaning and semiconductor etching gases

Substrate cleaning method for removing oxide film