205364 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Means for moving the material to be treated for moving the material across the discharge; Continuous moving of batches of workpieces
INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES
#2CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
#3COATING METHOD
#4METHOD AND DEVICES FOR PLASMA TREATMENT
#5SPUTTERING APPARATUS AND RELATED SYSTEMS AND METHODS FOR SPUTTERING SUBSTRATES
#6Device and method for sputtering and depositing metal on surface of magnetic powder materials
#7BATCH TYPE SUBSTRATE PROCESSING APPARATUS
#8Carrier with vertical grid for supporting substrates in coater
#9Carrier with vertical grid for supporting substrates in coater
#10Line-of-sight coating fixture and apparatus
#11GLASS PALLET FOR SPUTTERING SYSTEMS
#12Coating apparatus and coating method
#13High throughput vacuum deposition sources and system
#14Shaped electrodes for improved plasma exposure from vertical plasma source
#15PLANETARY GEAR ASSEMBLY FOR SPUTTERING MULTIPLE BALLOON CATHETER DISTAL ENDS
#16Carrier with vertical grid for supporting substrates in coater
#17Batch type substrate processing apparatus
#18System, method and support for coating eyeglass lenses
#19Device, method and use for the coating of lenses
#20SUBSTRATE SUPPORTS FOR A SPUTTERING DEVICE
#21Substrate processing system
#22Film forming method and film forming apparatus
#23Shaped electrodes for improved plasma exposure from vertical plasma source
#24Film formation apparatus
#25Pretreatment assembly and method for treating work pieces
#26Plasma processing apparatus
#27Plasma processing apparatus
#28APPARATUS FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR MASKING THE SUBSTRATE DURING VACUUM DEPOSITION
#29High throughput vacuum deposition sources and system
#30Vacuum processing apparatus and method for vacuum processing substrates
#31Planetary gear assembly for sputtering multiple balloon catheter distal ends
#32Plasma polymerization coating apparatus
#33LARGE AREA ENERGETIC ION SOURCE
#34Apparatus for treating objects with plasma, use of this apparatus and method of using this apparatus
#35Substrate processing apparatus and substrate processing method
#36Apparatus for coating substrates
#37Substrate processing apparatus
#38Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
#39Substrate processing apparatus
#40Method and apparatus for saving energy while increasing the conveying speed in vacuum coating plants
#41Method for forming a protective film
#42Device for Processing Plasma with a Circulation of Process Gas in Multiple Plasmas
#43Plasma treatment apparatus and method of plasma treating a substrate using the same
#44Substrate processing method and substrate processing apparatus
#45Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#46Substrate processing apparatus
#47LINEAR SCANNING SPUTTERING SYSTEM AND METHOD
#48Glass pallet for sputtering systems
#49Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#50Substrate processing apparatus
#51Plasma processing method and plasma processing apparatus
#52PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROVIDED WITH SAME
#53Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#54Substrate processing apparatus having ground electrode
#55Method of depositing a film, recording medium, and film deposition apparatus
#56Plasma processing apparatus, plasma processing method, and storage medium
#57Method and apparatus for producing a reflection-reducing layer on a substrate
#58Sputtering system and method using direction-dependent scan speed or power
#59Combinatorial plasma enhanced deposition and etch techniques
#60Apparatus and method for treating substrate
#61Application of coating materials
#62Narrow source for physical vapor deposition processing
#63LINEAR SCANNING SPUTTERING SYSTEM AND METHOD
#64Plasma processing apparatus and plasma processing method
#65METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER
#66Electrostatic chuck and semiconductor/liquid crystal manufacturing equipment
#67Method and device for plasma-treating workpieces
#68Film deposition method and film deposition apparatus
#69Plasma processing apparatus, plasma processing method, and storage medium
#70Deposition system with a rotating drum
#71Treating Surface of Substrate Using Inert Gas Plasma in Atomic Layer Deposition
#72Substrate processing apparatus
#73Substrate processing apparatus, processing tube, substrate holder, fixing part of the substrate holder, substrate processing method, and substrate manufacturing method
#74Combinatorial plasma enhanced deposition and etch techniques
#75SPUTTERING DEVICE
#76SPUTTERING DEPOSITION APPARATUS
#77Substrate processing method
#78SEMICONDUCTOR MANUFACTURING APPARATUS
#79Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
#80Substrate processing apparatus
#81Coating apparatus
#82Method and Apparatus for Multi-Cathode PVD Coating and Substrate with PVD Coating
#83Plasma processing apparatus of batch type
#84Amorphous carbon film forming method and device
#85Method for depositing a thin film
#86Method for manufacturing semiconductor device
#87Cathode apparatus to selectively bias pallet during sputtering
#88Sputtering apparatus and sputter film deposition method