PHYSICAL VAPOR DEPOSITION APPARATUS

Scanning Magnetron Device and Magnetron Sputtering Apparatus for PVD Planar Target

Beam Plasma Source Enhanced Magnetron Sputtering

PERMEANCE MAGNETIC ASSEMBLY

RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING THROUGH THE IMPLEMENTATION OF CAPACITIVE AND INDUCTIVE COMPONENTS

PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY

Sputtering apparatus for coating of 3D-objects

Permeance magnetic assembly

SPUTTERING APPARATUS

PHYSICAL VAPOR DEPOSITION APPARATUS

Semiconductor processing apparatus and magnetron mechanism

ELECTROCHROMIC DEVICES

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

Methods of and apparatus for magnetron sputtering

Methods and apparatus for processing a substrate

Permeance magnetic assembly

PIEZOELECTRIC BULK LAYERS WITH TILTED C-AXIS ORIENTATION AND METHODS FOR MAKING THE SAME

Magnet module and sputtering apparatus including the same

Deposition system with a multi-cathode

Vacuum system and method to deposit a compound layer

Deposition system with multi-cathode and method of manufacture thereof

Multi-radius magnetron for physical vapor deposition (PVD) and methods of use thereof

Tilted magnetron in a PVD sputtering deposition chamber

Cathode unit and film forming apparatus

Magnet unit for magnetron sputtering apparatus

Sputtering apparatus

IMPROVEMENTS IN AND RELATING TO COATING PROCESSES

Method and apparatus for depositing a material

Reference electrode assemblies including thin, porous current collectors and methods of manufacturing thin, porous current collectors

Methods of and apparatus for magnetron sputtering

Depositing apparatus

Reactive sputtering with HIPIMS

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

Apparatus and method for processing, coating or curing a substrate

Interchangeable magnet pack

Apparatus and methods for depositing durable optical coatings

Electrochromic devices

Permeance magnetic assembly

Sputtering device

Apparatus and methods for depositing variable interference filters

Piezoelectric bulk layers with tilted c-axis orientation and methods for making the same

SPUTTERING SOURCE

Film forming system and method for forming film on substrate

Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations

Providing voice call support in a network

Physical vapor deposition chamber with static magnet assembly and methods of sputtering

INVERTED MAGNETRON FOR PROCESSING OF THIN FILM MATERIALS

Film-forming apparatus and method for manufacturing magnetic recording medium

Film-forming apparatus and film-forming method

Systems and methods for low resistivity physical vapor deposition of a tungsten film

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING

Flexible adjustable return path magnet assembly and methods

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

Vacuum processing apparatus and method for vacuum processing substrates

Method to improve film quality for PVD carbon with reactive gas and bias power

COOLING AND UTILIZATION OPTIMIZATION OF HEAT SENSITIVE BONDED METAL TARGETS

Sputtering apparatus and sputtering method

Magnetron Sputtering Apparatus

Tubular target

APPARATUS AND METHOD FOR SPUTTERING HARD COATINGS

SPUTTERING TARGET HAVING REVERSE BOWNG TARGET GEOMETRY

Magnetic-field-generating apparatus for magnetron sputtering

Electrochromic devices

TARGET SPUTTERING DEVICE AND METHOD FOR SPUTTERING TARGET

Magnetic Spattering Coating Device and Target Device Thereof

Method and apparatus for saving energy while increasing the conveying speed in vacuum coating plants

Apparatus for sputtering and operation method thereof

Acoustic resonator structure with inclined C-axis piezoelectric bulk and crystalline seed layers

Apparatus and a method for deposition of material to form a coating

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

METHOD OF COATING HIGH ASPECT RATIO FEATURES

DEPOSITION OF THICK MAGNETIZABLE FILMS FOR MAGNETIC DEVICES

Magnetron and magnetron sputtering device

Method and apparatus for depositing a material

Sputter deposition source, apparatus for sputter deposition and method of assembling thereof

Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)

Electrochromic devices

Semiconductor device, display device, display module, electronic device, oxide, and manufacturing method of oxide

Apparatus for PVD dielectric deposition

Interchangeable magnet pack

Collimator for use in substrate processing chambers

MOVING MAGNET ASSEMBLY TO INCREASE THE UTILITY OF A RECTANGULAR MAGNETRON SPUTTERING TARGET

Oxide and method for forming the same

Method of and magnet assembly for high power pulsed magnetron sputtering

Sputtering method using sputtering device

Deposition device and deposition method

Physical vapor deposition of low-stress nitrogen-doped tungsten films

Rotation plus vibration magnet for magnetron sputtering apparatus

Deposition system with multi-cathode and method of manufacture thereof

Film deposition device

SUPPORTING MEMBER FOR MAGNETRON SPUTTERING ANODE BAR AND MAGNETRON SPUTTERING DEVICE INCLUDING THE SAME

FILM FORMING APPARATUS

Semiconductor devices and methods for fabricating the same

SYSTEMS FOR FORMING PHOTOVOLTAIC CELLS ON FLEXIBLE SUBSTRATES

In situ plasma clean for removal of residue from pedestal surface without breaking vacuum

Method and apparatus for producing a reflection-reducing layer on a substrate

Self-ionized and inductively-coupled plasma for sputtering and resputtering

Filters for blocking macroparticles in plasma deposition apparatus

Process kit for deposition and etching

Sputter source for use in a semiconductor process chamber

Film deposition apparatus with low plasma damage and low processing temperature

Variable radius dual magnetron

PVD RF DC open/closed loop selectable magnetron

Hot tile sputtering system

Wafer processing deposition shielding components

Adjustable shunt assembly for a sputtering magnetron and a method for adjusting such a shunt

Sputtering device for forming thin film and method for making thin film

New Magnet Design Which Improves Erosion Profile for PVD Systems

Racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering

Remote arc discharge plasma assisted processes

Low pressure arc plasma immersion coating vapor deposition and ion treatment

TARGET COOLING FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS

Magnetron design for extended target life in radio frequency (RF) plasmas

Magnet module having epicyclic gearing system and method of use

MAGNETRON SPUTTERING SYSTEM

Magnetic-field-generating apparatus for magnetron sputtering

Narrow source for physical vapor deposition processing

Magnetron source, magnetron sputtering apparatus and magnetron sputtering method

Edge ring for a deposition chamber

RF substrate bias with high power impulse magnetron sputtering (HIPIMS)

Rotation plus vibration magnet for magnetron sputtering apparatus

Sputtering sources for high-pressure sputtering with large targets and sputtering method

Pinned target design for RF capacitive coupled plasma

Magnetron sputtering apparatus and film forming method

Sputtering method using sputtering device

Magnetron sputtering apparatus

Method and apparatus for sputtering with a plasma lens

Arc PVD plasma source and method of deposition of nanoimplanted coatings

METHOD AND APPARATUS FOR THE MULTI-LAYER AND MULTI-COMPONENT COATING OF THIN FILMS ON SUBSTRATES, AND MULTI-LAYER AND MULTI-COMPONENT COATINGS

Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source

SPUTTERING TARGETS, SPUTTER REACTORS, METHODS OF FORMING CAST INGOTS, AND METHODS OF FORMING METALLIC ARTICLES

FILM FORMING METHOD BY SPUTTERING APPARATUS AND SPUTTERING APPARATUS

SPUTTERING DEVICE AND SPUTTERING METHOD

Sputtering method and sputtering apparatus

SPUTTERING APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

Wafer processing deposition shielding components

INTERIOR ANTENNA FOR SUBSTRATE PROCESSING CHAMBER

Target cooling through gun drilled holes

GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS

SPUTTERING DEVICE

Method and Apparatus for Super-High Rate Deposition

Method for predicting and compensating erosion in a magnetron sputtering target

MAGNETRON SPUTTERING APPARATUS

FILM-FORMING APPARATUS

Homing of arbitrary scan path of a rotating magnetron

MAGNETRON SPUTTERING CATHODE AND FILM FORMATION APPARATUS

Deposition of Material to Form a Coating

MAGNETRON SPUTTERING APPARATUS AND ELECTRONIC COMPONENT MANUFACTURING METHOD

Methods for depositing metal in high aspect ratio features

CONTROL OF PLASMA PROFILE USING MAGNETIC NULL ARRANGEMENT BY AUXILIARY MAGNETS

COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN

Magnetron design for RF/DC physical vapor deposition

Homing device for magnetron rotating on two arms

Magnet unit and magnetron sputtering apparatus

Magnetic field control for uniform film thickness distribution in sputter apparatus

Deposition system and methods having improved material utilization

SPUTTERING SYSTEM

Sputtering device and sputtering method

METHODS AND APPARATUS FOR MAGNETRON METALLIZATION FOR SEMICONDUCTOR FABRICATION

Electron-assisted deposition

Methods for depositing a layer on a substrate using surface energy modulation

Thin-film forming sputtering system

Plasma processing apparatus, magnetoresistive device manufacturing apparatus, magnetic thin film forming method, and film formation control program

Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor

Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor

Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor

Magnetron source and method of manufacturing

TARGET ASSEMBLY FOR A MAGNETRON SPUTTERING APPARATUS, A MAGNETRON SPUTTERING APPARATUS AND A METHOD OF USING THE MAGNETRON SPUTTERING APPARATUS

REDUNDANT ANODE SPUTTERING METHOD

Apparatus and method for pretreating and coating bodies

Apparatus and method for sputtering hard coatings

STRUCTURE FOR INCREASING UTILIZATION RATE OF TARGET

Magnetic field generating apparatus and plasma processing apparatus

Method for applying a diffusion barrier interlayer for high temperature components

Method and apparatus for improved high power impulse magnetron sputtering

Sputtering system for depositing thin film and method for depositing thin film

Methods for stable process in a reactive sputtering process using zinc or doped zinc target

Sputtering apparatus

SPUTTERING APPARATUS AND SPUTTERING METHOD

Magnetron sputtering apparatus and magnetron sputtering method

PROCESS KIT FOR RF PHYSICAL VAPOR DEPOSITION

MAGNETRON SPUTTERING TARGET ASSEMBLY AND COATING APPARATUS HAVING SAME

Use of DC magnetron sputtering systems

Magnetic device and magnetron sputtering device using the same

Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities

Low Temperature Deposition of Amorphous Thin Films

Sputtering target temperature control utilizing layers having predetermined emissivity coefficients

High Power Pulse Ionized Physical Vapor Deposition

DRY ETCHING METHOD, MAGNETO-RESISTIVE ELEMENT, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME

SPUTTERING FILM FORMING METHOD AND SPUTTERING FILM FORMING APPARATUS

Vacuum coating unit for homogeneous PVD coating

High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches

MAGNETRON SPUTTERING TARGET AND MAGNETRON SPUTTERING SYSTEM

Hot tile sputtering system

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

Mechanism for continuously varying radial position of a magnetron

High-power pulsed magnetron sputtering process as well as a high-power electrical energy source

Self-ionized sputtering apparatus

In situ plasma clean for removal of residue from pedestal surface without breaking vacuum

Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device

Magnet target and magnetron sputtering apparatus having the same

Physical vapor deposition with impedance matching network

SPUTTERING APPARATUS, DOUBLE ROTARY SHUTTER UNIT, AND SPUTTERING METHOD

Physical vapor deposition with phase shift

PZT Depositing Using Vapor Deposition

Methods and apparatus for forming diamond-like coatings

Apparatus and method for making sputtered films with reduced stress asymmetry

RF sputtering arrangement

Method of forming thin film and apparatus for forming thin film

Electromagnet array in a sputter reactor

Shaped anode and anode-shield connection for vacuum physical vapor deposition

Magnetron sputtering apparatus and method for manufacturing thin film

RF sputtering arrangement

MAGNETRON SPUTTERING APPARATUS

Magnetron sputtering apparatus

Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities

Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target

GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS

CONTROL OF EROSION PROFILE ON A DIELECTRIC RF SPUTTER TARGET

Confining Magnets In Sputtering Chamber

Sputtering Chamber Having ICP Coil and Targets on Top Wall

Shutter disk having a tuned coefficient of thermal expansion

Process for coating a substrate, plant for implementing the process and feeder for feeding such a plant with metal

PROCESS KIT SHIELDS AND METHODS OF USE THEREOF

Magnetron sputtering electrode, and sputtering apparatus provided with magnetron sputtering electrode

SPUTTERING APPARATUS, SPUTTERING METHOD AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM

Apparatus and method for sputtering target debris reduction

SPUTTER CATHODE APPARATUS ALLOWING THICK MAGNETIC TARGETS

DEPOSITION SYSTEM HAVING IMPROVED MATERIAL UTILIZATION

Magnetron unit moving apparatus for preventing magnetization and magnetron sputtering equipment having the same

MAGNETIC FIELD GENERATION CONTROL UNIT AND MAGNETRON SPUTTERING APPARATUS AND METHOD USING THE SAME

Method of Hard Coating a Blade

VACUUM COATING APPARATUS

MAGNETRON SPUTTERING APPARATUS AND METHOD FOR MANUFACTURING THIN FILM

MAGNETIC FIELD GENERATING APPARATUS, MAGNETIC FIELD GENERATING METHOD, SPUTTERING APPARATUS, AND METHOD OF MANUFACTURING DEVICE

WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS

COAXIAL MICROWAVE ASSISTED DEPOSITION AND ETCH SYSTEMS

Magnetron unit, magnetron sputtering apparatus, and method of manufacturing electronic device

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM

Thin film metal oxynitride semiconductors

Sputtering cathode, sputtering apparatus provided with sputtering cathode, film-forming method, and method for manufacturing electronic device

Magnet unit for magnetron sputtering system

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement

HIGH POWER IMPULSE MAGNETRON SPUTTERING VAPOUR DEPOSITION

MAGNETRON SPUTTERING MAGNET ASSEMBLY, MAGNETRON SPUTTERING DEVICE, AND MAGNETRON SPUTTERING METHOD

Reactive sputtering with HIPIMs

Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source

Prediction and compensation of erosion in a magnetron sputtering target

Control of arbitrary scan path of a rotating magnetron

Sputtering apparatus and sputtering method

Magnetron sputtering cathode mechanism

MAGNET CHOIR DESIGN FOR TARGET MATERIAL EROSION

Sputtering apparatus of forming thin film

SPUTTER COATING DEVICE AND COATING METHOD

Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging

CHALCOGENIDE TARGET AND METHOD

Method and Apparatus for Producing Controlled Stresses and Stress Gradients in Sputtered Films

MAGNET ASSEMBLY CAPABLE OF GENERATING MAGNETIC FIELD HAVING DIRECTION THAT IS UNIFORM AND CAN BE CHANGED AND SPUTTERING APPARATUS USING THE SAME

Mirror Magnetron Plasma Source

High density plasma source

Sputtering system

MAGNETRON SPUTTERING APPARATUS AND MANUFACTURING METHOD FOR STRUCTURE OF THIN FILM

MULTITARGET SPUTTER SOURCE AND METHOD FOR THE DEPOSITION OF MULTI-LAYERS

Redundant anode sputtering method and assembly

Plasma Systems with Magnetic Filter Devices to Alter Film Deposition/Etching Characteristics

SWINGING MAGNETS TO IMPROVE TARGET UTILIZATION

COOLING SHIELD FOR SUBSTRATE PROCESSING CHAMBER

IMPLANTABLE DEVICES HAVING TEXTURED SURFACES AND METHODS OF FORMING THE SAME

Sputtering apparatus

METHOD AND APPARATUS FOR MANUFACTURING A SUBSTRATE WITH A MAGNETRON SPUTTER COATING

Method for controlling plasma density or the distribution thereof

Sputtering apparatus and film-forming processes

Sputtering apparatus, method for producing a transparent electroconductive film

Sputtering Magnetron

RESPUTTERED COPPER SEED LAYER

DESIGN SUPPORTING METHOD, SYSTEM, AND PROGRAM OF MAGNETRON SPUTTERING APPARATUS

Offset magnet compensation for non-uniform plasma

IMPLANTABLE DEVICES AND METHODS OF FORMING THE SAME

Magnetron Sputtering Source, Sputter-Coating Installation, and Method for Coating a Substrate

Magnetron sputtering apparatus and method of manufacturing semiconductor device

MAGNETRON SPUTTERING APPARATUS

Self-ionized and capacitively-coupled plasma for sputtering and resputtering

RF substrate bias with high power impulse magnetron sputtering (HIPIMS)

Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)

Deposition system

PHYSICAL VAPOR DEPOSITION CHAMBER HAVING AN ADJUSTABLE TARGET

Self-ionized and inductively-coupled plasma for sputtering and resputtering

Position controlled dual magnetron

Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum

Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals

Systems and methods for magnetron deposition

Magnet arrangement for a planar magnetron background and summary of the invention

Coaxial shafts for radial positioning of rotating magnetron

Ganged scanning of multiple magnetrons, especially two level folded magnetrons

Method and apparatus for trans-zone sputtering

MAGNETRON ASSEMBLY

COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN