SPUTTERING APPARATUS AND SPUTTERING METHOD

COATING PLANT AND METHOD FOR TARGET REPLACEMENT

MULTIFACETED TARGET FOR AN ION SOURCE

INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES

RARE EARTH ROTARY TARGET AND PREPARATION METHOD THEREFOR

HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS

SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PLATE, AND METHOD OF MANUFACTURING SPUTTERING TARGET

FILM FORMING APPARATUS AND FILM FORMING METHOD

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

PROCESSING KIT SHIELD

FILM FORMATION METHOD AND FILM FORMATION DEVICE

SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER

Sputtering apparatus for coating of 3D-objects

Sputtering target and sputtering apparatus including the same

SPUTTERING APPARATUS

DEPOSITION APPARATUS

Deposition apparatus, deposition target structure, and method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Ion beam deposition target life enhancement

Device and method for sputtering and depositing metal on surface of magnetic powder materials

Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target

SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING THE SAME, AND MATERIALS DEPOSITED WITH THE SAME

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM

SPUTTERING APPARATUS AND CVD MASK COATING METHOD USING THE SAME

REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMS

PHYSICAL VAPOR DEPOSITION APPARATUS

ELECTROCHROMIC DEVICES

Etch uniformity improvement for single turn internal coil PVD chamber

Sputtering system with a plurality of cathode assemblies

Tilted PVD source with rotating pedestal

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

Deposition apparatus, deposition target structure, and method

Movable magnet array for magnetron sputtering

MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT

METHOD OF MANUFACTURING CRYSTALLINE MATERIAL FROM DIFFERENT MATERIALS

SPUTTER DEPOSITION

SPUTTER DEPOSITION APPARATUS AND METHOD

Magnetron plasma sputtering arrangement

Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target

METHOD AND APPARATUS FOR SPUTTER DEPOSITION

Sputtering apparatus and method for fabricating semiconductor device using the same

Sputter target magnet

High efficiency rotatable sputter target

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Film forming apparatus and film forming method

Target structure of physical vapor deposition

Partial spray refurbishment of sputtering targets

Sputtering system with a plurality of cathode assemblies

Systems and methods for an improved magnetron electromagnetic assembly

Sputtering apparatus and film forming method

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Deposition system with multi-cathode and method of manufacture thereof

Inverted cylindrical magnetron (ICM) system and methods of use

Sputtering target and method for manufacturing the same

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

System for coupling RF power into LINACs and bellows coating by magnetron sputtering with kick pulse

Multi-cathode processing chamber with dual rotatable shields

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films

Sputtering apparatus

Sputtering apparatus and sputtering method

Cathode unit and film forming apparatus

Sputtering apparatus including gas distribution system

Method and device for homogeneously coating 3D substrates

Resistive switching memory including resistive switching layer fabricated using sputtering and method of fabricating the same

High throughput vacuum deposition sources and system

Reactive sputter deposition of dielectric films

Sputtering apparatus

Sputtering a layer on a substrate using a high-energy density plasma magnetron

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Deposition apparatus for both lateral portions of substrate

Housing, mobile terminal, and sputter coating apparatus

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Process for producing sputtering target and sputtering target

Cathode device and sputtering apparatus

Stage device and processing apparatus

Target structure of physical vapor deposition

System and method to control PVD deposition uniformity

Deposition method and deposition apparatus

TARGET ASSEMBLY SHIELD

FILM FORMATION DEVICE

DUAL POWER FEED ROTARY SPUTTERING CATHODE

PARTICLE REMOVAL DURING FABRICATION OF ELECTROCHROMIC DEVICES

Physical vapor deposition apparatus

Deposition apparatus

Physical Vapor Deposition Target Assembly

Rotatable sputtering target

Apparatus and methods for depositing durable optical coatings

Sputtering apparatus including cathode with rotatable targets, and related methods

Electrochromic devices

System, method and support for coating eyeglass lenses

Device, method and use for the coating of lenses

Partial spray refurbishment of sputtering targets

Film-forming device

Film-forming apparatus, film-forming system, and film-forming method

Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus

Method of forming wiring on side portion of substrate

Methods and apparatus for co-sputtering multiple targets

Film forming apparatus and film forming method using the same

Apparatus for depositing material on the surface of a substrate

SUBSTRATE SUPPORTS FOR A SPUTTERING DEVICE

Process integration method to tune resistivity of nickel silicide

PVD REACTOR WITH A FUNCTION OF ALIGNMENT IN COVERING AN UPPER COVER OF THE REACTOR

Process for producing sputtering target and sputtering target

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

SPUTTERING SOURCE

Film forming system and method for forming film on substrate

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations

Film forming unit for sputtering apparatus

Ion source crucible for solid feed materials

Ion Source Device, Sputtering Apparatus and Method

VACUUM DEPOSITION COMPOSITE TARGET

Sputtering apparatus including gas distribution system

Sputter target magnet

Sputter devices and methods

Target structure of physical vapor deposition

Method of production of uniform metal plates and sputtering targets made thereby

Process integration method to tune resistivity of nickel silicide

Process for producing sputtering target and sputtering target

Partial spray refurbishment of sputtering targets

Plasma chamber target for reducing defects in workpiece during dielectric sputtering

Reactive sputter deposition of dielectric films

APPARATUS CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, SYSTEM CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON A SUBSTRATE

SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME

High throughput vacuum deposition sources and system

High Throughput Vacuum Deposition Sources and System

Paste method to reduce defects in dielectric sputtering

Powder coating apparatus

Physical vapor deposition processing systems target cooling

Sputtering target having RFID information

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

COOLING AND UTILIZATION OPTIMIZATION OF HEAT SENSITIVE BONDED METAL TARGETS

Sputtering target

Sputtering showerhead

Single oxide metal deposition chamber

Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus

SPUTTERING APPARATUS

ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE

SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM

Film forming apparatus

Multisurface simultaneous sputtering and shuttering

Sputter target and sputtering methods

Electrochromic devices

PVD apparatus and method with deposition chamber having multiple targets and magnets

Inverted cylindrical magnetron (ICM) system and methods of use

Dual power feed rotary sputtering cathode

Method for balancing consumption of targets in pulsed dual magnetron sputtering (DMS) processes

Durable 3D geometry conformal anti-reflection coating

Backing plate obtained by diffusion-bonding anticorrosive metal and Mo or Mo alloy, and sputtering target-backing plate assembly provided with said backing plate

Sputter device with moving target

SUBSTRATE PROCESSING DEVICE

Target and process for producing a target

Film formation apparatus and film-formed workpiece manufacturing method

Capacitive coupled plasma source for sputtering and resputtering

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

INSULATOR TARGET

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

SPUTTERING SOURCE ARRANGEMENT, SPUTTERING SYSTEM AND METHOD OF MANUFACTURING METAL-COATED PLATE-SHAPED SUBSTRATES

SPUTTERING DEVICE AND METHOD OF FORMING THIN FILM USING THE SAME

Cooling water jet pack for high power rotary cathodes

Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor

Acoustic resonator structure with inclined C-axis piezoelectric bulk and crystalline seed layers

Manufacturing apparatus

RADIO FREQUENCY IDENTIFICATION IN-METAL INSTALLATION AND ISOLATION FOR SPUTTERING TARGET

Methods and apparatus for co-sputtering multiple targets

Apparatus and a method for deposition of material to form a coating

Hermetically sealed magnetic keeper cathode

End block assembly, bearing assembly, and method for manufacturing a bearing assembly

Apparatus and method for multilayer deposition

Deposition apparatus

SPUTTERING DEVICE AND METHOD FOR REPLACING FILM ROLL IN SPUTTERING DEVICE

Cylindrical sputtering target

LINEAR SCANNING SPUTTERING SYSTEM AND METHOD

Sputtering apparatus including gas distribution system

Optimized textured surfaces and methods of optimizing

Density modulated thin film electrodes, methods of making same, and applications of same

Electrochromic devices

Magnetron sputtering apparatus

Semiconductor device, display device, display module, electronic device, oxide, and manufacturing method of oxide

Magnetron-sputtering coating system and method, and display substrate

Apparatus for PVD dielectric deposition

Target, adapted to an indirect cooling device, having a cooling plate

Methods of manufacturing large-area sputtering targets using interlocking joints

Partial spray refurbishment of sputtering targets

FORMING MEMORY USING HIGH POWER IMPULSE MAGNETRON SPUTTERING

ARC EVAPORATION COATING SOURCE HAVING A PERMANENT MAGNET

High throughput vacuum deposition sources and system

Sputtering target-backing plate assembly

Backing plate-integrated metal sputtering target and method of producing same

DEPOSITION DEVICE

Li-containing oxide target assembly

PROCESSING APPARATUS

Plasma processing apparatus and plasma processing method

Sputtering apparatus

Sputtering apparatus and method thereof

Sputtering apparatus

PARTICLE FREE ROTARY TARGET AND METHOD OF MANUFACTURING THEREOF

Deposition system with multi-cathode and method of manufacture thereof

Sputtering apparatus and substrate processing apparatus

Method for increased target utilization in ion beam deposition tools

SPUTTERING APPARATUS AND MANUFACTURING METHOD OF MAGNETORESISTIVE ELEMENT

MODIFIED LITHIUM COBALT OXIDE SPUTTERING TARGETS

Magnetron sputtering coating device, a nano-multilayer film, and the preparation method thereof

Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure

Film deposition device

Low deflection sputtering target assembly and methods of making same

SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOMASK BLANK, AND PHOTOMASK BLANK

HYBRID DEPOSITION SYSTEM

Physical vapor deposition tile arrangement and physical vapor deposition arrangement

Sputtering apparatus and sputtering method

ROTATABLE SPUTTER TARGET

Dual-target sputter deposition with controlled phase difference between target powers

Target adapted to an indirect cooling device

Sputtering apparatus and method

Method of manufacturing organic light emitting display apparatus by performing plasma surface process using target sputtering apparatus

Sputtering system and method of fabricating display device using the same

System and method for balancing consumption of targets in pulsed dual magnetron sputtering (DMS) processes

SPUTTERING APPARATUS AND METHOD

Homogeneous HiPIMS coating method

Sputtering target assembly

SYSTEMS FOR FORMING PHOTOVOLTAIC CELLS ON FLEXIBLE SUBSTRATES

Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device

Sputter target and sputtering methods

Sputtering system and method using direction-dependent scan speed or power

Sputtering apparatus, target and shield

Plating stack to condition a bonding surface

Film deposition apparatus with low plasma damage and low processing temperature

Target for PVD sputtering system

Finned shutter disk for a substrate process chamber

Plasma enhanced chemical vapor deposition (PECVD) source

Radio-frequency sputtering system with rotary target for fabricating solar cells

Remote arc discharge plasma assisted processes

Low pressure arc plasma immersion coating vapor deposition and ion treatment

Low pressure arc plasma immersion coating vapor deposition and ion treatment

Sputtering device

Film-forming apparatus

Inverted cylindrical magnetron (ICM) system and methods of use

Film-forming apparatus

Three dimensional metal deposition technique

Thin film forming apparatus and thin film forming method

MISALIGNED SPUTTERING SYSTEMS FOR THE DEPOSITION OF COMPLEX OXIDE THIN FILMS

Sputtering apparatus

Reactive sputter deposition of silicon films

Narrow source for physical vapor deposition processing

Vapour deposition

Substrate processing system with mechanically floating target assembly

Soft sputtering magnetron system

Sputtering apparatus including target mounting and control

Apparatus for forming gas blocking layer and method thereof

Apparatus for enabling concentricity of plasma dark space

PROFILED SPUTTER TARGET

PVD apparatus and method with deposition chamber having multiple targets and magnets

LINEAR SCANNING SPUTTERING SYSTEM AND METHOD

Methods of manufacturing large-area sputtering targets

Methods of manufacturing high-strength large-area sputtering targets

MEDIUM FREQUENCY MAGNETRON SPUTTERING DEVICE

SPUTTERING DEVICE

ROTARY CATHODES FOR MAGNETRON SPUTTERING SYSTEM

Sputtering apparatus and method of manufacturing electronic device

Separated target apparatus for sputtering and sputtering method using the same

SEPARATED TARGET APPARATUS FOR SPUTTERING AND SPUTTERING METHOD USING THE SAME

Elastomer Bonded Item and Method for Debonding

Sleep aid composition and method

Film-Forming apparatus and Film-Forming method

SPUTTERING APPARATUS AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

METHOD AND APPARATUS TO PRODUCE HIGH DENSITY OVERCOATS

Magnetron with non-equipotential cathode

PLASMA PROCESSING CHAMBER HAVING ENHANCED DEPOSITION UNIFORMITY

PHYSICAL VAPOR DEPOSITION DEVICE FOR COATING WORKPIECE

TARGET ASSEMBLY

Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus

Cylindrical Magnetron Sputter Source Utilizing Halbach Magnet Array

HOLLOW TARGET ASSEMBLY

Forming memory using high power impulse magnetron sputtering

SPUTTERING APPARATUS WITH MAGNETIC MODULE

METHOD AND APPARATUS FOR SPUTTERING FILM CONTAINING HIGH VAPOR PRESSURE MATERIAL

SPUTTERING DEVICE

Ring cathode for use in a magnetron sputtering device

Angled sputtering physical vapor deposition apparatus with wafer holder and wafer holder for an angled sputtering physical vapor deposition apparatus

Methods and apparatus for applying periodic voltage using direct current

Sputtering apparatus, sputtering method, and electronic device manufacturing method

Thin-film forming sputtering system

Sputtering system

Sputtering apparatus

Bipolar pulsed power supply and power supply apparatus having plurality of bipolar pulsed power supplies connected in parallel with each other

Sputtering apparatus

Sputtering apparatus including cathode with rotatable targets, and related methods

Papermaking fabrics with contaminant resistant nanoparticle coating and method of in situ application

High-frequency sputtering device

Method for depositing electrically insulating layers

Plasma vapor deposition

Sputtering apparatus

Sputtering apparatus including novel target mounting and/or control

Wafer Holder And Method Of Holding A Wafer

Papermaking fabrics with contaminant resistant nanoparticle coating and method of in situ application

Magnetic latch for a vapour deposition system