Patents-Review.com
ClassID:

205393 ⎘

H01J37/3414 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor Targets

Sub-classes:
Recent Application in this class:
#1
20260132019
2026-05-14

Anti-Stiction Process for Mems Device

 #2
20260038783
2026-02-05

PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON SPUTTERING

 #3
20250323006
2025-10-16

ELECTRON BEAM DEVICE FOR SURFACE TREATMENT

 #4
20250129467
2025-04-24

PVD TARGET STRUCTURE AND METHOD FOR PREPARING THE SAME

 #5
20240376592
2024-11-14

PHYSICAL VAPOR DEPOSITION (PVD) SYSTEM AND METHOD OF PROCESSING TARGET

 #6
20240203715
2024-06-20

Magnetron sputter device

 #7
20240112897
2024-04-04

THIN FILM FORMING APPARATUS AND METHOD

 #8
20230307218
2023-09-28

Physical vapor deposition apparatus and method thereof

 #9
20230178347
2023-06-08

PREPARATION METHOD OF HYDROGENATED COMPOSITE FILM AND OPTICAL FILTER

 #10
20220406582
2022-12-22

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #11
20220403499
2022-12-22

METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE

 #12
20220367161
2022-11-17

Physical vapor deposition apparatus and method thereof

 #13
20220356560
2022-11-10

Physical vapor deposition (PVD) system and method of processing target

 #14
20220344133
2022-10-27

METHOD FOR FORMING LAYER

 #15
20220310364
2022-09-29

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

 #16
20220310363
2022-09-29

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

 #17
20220242724
2022-08-04

Anti-stiction process for MEMS device

 #18
20220154329
2022-05-19

Isolator ring clamp and physical vapor deposition chamber incorporating same

 #19
20220068620
2022-03-03

Systems and methods for an improved magnetron electromagnetic assembly

 #20
20210358729
2021-11-18

Sputtering target and method for manufacturing the same

 #21
20210343513
2021-11-04

Pulsed power module with pulse and ion flux control for magnetron sputtering

 #22
20210319989
2021-10-14

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

 #23
20210305032
2021-09-30

Substrate processing method and apparatus

 #24
20210222289
2021-07-22

SPUTTERING APPARATUS

 #25
20210020419
2021-01-21

Target structure and film forming apparatus

 #26
20210013410
2021-01-14

Apparatus for and method of fabricating semiconductor device

 #27
20200385853
2020-12-10

Sputtering target

 #28
20200255935
2020-08-13

Sputtering apparatus

 #29
20200240004
2020-07-30

Sputter trap having multimodal particle size distribution

 #30
20200161100
2020-05-21

Apparatus for physical vapor deposition and method for forming a layer

 #31
20200123003
2020-04-23

Anti-stiction process for MEMS device

 #32
20200105511
2020-04-02

Physical vapor deposition apparatus and method thereof

 #33
20200105297
2020-04-02

Sputtering target for magnetic recording media

 #34
20190390325
2019-12-26

Sputtering device

 #35
20190341237
2019-11-07

SHUTTER MECHANISM FOR TARGET, AND FILM-FORMING DEVICE PROVIDED WITH SAME

 #36
20190311889
2019-10-10

SYNTHESIS OF HIGH-PURITY BULK COPPER INDIUM GALLIUM SELENIDE MATERIALS

 #37
20190288203
2019-09-19

Apparatus for and method of fabricating semiconductor devices

 #38
20190284683
2019-09-19

APPARATUS AND METHODS FOR REDUCED-ARC SPUTTERING

 #39
20190180991
2019-06-13

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #40
20190144990
2019-05-16

Device For Sputtering A Material Onto A Surface Of A Substrate While Moving

 #41
20190096643
2019-03-28

Smart chamber and smart chamber components

 #42
20190035612
2019-01-31

SPUTTERING TARGET WITH MICRO CHANNELS

 #43
20190035611
2019-01-31

Systems and methods for uniform target erosion magnetic assemblies

 #44
20190032195
2019-01-31

LITHIUM SPUTTER TARGETS

 #45
20190031503
2019-01-31

Anti-stiction process for MEMS device

 #46
20180358213
2018-12-13

Pulsed power module with pulse and ion flux control for magnetron sputtering

 #47
20180327896
2018-11-15

Sputtering target

 #48
20180209036
2018-07-26

Sputtering apparatus and target changing device thereof

 #49
20180171465
2018-06-21

Sputter trap having multimodal particle size distribution

 #50
20180037983
2018-02-08

SPUTTERING DEVICE

 #51
20170369985
2017-12-28

Laterally adjustable return path magnet assembly and methods

 #52
20170342547
2017-11-30

Sputtering apparatus and sputtering method using the same

 #53
20170338087
2017-11-23

Sputter target and sputtering methods

 #54
20170327940
2017-11-16

Lithium sputter targets

 #55
20170268122
2017-09-21

Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms

 #56
20170207071
2017-07-20

Sputter device with moving target

 #57
20170034965
2017-02-02

Electromagnetic wave shielding thin film, electronic device provided with electromagnetic wave shielding thin film and shielding structure, and method for manufacturing electromagnetic wave shielding thin film

 #58
20160343551
2016-11-24

Sputtering target

 #59
20160333464
2016-11-17

Apparatus and method for multilayer deposition

 #60
20160333463
2016-11-17

Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions

 #61
20160326633
2016-11-10

Sputtering target and method for making the same

 #62
20160203961
2016-07-14

Magnetron sputtering apparatus

 #63
20160189940
2016-06-30

RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS

 #64
20160189939
2016-06-30

MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION

 #65
20160093478
2016-03-31

High throughput vacuum deposition sources and system

 #66
20160032445
2016-02-04

Plasma processing apparatus and plasma processing method

 #67
20150307983
2015-10-29

Drum sputtering device

 #68
20150262798
2015-09-17

Smart chamber and smart chamber components

 #69
20150170888
2015-06-18

Physical vapor deposition (PVD) target having low friction pads

 #70
20150114824
2015-04-30

Physical vapor deposition tile arrangement and physical vapor deposition arrangement

 #71
20150075620
2015-03-19

Copper indium gallium selenide (CIGS) thin films with composition controlled by co-sputtering

 #72
20150062710
2015-03-05

Transparent body for use in a touch panel having structured transparent conductive film directly between first and second transparent layer stacks, method of making, and apparatus for making

 #73
20150034478
2015-02-05

Cathodic arc deposition

 #74
20150014151
2015-01-15

Method of fabricating sputtering target, sputtering target using the method, and method of manufacturing organic light-emitting display apparatus using the sputtering target

 #75
20150004400
2015-01-01

SUPPORT ASSEMBLY FOR USE IN SEMICONDUCTOR MANUFACTURING TOOLS WITH A FUSIBLE BOND

 #76
20140318953
2014-10-30

Sputtering target and manufacturing method therefor

 #77
20140318947
2014-10-30

Sputter target and sputtering methods

 #78
20140284210
2014-09-25

Sputtering apparatus, target and shield

 #79
20140261180
2014-09-18

PVD target for self-centering process shield

 #80
20140251799
2014-09-11

Film deposition apparatus with low plasma damage and low processing temperature

 #81
20140251217
2014-09-11

Target for PVD sputtering system

 #82
20140174920
2014-06-26

Evaporation source

 #83
20140138242
2014-05-22

Lithium sputter targets

 #84
20140034490
2014-02-06

Diffusion-bonded sputter target assembly and method of manufacturing

 #85
20140027274
2014-01-30

Three dimensional metal deposition technique

 #86
20130337602
2013-12-19

Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube

 #87
20130299345
2013-11-14

Sputtering apparatus

 #88
20130277204
2013-10-24

Vapour deposition

 #89
20130270108
2013-10-17

Indium sputtering target and method for manufacturing same

 #90
20130264200
2013-10-10

Planar or tubular sputtering target and method for the production thereof

 #91
20130256127
2013-10-03

Substrate processing system having symmetric RF distribution and return paths

 #92
20130220803
2013-08-29

Tungsten target and method for producing same

 #93
20130056347
2013-03-07

Cooling ring for physical vapor deposition chamber target

 #94
20130037408
2013-02-14

Indium target and manufacturing method thereof

 #95
20120298500
2012-11-29

SEPARATED TARGET APPARATUS FOR SPUTTERING AND SPUTTERING METHOD USING THE SAME

 #96
20120245725
2012-09-27

Manufacturing method and system of target

 #97
20120228132
2012-09-13

Sputtering target-backing plate assembly, and its production method

 #98
20120160671
2012-06-28

SPUTTERING DEVICE

 #99
20120097530
2012-04-26

Target of sintered compact, and method of producing the sintered compact

 #100
20120061238
2012-03-15

Sputtering cathode having a non-bonded semiconducting target

 #101
20120048726
2012-03-01

Methods of sputtering using a non-bonded semiconducting target

 #102
20120048725
2012-03-01

NON-BONDED ROTARY SEMICONDUCTING TARGETS AND METHODS OF THEIR SPUTTERING

 #103
20110290638
2011-12-01

SPUTTER DEVICE AND METHOD OF MANUFACTURING MAGNETIC STORAGE MEDIUM

 #104
20110223346
2011-09-15

Sputtering device and sputtering method

 #105
20110174612
2011-07-21

SPUTTERING APPARATUS WITH ROTATABLE SPUTTERING TARGET

 #106
20110155570
2011-06-30

Barrier film for semiconductor wiring, sintered compact sputtering target and method of producing the sputtering target

 #107
20110143075
2011-06-16

Sputtering target and manufacturing method therefor, and recordable optical recording medium

 #108
20110139614
2011-06-16

SPUTTERING TARGET WITH AN INSULATING RING AND A GAP BETWEEN THE RING AND THE TARGET

 #109
20110067997
2011-03-24

Synthesis of high-purity bulk copper indium gallium selenide materials

 #110
20110067757
2011-03-24

Copper indium gallium selenide (CIGS) thin films with composition controlled by co-sputtering

 #111
20110056829
2011-03-10

Cathode unit and sputtering apparatus provided with the same

 #112
20110036711
2011-02-17

SPUTTERING DEVICE

 #113
20100310902
2010-12-09

DRY ETCHING METHOD, MAGNETO-RESISTIVE ELEMENT, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME

 #114
20100270143
2010-10-28

SUBSTRATE STAGE, SPUTTERING APPARATUS PROVIDED WITH SAME, AND FILM FORMING METHOD

 #115
20100133090
2010-06-03

Film forming method by sputtering and sputtering apparatus thereof

 #116
20100129722
2010-05-27

Oxynitride sputtering target

 #117
20100116654
2010-05-13

FILM COATING APPARATUS

 #118
20100078309
2010-04-01

SPUTTERING METHOD AND SPUTTERING APPARATUS

 #119
20090178919
2009-07-16

SPUTTER COATING DEVICE

 #120
20090134020
2009-05-28

SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

 #121
20090127107
2009-05-21

Magnetron sputtering cathode mechanism

 #122
20090078566
2009-03-26

Deposited Film Forming Method, Deposited Film Forming Device, Deposited Film, and Photosensitive Member Provided with the Deposited Film

 #123
20090065349
2009-03-12

Plasma vapor deposition

 #124
20090057139
2009-03-05

Pot-shaped copper sputtering target and manufacturing method thereof

 #125
20090045051
2009-02-19

Target designs and related methods for coupled target assemblies, methods of production and uses thereof

 #126
20090008245
2009-01-08

Method for connecting magnetic substance target to backing plate, and magnetic substance target

 #127
20080283394
2008-11-20

MAGNETRON SPUTTERING TARGET

 #128
20080164146
2008-07-10

Sputtering target with an insulating ring and a gap between the ring and the target

 #129
20080135405
2008-06-12

Metal Double-Layer Structure and Method For Manufacturing the Same and Regeneration Method of Sputtering Target Employing That Method

 #130
20080116887
2008-05-22

Method and apparatus for automation of PTF measurement in sputter targets

 #131
20080041720
2008-02-21

Novel manufacturing design and processing methods and apparatus for PVD targets

 #132
20070218239
2007-09-20

Sputtering target and manufacturing method therefor, and recordable optical recording medium

 #133
20070205101
2007-09-06

Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers

 #134
20070138003
2007-06-21

Lamination and conversion process and apparatus

 #135
20060237303
2006-10-26

Sputtering target, method of manufacturing a multilayer reflective film coated substrate, method of manufacturing a reflective mask blank, and method of manufacturing a reflective mask

 #136
20060197457
2006-09-07

Magnetically enhanced capacitive plasma source for ionized physical vapor deposition

 #137
20060191782
2006-08-31

Magnetron sputtering coater and method of improving magnetic field uniformity thereof

 #138
20050194910
2005-09-08

Magnetically enhanced capacitive plasma source for ionized physical vapor deposition

 #139
20050082258
2005-04-21

Methods of treating non-sputtered regions of PVD target constructions to form particle traps