Patents-Review.com
ClassID:

205395 ⎘

H01J37/342 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor; Targets Hollow targets

Recent Application in this class:
#1
20260094795
2026-04-02

Inverted Cylindrical Magnetron (ICM) System and Methods of Use

 #2
20250316468
2025-10-09

ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD

 #3
20250029819
2025-01-23

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

 #4
20240136156
2024-04-25

Sputtering apparatus for coating of 3D-objects

 #5
20230369008
2023-11-16

Hybrid ion source for aluminum ion generation using a target holder and a solid target

 #6
20230369006
2023-11-16

HYBRID ION SOURCE FOR ALUMINUM ION GENERATION USING A TARGET HOLDER AND ORGANOALUMINIUM COMPOUNDS

 #7
20230154734
2023-05-18

Magnet system, sputtering device and housing cover

 #8
20230052340
2023-02-16

Movable magnet array for magnetron sputtering

 #9
20220181129
2022-06-09

MAGNETRON PLASMA APPARATUS

 #10
20220157582
2022-05-19

MAGNET BAR WITH ATTACHED SENSOR

 #11
20220028672
2022-01-27

ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD

 #12
20210375573
2021-12-02

Inverted cylindrical magnetron (ICM) system and methods of use

 #13
20210351022
2021-11-11

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

 #14
20210285090
2021-09-16

Convertible magnetics for rotary cathode

 #15
20210217586
2021-07-15

Sputtering apparatus including gas distribution system

 #16
20210082674
2021-03-18

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

 #17
20210071293
2021-03-11

PROCESS FOR PREPARING A TUBULAR ARTICLE

 #18
20210050196
2021-02-18

Heat-Transfer Roller for Sputtering and Method of Making the Same

 #19
20210005438
2021-01-07

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

 #20
20200303173
2020-09-24

HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME

 #21
20200266038
2020-08-20

DUAL POWER FEED ROTARY SPUTTERING CATHODE

 #22
20200203134
2020-06-25

Rotatable sputtering target

 #23
20200185205
2020-06-11

Sputtering apparatus including cathode with rotatable targets, and related methods

 #24
20200176234
2020-06-04

HIGH-POWER RESONANCE PULSE AC HEDP SPUTTERING SOURCE AND METHOD FOR MATERIAL PROCESSING

 #25
20200051794
2020-02-13

Methods and apparatus for producing low angle depositions

 #26
20190203346
2019-07-04

Sputtering cathode, sputtering device, and method for producing film-formed body

 #27
20190080883
2019-03-14

Sputtering apparatus including gas distribution system

 #28
20190057848
2019-02-21

Magnetic force release for sputtering sources with magnetic target materials

 #29
20190041183
2019-02-07

Cylindrical target production method and cylindrical target

 #30
20180261428
2018-09-13

ION SOURCE SPUTTERING

 #31
20180171464
2018-06-21

SPUTTERING CATHODE, SPUTTERING DEVICE, AND METHOD FOR PRODUCING FILM-FORMED BODY

 #32
20180127865
2018-05-10

Nanoparticle Deposition Systems

 #33
20180105925
2018-04-19

PROCESS FOR PREPARING A TUBULAR ARTICLE

 #34
20180100231
2018-04-12

Lithium-containing transition metal oxide target

 #35
20180037984
2018-02-08

ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE

 #36
20180030591
2018-02-01

Rotary cathode unit for magnetron sputtering apparatus

 #37
20180012738
2018-01-11

MAGNETRON PLASMA APPARATUS

 #38
20170350001
2017-12-07

Sputtering target for PVD chamber

 #39
20170301502
2017-10-19

Inverted cylindrical magnetron (ICM) system and methods of use

 #40
20170278685
2017-09-28

Dual power feed rotary sputtering cathode

 #41
20170271130
2017-09-21

Durable 3D geometry conformal anti-reflection coating

 #42
20170207071
2017-07-20

Sputter device with moving target

 #43
20170175251
2017-06-22

Surrounding field sputtering source

 #44
20170047204
2017-02-16

MAGNETRON PLASMA APPARATUS

 #45
20160343550
2016-11-24

End block assembly, bearing assembly, and method for manufacturing a bearing assembly

 #46
20160312353
2016-10-27

Film deposition apparatus and film deposition method

 #47
20160289820
2016-10-06

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

 #48
20160289818
2016-10-06

Laminate structure and manufacturing method thereof

 #49
20160284524
2016-09-29

Cylindrical sputtering target

 #50
20160254128
2016-09-01

SPUTTERING TARGET AND PROCESS FOR PRODUCING IT

 #51
20160099135
2016-04-07

Rectangular Hollow Sputter Source and Method of use Thereof

 #52
20160093477
2016-03-31

DURABLE 3D GEOMETRY CONFORMAL ANTI-REFLECTION COATING

 #53
20150376772
2015-12-31

MULTI-SURFACE NANOPARTICLE SOURCES AND DEPOSITION SYSTEMS

 #54
20150197847
2015-07-16

Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure

 #55
20150041310
2015-02-12

Sputtering apparatus and method

 #56
20150008120
2015-01-08

In-vacuum rotational device

 #57
20140367252
2014-12-18

Sputtering target assembly

 #58
20140315043
2014-10-23

Sputtering target for forming protective film, and laminated wiring film

 #59
20140305795
2014-10-16

Magnetron plasma apparatus

 #60
20140262767
2014-09-18

Sputter source for semiconductor process chambers

 #61
20140262752
2014-09-18

Method and apparatus for producing low-particle layers on substrates

 #62
20140262750
2014-09-18

Sputtering devices and methods

 #63
20140238852
2014-08-28

Cylindrical evaporation source

 #64
20140183037
2014-07-03

Radio-frequency sputtering system with rotary target for fabricating solar cells

 #65
20140061029
2014-03-06

Sputtering apparatus

 #66
20140042022
2014-02-13

Inverted cylindrical magnetron (ICM) system and methods of use

 #67
20140027276
2014-01-30

Tubular target having a protective device

 #68
20130264199
2013-10-10

CYLINDRICAL MAGNETRON SPUTTERING TARGET ASSEMBLY

 #69
20130228452
2013-09-05

Soft sputtering magnetron system

 #70
20130220795
2013-08-29

Sputtering apparatus including target mounting and control

 #71
20130192981
2013-08-01

Direct cooled rotary sputtering target

 #72
20130008777
2013-01-10

Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions

 #73
20120261253
2012-10-18

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

 #74
20120222956
2012-09-06

METHOD AND APPARATUS FOR FORMING A CYLINDRICAL TARGET ASSEMBLY

 #75
20120213917
2012-08-23

Tube-shaped sputtering target

 #76
20120211352
2012-08-23

Sputtering magnetron assembly

 #77
20120193227
2012-08-02

MAGNET ARRAY FOR A PHYSICAL VAPOR DEPOSITION SYSTEM

 #78
20120193226
2012-08-02

PHYSICAL VAPOR DEPOSITION SYSTEM

 #79
20120181171
2012-07-19

Nanoparticle Deposition Systems

 #80
20120175251
2012-07-12

Sputtering apparatus

 #81
20120164051
2012-06-28

METHOD FOR THE PRODUCTION OF OXIDE AND NITRIDE COATINGS AND ITS USE

 #82
20120152738
2012-06-21

MAGNETRON ARRANGEMENT WITH A HOLLOW TARGET

 #83
20120118725
2012-05-17

FILM FORMING METHOD AND FILM FORMING APPARATUS

 #84
20120103803
2012-05-03

Tube target

 #85
20120048724
2012-03-01

Cylindrical Magnetron Sputter Source Utilizing Halbach Magnet Array

 #86
20120037500
2012-02-16

HOLLOW TARGET ASSEMBLY

 #87
20120012458
2012-01-19

Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system

 #88
20120012455
2012-01-19

Apparatus and method for detecting a state of a deposition apparatus

 #89
20120006680
2012-01-12

Rotary target backing tube bonding assembly

 #90
20110192716
2011-08-11

METHOD FOR PRODUCING AN ITO LAYER AND SPUTTERING SYSTEM

 #91
20110168555
2011-07-14

ROTARY SPUTTERING TARGET AND APPARATUS FOR MANUFACTURE

 #92
20110079511
2011-04-07

MAGNET ARRANGEMENT FOR A TARGET BACKING TUBE AND TARGET BACKING TUBE COMPRISING THE SAME

 #93
20110062022
2011-03-17

Rotatable sputtering magnetron with high stiffness

 #94
20110062020
2011-03-17

Rotary Target Assembly and Rotary Target

 #95
20110031117
2011-02-10

Sputtering target apparatus

 #96
20110024284
2011-02-03

Sputtering apparatus including cathode with rotatable targets, and related methods

 #97
20110005923
2011-01-13

SPUTTERING SYSTEM, ROTATABLE CYLINDRICAL TARGET ASSEMBLY, BACKING TUBE, TARGET ELEMENT AND COOLING SHIELD

 #98
20100330856
2010-12-30

Papermaking fabrics with contaminant resistant nanoparticle coating and method of in situ application

 #99
20100300877
2010-12-02

HIGH UTILIZATION ROTATABLE TARGET USING CERAMIC TITANIUM OXIDE RING

 #100
20100270144
2010-10-28

High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches

 #101
20100252416
2010-10-07

Sputtering target for PVD chamber

 #102
20100243428
2010-09-30

Rotary cathode for magnetron sputtering apparatus

 #103
20100236920
2010-09-23

DEPOSITION APPARATUS WITH HIGH TEMPERATURE ROTATABLE TARGET AND METHOD OF OPERATING THEREOF

 #104
20100200395
2010-08-12

Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses

 #105
20100170780
2010-07-08

Magnet bar support system

 #106
20100155226
2010-06-24

Rotatable magnetron sputtering with axially movable target electrode tube

 #107
20100101946
2010-04-29

ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHODS OF PRODUCING AND RESTORING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION

 #108
20100018854
2010-01-28

Trim magnets to adjust erosion rate of cylindrical sputter targets

 #109
20090277787
2009-11-12

Rotatable sputter target comprising an end-block with a liquid coolant supply system

 #110
20090145743
2009-06-11

Sputtering devices and methods

 #111
20090139861
2009-06-04

Magnetic shunts in tubular targets

 #112
20090045047
2009-02-19

Conformal magnetron sputter deposition

 #113
20080299309
2008-12-04

METHOD FOR PRODUCING A COATING WITH IMPROVED ADHESION

 #114
20080280130
2008-11-13

Component, an apparatus and a method for the manufacture of a layer system

 #115
20080011600
2008-01-17

Dual hexagonal shaped plasma source

 #116
20080011599
2008-01-17

Sputtering apparatus including novel target mounting and/or control

 #117
20080003385
2008-01-03

PVD cylindrical target

 #118
20070256926
2007-11-08

HOLLOW CATHODE SPUTTERING APPARATUS AND RELATED METHOD

 #119
20070131545
2007-06-14

Packaging device and packaging method for hollow cathode type sputtering target

 #120
20070095654
2007-05-03

Controlled multi-step magnetron sputtering process

 #121
20070089983
2007-04-26

CATHODE INCORPORATING FIXED OR ROTATING TARGET IN COMBINATION WITH A MOVING MAGNET ASSEMBLY AND APPLICATIONS THEREOF

 #122
20070080056
2007-04-12

Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths

 #123
20070074969
2007-04-05

Very long cylindrical sputtering target and method for manufacturing

 #124
20070062809
2007-03-22

Method of manufacturing a rotary sputtering target using a mold

 #125
20060207871
2006-09-21

Sputtering devices and methods

 #126
20060204657
2006-09-14

Papermaking fabrics with contaminant resistant nanoparticle coating and method of in situ application

 #127
20050255700
2005-11-17

Controlled multi-step magnetron sputtering process

 #128
20050167015
2005-08-04

Hollow cathode target and methods of making same

 #129
20050103620
2005-05-19

PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE

 #130
20050056536
2005-03-17

Multi-step magnetron sputtering process

 #131
20050029088
2005-02-10

Hollow cathode sputtering apparatus and related method