PROCESS TO DEPOSIT QUANTIZED NANO LAYERS BY MAGNETRON SPUTTERING

MULTIFACETED TARGET FOR AN ION SOURCE

INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES

RARE EARTH ROTARY TARGET AND PREPARATION METHOD THEREFOR

DEPOSITION SYSTEM AND METHOD

MOLYBDENUM MONOLITHIC PHYSICAL VAPOR DEPOSITION TARGET

FILM FORMING APPARATUS AND FILM FORMING METHOD

ACTIVELY COOLED ANODE FOR SPUTTERING PROCESSES

SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME

CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING

Deposition apparatus, deposition target structure, and method

Target and film forming apparatus

ELECTROCHROMIC DEVICES

Sputtering target product and method for producing recycled sputtering target product

Tilted PVD source with rotating pedestal

Deposition apparatus, deposition target structure, and method

Deposition system and method

SPUTTERING DEVICE

Movable magnet array for magnetron sputtering

Sputtering apparatus, film formation method, and method for manufacturing product

METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER COATED SUBSTRATES AND APPARATUS

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT

RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

Optical film, sputtering target, and method of producing optical film

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

COMMON VACUUM SHUTTER AND PASTING MECHANISM FOR A MULTISTATION CLUSTER PLATFORM

MAGNETRON PLASMA APPARATUS

Film forming apparatus and film forming method

Profiled sputtering target and method of making the same

Target, film forming apparatus, and method of manufacturing film formation object

Magnetron sputtering source and coating system arrangement

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

High throughput vacuum deposition sources and system

Sputtering target and method of producing the same

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Sputtering target

Heat-Transfer Roller for Sputtering and Method of Making the Same

Large-grain tin sputtering target

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Film forming apparatus

HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME

Sputtering target with backside cooling grooves

DUAL POWER FEED ROTARY SPUTTERING CATHODE

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus

Sputter trap having multimodal particle size distribution

Rotatable sputtering target

HIGH-POWER RESONANCE PULSE AC HEDP SPUTTERING SOURCE AND METHOD FOR MATERIAL PROCESSING

Electrochromic devices

Sputtering target packaging structure and method of packaging sputtering target

System, method and support for coating eyeglass lenses

Device, method and use for the coating of lenses

Plasma Process and Reactor for the Thermochemical Treatment of the Surface of Metallic Pieces

Target assembly for safe and economic evaporation of brittle materials

METHODS AND APPARATUS FOR UNIFORMITY CONTROL IN SELECTIVE PLASMA VAPOR DEPOSITION

SHIELDED SPUTTER DEPOSITION APPARATUS AND METHOD

SHIELDED SPUTTER DEPOSITION APPARATUS AND METHOD

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Sputtering cathode, sputtering device, and method for producing film-formed body

Ion Source Device, Sputtering Apparatus and Method

Sputtering target capable of stabilizing ignition

Method of production of uniform metal plates and sputtering targets made thereby

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Sputtering target with backside cooling grooves

Profiled sputtering target and method of making the same

Sputtering target

APPARATUS CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, SYSTEM CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON A SUBSTRATE

High throughput vacuum deposition sources and system

Vacuum processing apparatus and method for vacuum processing substrates

Monocrystalline silicon sputtering target

Processes for low pressure, cold bonding of solid lithium to metal substrates

Sputter trap having multimodal particle size distribution

SPUTTERING CATHODE, SPUTTERING DEVICE, AND METHOD FOR PRODUCING FILM-FORMED BODY

Sputtering target

Cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact

SPUTTERING TARGET HAVING REVERSE BOWNG TARGET GEOMETRY

Plasma Process and Reactor for the Thermochemical Treatment of the Surface of Metallic Pieces

Sputtering target with backside cooling grooves

MAGNETRON PLASMA APPARATUS

Sputtering target for PVD chamber

Magnetic anode for sputter magnetron cathode

Upright target structure and sputtering equipment

Electrochromic devices

Cathode assembly

Dual power feed rotary sputtering cathode

Durable 3D geometry conformal anti-reflection coating

SPUTTERING DEVICE COMPONENT WITH MODIFIED SURFACE AND METHOD OF MAKING

SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS

CONTOURED TARGET FOR SPUTTERING

Surrounding field sputtering source

SPUTTERING SOURCE ARRANGEMENT, SPUTTERING SYSTEM AND METHOD OF MANUFACTURING METAL-COATED PLATE-SHAPED SUBSTRATES

Target material for sputtering and method for manufacturing same

SPUTTERING APPARATUS

Apparatus and method for coating inner wall of metal tube

MAGNETRON PLASMA APPARATUS

Sputter System for Uniform Sputtering

Sputtering target

Methods for surface preparation of sputtering target

DESIGN AND ASSEMBLY OF GRADED-OXIDE TANTALUM POROUS FILMS FROM SIZE-SELECTED NANOPARTICLES AND DENTAL AND BIOMEDICAL IMPLANT APPLICATION THEREOF

Cylindrical sputtering target

Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact

SPUTTERING TARGET AND PROCESS FOR PRODUCING IT

Copper-gallium sputtering target

Tantalum sputtering target

WARP CORRECTION METHOD FOR SPUTTERING TARGET WITH BACKING PLATE

Electrochromic devices

Cylindrical sputtering target material

Manufacturing method of cylindrical sputtering target material

Target, adapted to an indirect cooling device, having a cooling plate

VACUUM ION SPUTTERING TARGET DEVICE

Sputtering target and method for production thereof

SPUTTERING TARGET AND METHOD OF PRODUCING THIN FILM BY USING SPUTTERING TARGET

Rectangular Hollow Sputter Source and Method of use Thereof

Backing plate-integrated metal sputtering target and method of producing same

CYLINDRICAL SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

Tablet for plasma coating system, method of manufacturing the same, and method of manufacturing a thin film using the method of manufacturing the tablet

Zinc oxide sputtering target

(Ga) Zn Sn oxide sputtering target

SILICON SPUTTERING TARGET WITH ENHANCED SURFACE PROFILE AND IMPROVED PERFORMANCE AND METHODS OF MAKING THE SAME

Sputtering targets and methods

Indium cylindrical sputtering target and manufacturing method thereof

TUBULAR TARGET

Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device

Physical vapor deposition (PVD) target having low friction pads

FILM FORMING APPARATUS

PVD APPARATUS FOR DIRECTIONAL MATERIAL DEPOSITION, METHODS AND WORKPIECE

ROTATING MAGNETRON SPUTTERING TARGET AND CORRESPONDING MAGNETRON SPUTTERING DEVICE

Sputtering target with backside cooling grooves

SILVER-BASED CYLINDRICAL TARGET AND PROCESS FOR MANUFACTURING SAME

Sputtering target assembly

Tablet for plasma coating system, method of manufacturing the same, and method of manufacturing a thin film using the method of manufacturing the tablet

Sputter source for semiconductor process chambers

Target for PVD sputtering system

Hot tile sputtering system

Finned shutter disk for a substrate process chamber

Radio-frequency sputtering system with rotary target for fabricating solar cells

Evaporation source

Diffusion-bonded sputter target assembly and method of manufacturing

Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube

Narrow source for physical vapor deposition processing

Indium sputtering target and method for manufacturing same

Apparatus for enabling concentricity of plasma dark space

Sputtering target with reverse erosion profile surface and sputtering system and method using the same

SPUTTER TARGET

SEPARATED TARGET APPARATUS FOR SPUTTERING AND SPUTTERING METHOD USING THE SAME

SPUTTERING TARGETS, SPUTTER REACTORS, METHODS OF FORMING CAST INGOTS, AND METHODS OF FORMING METALLIC ARTICLES

Magnetron with non-equipotential cathode

Tube target

PHYSICAL VAPOR DEPOSITION DEVICE FOR COATING WORKPIECE

Triangular Scanning Magnet in Sputtering Tool Moving Over Larger Triangular Target

Integrated anode and activated reactive gas source for use in magnetron sputtering device

PUCK FOR CATHODIC ARC COATING WITH CONTINUOUS GROOVE TO CONTROL ARC

Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same

METHOD AND APPARATUS FOR SPUTTERING FILM CONTAINING HIGH VAPOR PRESSURE MATERIAL

Ring cathode for use in a magnetron sputtering device

Cylindrical sputtering target, and method for manufacturing same

Target shaping

Cylindrical magnetron having a shunt

MAGNETRON SPUTTERING METHOD, AND MAGNETRON SPUTTERING APPARATUS

Cathode unit and sputtering apparatus provided with the same

Magnetron sputtering device having rotatable substrate holder

Physical vapor deposition device

Hot tile sputtering system

Sputtering target for PVD chamber

FILM COATING APPARATUS

ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION

MICROSTRIP ANTENNA ASSISTED IPVD

Coating Apparatus For The Coating Of A Substrate, As Well As A Method For The Coating Of A Substrate

Method of Hard Coating a Blade

LOW DAMAGE SPUTTERING SYSTEM AND METHOD

TARGET FOR EFFICIENT USE OF PRECIOUS DEPOSITION MATERIAL

MULTIPLE GROOVED VACUUM COUPLING

INSERT PIECE FOR AN END-BLOCK OF A SPUTTERING INSTALLATION

SPUTTER COATING DEVICE

Target arrangement

Sputter targets with expansion grooves for reduced separation

Sputtering target with grooves and intersecting channels

Plasma vapor deposition

Target designs and related methods for coupled target assemblies, methods of production and uses thereof

Puck for cathodic arc coating with continuous groove to control arc

Sputtering target having increased life and sputtering uniformity

MULTITARGET SPUTTER SOURCE AND METHOD FOR THE DEPOSITION OF MULTI-LAYERS

BONDING METHOD FOR CYLINDRICAL TARGET

Sputtering device and film forming method

Deposition system with improved material utilization

Magnetron Sputtering Source, Sputter-Coating Installation, and Method for Coating a Substrate

Deposition system

Sputtering target, sputtering target-backing plate assembly and deposition system

PVD cylindrical target

Electrically Coupled Target Panels

Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same

Magnetron cathode and sputtering device installing it

Sputtering apparatus, method of driving the same, and method of manufacturing substrate using the same

Target for a sputtering source

Target holding apparatus

Method of ionized physical vapor deposition sputter coating high aspect-ratio structures

Process kit components for titanium sputtering chamber

Target for sputtering chamber

Method and apparatus for improving symmetry of a layer deposited on a semiconductor substrate

Target arrangement for mounting / dismounting and method of manufacturing

Sputter apparatus with a pipe cathode and method for operating this sputter apparatus

Target designs and related methods for enhanced cooling and reduced deflection and deformation

SPUTTERING TARGET FOR TITANIUM SPUTTERING CHAMBER

Controlled multi-step magnetron sputtering process

Protective offset sputtering

Protective offset sputtering

Multiple zone sputtering target created through conductive and insulation bonding

Variable thickness plate for forming variable wall thickness physical vapor deposition target

Centering mechanism for aligning sputtering target tiles

Deposition method by physical vapor deposition and target for deposition processing by physical vapor deposition

Sputtering target tiles having structured edges separated by a gap

Target assemblies, targets, backing plates, and methods of target cooling

System and method for processing nanowires with holographic optical tweezers

Sputter coating system

Physical vapor deposition target constructions

Slotted thin-film sputter deposition targets for ferromagnetic materials

Target tiles in a staggered array

Cylindrical target with oscillating magnet for magnetron sputtering

Tubular sputtering targets and methods of flowforming the same

Rotary target locking ring assembly

Controlled multi-step magnetron sputtering process

Controlled cooling of sputter targets

Sputter target having modified surface texture

Multi-step magnetron sputtering process

Sliding anode magnetron sputtering source