205399 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor; Targets Target-material dispenser
SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PLATE, AND METHOD OF MANUFACTURING SPUTTERING TARGET
#2Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target
#3Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target
#4Profiled sputtering target and method of making the same
#5System for focused deposition of atomic vapors
#6Sputtering apparatus including cathode with rotatable targets, and related methods
#7Insertable target holder for solid dopant materials
#8METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION VIA LINEAR SCANNING WITH AMBIENT CONTROL
#9Profiled sputtering target and method of making the same
#10Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms
#11Plasma processing apparatus and plasma processing method
#12Physical vapor deposition tile arrangement and physical vapor deposition arrangement
#13Sputtering apparatus including cathode with rotatable targets, and related methods
#14SPUTTERING TARGET